US 6,831,004 B2Grant
Formation of boride barrier layers using chemisorption techniques
Issue Date:2004-12-14
•34 Claims
•7 Drawing Sheets
Abstract
A method of forming a boride layer for integrated circuit fabrication is disclosed. In one embodiment, the boride layer is formed by chemisorbing monolayers of a boron-containing compound and one refractory metal compound onto a substrate. In an alternate embodiment, the boride layer has a composite structure. The composite boride layer structure comprises two or more refractory metals. The composite boride layer is formed by sequentially chemisorbing monolayers of a boron compound and two or more refractory metal compounds on a substrate.
Metadata
Assignee
- Applied Materials, Inc.
Inventors
- Jeong Soo Byun
- Alfred Mak
Application Information
Application Number:US 10/387,990
Filing Date:2003-03-13
Priority Date:2000-06-27
Art Unit:7
Classifications
IPC:
H01L 214763
Field of Search:
438584438627438628
Patent Drawings (7 sheets)
Description
Cross-Reference to Related Applications
[0002] This application is a continuation of U.S. patent application Ser. No. 09/604,943, filed Jun. 27, 2000, now U.S. Pat. No. 6,620,723 which is herein incorporated by reference.
Background of the Invention
[0003] 1. Field of the Invention
[0004] The present invention relates to the formation of boride barrier layers and, more particularly to boride barrier layers formed using chemisorption techniques.
[0005] 2. Description of the Related Art
[0006] In the manufacture of integrated circuits, barrier layers are often used to inhibit the diffusion of metals and other impurities into regions underlying such barrier layers. These underlying regions may include transistor gates, capacitor dielectric, semiconductor substrates, metal lines, as well as many other structures that appear in integrated circuits.
[0007] For the current subhalf-micron (0.5 μm) generation of semiconductor devices, any microscopic reaction at an interface between interconnection layers can cause degradation of the resulting integrated circuits (e. g., increase the resistivity of the interconnection layers). Consequently, barrier layers have become a critical component for improving the reliability of interconnect metallization schemes.
[0008] Compounds of refractory metals such as, for example, nitrides, borides, and carbides have been suggested as diffusion barriers because of their chemical inertness and low resistivities (e. g., resistivities typically less than about 200 μΩ-cm). In particular, borides such as, for example, titanium diboride (TiB2) have been suggested for use as a barrier material since layers formed thereof generally have low resistivities (e. g., resistivities less than about 150 μΩ-cm).
[0009] Boride barrier layers are typically formed using chemical vapor deposition (CVD) techniques. For example, titanium tetrachloride (TiCl4) may be reacted with diborane (B2H6) to form titanium diboride (TiB2) using CVD. However, when Cl-based chemistries are used to form boride barrier layers, reliability problems can occur. In particular, boride layers formed using CVD chlorine-based chemistries typically have a high chlorine (Cl) content (e. g., chlorine content greater than about 3%). A high chlorine content is undesirable because the chlorine may migrate from the boride barrier layer into adjacent interconnection layers, which can increase the contact resistance of such interconnection layers and potentially change the characteristics of integrated circuits made therefrom.
[0010] Therefore, a need exists in the art for reliable boride barrier layers for integrated circuit fabrication. Particularly desirable would be reliable boride barrier layers useful for interconnect structures.
Summary of the Invention
[0011] Boride barrier layers for integrated circuit fabrication are provided. In one embodiment, the boride barrier layer comprises one refractory metal. The boride barrier layer may be formed by sequentially chemisorbing alternating monolayers of a boron compound and a refractory metal compound onto a substrate.
[0012] In an alternate embodiment, a composite boride barrier layer is formed. The composite boride barrier layer comprises two or more refractory metals. The composite boride barrier layer may be formed by sequentially chemisorbing monolayers of a boron compound and two or more refractory metal compounds onto a substrate.
[0013] The boride barrier layer is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the boride barrier layer comprises one refractory metal. The boride barrier layer is formed by sequentially chemisorbing alternating monolayers of a boron compound and one refractory metal compound on a substrate. Thereafter, one or more metal layers are deposited on the boride barrier layer to form an interconnect structure.
[0014] In another integrated circuit fabrication process, the boride barrier layer has a composite structure. The composite boride barrier layer comprises two or more refractory metals. The composite boride barrier layer is formed by sequentially chemisorbing monolayers of a boron compound and two or more refractory metal compounds on a substrate. Thereafter, one or more metal layers are deposited on the composite boride barrier layer to form an interconnect structure.
Brief Description of the Drawings
[0015] The teachings of the present invention can be readily understood by considering the following detailed description in conjunction with the accompanying drawings, in which:
[0016] FIG. 1 depicts a schematic illustration of an apparatus that can be used for the practice of embodiments described herein;
[0017] FIGS. 2a-2cdepict cross-sectional views of a substrate structure at different stages of integrated circuit fabrication incorporating a boride barrier layer;
[0018] FIGS. 3a-3cdepict cross-sectional views of a substrate undergoing a first sequential chemisorption process of a boron compound and one refractory metal compound to form a boride barrier layer;
[0019] FIGS. 4a-4ddepict cross-sectional views of a substrate undergoing a second sequential chemisorption process of a boron compound and two refractory metal compounds to form a composite boride barrier layer;
[0020] FIGS. 5a-5ddepict cross-sectional views of a substrate undergoing a third sequential chemisorption of a boron compound and two refractory metal compounds to form a composite boride barrier layer; and
[0021] FIGS. 6a-6cdepict cross-sectional views of a substrate structure at different stages of integrated circuit fabrication incorporating more than one boride barrier layer.
Detailed Description of the Preferred Embodiments
[0022] FIG. 1 depicts a schematic illustration of a wafer processing system 10 that can be used to form boride barrier layers in accordance with embodiments described herein. The system 10 comprises a process chamber 100, a gas panel 130, a control unit 110, along with other hardware components such as power supplies 106 and vacuum pumps 102. The salient features of process chamber 100 are briefly described below.
[0023] Chamber 100
[0024] The process chamber 100 generally houses a support pedestal 150, which is used to support a substrate such as a semiconductor wafer 190 within the process chamber 100. Depending on the specific process, the semiconductor wafer 190 can be heated to some desired temperature prior to layer formation.
[0025] In chamber 100, the wafer support pedestal 150 is heated by an embedded heater 170. For example, the pedestal 150 may be resistively heated by applying an electric current from an AC power supply 106 to the heater element 170. The wafer 190 is, in turn, heated by the pedestal 150, and can be maintained within a desired process temperature range of, for example, about 20° C. to about 500° C.
[0026] A temperature sensor 172, such as a thermocouple, is also embedded in the wafer support pedestal 150 to monitor the temperature of the pedestal 150 in a conventional manner. For example, the measured temperature may be used in a feedback loop to control the electric current applied to the heater element 170 by the power supply 106, such that the wafer temperature can be maintained or controlled at a desired temperature that is suitable for the particular process application. The pedestal 150 is optionally, heated using radiant heat (not shown).
[0027] A vacuum pump 102 is used to evacuate process gases from the process chamber 100 and to help maintain the desired pressure inside the chamber 100. An orifice 120 is used to introduce process gases into the process chamber 100. The dimensions of the orifice 120 are variable and typically depend on the size of the process chamber 100.
[0028] The orifice 120 is coupled to a gas panel 130 via a valve 125. The gas panel 130 provides process gases from two or more gas sources 135, 136 to the process chamber 100 through orifice 120 and valve 125. The gas panel 130 also provides a purge gas from a purge gas source 138 to the process chamber 100 through orifice 120 and valve 125.
