US 7,524,528 B2Grant
Precursor compositions and methods for the deposition of passive electrical components on a substrate
Issue Date:2009-04-28
•38 Claims
Abstract
Precursor compositions for the deposition of electronic features such as resistors and dielectric components and methods for the deposition of the precursor compositions. The precursor compositions have a low viscosity, such as not greater than about 1000 centipoise and can be deposited using a direct-write tool. The precursors also have a low conversion temperature, enabling the formation of electronic features on a wide variety of substrates, including low temperature substrates.
Metadata
Assignee
- Cabot Corporation
Inventors
- Toivo T. Kodas
- Mark J. Hampden-Smith
- Karel Vanheusden
- Hugh Denham
- Aaron D. Stump
- Allen B. Schult
- Paolina Atanassova
- Klaus Kunze
Application Information
Application Number:US 10/265,070
Filing Date:2002-10-04
Priority Date:2001-10-05
Art Unit:1792
Classifications
IPC:
B05D5/12B05D3/00H01C17/28
Patent Drawings
This patent does not have any drawings.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims priority to U.S. Provisional Patent Application No. 60/338,797 filed Nov. 2, 2001 and U.S. Provisional Patent Application No. 60/327,620 filed Oct. 5, 2001. The disclosure of each of these applications is incorporated herein by reference in its entirety.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to precursor compositions that are useful for the fabrication of passive electronic components and features such as resistors, inductors and capacitors. The precursor compositions can have a low conversion temperature to enable low-temperature treatment of the precursors to form electronic features on a variety of substrates. The precursor compositions have a low viscosity and can advantageously be deposited using a direct-write tool and subsequently converted to the passive electronic feature.
[0004] 2. Description of Related Art
[0005] A variety of materials are used to create electronic circuitry on a substrate. Examples include metals and other conductive materials for electrical conductors, dielectric materials for insulation and capacitive elements, resistive materials for resistors, ferroelectric materials for capacitive elements and magnetic materials for inductors.
[0006] Dielectric materials have a wide variety of applications in electronic circuits. They are used to provide electrical insulation as well as to facilitate the temporary storage of electrical charge. The dielectric constant, dielectric loss factor, and dielectric strength determine the suitability for a specific application. Variations in dielectric properties with frequency, temperature, and a range of environmental conditions such as humidity also play a role in determining the usefulness of any particular material composition.
[0007] Most resistors for integrated electronic applications are required to be ohmic, to display small deviations from their predetermined value (tolerance), and to have small temperature coefficients of resistance (TCR). TCR is an expression of change in resistance due to change in temperature and it is expressed in parts per million per degree Celsius (ppm/° C.). The TCR of conductive and semiconductive materials can be either positive (increasing resistance with increase in temperature) or negative (decreasing resistance with increasing temperature).
[0008] The major demand for resistors in electronic applications lies in the resistance range from 103 to 108 Ω. This is a serious challenge, as pure materials with suitable and reliable electrical behavior typically have resistivities below about 10−6 Ω-m. Unfortunately there are no pure, single-phase materials that provide optimum properties for ohmic resistors. The key to producing a resistor with a specific resistivity and low TCR lies in tailoring composition and microstructure of the final product.
[0009] Commercial ferrite applications usually require a high permeability and/or saturation magnetization. Short magnetic switching times are also highly desirable. Ceramic magnetic materials are currently being used in the fast growing area of high-frequency solid-state devices. The higher resistivity of these ferromagnetic oxides gives them a decisive advantage over magnetic metals. Lowering the high frequency loss is a challenge and many of the properties are sensitive to the effects of heat treatment and composition. For instance, a surplus or deficiency of Fe ions of a few percent can change the resistivity of a magnetic ceramic by several orders of magnitude. Eddy-current losses can be controlled by improving the resistivity of the ferrite. In a more general sense, phase purity, proper oxidation state, large grain size and low porosity all contribute strongly to lowering the loss in ferrites.
[0010] The electronics industry relies on printing of patterns of various materials onto substrates to form circuits. The primary methods for printing of these patterns are screen-printing for features larger than 100 μm and thin film approaches for features less than 100 μm. Other subtractive processes are available for feature sizes less than 100 μm. These include photo-patternable pastes, laser trimming, and others.
[0011] U.S. Pat. No. 5,801,108 by Huang et al. discloses dielectric pastes formulated from starting materials including a dielectric powder composition, a glass composition such as a borosilicate glass that will melt at about 500° C. to 600° C. and react with the dielectric powder upon firing and partially form a crystallized phase, and a binding material such as an organic binder. The resulting dielectric precursor is a multiphase, dielectric precursor wherein at least one phase is an alkaline earth, transition metal silicate. It is also disclosed that when the dielectric powder to crystallizable glass ratio is approximately 60 to 40 wt. %, then the resulting mixture will densify at approximately 850° C.
[0012] Precursor derived printable conductor compositions are described by R. W. Vest (Metallo-organic materials for improved thick film reliability, Nov. 1, 1980, Final Report, Contract #N00163-79-C-0352, National Avionic Center). Vest described only compositions that contained precursors and a solvent.
[0013] U.S. Pat. Nos. 6,036,889 and 5,882,722 by Kydd disclose conductor precursor compositions that contain particles, a metal organic decomposition (MOD) precursor and a vehicle and provide pure conductors at low temperatures on organic substrates. However, materials to form dielectrics, resistors, and ferrite materials are not disclosed. Also, formulations for fine mesh screen printing are not disclosed.
[0014] U.S. Pat. No. 6,197,366 by Takamatsu discloses methods using inorganometallic compounds to obtain formulations that convert to metals at low temperatures.
[0015] Attempts have been made to produce metal-containing compositions at low temperatures by using a composition including a polymer and a precursor to a metal. See, for example, U.S. Pat. No. 6,019,926, by Southward et al. However, the deposits were chosen for optical properties and were either not conductive or poorly conductive.
[0016] U.S. Pat. Nos. 5,846,615 and 5,894,038, both by Sharma et al., disclose precursors to Au and Pd that have low reaction temperatures thereby conceptually enabling processing at low temperatures to form metals. The printing of these compositions, however, is not disclosed in detail.
[0017] U.S. Pat. No. 5,332,646 by Wright et al. discloses a method of making colloidal palladium and/or platinum metal dispersions by reducing a palladium and/or platinum metal of a metallo-organic palladium and/or platinum metal salt which lacks halide functionality.
[0018] There exists a need for low viscosity precursor compositions to electronic materials for use in electronics, displays, and other applications. Further, there is a need for precursor compositions that provide low processing temperatures to allow deposition onto organic substrates while still providing a feature with high conductivity. Furthermore, there exists a need for low viscosity precursor compositions that enable deposition methods that offer enhanced resolution control and the ability to direct-write electronic features onto a substrate.
DESCRIPTION OF THE INVENTION
[0019] The present invention is directed to low viscosity precursor compositions that can be deposited onto a substrate and converted to an electronic material. The precursor compositions preferably have a low conversion temperature, thereby enabling the formation of electronic features on a variety of substrates, including organic substrates. In a preferred embodiment, the precursor compositions are deposited using a direct-write tool, such as an ink-jet device.
[0020] The precursor compositions according to the present invention can be formulated to have a wide range of properties and a wide range of relative cost. For example, in high volume applications that do not require well-controlled properties, inexpensive precursor compositions can be deposited on cellulose-based materials, such as paper, to form simple disposable circuits. On the other hand, the precursor compositions of the present invention can be utilized to form complex and high precision circuitry having good electrical properties.
[0021] The method for forming the electronic features according to the present invention can also make use of relatively low processing temperatures. Depending upon the materials included in the precursor composition, the conversion temperature can be not greater than 900° C., such as not greater than about 600° C. In one embodiment, the conversion temperature is not greater than about 400° C., such as not greater than about 350° C., not greater than about 300° C. and preferably not greater than about 250° C. In certain embodiments, the conversion temperature can be not greater than about 200° C. such as not greater than about 150° C. The heating time can also be very short, such as not greater than about 5 minutes, more preferably not greater than about 1 minute and even not greater than about 10 seconds.
Definitions
[0022] As used herein, the term low viscosity precursor composition refers to a flowable composition that has a viscosity of not greater than about 1000 centipoise, such as not greater than about 500 centipoise. According to one embodiment, the precursor composition has a viscosity of greater than about 100 centipoise, and can even have a viscosity of not greater than about 50 centipoise. As used herein, the viscosity is measured at a shear rate of about 132 Hz and under the relevant deposition conditions, particularly temperature. For example, some precursor compositions may be heated prior to and/or during deposition to reduce the viscosity.
[0023] As used herein, the term molecular precursor refers to a molecular compound that includes a metal atom. Examples include organometallics (molecules with carbon-metal bonds), metal organics (molecules containing organic ligands with metal bonds to other types of elements such as oxygen, nitrogen or sulfur) and inorganic compounds such as metal nitrates, metal halides and other metal salts.
[0024] As used herein, the term precursor solution refers to a precursor or a mixture of precursors dissolved in a solvent. A solvent is a flowable chemical that is capable of dissolving at least a portion of the molecular precursor. The precursor solution can also include other additives such as crystallization inhibitors, reducing agents, and agents that reduce the conversion (e.g., decomposition) temperature of the molecular precursors.
[0025] In addition to the precursor solution, the low viscosity precursor composition can include particulates of one or several materials. The particulates can fall in two size ranges referred to herein as nanoparticles and micron-size particles. Nanoparticles have an average size of not greater than about 100 nanometers and micron-size particles have an average particle size of greater than about 0.1 μm. Nanoparticles and micron-size particles are collectively referred to herein as particles or powders.
[0026] The precursor compositions can also include a vehicle. As used herein, a vehicle is a flowable medium that facilitates deposition of the precursor composition, such as by imparting sufficient flow properties to the composition. As will be appreciated from the following discussion, the same chemical can have multiple functions, such as one that is both a solvent and a vehicle.
[0027] Other materials, referred to simply as additives, can also be included in the precursor compositions of the present invention. As is discussed below, such additives can include, but are not limited to, crystallization inhibitors, polymers, polymer precursors (oligomers or monomers), reducing agents, binders, dispersants, surfactants, thickening agents and the like.
Precursor Compositions
[0028] As is discussed above, the low viscosity precursor compositions according to the present invention can optionally include particulates in the form of nanoparticles and/or micron-size particles.
[0029] Nanoparticles have an average size of not greater than about 100 nanometers, such as from about 10 to 80 nanometers. Particularly preferred for low viscosity precursor compositions are nanoparticles having an average size of not greater than about 75 μm, such as in the range of from about 25 to 75 nanometers.
[0030] Nanoparticles that are particularly preferred for use in the present invention are not substantially agglomerated. Preferred nanoparticle compositions include Al2O3, CuOx, SiO2 and TiO2, conductive metal oxides such as In2O3, indium-tin oxide (ITO) and antimony-tin oxide (ATO), silver, palladium, copper, gold, platinum and nickel. Other useful nanoparticles of metal oxides include pyrogenous silica such as HS-5 or M5 or others (Cabot Corp., Boston, Mass.) and AEROSIL 200 or others (Degussa AG, Dusseldorf, Germany) or surface modified silica such as TS530 or TS720 (Cabot Corp., Boston, Mass.) and AEROSIL 380 (Degussa AG, Dusseldorf, Germany). In one embodiment of the present invention, the nanoparticles are composed of the same metal that is contained in the metal precursor compound, discussed below. Nanoparticles can be fabricated using a number of methods and one preferred method, referred to as the Polyol process, is disclosed in U.S. Pat. No. 4,539,041 by Figlarz et al., which is incorporated herein by reference in its entirety.
[0031] The precursor compositions according to the present invention can also include micron-size particles, having an average size of at least about 0.1 μm. Preferred compositions of micron-size particles are similar to the compositions described above with respect to nanoparticles. The particles are preferably spherical, such as those produced by spray pyrolysis. Particles in the form of flakes increase the viscosity of the precursor composition and are not amenable to deposition using tools having a restricted orifice size, such as an ink-jet device. When substantially spherical particles are described herein, the particle size refers to the particle diameter. In one preferred embodiment, the low viscosity precursor compositions according to the present invention do not include any particles in the form of flakes.
[0032] Generally, the volume median particle size of the micron-size particles utilized in the low viscosity precursor compositions according to the present invention is at least about 0.1 μm, such as at least about 0.3 μm. Further, the volume median particle size is preferably not greater than about 20 μm. For most applications, the volume median particle size is more preferably not greater than about 10 μm and even more preferably is not greater than about 5 μm. A particularly preferred median particle size for the micron-size particles is from about 0.3 μm to about 3 μm. According to one embodiment of the present invention, it is preferred that the volume median particle size of the micron-size particles is at least 10 times smaller than the orifice diameter in the tool using the composition, such as not greater than about 5 μm for an ink-jet head having a 50 μm orifice.
[0033] There are many difficulties typically associated with depositing low viscosity compositions containing particulates. If many of the particulates are too small in size (nanoparticles), the viscosity of the composition can be too high. At the other extreme, larger micron-size particles tend to settle quickly out of the liquid leading to a short shelf life for the suspensions. Larger particles and particle agglomerates also tend to clog the orifices of many direct-write tools such as syringes and ink-jets. Flakes do not flow as easily through narrow channels and therefore spherical particulates are preferred. However, spherical particles of many materials are not readily available. For these and other reasons, many electronic materials have not been readily deposited using such direct-write tools.