[0029] A control unit 110, such as a computer, controls the flow of various process gases through the gas panel 130 as well as valve 125 during the different steps of a wafer process sequence. Illustratively, the control unit 110 comprises a central processing unit (CPU) 112, support circuitry 114, and memories containing associated control software 116. In addition to the control of process gases through the gas panel 130, the control unit 110 is also responsible for automated control of the numerous steps required for wafer processing—such as wafer transport, temperature control, chamber evacuation, among other steps.
[0030] The control unit 110 may be one of any form of general purpose computer processor that can be used in an industrial setting for controlling various chambers and sub-processors. The computer processor may use any suitable memory, such as random access memory, read only memory, floppy disk drive, hard disk, or any other form of digital storage, local or remote. Various support circuits may be coupled to the computer processor for supporting the processor in a conventional manner. Software routines as required may be stored in the memory or executed by a second processor that is remotely located. Bi-directional communications between the control unit 110 and the various components of the wafer processing system 10 are handled through numerous signal cables collectively referred to as signal buses 118, some of which are illustrated in FIG. 1.
[0031] Boride Barrier Layer Formation
[0032] FIGS. 2a-2cillustrate one preferred embodiment of boride layer formation for integrated circuit fabrication of an interconnect structure. In general, the substrate 200 refers to any workpiece upon which film processing is performed, and a substrate structure 250 is used to generally denote the substrate 200 as well as other material layers formed on the substrate 200. Depending on the specific stage of processing, the substrate 200 may be a silicon semiconductor wafer, or other material layer, which has been formed on the wafer. FIG. 2a,for example, shows a cross-sectional view of a substrate structure 250, having a material layer 202 thereon. In this particular illustration, the material layer 202 may be an oxide (e. g., silicon dioxide). The material layer 202 has been conventionally formed and patterned to provide a contact hole 202H extending to the top surface 200T of the substrate 200.
[0033] FIG. 2bshows a boride layer 204 conformably formed on the substrate structure 250. The boride layer 204 is formed by chemisorbing monolayers of a boron-containing compound and a refractory metal compound on the substrate structure 250.
[0034] The monolayers are chemisorbed by sequentially providing a boron-containing compound and one or more refractory metal compounds to a process chamber. In a first sequential chemisorption process, the monolayers of the boron-containing compound and one refractory metal compound are alternately chemisorbed on a substrate 300 as shown in FIGS. 3a-3c.
[0035] FIG. 3adepicts a cross-sectional view of a substrate 300, which may be in a stage of integrated circuit fabrication. A monolayer of a boron-containing compound 305 is chemisorbed on the substrate 300 by introducing a pulse of a boron-containing gas into a process chamber similar to that shown in FIG. 1. The boron-containing compound typically combines boron atoms 310 with one or more reactive species b 315. During boride layer formation, the reactive species b 315 form byproducts that are transported from the substrate 300 surface by the vacuum system.
[0036] The chemisorbed monolayer of the boron-containing compound 305 is self-limiting in that only one monolayer may be chemisorbed onto the substrate 300 surface during a given pulse. Only one monolayer of the boron-containing compound is chemisorbed on the substrate because the substrate has a limited surface area. This limited surface area provides a finite number of sites for chemisorbing the boron-containing compound. Once the finite number of sites are occupied by the boron-containing compound, further chemisorption of the boron-containing compound will be blocked.
[0037] The boron-containing compound may be for example a borane compound having the general formula BxHy, where x has a range between 1 and 10, and y has a range between 3 and 30. For example, borane (BH3), diborane (B2H6), triborane, tetraborane, pentaborane, hexaborane, heptaborane, octaborane, nanaborane, and decaborane, may be used as the boron-containing compound.
[0038] After the monolayer of the boron compound is chemisorbed onto the substrate 300, excess boron-containing compound is removed from the process chamber by introducing a pulse of a purge gas thereto. Purge gases such as, for example helium (He), argon (Ar), nitrogen (N2), ammonia (NH3), and hydrogen (H2), among others may be used.
[0039] After the process chamber has been purged, a pulse of one refractory metal compound is introduced into the process chamber. Referring to FIG. 3b,a layer of the refractory metal compound 307 is chemisorbed on the boron monolayer 305. The refractory metal compound typically combines refractory metal atoms 320 with one or more reactive species a 325.
[0040] The chemisorbed monolayer of the refractory metal compound 307 reacts with the boron-containing monolayer 305 to form a boride layer 309. The reactive species a 325 and b 315 form byproducts ab 330 that are transported from the substrate 300 surface by the vacuum system. The reaction of the refractory metal compound 307 with the boron monolayer 305 is self-limited, since only one monolayer of the boron compound was chemisorbed onto the substrate 300 surface.
[0041] The refractory metal compound may include refractory metals such as for example titanium (Ti), tungsten (W), tantalum (Ta), zirconium (Zr), hafnium (Hf), molybdenum (Mo), niobium (Nb), vanadium (V), and chromium (Cr), among others combined with reactive species such as, for example chlorine (Cl) and fluorine (F). For example, titanium tetrachloride (TiCl4), tungsten hexafluoride (WF6), tantalum pentachloride (TaCl5), zirconium tetrachloride (ZrCl4), hafnium tetrachloride (HfCl4), molybdenum pentachloride (MoCl5), niobium pentachloride (NbCl5), vanadium pentachloride (VCl5), chromium tetrachloride (CrCl4) may be used as the refractory metal compound.
[0042] After the monolayer of the refractory metal compound is chemisorbed onto the substrate 300, any excess refractory metal compound is removed from the process chamber by introducing another pulse of the purge gas therein. Thereafter, as shown in FIG. 3c,the boride layer deposition sequence of alternating monolayers of the boron-containing compound and the refractory metal compound are repeated until a desired boride layer thickness is achieved. The boride layer may, for example, have a thickness in a range of about 200 Å to about 5000 Å, and more preferably, about 2500 Å.
[0043] In FIGS. 3a-3c,boride layer formation is depicted as starting with the chemisorption of a boron-containing monolayer on the substrate followed by a monolayer of a refractory metal compound. Alternatively, the boride layer formation may start with the chemisorption of a monolayer of a refractory metal compound on the substrate followed by a monolayer of the boron-containing compound.
[0044] The pulse time for each pulse of the boron-containing compound, the one or more refractory metal compounds, and the purge gas is variable and depends on the volume capacity of the deposition chamber as well as the vacuum system coupled thereto. Similarly, the time between each pulse is also variable and depends on the volume capacity of the process chamber as well as the vacuum system coupled thereto.
[0045] In general, the alternating monolayers may be chemisorbed at a substrate temperature less than about 500° C., and a chamber pressure less than about 100 torr. A pulse time of less than about 1 second for the boron-containing compound, and a pulse time of less than about 1 second for the refractory metal compounds are typically sufficient to chemisorb the alternating monolayers that comprise the boride layer on the substrate. A pulse time of less than about 1 second for the purge gas is typically sufficient to remove the reaction byproducts as well as any residual materials remaining in the process chamber.
[0046] In a second chemisorption process, the boron-containing monolayers and two or more refractory metal compounds are alternately chemisorbed on the substrate to form a composite boride layer. FIG. 4adepicts a cross-sectional view of a substrate 400, which may be in a stage of integrated circuit fabrication. A self-limiting monolayer of a boron-containing compound 405 is chemisorbed on the substrate 400 by introducing a pulse of a boron-containing compound into a process chamber similar to that shown in FIG. 1 according to the process conditions described above with reference to FIGS. 2a-2c.The boron-containing compound combines boron atoms 410 with one or more reactive species b 415.
[0047] After the monolayer of the boron compound 405 is chemisorbed onto the substrate 400, excess boron-containing compound is removed from the process chamber by introducing a pulse of a purge gas thereto.
[0048] Referring to FIG. 4b,after the process chamber has been purged, a pulse of a first refractory metal compound M1a1is introduced into the process chamber. A layer of the first refractory metal compound 407 is chemisorbed on the boron monolayer 405. The first refractory metal compound typically combines first refractory metal atoms M1420 with one or more reactive species a1425.
[0049] The chemisorbed monolayer of the first refractory metal compound 407 reacts with the boron-containing monolayer 405 to form a boride monolayer 409. The reactive species a1425 and b 415 form byproducts a1b 430 that are transported from the substrate 400 surface by the vacuum system.
[0050] After the monolayer of the first refractory metal compound 407 is chemisorbed onto the substrate 400, the excess first refractory metal compound M1a1is removed from the process chamber by introducing another pulse of the purge gas therein.
[0051] Another pulse of the boron-containing compound is than introduced into the process chamber. A monolayer of the boron-containing compound 405 is chemisorbed on the first refractory metal monolayer 407, as shown in FIG. 4c.The chemisorbed monolayer of the boron-containing compound 405 reacts with the first refractory metal monolayer 407 to form a boride layer 409. The reactive species a1425 and b 415 form byproducts a1b 430 that are transported from the substrate 400 surface by the vacuum system.
[0052] After the monolayer of the boron compound 405 is chemisorbed onto the first refractive metal monolayer 407, excess boron-containing compound is removed from the process chamber by introducing a pulse of a purge gas thereto.
[0053] Referring to FIG. 4d,after the process chamber has been purged, a pulse of a second refractory metal compound M2a1is introduced into the process chamber. A layer of the second refractory metal compound 411 is chemisorbed on the boron monolayer 405. The second refractory metal compound typically combines second refractory metal atoms M2440 with one or more reactive species a1425.
[0054] The chemisorbed monolayer of the second refractory metal compound 411 reacts with the boron-containing monolayer 405 to form the composite boride layer 409. The reactive species a1425 and b 415 form byproducts a1b 430 that are transported from the substrate 400 surface by the vacuum system.
[0055] After the monolayer of the second refractory metal compound 411 is chemisorbed onto the substrate 400, the excess second refractory metal compound M2a1is removed from the process chamber by introducing another pulse of the purge gas therein.
[0056] Thereafter, the boride layer deposition sequence of alternating monolayers of the boron-containing compound and the two refractory metal compounds M1a1and M2a1are repeated until a desired boride layer thickness is achieved.
[0057] In FIGS. 4a-4d,boride layer formation is depicted as starting with the chemisorption of the boron-containing monolayer on the substrate followed by monolayers of the two refractory metal compounds. Alternatively, the boride layer formation may start with the chemisorption of monolayers of either of the two refractory metal compounds on the substrate followed by monolayers of the boron-containing compound. Optionally, monolayers of more than two refractory metal compounds may be chemisorbed on the substrate 400.
[0058] In a third chemisorption process, the boron-containing monolayers and two or more refractory metal compounds are alternately chemisorbed on the substrate to form a composite boride layer, as illustrated in FIGS. 5a-5d.
[0059] FIG. 5adepicts a cross-sectional view of a substrate 500, which may be in a stage of integrated circuit fabrication. A self-limiting monolayer of a first refractory metal compound 507 is chemisorbed on the substrate 500 by introducing a pulse of a first refractory metal compound M1a1into a process chamber similar to that shown in FIG. 1 according to the process conditions described above with reference to FIGS. 2a-2c.
[0060] After the monolayer of the first refractory metal compound 507 is chemisorbed onto the substrate 500, excess first refractory metal compound is removed from the process chamber by introducing a pulse of a purge gas thereto.
[0061] Referring to FIG. 5b,after the process chamber has been purged, a pulse of a second refractory metal compound M2a1is introduced into the process chamber. A layer of the second refractory metal compound 511 is chemisorbed on the first refractory metal monolayer 507.
[0062] After the monolayer of the second refractory metal compound 511 is chemisorbed onto the substrate 500, the excess second refractory metal compound M2a1is removed from the process chamber by introducing another pulse of the purge gas therein.
[0063] A pulse of a boron-containing compound is than introduced into the process chamber. A monolayer of the boron-containing compound 505 is chemisorbed on the second refractory metal monolayer 511, as shown in FIG. 5c.The chemisorbed monolayer of the boron-containing compound 505 reacts with the second refractory metal monolayer 511 to form a composite boride layer 509. The reactive species a1525 and b 515 form byproducts a1b 530 that are transported from the substrate 500 surface by the vacuum system.
[0064] After the monolayer of the boron compound 505 is chemisorbed onto the second refractory metal monolayer 511, excess boron-containing compound is removed from the process chamber by introducing a pulse of a purge gas thereto.
[0065] Referring to FIG. 5d,after the process chamber has been purged, a pulse of the first refractory metal compound M1a1is introduced into the process chamber. A monolayer of the first refractory metal compound 507 is chemisorbed on the boron monolayer 505.
[0066] The chemisorbed monolayer of the first refractory metal compound 507 reacts with the boron-containing monolayer 505 to form the boride monolayer 509. The reactive species a1525 and b 515 form byproducts a1b 530 that are transported from the substrate 500 surface by the vacuum system.
[0067] After the monolayer of the first refractory metal compound 507 is chemisorbed onto the substrate 500, the excess first refractory metal compound M1a1is removed from the process chamber by introducing another pulse of the purge gas therein.
[0068] Thereafter, the boride layer deposition sequence of alternating monolayers of the boron-containing compound and the two refractory metal compounds M1a1and M2a1are repeated until a desired boride layer thickness is achieved.
[0069] In FIGS. 5a-5d,boride layer formation is depicted as starting with the chemisorption of the first refractory metal monolayer on the substrate followed by monolayers of the second refractory metal compound and the boron-containing compound. Alternatively, the boride layer formation may start with the chemisorption of the monolayer of the boron-containing compound on the substrate followed by the monolayers of the two refractory metal compounds. Optionally, monolayers of more than two refractory metal compounds may be chemisorbed on the substrate 500.
[0070] The sequential deposition processes described above advantageously provide good step coverage for the boride layer, due to the monolayer chemisorption mechanism used for forming the boride layer. In particular, boride layer formation using the monolayer chemisorption mechanism is believed to contribute to a near perfect step coverage over complex substrate topographies.
[0071] Furthermore, in chemisorption processes, since only one monolayer may be absorbed on the topographic surface, the size of the deposition area is largely independent of the amount of precursor gas remaining in the reaction chamber once a monolayer has been formed.
[0072] Referring to FIG. 2c,after the formation of the boride layer 204, a contact layer 206 may be formed thereon to complete the interconnect structure. The contact layer 206 is preferably selected from the group of aluminum (Al), copper (Cu), tungsten (W), and combinations thereof.
[0073] The contact layer 206 may be formed, for example, using chemical vapor deposition (CVD), physical vapor deposition (PVD), or a combination of both CVD and PVD. For example, an aluminum (Al) layer may be deposited from a reaction of a gas mixture containing dimethyl aluminum hydride (DMAH) and hydrogen (H2) or argon (Ar) or other DMAH containing compounds, a CVD copper layer may be deposited from a gas mixture containing Cu+2(hfac)2(copper hexafluoro acetylacetonate), Cu+2(fod)2(copper heptafluoro dimethyl octanediene), Cu+1hfac TMVS (copper hexafluoro acetylacetonate trimethylvinylsilane), or combinations thereof, and a CVD tungsten layer may be deposited from a gas mixture containing tungsten hexafluoride (WF6). A PVD layer is deposited from a copper target, an aluminum target, or a tungsten target.