[0034] The micron-size particles that are useful in the precursor compositions of the present invention advantageously have settling velocities that correspond to relatively small particle sizes when measured by a sedimentation technique, corresponding to porous or hollow particles. There are numerous ways to measure and quantify particle size including by mass, volume and number. For the low viscosity compositions of the present invention, one of the most important aspects is that the particles do not settle rapidly and the means by which the particle size is measured and reported must be carefully interpreted in this context. The geometric sizes of the particles, as might be observed using a microscope, do not reflect that particles with the same size can have different densities and therefore significantly different settling velocities. Hollow or porous micron-size particles settle more slowly than dense particles. Similarly, optically determined particle sizes as from light scattering in liquids or gases also provide data that only reflect the geometric size of the particles and these measurements do not reflect that particles of the same size can have different densities. Any measurement that provides the actual physical size of the particles, such as optical techniques, can provide numbers that must be interpreted with caution. For example, the volume median diameter of particles determined from light scattering cannot easily be related to mass median diameter in the absence of information about the apparent density of the particles, such as whether they are hollow or porous and the extent of the porosity. Likewise, the particle size data determined from settling velocities can provide information about the settling behavior of the particles, but does not provide information about the true geometric particle size if the particles are hollow or porous.
[0035] However, the combination of size data measured from optically-based approaches and data measured from sedimentation velocity provides a measure of particle performance in low viscosity compositions, where control of the particle settling rate is crucial. A small size calculated from settling velocity of a dense particle along with a large geometric size is an indication of hollow or porous particles. It is preferred that the average size of the micron-size particles utilized in the precursor compositions of the present invention, as measured by sedimentation techniques corresponds to dense particles having a settling velocity corresponding to an average particle size of not greater than about 4 μm, more preferably not greater than about 1 μm, even more preferably not greater than about 0.5 μm and even more preferably not greater than about 0.1 μm.
[0036] Thus, the micron-size particles according to the present invention preferably include particles having a low settling rate as measured by settling techniques while having a larger size when measured by geometric techniques. One such geometric technique is to measure the particle size by light scattering using a MICROTRAC particle size analyzer (Honeywell Industrial Automation and Control, Fort Washington, Pa.), which yields a geometric (volume) average particle size.
[0037] It is desirable to maintain a substantially neutral buoyancy of the micron-size particles in the suspension while maintaining a relatively large physical size. The buoyancy is required for stability while the larger size maintains liquid properties, such as viscosity or light scattering ability, within useful ranges. Stated another way, it is often desirable to provide micron-size particles having a low settling velocity but at high loadings. The settling velocity of the particles is proportional to the apparent density of the particle (ρp) minus the density of the liquid (ρL). Ideally, the particles will have an apparent density that is approximately equal to the density of the liquid, which is typically about 1 g/cm3 (e.g., the density of water). Since a typical metal has a theoretical density in the range of from about 6 to about 20 g/cm3, it is preferable that the apparent density of such micron-size particles be a fraction of the theoretical density. According to one embodiment, the micron-size particles have an apparent density that is not greater than about 75 percent of the theoretical density for the particle, more preferably not greater than about 50 percent of the theoretical density.
[0038] One preferred method for obtaining a reduced apparent density of the micron-size particles according to the present invention is to produce particles having a hollow microstructure. That is, one preferred particle morphology is a particle comprised of a dense shell having an inner radius and an outer radius. Preferably, the shell has a high density and is substantially impermeable. For such a hollow particle, the equation representing the conditions for neutral buoyancy can be written:
[0039]
where:
where:
-
- [0040] r1=inner radius
- [0041] ρL=1 (water)
- [0042] r2=outer radius
- [0043] ρp=theoretical density of the particle
[0044] For example, if a hollow particle has an outer radius of 2 μm (4 μm diameter) and a density of 5 g/cm3, then the optimum average wall thickness would be about 0.15 μm for the particle to be neutrally buoyant in a liquid having a density of 1 g/cm3.
[0045] Although hollow micron-size particles can be preferred according to the present invention, it will be appreciated that other particle morphologies can be utilized while maintaining an apparent density within the desired range. For example, the particles could have a sufficient amount of closed porosity to yield a particle having an apparent density that is lower than the theoretical density. Open (surface) porosity can also decrease the apparent density if the surface tension of the liquid medium (the liquid precursor components) does not enable the liquid to substantially penetrate the surface pores.
[0046] Thus, the particles that are particularly useful in low viscosity precursor compositions according to the present invention have a low settling velocity in the liquid medium. The settling velocity according to Stokes Law can be defined as:
[0047]
where:
where:
-
- [0048] Dst=Stokes diameter
- [0049] η=fluid viscosity
- [0050] ρs=apparent density of the particle
- [0051] ρt=density of the liquid
- [0052] V=settling velocity
- [0053] g=acceleration due to gravity
[0054] Preferably, the average settling velocity of the particles is sufficiently low such that the precursor compositions have a useful shelf life without the necessity of mechanical mixing techniques. Thus, it is preferred that a large mass fraction of the particles, such as at least about 50 weight percent remains suspended in the liquid for at least 1 hour. Stated another way, the micron-size particles preferably have a settling velocity that is not greater than 50 percent, more preferably not greater than 20 percent, of a theoretically dense particle of the same composition. Further, the particles can be completely redispersed after settling, such as by mixing, to provide the same particle size distribution in suspension as measured before settling.
[0055] According to a preferred embodiment of the present invention, the particles (nanoparticles and micron-size particles) also have a narrow particle size distribution, such that the majority of particles are about the same size and so that there are a minimal number of large particles that can clog an orifice, such as an orifice in an ink-jet head. A narrow particle size distribution is particularly advantageous for direct-write applications due to reduced clogging of the orifice by large particles and due to the ability to form surface features having a fine line width, high resolution and high packing density. Preferably, at least about 70 volume percent and more preferably at least about 80 volume percent of the particles within the same size classification (nanoparticles or micron-size particles) are not larger than twice the average particle size. For example, when the average particle size of micron-size particles is about 2 μm, it is preferred that at least about 70 volume percent of the micron-size particles are not larger than 4 μm and it is more preferred that at least about 80 volume percent of the micron-size particles are not larger than 4 μm. Further, it is preferred that at least about 70 volume percent and more preferably at least about 80 volume percent of the particles are not larger than about 1.5 times the average particle size. Thus, when the average particle size of the micron-size particles is about 2 μm, it is preferred that at least about 70 volume percent of the micron-size particles are not larger than 3 μm and it is more preferred that at least about 80 volume percent of the micron-size particles are not larger than 3 μm.
[0056] It is known that micron-size particles and nanoparticles often form soft agglomerates as a result of their relatively high surface energies, as compared to larger particles. It is also known that such soft agglomerates may be dispersed easily by treatments such as exposure to ultrasound in a liquid medium, sieving, high shear mixing and 3-roll milling. The average particle size and particle size distributions described herein are measured by mixing samples of the powders in a liquid medium, such as water and a surfactant, and exposing the suspension to ultrasound through either an ultrasonic bath or horn. The ultrasonic treatment supplies sufficient energy to disperse the soft agglomerates into primary particles. The primary particle size and size distribution are then measured by light scattering in a MICROTRAC instrument. This provides a good measure of the useful dispersion characteristics of the powder because this simulates the dispersion of the particles in a liquid vehicle, such as an ink-jet suspension. Thus, the references to particle size herein refer to the primary particle size, such as after lightly dispersing soft agglomerates of the particles.
[0057] It is also possible to provide micron-size particles or nanoparticles having a bimodal particle size distribution. That is, the particles can have two distinct and different average particle sizes. Preferably, each of the distinct particle size distributions will meet the foregoing size distribution limitations. A bimodal or trimodal particle size distribution can advantageously enhance the packing efficiency of the particles when deposited according to the present invention. In one embodiment, the larger mode includes hollow or porous particles while the smaller mode includes dense particles. The two modes can include particles of different composition. In one embodiment, the two modes have average particle sizes at about 1 μm and 5 μm, and in another embodiment the average particle size of the 2 modes is about 0.5 μm and 2.5 μm. The bimodal particle size distribution can also be achieved using nanoparticles and in one embodiment the larger mode has an average particle size of from about 1 μm to 10 μm and the smaller mode has an average particle size of from about 10 to 100 nanometers.
[0058] The particles that are useful in precursor compositions according to the present invention also preferably have a high degree of purity and it is preferred that the particles include not greater than about 1.0 atomic percent impurities and more preferably not greater than about 0.1 atomic percent impurities and even more preferably not greater than about 0.01 atomic percent impurities. Impurities are those materials that are not intended in the final product (i.e., the conductive feature) and that negatively affect the properties of the final product. For many electronic applications, the most critical impurities to avoid are Na, K, Cl, S and F. As is discussed below, it will be appreciated that the particles can include composite particles having one or more second phases. Such second phases are not considered impurities.
[0059] The particles for use in the precursor compositions according to the present invention can also be coated particles wherein the particle includes a surface coating surrounding the particle core. Coatings can be generated on the particle surface by a number of different mechanisms. One preferred mechanism is spray pyrolysis. One or more coating precursors can vaporize and fuse to the hot particle surface and thermally react resulting in the formation of a thin film coating by chemical vapor deposition (CVD). Preferred coatings deposited by CVD include metal oxides and elemental metals. Further, the coating can be formed by physical vapor deposition (PVD) wherein a coating material physically deposits on the surface of the particles. Preferred coatings deposited by PVD include organic materials and elemental metals. Alternatively, a gaseous precursor can react in the gas phase forming small particles, for example, less than about 5 nanometers in size, which then diffuse to the larger particle surface and sinter onto the surface, thus forming a coating. This method is referred to as gas-to-particle conversion (GPC). Whether such coating reactions occur by CVD, PVD or GPC is dependent on the reactor conditions, such as temperature, precursor partial pressure, water partial pressure and the concentration of particles in the gas stream. Another possible surface coating method is surface conversion of the particles by reaction with a vapor phase reactant to convert the surface of the particles to a different material than that originally contained in the particles.
[0060] In addition, a volatile coating material such as lead oxide, molybdenum oxide or vanadium oxide can be introduced into the reactor such that the coating deposits on the particles by condensation. Further, the particles can be coated using other techniques. For example, soluble precursors to both the particle and the coating can be used in the precursor solution. In another embodiment, a colloidal precursor and a soluble precursor can be used to form a particulate colloidal coating on the composite particle. It will be appreciated that multiple coatings can be deposited on the surface of the particles if such multiple coatings are desirable.
[0061] The coatings are preferably as thin as possible while maintaining conformity about the particles such that the core of the particle is not substantially exposed. For example, the coatings on a micron-size particle can have an average thickness of not greater than about 200 nanometers, preferably not greater than about 100 nanometers and more preferably not more than about 50 nanometers. For most applications, the coating has an average thickness of at least about 5 nanometers. A specific example of useful coated particles is silica coated silver particles.
[0062] Nanoparticles can also be coated by utilizing the coating strategies as described above. In addition, it may be advantageous to coat nanoparticles with materials such as a polymer, to prevent agglomeration of the nanoparticles due to high surface energy. This is described by P. Y. Silvert et al. (Preparation of colloidal silver dispersions by the polyol process, Journal of Material Chemistry, 1997, volume 7(2), pp. 293-299). In another embodiment, the particles can be coated with an intrinsically conductive polymer, preventing agglomeration in the composition and providing a conductive patch after solidification of the composition. In yet another embodiment, the polymer can decompose during heating enabling the nanoparticles to sinter together. In one embodiment, the nanoparticles are generated in-situ and are coated with a polymer. Preferred coatings for nanoparticles according to the present invention include sulfonated perfluorohydrocarbon polymer (e.g., NAFION, available from E.I. duPont deNemours, Wilmington, Del.), polystyrene, polystyrene/methacrylate, polyvinyl pyrolidone, sodium bis(2-ethylhexyl) sulfosuccinate, tetra-n-octyl-ammonium bromide and alkane thiolates.
[0063] The particles that are useful with the present invention can also be “capped” with other compounds. The term capped refers to having compounds bonded to the outer surface of the particles without necessarily creating a coating over the outer surface. The particles used with the present invention can be capped with any functional group including organic compounds such as polymers, organometallic compounds, and metal organic compounds. These capping agents can serve a variety of functions including the prevention of agglomeration of the particles, prevention of oxidation, enhancement of bonding of the particles to a surface, and enhancement of the flowability of the particles in a precursor composition. Preferred capping agents that are useful with the particles of the present invention include amine compounds, organometallic compounds, and metal organic compounds.
[0064] The particulates in accordance with the present invention can also be composite particles wherein the particles include a first phase and a second phase associated with the first phase. Preferred composite particulates include carbon-metal, carbon-polymer, carbon-ceramic, carbon1-carbon2, ceramic-ceramic, ceramic-metal, metal1-metal2, metal-polymer, ceramic-polymer, and polymer1-polymer2. Also preferred are certain 3-phase combinations such as metal-carbon-polymer. In one embodiment, the second phase is uniformly dispersed throughout the first phase. The second phase can be an electronic compound or it can be a non-electronic compound. For example, sintering inhibitors such as metal oxides can be included as a second phase in a first phase of a metallic material, such as silver metal to inhibit sintering of the metal without substantially affecting the conductivity.
[0065] As a further example, the particles can be electrocatalyst particles, such as those composed of a metal dispersed on a support such as carbon. Such particles are disclosed in U.S. Pat. No. 6,103,393 by Kodas et al., which is incorporated herein by reference in its entirety.
[0066] Further, the micron-size particles can be hollow particles, as is discussed above, wherein the shell includes a first phase and a second phase dispersed throughout the first phase.