[0074] FIGS. 6a-6cillustrate an alternate embodiment of boride layer formation for integrated circuit fabrication of the interconnect structure. In general, the substrate 600 refers to any workpiece upon which film processing is performed, and a substrate structure 650 is used to generally denote the substrate 600 as well as other material layers formed on the substrate 600. Depending on the specific stage of processing, the substrate 600 may be a silicon semiconductor wafer, or other material layer, which has been formed on the wafer. FIG. 6a,for example, shows a cross-sectional view of a substrate structure 650, having a material layer 602 thereon. In this particular illustration, the material layer 602 may be an oxide (e. g., silicon dioxide). The material layer 602 has been conventionally formed and patterned to provide a contact hole 602H extending to the top surface 600T of the substrate 600.
[0075] FIG. 6bshows two boride layers 604, 606 conformably formed on the substrate structure 650. The boride layers 604, 606 are formed by chemisorbing monolayers of a boron-containing compound and one or more refractory metal compounds on the substrate structure 650 as described above with reference to FIGS. 3a-5d.The two boride layers 604, 606 may each comprise one or more refractory metals. The thicknesses of the two or more boride layers 604, 606 may be variable depending on the specific stage of processing. Each boride layer 604, 606 may, for example, have a thickness in a range of about 200 Å to about 5000 Å.
[0076] Referring to FIG. 6c,after the formation of the boride layers 604, 606, a contact layer 608 may be formed thereon to complete the interconnect structure. The contact layer 608 is preferably selected from the group of aluminum (Al), copper (Cu), tungsten (W), and combinations thereof.
[0077] The specific process conditions disclosed in the above discussion are meant for illustrative purposes only. Other combinations of process parameters such as precursor and inert gases, flow ranges, pressure and temperature may also be used in forming the boride layer of the present invention.
[0078] Although several preferred embodiments, which incorporate the teachings of the present invention, have been shown and described in detail, those skilled in the art can readily devise many other varied embodiments that still incorporate these teachings.
Claims
What is claimed is:
1. A method of forming a film on a substrate, comprising:
positioning the substrate having an oxide layer thereon; and
forming at least one metal boride layer on at least a portion of the substrate by sequentially chemisorbing monolayers of a boron-containing compound and one or more refractory metal compounds on the substrate to form the at least one metal boride layer thereon, wherein the at least one metal boride layer is formed using a sequential chemisorption process.
2. The method of claim 1, wherein the substrate is subjected to a purge gas following chemisorption of each monolayer.
3. The method of claim 1, wherein the boron-containing compound has general formula BxHy, where x has a range between 1 and 10, and y has a range between 3 and 30.
4. The method of claim 3, wherein the boron-containing compound is selected from the group consisting of borane, diborane, triborane, tetraborane, pentaborane, hexaborane, heptaborane, octaborane, nonaborane and decaborane.
5. The method of claim 1, wherein the one or more refractory metal compounds are selected from the group consisting of titanium tetrachloride, tungsten hexafluoride, tantalum pentachloride, zirconium tatrachloride, hafnium tetrachloride, molybdenum pentachloride, niobium pentachloride, vanadium chloride, and chromium chloride.
6. The method of claim 1, wherein forming at least one metal boride layer is performed at a temperature less than about 500° C.
7. The method of claim 1, wherein forming at least one metal boride layer is performed at a pressure less than about 100 Torr.
8. The method of claim 2, wherein the purge gas is selected from the group of helium, argon, hydrogen, nitrogen, ammonia, and combinations thereof.
9. The method of claim 1, wherein monolayers of the boron-containing compound and the one or more refractory metal compounds are alternately chemisorbed on the substrate.
10. The method of claim 9, wherein one monolayer of the boron-containing compound is chemisorbed between each chemisorbed monolayer of the one or more refractory metal compounds.
11. The method of claim 9, wherein one monolayer of the boron-containing compound is chemisorbed on the substrate after two or more monolayers of the one or more refractory metal compounds are chemisorbed thereon.
12. The method of claim 1, wherein the at least one metal boride layer has a thickness less than about 100 Å.
13. The method of claim 1, wherein the at least one metal boride layer has a thickness in a range of from about 200 Å to about 5,000 Å.
14. A method of forming a layer on a substrate for use in integrated circuit fabrication, comprising:
positioning the substrate within a deposition chamber; and
forming a boride layer comprising tungsten on at least a portion of the substrate by sequentially chemisorbing monolayers of a boron-containing compound and a tungsten-containing compound on the substrate.
15. A method of film deposition for integrated circuit fabrication, comprising:
placing a substrate within a deposition chamber;
introducing a boron-containing compound into the chamber;
chemisorbing at least a portion of the boron-containing compound on the substrate at conditions sufficient to form a boron-containing layer;
evacuating the chamber;
introducing at least one refractory metal compound into the chamber;
reacting a portion of the at least one refractory metal compound with the boron-containing layer at conditions sufficient to form a metal boride containing layer; and
evacuating the chamber.
16. The method of claim 15, wherein the metal boride containing layer comprises at least one refractory metal selected from the group consisting of titanium, tungsten, vanadium, niobium, tantalum, zirconium, hafnium, chromium and molybdenum.
17. The method of claim 15, wherein the at least one refractory metal compound is selected from the group consisting of titanium tetrachloride tungsten hexafluoride, tantalum pentachloride, zirconium tetrachloride, hafnium tetrachloride molybdenum pentachloride, niobium pentachloride, vanadium chloride and chromium chloride.
18. The method of claim 15, wherein the boron-containing compound has the general formula BxHy, where x has a range from 1 to 10 and y has a range from 3 to 30.
19. The method of claim 15, wherein the boron-containing compound is selected from the group consisting of borane, diborane, triborane, tetraborane, pentaborane, hexaborane, heptaborane, octaborane, nonaborane and decaborane.
20. The method of claim 15, wherein the conditions sufficient to form the metal boride containing layer comprises a temperature of about 500° C. or less.
21. The method of claim 15, wherein the conditions sufficient to form the metal boride containing layer comprises a pressure of about 100 Torr or less.
22. The method of claim 15, further comprising purging the deposition chamber with at least one purge gas selected from the group consisting of helium, argon, hydrogen, nitrogon, ammonia and combinations thereof.
23. The method of claim 15, wherein the metal boride containing layer comprises at least two refractory metals.
24. The method of claim 15, wherein the metal boride containing layer has a thickness from about 200 Å to about 5,000 Å.
25. A method of film deposition for integrated circuit fabrication, comprising:
placing a substrate within a deposition chamber;
introducing at least one refractory metal compound into the chamber;
chemisorbing a portion of the at least one refractory metal compound on the substrate to form refractory metal containing layer;
evacuating the chamber;
introducing a boron-containing compound into the chamber;
reacting at least a portion of the boron-containing compound with the refractory metal containing layer at conditions sufficient to form a metal boride containing layer; and
evacuating the chamber.
26. The method of claim 25, wherein the metal boride containing layer comprises at least one refractory metal selected from the group consisting of titanium, tungsten, vanadium, niobium, tantalum, zirconium, hafnium, chromium and molybdenum.
27. The method of claim 25, wherein the at least one refractory metal compound is selected from the group consisting of titanium tetrachloride, tungsten hexafluoride, tantalum pentachloride, zirconium tetrachloride, hafnium tetrachloride, molybdenum pentachloride, niobium pentachloride, vanadium chloride and chromium chloride.
28. The method of claim 25, wherein the boron-containing compound has the general formula BxHy, where x has a range from 1 to 10, and y has a range from 3 to 30.
29. The method of claim 25, wherein the boron-containing compound is selected from the group consisting of borane, diborane, triborane, tetraborane, pentaborane, hexaborane, heptaborane, octaborane, nonaborane and decaborane.
30. The method of claim 25, wherein the conditions sufficient to from the metal boride containing layer comprises a temperature of about 500° C. or less.