[0067] The particulates according to a preferred embodiment of the present invention are also substantially spherical in shape. That is, the particulates are not jagged or irregular in shape. Spherical particles are particularly advantageous because they are able to disperse more readily in a liquid suspension and impart advantageous flow characteristics to the precursor composition, particularly for deposition using an ink-jet device or similar tool. For a given level of solids loading, a low viscosity precursor composition having spherical particles will have a lower viscosity than a composition having non-spherical particles, such as flakes. Spherical particles are also less abrasive than jagged or plate-like particles, reducing the amount of abrasion and wear on the deposition tool.
[0068] Thus, micron-size particles with low settling densities derived from their porosity or hollowness can be used to provide the low viscosity precursor compositions. Such micron-size particles can be produced, for example, by spray pyrolysis. Spray pyrolysis for production of micron-size particles is described in U.S. Pat. No. 6,103,393 by Kodas, et al., which is incorporated herein by reference in its entirety.
[0069] Hollow particles with well-controlled apparent density can advantageously be formed by the spray-pyrolysis process disclosed above. In the case of metals such as silver, it is often necessary to add small amounts of metal oxide precursors, or salts to the starting solution that can be removed after particle formation. The metal oxides or the salts inhibit the densification of the metal particles during the residence time in the reactor. As an example, porous and/or hollow particles of conductors with reduced density can be formed by adding metal oxide precursors such as alumina, silica, copper oxides, glasses (e.g., barium aluminum borosilicate, calcium silicate or lead borosilicate) and virtually any other metal oxide that has a melting point significantly greater than the metal. These additives can also serve the dual purpose of providing adhesion to substrates, inhibiting sintering (as in the case of silver that has a low sintering temperature), modifying temperature coefficients of resistivity and other functions.
[0070] Another method for providing hollow particles in a spray pyrolysis process is the use of particle precursors having low solubility. Precursors having a low solubility precipitate at the surface of the droplet thereby forming a shell. As the remainder of the solvent leaves, more metal precursor precipitates onto the shell, forming a hollow particle. Examples include organometallics, metal organics and inorganic precursors. Preferred particle precursors according to this embodiment have solubilities of not greater than about 20 wt. %, more preferably not greater than about 10 wt. % and even more preferably not greater than about 5 wt. %. Inorganic precursors can be selected, for example, from metal nitrates, metal halides, metal sulfates, metal hydroxides and metal carbonates.
[0071] Another method for forming hollow particles is to use particle precursors that have low effective yields during conversion from the precursor to the particulate product. Once the droplets are dried and the particles consist only of precursor, reaction to form the product results in a porous or hollow particle because of the large volume change from reactant to product with a relatively constant particle diameter. One example is the formation of alumina from aluminum nitrate. Preferred particle precursors according to this embodiment have a volumetric yield of not greater than about 50%, more preferably not greater than about 25% and even more preferably not greater than about 10%.
[0072] Another method is to use particle precursors that liberate gases and inflate the particles during reaction of the precursor. Preferred particle precursors according to this embodiment release, for example, NOx or CO2 gas.
[0073] Metal salts such as nitrates, chlorides, sulfates, hydroxides or oxalates can be used as particle precursors in a spray pyrolysis process. Preferred metal salts include the metal nitrates. For example, a preferred precursor to platinum metal according to the present invention is nitrated diammine dinitroplatinum (II). Another preferred metal is silver and a preferred precursor to silver metal particles is silver nitrate, AgNO3, or a silver carboxylate compound.
[0074] The application of passive electronic components on flexible and/or low temperature substrates such as polyimide requires new approaches and concepts for the development of suitable precursor chemistries and formulations. For example, low temperature substrate materials require low precursor conversion temperatures.
[0075] One method according to the present invention for formulating compositions for fabrication of conductive, resistive and dielectric circuit components utilizes suitable molecular precursors that can be converted to functional materials. Some progress has been made in the development of metal organic precursors for printing conductors, dielectrics and resistors. See, for example, “Chemical aspects of solution routes to perovskite-phase mixed-metal oxides from metal-organic precursors”, C. D. Chandler, C Roger, and M. J. Hampden-Smith, Chem. Rev 0.93, 1205-1241 (1993). The chemical precursor to the functional phase should convert to the final material at a low temperature. The formulations should be easy to synthesize, environmentally benign, provide clean elimination of inorganic or organic ligands and be compatible with other precursor constituents. Other factors are solubility in various solvents, stability during the delivery process, homogeneous film-formation, good adhesion to the substrate, high ceramic yield, and shelf life. If a laser is used for precursor conversion, the precursor material should be highly absorptive at the laser wavelength being used to promote efficient laser energy coupling allowing for decomposition at low laser power. This will prevent substrate damage during laser processing.
[0076] The metal-ligand bond is a key factor in designing the metal organic precursors. For conductive phases in low-ohm resistors, this bond should be reactive enough to permit complete elimination of the ligand during formation of metallic features for conductors like silver, gold, nickel, platinum, copper, palladium or alloys of these elements. Preferred precursor families include metal carboxylates, alkoxides, and diketonates including at least one metal oxygen bond. Depending on the metal, thiolates and amines can be specifically tailored to the required characteristics.
[0077] Deposition of electro-ceramic materials for dielectric, ferrite, and resistor applications requires precursors that are able to undergo clean and low temperature transformation to single oxides or mixed oxides. This is required to mimic the high-fire compositions currently being used in the electronic industry. Typical reaction mechanisms involved for these metal oxide based formulations are condensation, polymerization, or elimination reactions of alkoxides typically used in sol gel processes. Other reaction routes involve ether, carboxylic anhydride, or ester elimination.
[0078] The present invention is also directed to combinations of precursors, additives and solvents for the conversion to the final material at low temperatures. Even if a conversion at low temperature with complete elimination of byproducts can be achieved, metal oxide materials may still need some higher temperature treatment for proper crystallization and consolidation. In contrast, important metals like silver, gold, palladium and copper can be deposited according to the present invention using carefully designed precursor compositions at temperatures below 200° C., in some cases even below 150° C. with good adhesion to polymeric substrates, such as polyimide substrates. The lower deposition temperatures required for complex mixed metal oxides would result in structures with materials that have controlled stoichiometries and in some cases would afford kinetic routes to new meta-stable crystal structures.
[0079] Particularly preferred precursor compositions for conductive, dielectric and resistive features are described more fully below.
[0080] The precursor compositions according to the present invention can include molecular metal precursors for the formation of a metallic phase, either alone or in combination with particulates. For example, low-ohm resistors often include a conductive metallic phase. Preferred examples of metallic phases include precursors to silver (Ag), nickel (Ni), platinum (Pt), gold (Au), palladium (Pd), copper (Cu), indium (In), ruthenium (Ru) and tin (Sn). Other molecular metal precursors can include precursors to aluminum (Al), zinc (Zn), iron (Fe), tungsten (W), molybdenum (Mo), ruthenium (Ru), lead (Pb), bismuth (Bi) and similar metals. The molecular metal precursors can be either soluble or insoluble in the precursor composition.
[0081] In general, molecular metal precursor compounds that eliminate ligands by a radical mechanism upon conversion to metal are preferred, especially if the species formed are stable radicals and therefore lower the decomposition temperature of that precursor.
[0082] Furthermore, molecular metal precursors containing ligands that upon precursor conversion eliminate cleanly and escape completely from the substrate (or the formed functional structure) are preferred because they are not susceptible to carbon contamination or contamination by anionic species such as nitrates. Therefore, preferred precursors for metals used for conductors are carboxylates, alkoxides or combinations thereof that would convert to metals, metal oxides or mixed metal oxides by eliminating small molecules such as carboxylic acid anhydrides, ethers or esters. Metal carboxylates, particularly halogenocarboxylates such as fluorocarboxylates, are particularly preferred metal precursors due to their high solubility.
[0083] Examples of silver metal precursors that can be used in the low viscosity precursor compositions according to the present invention are illustrated in Table 1.
[0084]
| TABLE 1 | ||
|---|---|---|
| Silver Precursor Molecular Compounds and Salts | ||
| General Class | Examples | Chemical Formula |
| Nitrates | Silver nitrate | Ag NO3 |
| Nitrites | Silver nitrite | AgNO2 |
| Oxides | Silver oxide | Ag2O, AgO |
| Carbonates | Silver carbonate | Ag2CO3 |
| Oxalates | Silver oxalate | Ag2C2O4 |
| (Pyrazolyl)borates | Silver trispyrazolylborate | Ag[(N2C3H3)3]BH |
| Silver tris(dimethylpyrazolyl)borate | Ag[((CH3)2N2C3H3)3]BH | |
| Azides | Silver azide | AgN3 |
| Fluoroborates | Silver tetrafluoroborate | AgBF4 |
| Carboxylates | Silver acetate | AgO2CCH3 |
| Silver propionate | AgO2CC2H5 | |
| Silver butanoate | AgO2CC3H7 | |
| Silver ethylbutyrate | AgO2CCH(C2H5)C2H5 | |
| Silver pivalate | AgO2CC(CH3)3 | |
| Silver cyclohexanebutyrate | AgO2C(CH2)3C6H11 | |
| Silver ethylhexanoate | AgO2CCH(C2H5)C4H9 | |
| Silver neodecanoate | AgO2CC9H19 | |
| Halogenocarboxylates | Silver trifluoroacetate | AgO2CCF3 |
| Silver pentafluoropropionate | AgO2CC2F5 | |
| Silver heptafluorobutyrate | AgO2CC3F7 | |
| Silver trichloroacetate | AgO2CCCl3 | |
| Silver 6,6,7,7,8,8,8-heptafluoro-2,2- | AgFOD | |
| dimethyl-3,5-octanedionate | ||
| Hydroxycarboxylates | Silver lactate | AgO2CH(OH)CH3 |
| Silver citrate | Ag3C6H5O7 | |
| Silver glycolate | AgOOCCH(OH)CH3 | |
| Aminocarboxylates | Silver glyconate | |
| Aromatic and nitro and/or | Silver benzoate | AgO2CCH2C6H5 |
| fluoro substituted aromatic | Silver phenylacetate | |
| Carboxylates | Silver nitrophenylacetates | |
| Silver dinitrophenylacetate | AgOOCCH2C6H5 | |
| Silver difluorophenylacetate | AgOOCCH2C6H4NO2 | |
| Silver 2-fluoro-5-nitrobenzoate | AgOOCCH2C6H3(NO2)2 | |
| AgOOCCH2C6H3F2 | ||
| AgOOCC6H3(NO2)F | ||
| Beta diketonates | Silver acetylacetonate | Ag[CH3COCH═C(O—)CH3] |
| Silver hexafluoroacetylacetonate | Ag[CF3COCH═C(O—)CF3] | |
| Silver trifluoroacetylacetonate | Ag[CH3COCH═C(O—)CF3] | |
| Silver sulfonates | Silver tosylate | AgO3SC6H4CH3 |
| Silver triflate | AgO3SCF3 | |
[0085] In addition to the foregoing, complex silver salts containing neutral inorganic or organic ligands can also be used as precursors. These salts are usually in the form of nitrates, halides, perchlorates, hydroxides or tetrafluoroborates. Examples are listed in Table 2.
[0086]
| TABLE 2 | |
|---|---|
| Complex Silver Salt Precursors | |
| Class | Examples (Cation) |
| Amines | [Ag(RNH2)2]+, Ag(R2NH)2]+, [Ag(R3N)2]+, |
| R = aliphatic or aromatic | |
| N-Heterocycles | [Ag(L)x]+, (L = aziridine, pyrrol, indol, piperidine, |
| pyridine, aliphatic substituted and amino | |
| substituted pyridines, imidazole, pyrimidine, | |
| piperazine, triazoles, etc.) | |
| Amino alcohols | [Ag(L)x]+, L = Ethanolamine |
| Amino acids | [Ag(L)x]+, L = Glycine |
| Acid amides | [Ag(L)x]+, L = Formamides, acetamides |
| Nitriles | [Ag(L)x]+, L = Acetonitriles |
[0087] The molecular metal precursors can be utilized in an aqueous-based solvent or an organic solvent. Organic solvents are typically used for ink-jet deposition. Preferred molecular metal precursors for silver in an organic solvent include Ag-nitrate, Ag-neodecanoate, Ag-trifluoroacetate, Ag-acetate, Ag-lactate, Ag-cyclohexanebutyrate, Ag-carbonate, Ag-oxide, Ag-ethylhexanoate, Ag-acetylacetonate, Ag-ethylbutyrate, Ag-pentafluoropropionate, Ag-benzoate, Ag-citrate, Ag-heptafluorobutyrate, Ag-salicylate, Ag-decanoate and Ag-glycolate. Among the foregoing, particularly preferred molecular metal precursors for silver include Ag-acetate, Ag-nitrate, Ag-trifluoroacetate and Ag-neodecanoate. Most preferred among the foregoing silver precursors are Ag-trifluoroacetate and Ag-acetate. The preferred precursors generally have a high solubility and high metal yield. For example, Ag-trifluoroacetate has a solubility in dimethylacetamide of about 78 wt. % and Ag-trifluoroacetate is a particularly preferred silver precursor according to the present invention.
[0088] Preferred molecular silver precursors for aqueous-based solvents include Ag-nitrates, Ag-fluorides such as silver fluoride or silver hydrogen fluoride (AgHF2), Ag-thiosulfate, Ag-trifluoroacetate and soluble diammine complexes of silver salts.
[0089] Silver precursors in solid form that decompose at a low temperature, such as not greater than about 200° C., can also be used. Examples include Ag-oxide, Ag-nitrite, Ag-carbonate, Ag-lactate, Ag-sulfite and Ag-citrate.
[0090] When a more volatile molecular silver precursor is desired, such as for spray deposition of the precursor composition, the precursor can be selected from alkene silver betadiketonates, R2(CH)2Ag([R′COCH═C(O—)CR″] where R=methyl or ethyl and R′, R″=CF3, C2F5, C3F7, CH3, CmH2m+1 (m=2 to 4), or trialkylphosphine and triarylphosphine derivatives of silver carboxylates, silver beta diketonates or silver cyclopentadienides.
[0091] Molecular metal precursors for nickel that are preferred according to the present invention are illustrated in Table 3. A particularly preferred nickel precursor for use with an aqueous-based solvent is Ni-acetylacetonate.
[0092]
| TABLE 3 | ||
|---|---|---|
| Molecular Metal Precursors for Nickel | ||
| General Class | Example | Chemical Formula |
| Inorganic Salts | Ni-nitrate | Ni(NO3)2 |
| Ni-sulfate | NiSO4 | |
| Nickel ammine complexes | [Ni(NH3)6]n+ (n=2,3) | |
| Ni-tetrafluoroborate | Ni(BF4)2 | |
| Metal Organics | Ni-oxalate | NiC2O4 |
| (Alkoxides, Beta- | Ni-isopropoxide | Ni(OC3H7)2 |
| diketonates, | Ni-methoxyethoxide | Ni(OCH2CH2OCH3)2 |
| Carboxylates, | Ni-acetylacetonate | [Ni(acac)2]3 or |
| Fluoro- | Ni(acac)2(H2O)2 | |
| carboxylates | Ni- | Ni[CF3COCH═C(O—) |
| hexafluoroacetylacetonate | CF3]2 | |
| Ni-formate | Ni(O2CH)2 | |
| Ni-acetate | Ni(O2CCH3)2 | |
| Ni-octanoate | Ni(O2CC7H15)2 | |
| Ni-ethylhexanoate | Ni(O2CCH(C2H5)C4H9)2 | |
| Ni-trifluoroacetate | Ni(OOCCF3)2 | |
[0093] Various molecular precursors can be used for platinum metal. Preferred molecular precursors include ammonium salts of platinates such as ammonium hexachloro platinate (NH4)2PtCl6, and ammonium tetrachloro platinate (NH4)2PtCl4; sodium and potassium salts of halogeno, pseudohalogeno or nitrito platinates such as potassium hexachloro platinate K2PtCl6, sodium tetrachloro platinate Na2PtCl4, potassium hexabromo platinate K2PtBr6, potassium tetranitrito platinate K2Pt(NO2)4; dihydrogen salts of hydroxo or halogeno platinates such as hexachloro platinic acid H2PtCl6, hexabromo platinic acid H2PtBr6, dihydrogen hexahydroxo platinate H2Pt(OH)6; diammine and tetraammine platinum compounds such as diammine platinum chloride Pt(NH3)2Cl2, tetraammine platinum chloride [Pt(NH3)4]Cl2, tetraammine platinum hydroxide [Pt(NH3)4](OH)2, tetraammine platinum nitrite [Pt(NH3)4](NO2)2, tetrammine platinum nitrate Pt(NH3)4(NO3)2, tetrammine platinum bicarbonate [Pt(NH3)4](HCO3)2, tetraammine platinum tetrachloroplatinate [Pt(NH3)4]PtCl4; platinum diketonates such as platinum (II) 2,4-pentanedionate Pt(C5H7O2)2; platinum nitrates such as dihydrogen hexahydroxo platinate H2Pt(OH)6 acidified with nitric acid; other platinum salts such as Pt-sulfite and Pt-oxalate; and
- [0094] platinum salts comprising other N-donor ligands such as [Pt(CN)6]4+.
[0095] Platinum precursor compounds useful in organic-based precursor compositions include Pt-carboxylates or mixed carboxylates. Examples of carboxylates include Pt-formate, Pt-acetate, Pt-propionate, Pt-benzoate, Pt-stearate, Pt-neodecanoate. Other precursors useful in organic vehicles include aminoorgano platinum compounds including Pt(diaminopropane)(ethylhexanoate).
Preferred combinations of platinum precursors and solvents include: PtCl4 in H2O; Pt-nitrate solution from H2Pt(OH)6; H2Pt(OH)6 in H2O; H2PtCl6 in H2O; and [Pt(NH3)4](NO3)2 in H2O.
[0096] Gold precursors that are particularly useful for aqueous based precursor compositions include Au-chloride (AuCl3) and tetrachloric auric acid (HAuCl4).
[0097] Gold precursors useful for organic based formulations include: Au-thiolates, Au-carboxylates such as Au-acetate Au(O2CCH3)3; aminoorgano gold carboxylates such as imidazole gold ethylhexanoate; mixed gold carboxylates such as gold hydroxide acetate isobutyrate; Au-thiocarboxylates and Au-dithiocarboxylates.
[0098] In general, preferred gold molecular metal precursors for low temperature conversion are compounds comprising a set of different ligands such as mixed carboxylates or mixed alkoxo metal carboxylates. As one example, gold acetate isobutyrate hydroxide decomposes at 155° C., a lower temperature than gold acetate. As another example, gold acetate neodecanoate hydroxide decomposes to gold metal at even lower temperature, 125° C. Still other examples can be selected from gold acetate trifluoroacetate hydroxide, gold bis(trifluoroacetate) hydroxide and gold acetate pivalate hydroxide.
[0099] Other useful gold precursors include Au-azide and Au-isocyanide. When a more volatile molecular gold precursor is desired, such as for spray deposition, the precursor can be selected from:
-
- [0100] dialkyl and monoalkyl gold carboxylates, R3-nAu(O2CR′)n (n=1,2) R=methyl, ethyl; R′=CF3, C2F5, C3F7, CH3, CmH2m+1 (m=2-9)
- [0101] dialkyl and monoalkyl gold beta diketonates, R3-nAu [R′COCH═C(O—)CR″]n (n=1,2), R=methyl, ethyl; R′, R″=CF3, C2F5, C3F7, CH3, CmH2m+1 (m=2-4)
- [0102] dialkyl and monoalkyl gold alkoxides, R3-nAu(OR′)n (n=1,2) R=methyl, ethyl; R′=CF3, C2F5, C3F7, CH3, CmH2m+1 (m=2-4), SiR3″ (R″=methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert. Butyl) phosphine gold complexes:
- [0103] RAu(PR′3) R, R′=methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert. Butyl,
R3Au(PR′3) R, R′=methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert. butyl.
- [0103] RAu(PR′3) R, R′=methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert. Butyl,
[0104] Particularly useful precursors to palladium for organic based precursor compositions according to the present invention include Pd-carboxylates, including Pd-fluorocarboxylates such as Pd-acetate, Pd-propionate, Pd-ethylhexanoate, Pd-neodecanoate and Pd-trifluoroacetate as well as mixed carboxylates such as Pd(OOCH)(OAc), Pd(OAc)(ethylhexanoate), Pd(ethylhexanoate)2, Pd(OOCH)1.5 (ethylhexanoate)0.5, Pd(OOCH)(ethylhexanoate), Pd(OOCCH(OH)CH(OH)COOH)m (ethylhexanoate), Pd(OPr)2, Pd(OAc)(OPr), Pd-oxalate, Pd(OOCCHO)m(OOCCH2OH)n=(Glyoxilic palladium glycolate) and Pd-alkoxides. A particularly preferred palladium precursor is Pd-trifluoroacetate.
[0105] Palladium precursors useful for aqueous based precursor compositions include: tetraammine palladium hydroxide [Pd(NH3)4](OH)2; Pd-nitrate Pd(NO3)2; Pd-oxalate Pd(O2CCO2)2; Pd-chloride PdCl2; Di- and tetraammine palladium chlorides, hydroxides or nitrates such as tetraammine palladium chloride [Pd(NH3)4]Cl2, tetraammine palladium hydroxide [Pd(NH3)4](OH)2, tetraammine palladium nitrate [Pd(NH3)4](NO3)2, diammine palladium nitrate [Pd(NH3)2](NO3)2 and tetraammine palladium tetrachloropalladate [Pd(NH3)4][PdCl4].
[0106] When selecting a molecular copper precursor compound, it is desired that the compound react during processing to metallic copper without the formation of copper oxide or other species that are detrimental to the conductivity of the conductive copper feature. Some copper molecular precursors form copper by thermal decomposition at elevated temperatures. Other molecular copper precursors require a reducing agent to convert to copper metal. Reducing agents are materials that are oxidized, thereby causing the reduction of another substance. The reducing agent loses one or more electrons and is referred to as having been oxidized.
[0107] The introduction of the reducing agent can occur in the form of a chemical agent (e.g., formic acid) that is soluble in the precursor composition to afford a reduction to copper either during transport to the substrate or on the substrate. In some cases, the ligand of the molecular copper precursor has reducing characteristics, such as in Cu-formate or Cu-hypophosphite, leading to reduction to copper metal. However, formation of metallic copper or other undesired side reactions that occur prematurely in the ink or precursor composition should be avoided.
[0108] Accordingly, the ligand can be an important factor in the selection of suitable copper molecular precursors. During thermal decomposition or reduction of the precursor, the ligand needs to leave the system cleanly, preferably without the formation of carbon or other residues it could be incorporated into the copper feature. Copper precursors containing inorganic ligands are preferred in cases where carbon contamination is detrimental. Other desired characteristics for molecular copper precursors are low decomposition temperature or processing temperature for reduction to copper metal, high solubility in the selected solvent/vehicle to increase metallic yield and achieve dense features and the compound should be environmentally benign.
[0109] Preferred copper metal precursors according to the present invention include Cu-formate and Cu-neodecanoate. Molecular copper precursors that are useful for aqueous-based precursor compositions include: Cu-nitrate and ammine complexes thereof; Cu-carboxylates including Cu-formate and Cu-acetate; and Cu beta-diketonates such as Cu-hexafluoroacetylacetonateand copper salts such as Cu-chloride.
[0110] Molecular copper precursors generally useful for organic based formulations include: Cu-carboxylates and Cu-fluorocarboxylates such as: Cu-formate; Cu-ethylhexanoate; Cu-neodecanoate; Cu-methacrylate; Cu-trifluoroacetate; Cu-hexanoate; and copper beta-diketonates such as cyclooctadiene Cu hexafluoroacetylacetonate.
Among the foregoing, Cu-formate is particularly preferred as it is highly soluble in water and results in the in-situ formation of formic acid, which is an effective reducing agent.
[0111] As is discussed above, two or more molecular metal precursors can be combined to form metal alloys and/or metal compounds. Preferred combinations of metal precursors to form alloys based on silver include: Ag-nitrate and Pd-nitrate; Ag-acetate and [Pd(NH3)4](OH)2; Ag-trifluoroacetate and [Pd(NH3)4](OH)2; and Ag-neodecanoate and Pd-neodecanoate. One particularly preferred combination of molecular metal precursors is Ag-trifluoroacetate and Pd-trifluoroacetate. Another preferred alloy is Ag/Cu.
[0112] To form alloys, the two (or more) molecular metal precursors should have similar decomposition temperatures to avoid the formation of one of the metal species before the other species. Preferably, the decomposition temperatures of the different molecular metal precursors are within 50° C., more preferably within 25° C.
[0113] Some applications require the utilization of a transparent or semi-transparent conductive feature. For example, indium tin oxide (ITO) is useful for the formation of transparent conductive features, such as for use in display applications. Antimony tin oxide (ATO) is useful as a color tunable oxide layer that finds use in electrochromic applications.
[0114] Such transparent conductive features can also be fabricated according to the present invention. For ITO, useful molecular precursors for indium include: In-nitrate; In-chloride; In-carboxylates such as In-acetate; In-propionates including fluoro, chloro or bromo derivatives thereof; beta diketonates such as In-acetylacetonate, In-hexafluoroacetylacetonate and In-trifluoroacetylacetonate; pyrazolyl borohydrides such as In(pz)3BH; In-alkoxides and In-fluoroalkoxides; and In-amides. Mixed alkoxo In-carboxylates such as indium isopropoxide ethylhexanoate are also useful.
[0115] Useful molecular precursors for tin in ITO or ATO include: Sn-halides such as Sn-tetrachloride; Sn-dichloride; Sn-carboxylates such as Sn-acetate or Sn-ethylhexanoate; Sn-alkoxides such as Sn(OtBu)4; Sn-hydroxycarboxylates such as Sn-glycolate; and beta diketonates such as Sn-hexafluoroacetylacetonate.
[0116] Useful molecular precursors for antimony include: Sb-trichloride; antimony carboxylates such as Sb-acetate or Sb-neodecanoate; antimony alkoxides such as Sb-methoxide, Sb-ethoxide, Sb-butoxide.
[0117] The low viscosity precursor compositions according to the present invention can also include a solvent capable of solubilizing the molecular metal precursor discussed above. The solvent can be water thereby forming an aqueous-based precursor composition. Water is more environmentally acceptable as compared to organic solvents. However, water cannot typically be used for deposition of the precursor composition onto hydrophobic substrates, such as tetrafluoroethylene fluorocarbon substrates (e.g., TEFLON, E.I. duPont deNemours, Wilmington, Del.), without modification of the substrate or the aqueous composition.
[0118] The solvent can also include an organic solvent, by itself or in addition to water. The selected solvent should be capable of solubilizing the selected molecular metal precursor to a high level. A low solubility of the molecular metal precursor in the solvent leads to low yields of the conductor, thin deposits and low conductivity. The precursor compositions of the present invention exploit combinations of solvents and precursors that advantageously provide high solubility of the molecular precursor while still allowing low temperature conversion of the precursor to the conductive phase.