31. The method of claim 25, wherein the conditions sufficient to form the metal boride containing layer comprises a pressure of about 100 Torr or less.
32. The method of claim 25, further comprising purging the deposition chamber with at least one purge gas selected from the group consisting of helium, argon, hydrogen, nitrogen, ammonia and combinations thereof.
33. The method of claim 25, wherein the metal boride containing layer comprises at least two refractory metals.
34. The method of claim 25, wherein the metal boride containing layer has a thickness from about 200 Å to about 5,000 Å.
Patent Citations (288)
| Patent | Date | Inventor | Cited By |
|---|---|---|---|
| US4389973(A) | 1983-06-01 | Suntola et al. | Applicant |
| US4413022(A) | 1983-11-01 | Suntola et al. | Applicant |
| US4486487(A) | 1984-12-01 | Skarp | Applicant |
| US5290609(A) | 1994-03-01 | Horiike et al. | Applicant |
| US5306666(A) | 1994-04-01 | Izumi | Applicant |
| US5374570(A) | 1994-12-01 | Nasu et al. | Applicant |
| US5526244(A) | 1996-06-01 | Bishop | Applicant |
| US5711811(A) | 1998-01-01 | Suntola et al. | Applicant |
| US5804488(A) | 1998-09-01 | Shih et al. | Applicant |
| US5916365(A) | 1999-06-01 | Sherman | Applicant |
| US5923056(A) | 1999-07-01 | Lee et al. | Applicant |
| US6013553(A) | 2000-01-01 | Wallace et al. | Applicant |
| US6015590(A) | 2000-01-01 | Suntola et al. | Applicant |
| US6015917(A) | 2000-01-01 | Bhandari et al. | Applicant |
| US6020243(A) | 2000-02-01 | Wallace et al. | Applicant |
| US6042652(A) | 2000-03-01 | Hynn et al. | Applicant |
| US6084302(A) | 2000-07-01 | Sandhu | Applicant |
| US6124158(A) | 2000-09-01 | Dautartas et al. | Applicant |
| US6139700(A) | 2000-10-01 | Kang et al. | Applicant |
| US6144060(A) | 2000-11-01 | Park et al. | Applicant |
| US6174809(B1) | 2001-01-01 | Kang et al. | Applicant |
| US6197683(B1) | 2001-03-01 | Kang et al. | Applicant |
| US6200893(B1) | 2001-03-01 | Sneh | Applicant |
| US6203613(B1) | 2001-03-01 | Gates et al. | Applicant |
| US6207302(B1) | 2001-03-01 | Sugiura et al. | Applicant |
| US6207487(B1) | 2001-03-01 | Kim et al. | Applicant |
| US6218298(B1) | 2001-04-01 | Hoinkis | Applicant |
| US6238734(B1) | 2001-05-01 | Senzaki et al. | Applicant |
| US6270572(B1) | 2001-08-01 | Kim et al. | Applicant |
| US6284646(B1) | 2001-09-01 | Leem | Applicant |
| US6287965(B1) | 2001-09-01 | Kang et al. | Applicant |
| US6291283(B1) | 2001-09-01 | Wilk | Applicant |
| US6297539(B1) | 2001-10-01 | Ma et al. | Applicant |
| US6299294(B1) | 2001-10-01 | Regan | Applicant |
| US6305314(B1) | 2001-10-01 | Sneh et al. | Applicant |
| US6333260(B1) | 2001-12-01 | Kwon et al. | Applicant |
| US6335280(B1) | 2002-01-01 | van der Jeugd | Applicant |
| US6342277(B1) | 2002-01-01 | Sherman | Applicant |
| US6348376(B2) | 2002-02-01 | Lim et al. | Applicant |
| US6348386(B1) | 2002-02-01 | Gilmer | Applicant |
| US6355561(B1) | 2002-03-01 | Sandhu et al. | Applicant |
| US6358829(B2) | 2002-03-01 | Yoon et al. | Applicant |
| US6368954(B1) | 2002-04-01 | Lopatin et al. | Applicant |
| US6369430(B1) | 2002-04-01 | Adetutu et al. | Applicant |
| US6372598(B2) | 2002-04-01 | Kang et al. | Applicant |
| US6379748(B1) | 2002-04-01 | Bhandari et al. | Applicant |
| US6391785(B1) | 2002-05-01 | Satta et al. | Applicant |
| US6391803(B1) | 2002-05-01 | Kim et al. | Applicant |
| US6395650(B1) | 2002-05-01 | Callegari et al. | Applicant |
| US6399491(B2) | 2002-06-01 | Jeon et al. | Applicant |
| US6416577(B1) | 2002-07-01 | Suntoloa et al. | Applicant |
| US6420189(B1) | 2002-07-01 | Lopatin | Applicant |
| US6420279(B1) | 2002-07-01 | Ono et al. | Applicant |
| US6423619(B1) | 2002-07-01 | Grant et al. | Applicant |
| US6447933(B1) | 2002-09-01 | Wang et al. | Applicant |
| US6451119(B2) | 2002-09-01 | Sneh et al. | Applicant |
| US6451695(B2) | 2002-09-01 | Sneh | Applicant |
| US6452229(B1) | 2002-09-01 | Krivokapic | Applicant |
| US6458701(B1) | 2002-10-01 | Chae et al. | Applicant |
| US6468924(B2) | 2002-10-01 | Lee et al. | Applicant |
| US6475276(B1) | 2002-11-01 | Elers et al. | Applicant |
| US6475910(B1) | 2002-11-01 | Sneh | Applicant |
| US6478872(B1) | 2002-11-01 | Chae et al. | Applicant |
| US6482262(B1) | 2002-11-01 | Elers et al. | Applicant |
| US6482733(B2) | 2002-11-01 | Raaijmakers et al. | Applicant |
| US6482740(B2) | 2002-11-01 | Soininen et al. | Applicant |
| US6511539(B1) | 2003-01-01 | Raaijmakers | Applicant |
| US6534395(B2) | 2003-03-01 | Werkhoven et al. | Applicant |
| US6548424(B2) | 2003-04-01 | Putkonen | Applicant |
| US6551929(B1) | 2003-04-01 | Kori et al. | Applicant |
| US6569501(B2) | 2003-05-01 | Chiang et al. | Applicant |
| US6585823(B1) | 2003-07-01 | Van Wijck | Applicant |
| US6599572(B2) | 2003-07-01 | Saanila et al. | Applicant |
| US6607976(B2) | 2003-08-01 | Chen et al. | Applicant |
| US6620723(B1) | 2003-09-01 | Byun et al. | Applicant |
| US6630201(B2) | 2003-10-01 | Chiang et al. | Applicant |
| US6632279(B1) | 2003-10-01 | Ritala et al. | Applicant |
| US6660126(B2) | 2003-12-01 | Nguyen et al. | Applicant |
| US6686271(B2) | 2004-02-01 | Raaijmakers et al. | Applicant |
| US2001/0000866(A1) | 2001-05-01 | Sneh et al. | Applicant |
| US2001/0002280(A1) | 2001-05-01 | Sneh | Applicant |
| US2001/0009140(A1) | 2001-07-01 | Bondestam et al. | Applicant |
| US2001/0009695(A1) | 2001-07-01 | Saanila et al. | Applicant |
| US2001/0021589(A1) | 2001-09-01 | Wilk | Applicant |
| US2001/0024387(A1) | 2001-09-01 | Raaijmakers et al. | Applicant |
| US2001/0025979(A1) | 2001-10-01 | Kim et al. | Applicant |