[0119] According to one embodiment of the present invention, the solubility of the molecular metal precursor in the solvent is preferably at least about 20 weight percent metal precursor, more preferably at least 40 weight percent metal precursor, even more preferably at least about 50 weight percent metal precursor and most preferably at least about 60 weight percent metal precursor. Such high levels of metal precursor lead to increased metal yield and the ability to deposit features having adequate thickness.
[0120] In some cases, the solvent can be a high melting point solvent, such as one having a melting point of at least about 30° C. and not greater than about 100° C. In this embodiment, a heated ink-jet head can be used to deposit the precursor composition while in a flowable state whereby the solvent solidifies upon contacting the substrate. Subsequent processing can then remove the solvent by other means and then convert the material to the final product, thereby retaining resolution. Preferred solvents according to this embodiment are waxes, high molecular weight fatty acids, alcohols, acetone, N-methyl-2-pyrrolidone, toluene, tetrahydrofuran (THF) and the like. Alternatively, the precursor composition may be a liquid at room temperature, wherein the substrate is kept at a lower temperature below the freezing point of the composition.
[0121] The solvent can also be a low melting point solvent. A low melting point is required when the precursor composition must remain as a liquid on the substrate until dried. A preferred low melting point solvent according to this embodiment is DMAc, which has a melting point of about −20° C.
[0122] In addition, the solvent can be a low vapor pressure solvent. A lower vapor pressure advantageously prolongs the work life of the composition in cases where evaporation in the ink-jet head, syringe or other tool leads to problems such as clogging. A preferred solvent according to this embodiment is terpineol. Other low vapor pressure solvents include diethylene glycol, ethylene glycol, hexylene glycol, N-methyl-2-pyrrolidone, and tri(ethylene glycol) dimethyl ether.
[0123] The solvent can also be a high vapor pressure solvent, such as one having a vapor pressure of at least about 1 kPa. A high vapor pressure allows rapid removal of the solvent by drying. Other high vapor pressure solvents include acetone, tetrahydrofuran, toluene, xylene, ethanol, methanol, 2-butanone, and water.
[0124] The solvents can be polar or non-polar. Solvents that are useful according to the present invention include amines, amides, alcohols, water, ketones, unsaturated hydrocarbons, saturated hydrocarbons, mineral acids organic acids and bases, Preferred solvents include alcohols, amines, amides, water, ketone, ether, aldehydes and alkenes. Particularly preferred organic solvents according to the present invention include N,N,-dimethylacetamide (DMAc), diethyleneglycol butylether (DEGBE), ethanolamine and N-methylpyrrolidone.
[0125] As is discussed above, a vehicle is a flowable medium that facilitates the deposition of the precursor composition. In cases where the liquid serves only to carry particles and not to dissolve molecular species, the terminology of vehicle is often used for the liquid. However, in many precursor compositions, the solvent can also be considered the vehicle. The metal, such as silver, can be bound to the vehicle, for example, by synthesizing a silver derivative of terpineol that simultaneously acts as both a precursor to silver and as a vehicle. This improves the metallic yield and reduces the porosity of the conductive feature.
[0126] Examples of preferred vehicles are listed in Table 4. Particularly preferred vehicles according to the present invention can include alpha terpineol, toluene and ethylene glycol.
[0127]
| TABLE 4 | |
|---|---|
| Organic Vehicles Useful in Precursor Compositions | |
| Formula/Class | Name |
| Alcohols | 2-Octanol |
| Benzyl alcohol | |
| 4-hydroxy-3methoxy benzaldehyde | |
| Isodeconol | |
| Butylcarbitol | |
| Terpene alcohol | Alpha-terpineol |
| Beta-terpineol | |
| Cineol | |
| Esters | 2,2,4 trimethylpentanediol-1,3 |
| monoisobutyrate | |
| Butyl carbitol acetate | |
| Butyl oxalate | |
| Dibutyl phthalate | |
| Dibutyl benzoate | |
| Butyl cellosolve acetate | |
| Ethylene glycol diacetate | |
| Ethylene glycol diacetate | |
| N-methyl-2-pyrrolidone | |
| Amides | N,N-dimethyl formamide |
| N,N-dimethyl acetamide | |
| Aromatics | Xylenes |
| Aromasol | |
| Substituted aromatics | Nitrobenzene |
| o-nitrotoluene | |
| Terpenes | Alpha-pinene, beta-pinene, dipentene, |
| dipentene oxide | |
| Essential Oils | Rosemary, lavender, fennel, sassafras, |
| wintergreen, anise oils, camphor, turpentine | |
[0128] The low viscosity precursor compositions in accordance with the present invention can also include one or more polymers. The polymers can be thermoplastic polymers or thermoset polymers. Thermoplastic polymers are characterized by being fully polymerized. They do not take part in any reactions to further polymerize or cross-link to form a final product. Typically, such thermoplastic polymers are melt-cast, injection molded or dissolved in a solvent. Examples include polyimide films, ABS plastics, vinyl, acrylic, styrene polymers of medium or high molecular weight and the like.
[0129] The polymers can also be thermoset polymers, which are characterized by not being fully polymerized or cured. The components that make up thermoset polymers must undergo further reactions to form fully polymerized, cross-linked or dense final products. Thermoset polymers tend to be resistant to solvents, heat, moisture and light.
[0130] A typical thermoset polymer mixture initially includes a monomer, resin or low molecular weight polymer. These components require heat, hardeners, light or a combination of the three to fully polymerize. Hardeners are used to speed the polymerization reactions. Some thermoset polymer systems are two part epoxies that are mixed at consumption or are mixed, stored and used as needed.
[0131] Specific examples of thermoset polymers include amine or amide-based epoxies such as diethylenetriamine, polyglycoldianine and triethylenetetramine. Other examples include imidazole, aromatic epoxies, brominated epoxies, thermoset PET, phenolic resins such as bisphenol-A, polymide, acrylics, urethanes, and silicones. Hardeners can include isophoronediamine and meta-phenylenediamene.
[0132] The polymer can also be an ultraviolet or other light-curable polymer. The polymers in this category are typically UV and light-curable materials that require photoinitiators to initiate the cure. Light energy is absorbed by the photoinitiators in the formulation causing them to fragment into reactive species, which can polymerize or cross-link with other components in the formulation. In acrylate-based adhesives, the reactive species formed in the initiation step are known as free radicals. Another type of photoinitiator, a cationic salt, is used to polymerize epoxy functional resins generating an acid, which reacts to create the cure. Examples of these polymers include cyanoacrylates such as z-cyanoacrylic acid methyl ester with an initiator as well as typical epoxy resin with a cationic salt.
[0133] The polymers can also be conductive polymers such as intrinsically conductive polymers. Conductive polymers are disclosed, for example, in U.S. Pat. No. 4,959,430 by Jonas et al., which is incorporated herein by reference in its entirety. Other examples of intrinsically conductive polymers are listed in Table 5 below.
[0134]
| TABLE 5 | ||
|---|---|---|
| Intrinsically Conductive Polymers | ||
| Examples | Class/Monomers | Catalyst/Dopant |
| Polyacetylene | ||
| Poly[bis(benzylthio) acetylene] | Phenyl vinyl sulfoxide | Ti alkylidene |
| Poly[bis(ethylthio)acetylene] | ||
| Poly[bis(methylthio)acetylene] | 1,3,5,7-Cyclooctatetraene | |
| Polyaniline | ||
| Fully reduced | organic sulfonic acids such as: | |
| Half oxidized | Dinonylnaphthalenedisulfonc acid | |
| Dinonylnaphthaleneusulfonic acid | ||
| Dodecylbenzenesulfonic acid | ||
| Poly(anilinesulfonic acid) | ||
| Self-doped state | ||
| Polypyrrole | ||
| Organic sulfonic acid | ||
| Polythiophene | ||
| Poly(thiophine-2.5-diyl) | 2,5-Dibromo-3-alkyl/arylthiophene | |
| Poly(3-alkylthiophene-2.5-diyl) | alkyl = butyl, hexyl, octyl, | |
| alkyl = butyl, hexyl, octyl, | decyl, dodecyl | |
| decyl, dodecyl | aryl = phenyl | |
| Poly(styrenesulfonate)/poly- | Dibromodithiophene | |
| (2,3-dihydrothieno-[3,4-b]-1,4- | Terthiophene | |
| dioxin) | Other substituted thiophenes | |
| Poly(1,4-phenylenevinylene) | ||
| (PPV) | ||
| p-Xylylenebis | ||
| (tetrahydrothiopheniumchloride)) | ||
| Poly(1,4-phenylene sulfide) | ||
| Poly(fluroenyleneethynylene) | ||
[0135] Other additives can be included in the low viscosity precursor compositions in accordance with the present invention. Among these are reducing agents to prevent the undesirable oxidation of metal species. For example, copper and nickel metal have a strong tendency to oxidize. Precursor compositions adapted to form base metals, including nickel or copper, according to the present invention can include reducing agents as additives to provide reaction conditions for the formation of the metal at the desired temperature, rather than the metal oxide. Reducing agents are particularly applicable when using molecular metal precursor compounds where the ligand is not reducing by itself. Examples of reducing agents include amino alcohols and formic acid. Alternatively, the precursor conversion process can take place under reducing atmosphere, such as nitrogen, hydrogen or forming gas.
[0136] In some cases, the addition of reducing agents results in the formation of the metal even under ambient conditions. The reducing agent can be part of the precursor itself, for example in the case of certain ligands. An example is Cu-formate where the precursor forms copper metal even in ambient air at low temperatures. In addition, the Cu-formate precursor is highly soluble in water, results in a relatively high metallic yield and forms only gaseous byproducts, which are reducing in nature and protect the in-situ formed copper from oxidation. Cu-formate is therefore a preferred precursor for aqueous based precursor compositions. Other examples of molecular metal precursors containing a ligand that is a reducing agent are Ni-acetylacetonate and Ni-formate.
[0137] The compositions can also include crystallization inhibitors and a preferred crystallization inhibitor is lactic acid. Such inhibitors reduce the formation of large crystallites directly from the molecular metal precursor, which can be detrimental to conductivity. Other crystallization inhibitors include ethylcellulose and polymers such as styrene allyl alcohol (SAA) and polyvinyl pirolydone (PVP). For example, in some silver precursor compositions small additions of lactic acid completely prevent crystallization. In other cases, such as in aqueous Cu-formate compositions, small amounts of glycerol can act as a crystallization inhibitor. Other compounds useful for reducing crystallization are other polyalcohols such as malto dextrin, sodium carboxymethylcellulose and TRITON X100. In general, solvents with a higher melting point and lower vapor pressure inhibit crystallization of any given compound more than a lower melting point solvent with a higher vapor pressure. In one embodiment, not greater than about 10 weight percent crystallization inhibitor as a percentage of total composition is added, preferably not greater than 5 weight percent and more preferably not greater than 2 weight percent.
[0138] The low viscosity precursor compositions can also include an adhesion promoter adapted to improve the adhesion of the conductive feature to the underlying substrate. For example, polyamic acid can improve the adhesion of the composition to a polymer substrate. In addition, the precursor compositions can include rheology modifiers. As an example, styrene allyl alcohol (SAA) can be added to the precursor composition to reduce spreading on the substrate.
[0139] The low viscosity precursor compositions can also include complexing agents. Complexing agents are a molecule or species that binds to a metal atom and isolates the metal atom from solution. Complexing agents are adapted to increase the solubility of the molecular precursors in the solvent, resulting in a higher yield of metal. One preferred complexing agent, particularly for use with Cu-formate and Ni-formate, is 3-amino-1-proponal. For example, a preferred precursor composition for the formation of copper includes Cu-formate dissolved in water and 3-amino-1-propanol.
[0140] The precursor compositions described herein can include rheology modifiers. Rheology modifiers include SOLTHIX 250 (Avecia Limited), SOLSPERSE 21000 (Avecia Limited), styrene allyl alcohol (SAA), ethyl cellulose, carboxy methylcellulose, nitrocellulose, polyalkylene carbonates, ethyl nitrocellulose, and the like. These additives can reduce the spreading after deposition, as is discussed in more detail below.
[0141] The precursor compositions can also include other additives such as wetting angle modifiers, humectants and the like.
[0142] In accordance with the foregoing, the low viscosity precursor compositions according to the present invention can include combinations of particles (nanoparticles and/or micro-size particles), molecular metal precursor compounds, solvents, vehicles, reducing agents, crystallization inhibitors, adhesion promoters, complexing agents and other minor additives to control properties such as surface tension.
[0143] For low viscosity precursor compositions, it is preferred that the total loading of particulates (nanoparticles and micron-size particles) is not greater than about 75 weight percent, such as from about 5 wt. % to 50 wt. %. Loading in excess of the preferred amount can lead to higher viscosities and undesirable flow properties. It is particularly preferred that the total loading of micron-size particles not exceed about 50 weight percent and that the total loading of nanoparticles not exceed about 75 weight percent. In one preferred embodiment, the low viscosity precursor composition includes from about 5 to about 50 weight percent nanoparticles and substantially no micron-size particles.
[0144] A preferred low viscosity precursor composition comprises at least one molecular metal precursor where the precursor is highly soluble in the selected aqueous or organic solvent. Preferably, the precursor composition includes at least about 20 weight percent of molecular metal precursor, such as from about 30 weight percent to about 60 weight percent. It is particularly preferred that the molecular metal precursor be added to the precursor composition up to the solubility limit of the compound in the solvent.
[0145] The solvent can also serve as the vehicle. Alternatively, an additional liquid can be added as a vehicle.
[0146] According to certain embodiments of the present invention, the precursor composition can be selected to reduce the conversion temperature required to convert the metal precursor compound to the conductive metal. The precursor converts at a low temperature by itself or in combination with other precursors and provides for a high metal yield. As used herein, the conversion temperature is the temperature at which the metal species contained in the molecular metal precursor compound, is at least 95 percent converted to the pure metal. As used herein, the conversion temperature is measured using a thermogravimetric analysis (TGA) technique wherein a 50-milligram sample of the precursor composition is heated at a rate of 10° C./minute in air and the weight loss is measured.
[0147] A preferred approach for reducing the conversion temperature according to the present invention is to bring the molecular metal precursor compound into contact with a conversion reaction inducing agent. As used herein, a conversion reaction inducing agent is a chemical compound that effectively reduces the temperature at which the molecular metal precursor compound decomposes to the metal. The conversion reaction inducing agent can either be added into the original precursor composition or added in a separate step during conversion on the substrate. The former method is preferred. Preferably, the conversion temperature of the metal precursors can be preferably lowered by at least about 25° C., more preferably by at least about 50° C. even more preferably by at least about 100° C., as compared to the dry metal precursor compound
[0148] The reaction inducing agent can be the solvent or vehicle that is used for the precursor composition. For example, the addition of certain alcohols can reduce the conversion temperature of the precursor composition.
[0149] Preferred alcohols for use as conversion reaction inducing agents according to certain embodiments of the present invention include terpineol and diethyleneglycol butylether (DEGBE). It will be appreciated that the alcohol can also be the vehicle, such as in the case of terpineol.
[0150] More generally, organic alcohols such as primary and secondary alcohols that can be oxidized to aldehydes or ketones, respectively, can advantageously be used as the conversion reaction inducing agent. Examples are 1-butanol, diethyleneglycol, DEGBE, octanol, and the like. The choice of the alcohol is determined by its reducing capability as well as its boiling point, viscosity and precursor solubilizing capability. It has been discovered that some tertiary alcohols can also lower the conversion temperature of some precursors. For example, alpha-terpineol, which also serves as a vehicle, significantly lowers the conversion temperature of some molecular metal precursors. The boiling point of the conversion reaction inducing agents is preferably high enough to provide for the preferred ratio of metal ions to inducing agent during conversion to metal. It should also be low enough for the inducing agent to escape the deposit cleanly without unwanted side reactions that could lead to carbon residues in the final film. The preferred ratio of metal precursor to inducing agent is stoichiometric for complete reduction. However, in some cases catalytic amounts of the inducing agent are sufficient.
[0151] Some solvents, such as DMAc, can serve as both a vehicle and a conversion reaction inducing agent. It can also be regarded as a complexing agent for silver. This means that precursors such as Ag-nitrate that are otherwise not very soluble in organic solvents can be brought into solution by complexing the metal ion with a complexing agent such as DMAc. In this specific case, Ag-nitrate can form a 1:1 adduct with DMAc which is soluble in organic solvents such as N-methylpyrrolidinone (NMP) or DMAc.
[0152] Another approach for reducing the conversion temperature of certain metal precursors is utilizing a palladium compound as a conversion reaction inducing agent. According to this embodiment, a palladium precursor compound is added to the precursor composition, which includes another precursor such as a silver precursor. With addition of various Pd compounds, the conversion temperature of the silver precursor can be advantageously reduced by at least 25° C. and more preferably by at least 50° C. Preferred palladium precursors according to this embodiment of the present invention include Pd-acetate, Pd-trifluoroacetate, Pd-neodecanoate and tetraammine palladium hydroxide. Pd-acetate and Pd-trifluoroacetate are particularly preferred as conversion reaction inducing agents to reduce the conversion temperature of a silver metal carboxylate compound. Small additions of Pd-acetate to a precursor composition that includes Ag-trifluoroacetate in DMAC can lower the decomposition temperature by up to 80° C. Preferred are additions of Pd-acetate or Pd-trifluoracetate in an amount of at least about 1 weight percent, more preferably at least about 2 weight percent. The upper range for this Pd conversion reaction inducing agent is limited by its solubility in the solvent and in one embodiment does not exceed about 10 weight percent. Most preferred is the use of Pd-trifluoroacetate because of its high solubility in organic solvents. For example, a preferred precursor composition for a silver/palladium alloy according to the present invention is Ag-trifluoroacetate and Pd-trifluoracetate dissolved in DMAC and lactic acid.
[0153] A complete range of Ag/Pd alloys can be formed with a Ag-trifluoroacetate/Pd-trifluoroacetate combination in a solvent such as DMAc. The molecular mixing of the metal precursors provides preferred conditions for the formation of virtually any Ag/Pd alloy at low temperature. The conversion temperature of the silver precursor when dissolved in DMAc is preferably reduced by at least 80° C. when combined with Pd-trifluoroacetate. Pure Pd-trifluoroacetate dissolved in DMAc can be converted to pure Pd at the same temperature. Similar conversion temperatures for the Ag and Pd precursor are advantageous since it provides optimal conditions for molecular mixing and the formation of Ag/Pd alloys with a homogeneous distribution of Ag and Pd.
[0154] Other conversion reaction inducing agents that can also lower the conversion temperature for nickel and copper metal precursors can be used such as amines (ammonia, ethylamine, propylamine), amides (DMAc, dimethylformamide, methylformamide, imidazole, pyridine), aminoalcohols (ethanol amine, diethanolamine and triethanolamine), aldehydes (formaldehyde, benzaldehyde, acetaldehyde); formic acid; thiols such as ethyl thioalcohol, phosphines such as trimethylphosphine or triethylphosphine and phosphides. Still other conversion reaction inducing agents can be selected from boranes and borohydrides such as borane-dimethylamine or borane-trimethylamine. Preferred conversion reaction inducing agents are alcohols and amides. Advantageously, DMAc can also serve as the solvent for the molecular precursor. Compared to precursor compositions that contain other solvents such as water, the precursor conversion temperature can be reduced by as much as 60° C. to 70° C. Also preferred is DEGBE, which can reduce the decomposition temperature of a silver precursor dissolved in a solvent such as water by as much as 125° C.
[0155] Another factor that has been found to influence the conversion temperature is the ratio of molecular metal precursor to conversion reaction inducing agent. It has been found that the addition of various amounts of DEGBE to a molecular silver precursor such as Ag-trifluoroacetate in DMAc reduces the precursor conversion temperature by up to about 70° C. Most preferred is the addition of stoichiometric amounts of the inducing agent such as DEGBE. Excess amounts of conversion temperature inducing agent are not preferred because it does not lower the temperature any further. In addition, higher amounts of solvent or inducing agents lower the overall concentration of precursor in solution and can negate other solution characteristics such as the composition being in the preferred viscosity and surface tension range. The ratio of inducing agent to metal ion that is reduced to metal during conversion can be expressed as a molar ratio of functional group (inducing part in the reducing agent) to metal ion. The ratio is preferably about 1, such as in the range from about 1.5 to about 0.5 and more preferably in the range of about 1.25 to about 0.75 for univalent metal ions such as Ag. For divalent metal ions the ratio is preferably about 2, such as in the range from about 3 to 1, and for trivalent metals the ratio is preferably about 3, such as in the range from about 4.5 to 1.5.
[0156] The molecular precursor preferably provides as high a yield of metal as possible. A preferred ratio of molecular precursor to solvent is that corresponding to greater than 10% mass fraction of metal relative to the total weight of the liquid (i.e., all precursor components excluding particles). As an example, at least 10 grams of conductor is preferably contained in 100 grams of the precursor composition. More preferably, greater than 20 wt. % of the precursor composition is metal, even more preferably greater than 30 wt. %, even more preferably greater than 40 wt. % and most preferably greater than 50 wt. %.
[0157] Yet another preferred approach for reducing the conversion temperature is to catalyze the reactions using particles, particularly nanoparticles. Preferred powders that catalyze the reaction include pure Pd, Ag/Pd alloy particles and other alloys of Pd. Another approach for reducing the conversion temperature is to use gaseous reducing agents such as hydrogen or forming gas.
[0158] Yet another preferred approach for reducing the conversion temperature is ester elimination, either solvent assisted or without solvent assist. Solvent assist refers to a process wherein the metal alkoxide is converted to an oxide by eliminating an ester. In one embodiment, a metal carboxylate and metal alkoxide are mixed into the formulation. At the processing temperature the two precursors react and eliminate an organic ester to form a metal oxide, which decomposes to the corresponding metal at lower temperature than the precursors themselves. This is also useful for Ag and Au, where for Au the metal oxide formation is skipped.
[0159] Another preferred approach for reducing the conversion temperature is by photochemical reduction. For example, photochemical reduction of Ag can be achieved by using precursors containing silver bonds that can be broken photochemically. Another method is to induce photochemical reduction of silver on prepared surfaces where the surface catalyzes the photochemical reaction.
[0160] Another preferred approach for reducing the conversion temperature is in-situ precursor generation by reaction of ligands with particles. For example, silver oxide can be a starting material and can be incorporated into a conductor or resistor precursor composition in the form of nanoparticles. It can react with deprotonateable organic compounds to form the corresponding silver salts. For example, silver oxide can be mixed with a carboxylic acid to form silver carboxylate. Preferred carboxylic acids include acetic acid, neodecanoic acid and trifluoroacetic acid. Other carboxylic acids work as well. For example, DARVAN C (Vanderbilt Chemical) can be included in the composition as a rheology modifier and can react its carboxylic function with the metal oxide. Small silver particles that are coated with a thin silver oxide layer can also be reacted with these compounds. Another potential benefit is simultaneously gained with regard to rheology in that such a surface modification can lead to improved particle loadings in conductor compositions. Another example is the reaction of CuO coated silver powder with carboxylic acids. This procedure can be applied more generally on other oxides such as copper oxide, palladium oxide and nickel oxide particles as well. Other deprotonateable compounds are halogeno-, hydroxy- and other alkyl and aryl derivatives of carboxylic acids, beta diketones, more acidic alcohols such as phenol, and hydrogentetrafluoroborates.
Dielectric Precursor Compositions
[0161] For dielectric materials, the formation of carbon during the conversion of a molecular precursor should be avoided because it can lead to a high degree of dielectric loss. Many high K dielectric compositions contain barium. When processed in air, barium precursors are susceptible to formation of barium carbonate. Once barium carbonate is formed, it cannot be converted to an oxide below 1000° C. Therefore, barium carbonate formation should be avoided. It is also known that hydroxyl groups are an important source of loss in dielectric metal oxides and the condensation reactions to convert metal hydroxides to metal oxides are not complete until about 800° C. (for isolated surface hydroxyl groups). The present invention includes precursor compositions that avoid hydrolytic-based chemistry such as sol-gel-based hydrolysis and condensation routes.
[0162] For layers with low dielectric loss and high dielectric constant, the incorporation of porosity is detrimental to the performance of these layers as a result of the high internal surface area and the contribution of the dielectric properties of the material trapped inside the pores, especially air. Therefore, porosity should be reduced to a minimum.
[0163] The metal oxide phases that lead to the desired dielectric properties also require that the material be highly crystalline. The desired metal oxides do not crystallize until a high temperature and so a method that relies on a low temperature precursor composition that only includes a molecular precursor to the final phase will have both a low material yield and poor crystallinity. Conversely, a composition and method relying on only particulate material will likely provide high porosity if processed below 300° C.
[0164] The present invention includes dielectric precursor compositions that address these issues and can be converted at low temperatures to form high performance dielectric features. The compositions can include a large volume and mass fraction of highly crystalline, high performance dielectric powder such as BaTiO3 or BaNd2Ti5O14 that has the desired dielectric constant, has a low temperature coefficient and has a low loss. The precursor composition can include a smaller fraction of precursor to another material for which precursors are available that have the following characteristics:
-
- [0165] Avoid the intermediate formation of hydroxyl groups.
- [0166] Have ligands that react preferentially to give a single-phase complex stoichiometry product rather than a mixture of a number of different crystalline phases.
- [0167] Can be processed to form a crystalline phase at low temperatures.
- [0168] Have high ceramic yield.
- [0169] Which result in a good K, low loss and small temperature coefficient contribution.
An example of such a target phase is TiO2 or Zr0.40Sn0.66Ti0.94O2.
[0170] One embodiment of the present invention utilizes novel combinations of molecular precursors that provide lower reaction temperatures than can be obtained through individual precursors. The precursors can include molecules that can be converted to metal oxides, glass-metal oxide, metal oxide-polymer, and other combinations. The dielectric precursor compositions of the present invention can include novel combinations of precursors that provide lower reaction temperatures to form dielectric features than can be obtained through the use of individual precursors. An example of one such combination is Sn-, Zr-, and Ti-oxide precursors.