| US2001/0028924(A1) | 2001-10-01 | Sherman | Applicant |
| US2001/0029094(A1) | 2001-10-01 | Mee-Young et al. | Applicant |
| US2001/0029891(A1) | 2001-10-01 | Oh et al. | Applicant |
| US2001/0034123(A1) | 2001-10-01 | Jeon et al. | Applicant |
| US2001/0041250(A1) | 2001-11-01 | Werkhoven et al. | Applicant |
| US2001/0050039(A1) | 2001-12-01 | Park | Applicant |
| US2001/0054730(A1) | 2001-12-01 | Kim et al. | Applicant |
| US2001/0054769(A1) | 2001-12-01 | Raaijmakers et al. | Applicant |
| US2002/0000598(A1) | 2002-01-01 | Kang et al. | Applicant |
| US2002/0004293(A1) | 2002-01-01 | Soininen et al. | Applicant |
| US2002/0005556(A1) | 2002-01-01 | Cartier et al. | Applicant |
| US2002/0007790(A1) | 2002-01-01 | Park | Applicant |
| US2002/0008297(A1) | 2002-01-01 | Park et al. | Applicant |
| US2002/0014647(A1) | 2002-02-01 | Seidl et al. | Applicant |
| US2002/0015790(A1) | 2002-02-01 | Baum et al. | Applicant |
| US2002/0019121(A1) | 2002-02-01 | Pyo | Applicant |
| US2002/0020869(A1) | 2002-02-01 | Park et al. | Applicant |
| US2002/0021544(A1) | 2002-02-01 | Cho et al. | Applicant |
| US2002/0029092(A1) | 2002-03-01 | Gass | Applicant |
| US2002/0031618(A1) | 2002-03-01 | Sherman | Applicant |
| US2002/0037630(A1) | 2002-03-01 | Agarwal et al. | Applicant |
| US2002/0041931(A1) | 2002-04-01 | Suntola et al. | Applicant |
| US2002/0043666(A1) | 2002-04-01 | Parson et al. | Applicant |
| US2002/0048635(A1) | 2002-04-01 | Kim et al. | Applicant |
| US2002/0048880(A1) | 2002-04-01 | Lee | Applicant |
| US2002/0052097(A1) | 2002-05-01 | Park | Applicant |
| US2002/0055235(A1) | 2002-05-01 | Agarwal et al. | Applicant |
| US2002/0061612(A1) | 2002-05-01 | Sandhu et al. | Applicant |
| US2002/0064970(A1) | 2002-05-01 | Chooi et al. | Applicant |
| US2002/0074588(A1) | 2002-06-01 | Lee | Applicant |
| US2002/0076507(A1) | 2002-06-01 | Chiang et al. | Applicant |
| US2002/0076837(A1) | 2002-06-01 | Hujanen et al. | Applicant |
| US2002/0081826(A1) | 2002-06-01 | Rotondaro et al. | Applicant |
| US2002/0081844(A1) | 2002-06-01 | Jeon et al. | Applicant |
| US2002/0086111(A1) | 2002-07-01 | Byun et al. | Applicant |
| US2002/0090829(A1) | 2002-07-01 | Sandhu et al. | Applicant |
| US2002/0093046(A1) | 2002-07-01 | Moriya et al. | Applicant |
| US2002/0093781(A1) | 2002-07-01 | Bechhofer et al. | Applicant |
| US2002/0094689(A1) | 2002-07-01 | Park | Applicant |
| US2002/0098627(A1) | 2002-07-01 | Pomarede et al. | Applicant |
| US2002/0105088(A1) | 2002-08-01 | Yang et al. | Applicant |
| US2002/0106536(A1) | 2002-08-01 | Lee et al. | Applicant |
| US2002/0106846(A1) | 2002-08-01 | Seutter et al. | Applicant |
| US2002/0109168(A1) | 2002-08-01 | Kim et al. | Applicant |
| US2002/0117399(A1) | 2002-08-01 | Chen et al. | Applicant |
| US2002/0121241(A1) | 2002-09-01 | Nguyen et al. | Applicant |
| US2002/0121342(A1) | 2002-09-01 | Nguyen et al. | Applicant |
| US2002/0121697(A1) | 2002-09-01 | Marsh et al. | Applicant |
| US2002/0135071(A1) | 2002-09-01 | Kang et al. | Applicant |
| US2002/0146895(A1) | 2002-10-01 | Ramdani et al. | Applicant |
| US2002/0151152(A1) | 2002-10-01 | Shimamoto et al. | Applicant |
| US2002/0153579(A1) | 2002-10-01 | Yamamoto | Applicant |
| US2002/0155722(A1) | 2002-10-01 | Satta et al. | Applicant |
| US2002/0162506(A1) | 2002-11-01 | Sneh et al. | Applicant |
| US2002/0172768(A1) | 2002-11-01 | Endo et al. | Applicant |
| US2002/0175393(A1) | 2002-11-01 | Baum et al. | Applicant |
| US2002/0177282(A1) | 2002-11-01 | Song | Applicant |
| US2002/0182320(A1) | 2002-12-01 | Leskela et al. | Applicant |
| US2002/0187256(A1) | 2002-12-01 | Elers et al. | Applicant |
| US2002/0187631(A1) | 2002-12-01 | Kim et al. | Applicant |
| US2002/0197863(A1) | 2002-12-01 | Mak et al. | Applicant |
| US2002/0197881(A1) | 2002-12-01 | Ramdani et al. | Applicant |
| US2003/0013300(A1) | 2003-01-01 | Byun | Applicant |
| US2003/0013320(A1) | 2003-01-01 | Kim et al. | Applicant |
| US2003/0031807(A1) | 2003-02-01 | Elers et al. | Applicant |
| US2003/0032281(A1) | 2003-02-01 | Werkhoven et al. | Applicant |
| US2003/0049931(A1) | 2003-03-01 | Byun et al. | Applicant |
| US2003/0049942(A1) | 2003-03-01 | Haukka et al. | Applicant |
| US2003/0053799(A1) | 2003-03-01 | Lel | Applicant |
| US2003/0054631(A1) | 2003-03-01 | Raaijmakers et al. | Applicant |
| US2003/0057526(A1) | 2003-03-01 | Chung et al. | Applicant |
| US2003/0057527(A1) | 2003-03-01 | Chung et al. | Applicant |
| US2003/0059538(A1) | 2003-03-01 | Chung et al. | Applicant |
| US2003/0072884(A1) | 2003-04-01 | Zhang et al. | Applicant |
| US2003/0072975(A1) | 2003-04-01 | Shero et al. | Applicant |
| US2003/0079686(A1) | 2003-05-01 | Chen et al. | Applicant |
| US2003/0082296(A1) | 2003-05-01 | Elers et al. | Applicant |
| US2003/0082300(A1) | 2003-05-01 | Todd et al. | Applicant |
| US2003/0082301(A1) | 2003-05-01 | Chen et al. | Applicant |
| US2003/0082307(A1) | 2003-05-01 | Chung et al. | Applicant |
| US2003/0089308(A1) | 2003-05-01 | Raaijmakers et al. | Applicant |
| US2003/0089942(A1) | 2003-05-01 | Bhattacharyya | Applicant |
| US2003/0101927(A1) | 2003-06-01 | Raaijmakers | Applicant |
| US2003/0104126(A1) | 2003-06-01 | Fang et al. | Applicant |
| US2003/0104710(A1) | 2003-06-01 | Visokay et al. | Applicant |
| US2003/0106490(A1) | 2003-06-01 | Jallepally et al. | Applicant |
| US2003/0108674(A1) | 2003-06-01 | Chung et al. | Applicant |
| US2003/0109114(A1) | 2003-06-01 | Niwa | Applicant |
| US2003/0113187(A1) | 2003-06-01 | Lel et al. | Applicant |
| US2003/0116087(A1) | 2003-06-01 | Nguyen et al. | Applicant |
| US2003/0116804(A1) | 2003-06-01 | Visokay et al. | Applicant |
| US2003/0121608(A1) | 2003-07-01 | Chen et al. | Applicant |
| US2003/0123216(A1) | 2003-07-01 | Yoon et al. | Applicant |
| US2003/0124262(A1) | 2003-07-01 | Chen et al. | Applicant |
| US2003/0129826(A1) | 2003-07-01 | Werkhoven et al. | Applicant |
| US2003/0134508(A1) | 2003-07-01 | Raaijamakers et al. | Applicant |
| US2003/0143328(A1) | 2003-07-01 | Chen et al. | Applicant |
| US2003/0143839(A1) | 2003-07-01 | Raaijmakers et al. | Applicant |
| US2003/0143841(A1) | 2003-07-01 | Yang et al. | Applicant |
| US2003/0153181(A1) | 2003-08-01 | Yoon et al. | Applicant |
| US2003/0160277(A1) | 2003-08-01 | Bhattacharyya | Applicant |
| US2003/0161952(A1) | 2003-08-01 | Wang et al. | Applicant |
| US2003/0165615(A1) | 2003-09-01 | Aaltonen et al. | Applicant |
| US2003/0168750(A1) | 2003-09-01 | Basceri et al. | Applicant |
| US2003/0173586(A1) | 2003-09-01 | Moriwaki et al. | Applicant |
| US2003/0185980(A1) | 2003-10-01 | Endo | Applicant |
| US2003/0186495(A1) | 2003-10-01 | Saanlla et al. | Applicant |
| US2003/0188682(A1) | 2003-10-01 | Tols et al. | Applicant |
| US2003/0190423(A1) | 2003-10-01 | Yang et al. | Applicant |
| US2003/0190497(A1) | 2003-10-01 | Yang et al. | Applicant |
| US2003/0190804(A1) | 2003-10-01 | Glenn et al. | Applicant |
| US2003/0194493(A1) | 2003-10-01 | Chang et al. | Applicant |
| US2003/0194825(A1) | 2003-10-01 | Law et al. | Applicant |
| US2003/0194853(A1) | 2003-10-01 | Jeon | Applicant |
| US2003/0203616(A1) | 2003-10-01 | Chang et al. | Applicant |
| US2003/0205729(A1) | 2003-11-01 | Basceri et al. | Applicant |
| US2003/0213987(A1) | 2003-11-01 | Basceri et al. | Applicant |
| US2003/0224217(A1) | 2003-12-01 | Byun et al. | Applicant |
| US2003/0224578(A1) | 2003-12-01 | Chung et al. | Applicant |
| US2003/0224600(A1) | 2003-12-01 | Cao et al. | Applicant |
| US2003/0227033(A1) | 2003-12-01 | Ahn et al. | Applicant |
| US2003/0232501(A1) | 2003-12-01 | Kher et al. | Applicant |
| US2003/0232506(A1) | 2003-12-01 | Metzner et al. | Applicant |
| US2003/0232511(A1) | 2003-12-01 | Metzner et al. | Applicant |
| US2003/0234417(A1) | 2003-12-01 | Raaijmakers et al. | Applicant |
| US2003/0235961(A1) | 2003-12-01 | Metzner et al. | Applicant |
| US2004/0007747(A1) | 2004-01-01 | Visokay et al. | Applicant |
| US2004/0009307(A1) | 2004-01-01 | Koh et al. | Applicant |
| US2004/0009675(A1) | 2004-01-01 | Eissa et al. | Applicant |
| US2004/0011504(A1) | 2004-01-01 | Ku et al. | Applicant |
| US2004/0013577(A1) | 2004-01-01 | Ganguli et al. | Applicant |
| US2004/0013803(A1) | 2004-01-01 | Chung et al. | Applicant |
| US2004/0014315(A1) | 2004-01-01 | Lai et al. | Applicant |
| US2004/0014320(A1) | 2004-01-01 | Chen et al. | Applicant |
| US2004/0015300(A1) | 2004-01-01 | Ganguli et al. | Applicant |
| US2004/0016973(A1) | 2004-01-01 | Rotondaro et al. | Applicant |
| US2004/0018304(A1) | 2004-01-01 | Chung et al. | Applicant |
| US2004/0018723(A1) | 2004-01-01 | Gross et al. | Applicant |
| US2004/0018747(A1) | 2004-01-01 | Byun et al. | Applicant |
| US2004/0023461(A1) | 2004-02-01 | Ahn et al. | Applicant |
| US2004/0023462(A1) | 2004-02-01 | Rotondaro et al. | Applicant |
| US2004/0028952(A1) | 2004-02-01 | Cartier et al. | Applicant |
| US2004/0029321(A1) | 2004-02-01 | Ang et al. | Applicant |
| US2004/0033698(A1) | 2004-02-01 | Lee et al. | Applicant |
| US2004/0036111(A1) | 2004-02-01 | Nishikawa et al. | Applicant |
| US2004/0038554(A1) | 2004-02-01 | Ahn et al. | Applicant |
| US2004/0040501(A1) | 2004-03-01 | Vaartstra | Applicant |
| US2004/0043149(A1) | 2004-03-01 | Gordon et al. | Applicant |
| US2004/0043569(A1) | 2004-03-01 | Ahn et al. | Applicant |
| US2004/0043630(A1) | 2004-03-01 | Vaarstra et al. | Applicant |
| US2004/0046197(A1) | 2004-03-01 | Basceri et al. | Applicant |
| US2004/0048491(A1) | 2004-03-01 | Jung et al. | Applicant |
| US2004/0051152(A1) | 2004-03-01 | Nakajima | Applicant |
| US2004/0053484(A1) | 2004-03-01 | Kumar et al. | Applicant |
| US2004/0078723(A1) | 2004-04-01 | Gross et al. | Applicant |
| EP1146141 | 2001-10-01 | Applicant | |
| EP1167569 | 2002-01-01 | Applicant | |
| EP1170804 | 2002-01-01 | Applicant | |
| GB2355727 | 2001-05-01 | Applicant | |
| JP2246161 | 1999-09-01 | Applicant | |
| JP2000031387 | 2000-01-01 | Applicant | |
| JP2000058777 | 2000-02-01 | Applicant | |
| JP2001172767 | 2001-06-01 | Applicant | |
| JP2001220294 | 2001-08-01 | Applicant | |
| JP2001254181 | 2001-09-01 | Applicant | |
| JP2002060944 | 2002-02-01 | Applicant | |
| JP2002-69641 | 2002-03-01 | Applicant | |
| JP2002-93804 | 2002-03-01 | Applicant | |
| JP2002-167672 | 2002-06-01 | Applicant | |
| JP2002-172767 | 2002-06-01 | Applicant | |
| JP2001111000 | 2002-12-01 | Applicant | |
| WO96/17107 | 1996-06-01 | Applicant | |
| WO98/51838 | 1998-11-01 | Applicant | |
| WO99/01595 | 1999-01-01 | Applicant | |
| WO99/29924 | 1999-06-01 | Applicant | |
| WO99/65064 | 1999-12-01 | Applicant | |
| WO/15865 | 2000-03-01 | Applicant | |
| WO/16377 | 2000-03-01 | Applicant | |
| WO/54320 | 2000-09-01 | Applicant | |
| WO/63957 | 2000-10-01 | Applicant | |
| WO/70674 | 2000-11-01 | Applicant | |
| WO/79576 | 2000-12-01 | Applicant | |
| WO1/15220 | 2001-03-01 | Applicant | |
| WO1/17692 | 2001-03-01 | Applicant | |
| WO1/25502 | 2001-04-01 | Applicant | |
| WO1/27346 | 2001-04-01 | Applicant | |
| WO1/27347 | 2001-04-01 | Applicant | |
| WO1/29280 | 2001-04-01 | Applicant | |
| WO1/29891 | 2001-04-01 | Applicant | |
| WO1/29893 | 2001-04-01 | Applicant | |
| WO1/36702 | 2001-05-01 | Applicant | |
| WO1/40541 | 2001-06-01 | Applicant | |