[0171] Depending on their nature, the dielectric precursors can react in the following ways:
[0172] Hydrolysis/Condensation
M(OR)n+H2O→[MOx(OR)n-x]+MOy
M(OR)n+H2O→[MOx(OR)n-x]+MOy
[0173] Anhydride Elimination
M(OAc)n→[MOx/2(OAc)n-x]+x/2Ac2O→MOy+n-xAc2O
M(OAc)n→[MOx/2(OAc)n-x]+x/2Ac2O→MOy+n-xAc2O
[0174] Ether Elimination
M(OR)n+[MOx(OR)n-x]+R2O→MOy+n-xR2O
M(OR)n+[MOx(OR)n-x]+R2O→MOy+n-xR2O
[0175] Ketone Elimination
M(OOCR)(R′)→MOy+R′RCO
M(OOCR)(R′)→MOy+R′RCO
[0176] Ester Elimination
M(OR)n+M′(OAc)n→[MM′Ox(OAc)n-x(OR)n-x]+ROAc
[MM′Ox(OAc)n-x(OR)n-x]→MM′Oy+n-xROAc
M(OR)n+M′(OAc)n→[MM′Ox(OAc)n-x(OR)n-x]+ROAc
[MM′Ox(OAc)n-x(OR)n-x]→MM′Oy+n-xROAc
[0177] Alcohol-induced Ester Elimination
M(OAc)n+HOR+[MOx(OAc)n-x]→MOy
M(OAc)n+HOR+[MOx(OAc)n-x]→MOy
[0178] Small Molecule-induced Oxidation
M(OOCR)+Me3NO→MOy+Me3N+CO2
M(OOCR)+Me3NO→MOy+Me3N+CO2
[0179] Alcohol-induced Ester Elimination
MO2CR+HOR→MOH+RCO2R (ester)
MOH->MO2
MO2CR+HOR→MOH+RCO2R (ester)
MOH->MO2
[0180] Ester Elimination
MO2CR+MOR→MOM+RCO2R (ester)
MO2CR+MOR→MOM+RCO2R (ester)
[0181] Condensation Polymerization
MOR+H2O→(MaOb)OH+HOR
(MaOb)OH+(MaOb)OH→[(MaOb)O(MaOb)O]
MOR+H2O→(MaOb)OH+HOR
(MaOb)OH+(MaOb)OH→[(MaOb)O(MaOb)O]
[0182] A particularly preferred approach is ester elimination, including a sol-gel process utilizing alcohol ester elimination. One preferred combination of precursors according to the present invention is Sn-ethylhexanoate, Zr-ethylhexanoate and dimethoxy titanium neodecanoate. These precursors can be advantageously used in an organic based precursor composition. In this case, the presence of metal alkoxides precludes the use of water. The nature and the ratio of the ligands used in these precursors are critical to achieve a low conversion temperature. Generally, small ligands that can escape cleanly without leaving carbon residue during conversion are preferred. For example, this can be achieved by formation of ethers from alkoxide ligands or by formation of anhydrides from carboxylates. Another preferred combination is the use of a mixed ligand system such as a carboxylate and an alkoxide that can be bound to either the same or different metal centers. Upon conversion, the metal oxygen bonds are broken and small molecules are eliminated. A carboxylate to alkoxide ratio of about 1:1 is particularly preferred because of the formation of organic esters at lower temperatures.
[0183] In accordance with the foregoing, useful precursors (where metal=Sn, Zr, Ti, Ba, Ca, Nd, Sr, Pb, Mg) include:
[0184] 1) Metal alkoxides, such as Sn-ethoxide, Zr-propoxide, Pb-butoxide, Pb-isopropoxide, Sn-neodecanoate;
[0185] 2) Metal carboxylates, such as metal fluorocarboxylates, metal chlorocarboxylates, metal hydroxocarboxylates. Specific examples include Ba-acetate, Sn-ethylhexanoate, and Pb-carboxylates such as Pb-acetate, Pb-trifluoroacetate and Pb-ethylhexanoate;
[0186] 3) Metal betadiketonates, including Pb-betadiketonates such as Pb-acetylacetonate and Pb-hexafluoroacetylacetonate; and
[0187] 4) Mixed alkoxo metal carboxylates (where metal=Sn, Zr, Ti, Ba, Ca, Nd, Sr, Pb, Mg) such as dimethoxy titanium neodecanoate. Dialkoxo titanium dicarboxylate precursors in the dielectric precursor compositions can also serve as an adhesion promoter.
[0188] A dielectric precursor composition can include a dielectric powder and a precursor to an insulative phase. Alternatively, the dielectric precursor can include an insulative powder and a precursor to a dielectric phase. Preferred dielectric powders (nanoparticles or micron-size particles) include BaTiO3, lead manganese niobate (PMN), lead zirconium titanate (PZT), doped barium titanate (BTO), barium neodymium titanate (BNT), lead tantalate (Pb2Ta2O7), and other pyrochlores. Preferred insulative powders include TiO2, SiO2, and insulating glasses. Preferred insulative phase precursors include organic titanates such as titanium bis(ammonium lactato) dihydroxide; mixed alkoxo titanium carboxylates such as dimethoxy titanium bis(neodecanoate) or dibutoxy titanium bis(neodecanoate); silicon alkoxides such as silicon methoxide and silicon ethoxide. Preferred dielectric phase precursors include metal alkoxides, carboxylates and beta-diketonates to form the mixed metal oxide as listed above.
[0189] Another consideration when using precursor compositions containing dielectric particles that are formulated to be converted at a low temperature is that the particles must possess properties close to the final desired physical properties of the fully processed devices. Optimization of the intrinsic properties of the particles is crucial because recrystallization and annealing of crystal defects during thermal processing is often not possible at processing temperatures of less than 500° C. Maximization of dielectric constant in the final material requires maximization of the dielectric constant of the powders because the composition is subjected to low temperatures for short times, which are insufficient to increase the crystallinity of the high k powder during processing.
[0190] In one embodiment, the precursor composition utilizes dielectric powders with dielectric constants (k) preferably greater than 500 and more preferably greater than 1000. The dielectric constant of the powder can be measured as follows: A pellet is pressed from the dry powder and calcined at 400° C. for one hour to drive off water. The pellet is then placed between metal electrodes and the capacitance is measured as a parallel plate capacitor, over the frequency range of 1 kHz to 1 MHz. Based on the geometry and packing density, the logarithmic rule of mixtures is applied, assuming the two phases present are the powder and air, and the dielectric constant of the powder alone is calculated.
[0191] In another embodiment, a precursor composition utilizes dielectric powders with dielectric constants greater than 2000. Such high dielectric constant can be obtained in a powder in various ways. One way is the use of spray pyrolysis, which allows for the addition of dopant in each individual particle. Another way is the use of annealing of particle beds at elevated temperatures such as 900° C. to 1000° C. to improve particle composition and particle crystallinity followed by milling to break up any soft agglomerations formed during firing. A rotary calcine can be used to anneal and limit particle agglomeration.
[0192] In another embodiment, a precursor composition includes low loss dielectric powders having a loss of less than 1%, more preferably less than 0.1%, and most preferably less than 0.01%, over the frequency range of 1 kHz to 1 MHz. The dielectric loss can be measured as follows: A pellet is pressed from the dry powder and calcined at 400° C. to drive off surface water. Once the pellet has been dried, it is kept in a dry environment. The pellet is then placed between electrodes and the loss measured as a parallel plate capacitor over the frequency range of 1 kHz to 1 MHz.
[0193] In another embodiment, a precursor composition utilizes high-k or low loss dielectric powders as described above, where the particles are exposed to a liquid surface modification agent, such as a silanating agent. The purpose of this treatment is the elimination of surface defects such as hydroxyl groups that induce dielectric loss and/or sensitivity to humidity in the final low-fired dielectric layer. The silanating agent can include an organosilane. For example, a surface-modifying agent is exposed as a gas in a confined enclosure to the powder bed and allowed to sit for about 15 minutes at 120° C. for 10 minutes, completing the surface modification.
[0194] Useful organosilanes include RnSiX(4-n), where X is a hydrolysable leaving group such as an amine (e.g., hexamethyldisilazane), halide (e.g., dichlorodimethylsilane), alkoxide (e.g., trimethoxysilane, methacryloxypropyltrimethoxysilane, N-methyl-3-aminopropyltrimethoxysilane), or acyloxy (e.g., acryloxytrimethylsilane).
[0195] Hydrolysis and condensation can occur between organosilane and surface hydroxy groups on the dielectric particle surface. Hydrolysis occurs first with the formation of the corresponding silanol followed by condensation with hydroxo groups on the metal oxide surface. As an example:
R—(CH2)3Si(OMe)3+H2O→R—(CH2)3Si(OH)2(OMe)2+2MeOH
R—(CH2)3Si(OH)2(OMe)2+(particlesurfSi)OH→(particlesurfSi)—O—Si(OH)2(CH2)3—R+H2O
R—(CH2)3Si(OMe)3+H2O→R—(CH2)3Si(OH)2(OMe)2+2MeOH
R—(CH2)3Si(OH)2(OMe)2+(particlesurfSi)OH→(particlesurfSi)—O—Si(OH)2(CH2)3—R+H2O
-
- [0196] where
- [0197] R=CH2CCH3COO
[0198] Particularly preferred compositions for high dielectric constant powders are those having the perovskite structure. Examples include metal titanates, metal zirconates, metal niobates, and other mixed metal oxides. Particularly useful is the barium titanate system which can reach a broad range of dielectric performance characteristics by adding small levels of dopant ions. Specific examples include BaTiO3, PbTiO3, PbZrO3, PbZrxTi1-xO3 and PbMg1/3Nb2/3O3.
[0199] Particularly preferred compositions for low loss dielectric constant powders are Zr0.7Sn0.3TiO4, Zr0.4Sn0.66Ti0.94O4, CaZr0.98Ti0.02O3, SrZr0.94Ti0.06O3, BaNd2Ti5O14, Pb2Ta2O7, and various other pyrochlores.
[0200] The dielectric precursor compositions of the present invention uniquely allow for the use of two or more different particles, such as by mixing Al2O3 and TiO2 particles, or barium titanate and PZT particles. These compositions will not interdiffuse significantly during firing below 600° C., preserving their unique dielectric properties. These compositions can be tailored to have a very low TCC value combined with very low loss.
[0201] Preferred glass compositions are low melting temperature glasses, such as borosilicate glasses doped with lead or bismuth. The preferred average particle size for the glass powder is no larger than the other particles present, and more preferably is less than about half the size of the other particles.
[0202] The preferred average particle size of the low melting glass particles is on the order of the size of the dielectric particles, and more preferably is about one-half the size of the dielectric particles, and most preferably is about one quarter the size of the dielectric particles.
[0203] A bimodal size distribution of particles, as is discussed above, enhances the packing density and is desired to increase the performance, preferably with the smaller particles being about 10 wt. % of the total mass of powder.
[0204] The dielectric precursor compositions of the present invention can be converted at a low temperature. The preferred conversion temperature is less than 900° C. for ceramic substrates. For glass substrates, the preferred conversion temperature is not greater than 600° C. Even more preferred for glass substrates is a conversion temperature of not greater than 500° C., such as not greater than 400° C. The preferred conversion temperature for organic substrates is not greater than 350° C., even more preferably not greater than 300° C., and even more preferably not greater than 200° C.
[0205] Spherical dielectric particles can be incorporated to improve solids loading while maintaining good flowability. In one embodiment, the precursor composition includes spherical dielectric particles and a vehicle. The spherical particles can be formed, in one embodiment, by spray pyrolysis.
[0206] In another embodiment, the dielectric precursor composition includes dielectric particles, a precursor and a vehicle, wherein the precursor is preferably a metal organic.
[0207] In another embodiment, the dielectric precursor composition includes solid dielectric particles, nanoparticles and a vehicle.
[0208] In another embodiment, the dielectric precursor composition includes solid dielectric particles, a precursor, nanoparticles and a vehicle wherein the precursor is preferably a metallo-organic compound.
[0209] The dielectric precursor compositions can include dielectric particles, vehicle, and polymer precursor. In cases where adhesion to a polymeric substrate is desired, the precursor composition can include a polymer or precursor to a polymer. The precursor to a polymer can be poly (amic) acid. The polymer can be an epoxy, polyimide, phenolic resin, thermo set polyester, polyacrylate and the like. The flowable compositions can include a low curing polymer that cures at not greater than 200° C., more preferably not greater than 150° C.
[0210] The precursor composition can include a low loss polymer such as poly tetra fluoro ethylene, or a precursor to such a polymer.
[0211] The precursor compositions can include a particle surface modifier such as a liquid surface modification agent, for example, a silanating agent. The silanating agent can include hexamethyldisilazane.
[0212] The present invention provides dielectric precursor compositions capable of forming combinations of high k particles and matrix derived from a precursor or a low melting glass or both. Preferred particles for high k materials are lead magnesium niobate (PMN, PbMg1/3Nb2/3O3), PbTiO3 (PT), PMN-PT, PbZrxTi1-xO (PZT), and doped BaTiO3. Preferred particles for low loss applications are barium neodymium titanate (BNT, BaNd2Ti5O14), zirconium tin titanate (ZST, Ti0.94Zr0.4Sn0.66O4), lead tantalate (Pb2Ta2O7). Preferred glass compositions are low melting sealing glasses with a melting point below 500° C., more preferably below 400° C., even more preferably below 300° C. Preferred low melting glass particles for high k compositions have high dielectric constants, typically in the range from 10 to 40, more preferably higher than 40. Preferred low melting glass particles for high k compositions have low dielectric loss characteristics, preferably not greater than 2%, more preferably not greater than 1%, even more preferably not greater than 0.1%.
[0213] There are essentially two routes to formation of dielectric materials according to the present invention: a precursor plus powders approach, and a powders only approach. Ceramic products that are desirably formed using a precursor plus powder method include: BaTiO3—PbZrxTi1-xO, BaTiO3—TiO2, BaTiO3—TiZrxSn1-xO4, BaNd2Ti5O14—TiZrxSn1-xO4. These basic building blocks may be enhanced by the application of surface modification (silanation), or the addition of low melting temperature glass.
[0214] The precursor-based approach for dielectrics requires the combination of a dielectric powder with a precursor to a dielectric. The general approach is to first disperse the dielectric powder in a low boiling point solvent. The precursor is then added to the dispersion and most of the solvent is removed, leaving a thick precursor consisting of particles and precursor with a trace amount of solvent. This precursor can then be deposited on a substrate by a variety of methods and fired to yield a novel structure of dielectric particles connected by a dielectric formed from precursor decomposition.