| WO1/66832 | 2001-09-01 | Applicant | |
| WO1/82390 | 2001-11-01 | Applicant | |
| WO2/01628(A2) | 2002-01-01 | Applicant | |
| WO2/08485 | 2002-01-01 | Applicant | |
| WO2/09167 | 2002-01-01 | Applicant | |
| WO2/27063 | 2002-04-01 | Applicant | |
| WO2/43115 | 2002-05-01 | Applicant | |
| WO2/45167 | 2002-06-01 | Applicant | |
| WO2/45871(A1) | 2002-06-01 | Applicant | |
| WO2/067319 | 2002-08-01 | Applicant |
Non-Patent Literature (32)
- C.S. Cchoi et al., “The effect of annealing on resisivity of low pressure chemical vapor titanium diboride”, Journal of Applied Physics, Jun. 1, 1991, pp. 7853-7861.Applicant
- Klaus, et al. “Atomically Controlled Growth of Tungsten and Tungsten Nitride Using Sequential Surface Reactions,” Applied Surface Science, 162-163 (2000) 479-491.Applicant
- Sneh, et al. “Atomic Layer Deposition of SiO2 Using Catalyzed and Uncatalyzed Self-Limiting Surface Reactions,” Surface Review and Letters, vol. 6, Nos. 3 & 4 (1999) 435-448.Applicant
- Rossnagel, et al. “Plasma-enhanced Atomic Layer Depositon of Ta and Ti for Interconnect Diffusion Barriers,” J. Vacuum Sci & Tech. B., vol. 18, No. 4 (Jul. 2000), pp. 2016-2020.Applicant
- Ritala, et al. “Perfectly Conformal TiN and Al2O3 Films Deposited by Atmoic Layer Deposition,” Chem. Vap. Deposition 1999, 5, No. 1.Applicant
- Ritala, et al. “Atomic Layer Epitaxy Growth of TiN Thin Films,” J. Electrochem. Soc., vol. 142, No. 8, Aug. 1995.Applicant
- Ritala, et al. “Surface Roughness Reductin in Atomic Layer Epitaxy Growth of Titanium Dioxide Thin Films,” Thin Solid-Films, vol. 249, No. 2 (Sep. 15, 1994), pp. 155-162.Applicant
- Ritala, et al. “Atomic Force Microscopy Study of Titanium Dioxide Thin Films Grown by Atomic Layer Epitaxy,” Thin Solid Films, vol. 228, No. 1-2 (May 15, 1993), pp. 32-35.Applicant
- Ritala, et al. “Growth of Titanium Dioxide Thin Films by Atomic Layer Epitaxy,” Thin Solid Films, vol. 225, No. 1-2 (Mar. 25, 1993) pp. 288-295.Applicant
- Ritala, et al. “Effects of Intermediate Zinc Pulses on Properties of TiN and NbN Films by Atomic Layer Epitaxy,” Applied Surface Science, vol. 120, No. 3-4, (Dec.1997), pp. 199-212.Applicant
- Ritala, et al. “Atomic Layer Epitaxy Growth of TiN Thin Films From TiI4 and NH3, ” J. Electrochem. Soc., vol. 145, No. 8 (Aug., 1998) pp. 2914-2920.Applicant
- Martensson, et al. “Use of Atomic Layer Epitaxy for Fabrication of Si/TiN/Cu Structures,” J. Vac. Sci. & Tech. B, vol. 17, No. 5, (Sep. 1999) pp. 2122-2128.Applicant
- Proceedings of the ICEEE 1998 International Interconnect Technology Conference—San Francisco, California, Jun. 1-3, 1998.Applicant
- Niinisto, et al. “Synthesis of Oxide Thin Films and Overlayers by Atomic Layer Epitaxy for Advanced Applications,” Materials Science and Engineering B41 (1996) 23-29.Applicant
- Min, et al. “Metal-organic Atomic-layer Deposition of Titanium-silicon-nitride films,” Applied Physics Letters, vol. 75, No. 11 (Sep. 13, 1999).Applicant
- Min, et al. “Chemical Vapor Deposition of Ti-Si-N Films With Alternating Source Supply,” Mat. Rec. Soc. Symp. Proc. vol. (1999).Applicant
- Min, et al. “Atomic Layer Deposition of TiN Thin Films by Sequential Introduction of Ti Precursor and NH3,” Mat. Res. Soc. Symp. Proc. vol. 514 (1998).Applicant
- George, et al. “Surface Chemistry for Atomic Layer Growth,” J. Phys. Chem. 1996, 100, 13121-13131.Applicant
- Kukli, et al., “Tailoring the Dielectric Properties of HfO2-Ta2-O5 Nanolaminates,” Applied Physics Letters, vol. 68, No. 26, Jun. 24, 1996; pp. 3737-9.Applicant
- Kukli, et al. “Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta(OC2H5)5 and H2O,” Journal of the Electrochemical Society, vol. 142, No. 5, May 1995; pp. 1670-5.Applicant
- Kukli, et al., “In situ Study of Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films From Ta(OC2H5)5 and H2O,”Applied Surface Science, vol. 112, Mar. 1997, pp. 236-42.Applicant
- Kukli, et al., “Properties of Ta2O5-Based Dielectric Nanolaminates Deposited by Atomic Layer Epitaxy,” Journal of the Electrochemical Society, vol. 144, No. 1, Jan. 1997; pp. 300-6.Applicant
- Kukli, et al., “Properties of [Nb1-xTax]2O5 Solid Solutions and [Nb1-xTax]2O5-ZrO2 Nanolaminates Grown by Atomic Layer Epitaxy,” 1997; pp. 785-93.Applicant
- Ritala, M., et al., “Chemical Vapor Deposition,” Jan. 1999, pp. 6-9.Applicant
- Eisenbraum, et al. “Atomic Layer Deposition (ALD) of Tantalum-based materials for zero thickness copper barrier applications,” Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No. 01EX461)2001.Applicant
- Hendrix, et al., “Composition Control of Hf1-xSixO2 Films Deposited on Si by Chemical-vapor Deposition Using Amide Precursors,” Applied Physics Letters, vol. 80, No. 13 (Apr. 1, 2002).Applicant
- Cheon, et al. “Gas Phase Photoproduction of Diatomic Metal Nitrides During Metal Nitride Laser Chemical Vapor Deposition,” Inorg. Chem. 1999, 38, 2238-2239.Applicant
- Ohshita, et al. “HfO2 Growth by Low-pressure Chemical Vapor Deposition Using the Hf(N(C2H5)2)4/O2 Gas System,” Journal of Crystal Growth 233 (2001) 292-297.Applicant
- Balog, et al. “Chemical Vapor Deposition and Characterization of HfO2 Films from Organo-Hafnium Compounds,” Thin Solid Films, 41 (1977) 247-259.Applicant
- Ritala, et al. Ann. Acad. Sci. Fenn. Ser. A II. Chemica 257 (1994) 1-48.Applicant
- Kattelus, et al. Electrical Properties of Tantalum Based Composite Oxide Films, Mat. Res. Soc. Symp. Proc., 284 (1993) 511-516.Applicant
- Ritala, et al., “Development of Crystallinity and Morphology in Hafnium Dioxide Thin Films Grown by Atomic Layer Epitaxy,” Thin Solid Films, vol. 250, No. 1-2, (Oct. 1, 1994), pp. 72-80.Applicant