[0215] An approach exploiting low melting glasses (LTG) is desirable for: BaTiO3-LTG, BaNd2Ti5O14-LTG and PbMg1/3Nb2/3O3-LTG. The glass-based approach combines a low melting point glass with one or more dielectric powders. For this approach to be successful the particle size of the glass phase is critical. If the glass particles are larger than the dielectric powder, they will either pool when melted, forming inhomogeneities, or they will wick into the porous arrangement of dielectric particles leaving behind voids.
[0216] The general approach according to the present invention is to coat the powders with a dispersant while in a vehicle then remove the vehicle. The coated powders are then combined in the desired ratio and milled with a solvent and binder system. The desired ratio of glass to particles will vary by application and desired final properties, but will be governed by the following criteria. The dielectric phase is targeted to occupy the majority of the final composite depending on the particle size distribution of the powder. For example, a monomodal powder would be targeted to occupy 63% of the composite. The glass phase is then targeted to occupy the remaining volume, in the example here, 37%. This calculation provides the minimum glass loading and there may be some applications where more glass is used.
[0217] The dielectric precursor compositions of the present invention are based on optimizing the dielectric performance of a multiphase composite by combining the phases in the best possible way. The traditional route to high performance dielectrics is dominated by sintering of ceramics at high temperatures, which eliminates porosity and allows for high degrees of crystallization, which yield high performance. When processing at low temperatures, sintering will not occur and other methods must be employed to achieve the best performance. One route to accomplish this is to densely pack dielectric powders and fill the remaining voids with another component. This route has been used in polymer thick film by using a polymer to fill the voids. The dielectric constant of a composite follows a logarithmic mixing rule:
[0218]
where the log of the dielectric constant of the composite is a sum of the dielectric constants of the phases (Ki) multiplied by their volume fractions (Vi). Filling the voids with a low dielectric constant material, for example a polymer, would dramatically reduce the dielectric constant of the composite. For example, if a dielectric powder with a dielectric constant of 5000 is packed 60% dense and the remaining volume is filled with a polymer having a dielectric constant of 4, the resulting dielectric constant of the composite is 289. This equation leads to two pursuable routes to maximizing the dielectric constant. One is to maximize the volume fraction of the high dielectric constant particles, and the other is to increase the dielectric constant of the matrix phase.
where the log of the dielectric constant of the composite is a sum of the dielectric constants of the phases (Ki) multiplied by their volume fractions (Vi). Filling the voids with a low dielectric constant material, for example a polymer, would dramatically reduce the dielectric constant of the composite. For example, if a dielectric powder with a dielectric constant of 5000 is packed 60% dense and the remaining volume is filled with a polymer having a dielectric constant of 4, the resulting dielectric constant of the composite is 289. This equation leads to two pursuable routes to maximizing the dielectric constant. One is to maximize the volume fraction of the high dielectric constant particles, and the other is to increase the dielectric constant of the matrix phase.
[0219] The packing of spherical particles has been studied thoroughly and the best packing of monomodal spheres results in 74% efficient space filling, with a random packing resulting in a density of about 63%, or the practical limit for monomodal packing. Pauling's rules for packing of spheres shows that perfect packing results in two different sized interstitial voids throughout the structure. To fill the larger voids with smaller spheres, one would target a radius ratio of small particle to big particle of 0.414. To fill the smaller voids would require a radius ratio of small particle to big particle of 0.225. Using a trimodal distribution of spherical particles in accordance with the present invention and assuming perfect packing of the system, 81% of the space. Naturally, this process could be continued filling the voids between the spheres with smaller and smaller spheres, but there is a diminishing return and physical limits that prohibit packing to 100% density by this approach. With particles in the micron range and traditional processing techniques, a density of 70% would be achievable and anything higher would be a significant advance in the art.
[0220] It is an object of the present invention to maximize the dielectric constant of the matrix. Most polymers have dielectric constants ranging from 2 to 10. Most glasses are not much higher, but glasses with high lead or bismuth contents can have dielectric constants upwards of 40. The best way to achieve the high dielectric constant matrix is to use a metal oxide such as barium titanate. To achieve this at low processing temperatures requires a dielectric precursor approach. Metal oxide precursors can form traditional high dielectric constant morphologies at low temperatures. The compositions and methods of the present invention can produce a high ceramic yield and a high degree of crystallinity.
[0221] The present invention is also particularly useful for making low loss materials. Some of the major classes of materials that can be utilized or formed by the present invention include: Ba—Ln—Ti—O (Ln=Nd, Sm), (Zn,Sn)x(Ti,Sn)yO4, Ba2Ti9O20Ba3Ta2MeO9 (Me=Zn or Mg). Specific examples include: Ba—Pb—Nd—Ti—O, Ba(Mg1/3Ta2/3)O3—BaO—Nd2O3-5TiO2 Ba4.5Nd9Ti18O54, with small additions of Bi2O or bismuth titanate, ReBa3Ti2O8.5 (Re=Y, Nd, and Sm), Ba3.75Nd95Ti18O54 with 1.0-4.0 wt. % Bi2O3BaO—Ln2O3-5TiO2 (Ln=La, Pr, Nd, Sm), BaO—Nd2O3-TiO2Ba6-x(Sm1−yNdy)8+2x/3Ti18O54, (Ba,Pb)O—Nd2O3—TiO2 (CaO doped) and Ti0.94Zr0.4Sn0.66O4.
[0222] Another class of materials that can be utilized are the pyrochlores, having the general formula A2B2O7, for example Pb2Ta2O7. The present invention is useful for making high dielectric constant materials. One family of materials that can be used are those having a perovskite structure. Examples include metal titanates, metal zirconates, metal niobates, and other mixed metal oxides. Of extensive use has been the barium titanate system, which can reach a broad range of dielectric performance characteristics by adding small levels of dopant ions. Specific examples include: BaTiO3, PbTiO3, PbZrO3, PbZrxTi1-xO, PbMg1/3Nb2/3O3.
[0223] The foregoing dielectric precursor compositions can include the additional components, such as solvents, vehicles and other additives, as is described above.
Resistor Precursor Compositions
[0224] The present invention also relates to resistor precursor compositions for low-, mid-, and high-ohm resistors. The major classes of conductor component materials for mid to high ohm resistors include metal rutile, pyrochlore, and perovskite phases, many of which contain ruthenium. Examples include RuO2, Pb2Ru2O6-7, SrRuO3. Other metallic oxides which behave similarly to these ruthenates may be used. Substitutions for Ru can include Ir, Rh, Os. La and Ta compounds can also be used. Other conductive phases include materials such as carbon, zinc oxide, indium oxide, indium tin oxide, and conductive glasses. Insulative components of the resistor may be formed from many types of glass materials including but not limited to lead borosilicate glass compositions.
[0225] The present invention is also directed to novel combinations of precursors that can be converted to a useful resistor at lower reaction temperatures than by using individual precursors. In one embodiment, a mixture of metal oxide precursors is dissolved in an aqueous solution to form an amorphous lead zinc aluminum borosilicate glass with a conductive ruthenate constituent at 300° C. This formulation included ruthenium nitrosyl nitrate precursor plus lead acetate precursor to form a lead ruthenate conductive phase with lead acetate, aluminum nitrate, boric acid, zinc acetate and fumed silica nanoparticles forming the glass phase. A preferred combination for an organic based precursor composition includes ruthenium ethylhexanoate with other metal ethylhexanoates for lead, aluminum, zinc, boron and some silica nanoparticles or silane precursor in a solvent such as DMAc or tetrahydrofuran (THF). Precursors for insulative matrix materials include organosilanes and sol-gel type materials as precursors to silica. An insulative matrix can also be derived from polymer precursors such as polyamic acid. Other polymer matrix phases include a wide variety of polymer resins.
[0226] The resistor precursor compositions can include various precursors. The precursors can include molecules that can be converted to metal oxides, glasses-metal oxide, metal oxide-polymer, and other combinations. Low-ohm resistors typically include a conductive phase such as silver metal with controlled amounts of an insulative phase such as a glass or metal oxide. Typically, the low-ohm resistors include at least 50 volume percent of an insulative phase. High-ohm resistors typically include a conductive oxide phase (e.g., a ruthenate compound) with controlled amounts of an insulative phase. The resistor precursor compositions of the present invention can therefore include molecular precursors to conductive phases and molecular precursors to insultative phases.
[0227] Depending on their nature, the molecular precursors to the resistor phases can react in the following ways:
[0228] Hydrolysis/Condensation
M(OR)n+H2O→[MOx(OR)n-x]+MOy
M(OR)n+H2O→[MOx(OR)n-x]+MOy
[0229] Anhydride Elimination
M(OAc)n→[MOx/2(OAc)n-x]+x/2Ac2O→MOy+n-xAc2O
M(OAc)n→[MOx/2(OAc)n-x]+x/2Ac2O→MOy+n-xAc2O
[0230] Ether Elimination
M(OR)n+[MOx(OR)n-x]+R2O→MOy+n-xR2O
M(OR)n+[MOx(OR)n-x]+R2O→MOy+n-xR2O
[0231] Ketone Elimination
M(OOCR)(R′)→MOy+R′RCO
M(OOCR)(R′)→MOy+R′RCO
[0232] Ester Elimination
M(OR)n+M′(OAc)n→[MM′Ox(OAc)n-x(OR)n-x]+ROAc
[MM′Ox(OAc)n-x(OR)n-x]→MM′Oy+n-xROAc
M(OR)n+M′(OAc)n→[MM′Ox(OAc)n-x(OR)n-x]+ROAc
[MM′Ox(OAc)n-x(OR)n-x]→MM′Oy+n-xROAc
[0233] Alcohol-induced Ester Elimination
M(OAc)n+HOR+[MOx(OAc)n-x]→MOy
M(OAc)n+HOR+[MOx(OAc)n-x]→MOy
[0234] Small Molecule-induced Oxidation
M(OOCR)+Me3NO→MOy+Me3N+CO2
M(OOCR)+Me3NO→MOy+Me3N+CO2
[0235] Alcohol-induced Ester Elimination
MO2CR+HOR→MOH+RCO2R (ester)
MOH→MO2
MO2CR+HOR→MOH+RCO2R (ester)
MOH→MO2
[0236] Ester Elimination
MO2CR+MOR→MOM+RCO2R (ester)
MO2CR+MOR→MOM+RCO2R (ester)
[0237] Condensation Polymerization
MOR+H2O→(MaOb)OH+HOR
(MaOb)OH+(MaOb)OH→[(MaOb)O(MaOb)O]
MOR+H2O→(MaOb)OH+HOR
(MaOb)OH+(MaOb)OH→[(MaOb)O(MaOb)O]
[0238] A particularly preferred approach is ester elimination.
[0239] Preferred precursors to conductive phases in resistor precursor compositions are described above with respect to metal phases and include metal alkoxides, carboxylates, acetylacetonates, and others. Ruthenates are typically used in resistors for their temperature stability over a useful range of temperatures. Particularly preferred ruthenate precursors are ruthenium compounds such as Ru-nitrosyinitrate, Ru-ethylhexanoate and other ruthenium resinate materials. Other preferred combinations are any of the ruthenium compounds with: lead precursors such as Pb-acetate, Pb-nitrate or Pb-ethylhexanoate; bismuth precursors such as Bi-nitrate, Bi-carboxylates or Bi-beta-diketonates; and strontium precursors such as Sr-nitrate or Sr-carboxylates.
[0240] Other precursors to conductive non-ruthenate materials can be used such as precursors to IrO2, SnO2, In2O3, LaB6, TiSi2 or TaN. Precursors to insulative phases include precursors to PbO, B2O3, SiO2 and Al2O3. Such insulative phase precursors can include boric acid, Si-alkoxides, Al-nitrate, Al-ethylhexanoate or other Al-carboxylates. The ratio of the insulative phase to the conductive phase can be adjusted to obtain a resistor having the desired properties.
[0241] Other preferred conductive phases for low-ohm resistors include metals such as silver, metal ruthenates, and other conducting metal, metal oxide, nitride, carbide, boride and silicide compounds. Particularly preferred precursors are Ag-trifluoroacetate, Ag-neodecanoate, tetraammine palladium hydroxide, Pd-neodecanoate and Pd-trifluoroacetate.
[0242] Although the resistors can be derived from only precursors, the resistor precursor compositions can also include powders of conductor precursor and powders of insulator or powders of insulator and molecular precursors to conductive phases. Preferred conductor powders include metals and metal ruthenates such as strontium, bismuth and lead ruthenate. Preferred insulator powders include lead borosilicate glasses and other borosilicate glasses. Preferred molecular precursors to insulative phases include metal alkoxides and carboxylates.
[0243] The resistor precursor compositions can include powders of conductors and powders of insulators. Preferred conductor powders include ruthenium-based metal oxides. Preferred insulator powders can include low melting glasses such as glasses having a melting point of not greater than about 500° C., more preferably not greater than about 400° C. It is preferred that the powders have a small particle size.
[0244] The conductor phase of the resistor can include a metal or a metal compound such as a metal oxide, metal nitride, metal carbide, metal boride, metal oxycarbide, metal oxynitride, metal sulfide, metal oxysulfide, metal silicide or metal germamide. The conductor phase can also include carbon such as graphitic carbon. Preferred conductor metals include silver, copper and nickel. Preferred metal oxides include RuO2, SrRuO3, BixRuyOz, and other Ru-based mixed metal oxides.
[0245] The insulator phase can include a glass. It can also include a ceramic or glass ceramic. The glass can be silica, a lead-based glass, lead borosilicate, lead aluminum borosilicate glass or a silver-based glass.
[0246] Preferred processing temperatures for resistor precursor compositions are not greater than about 900° C., more preferably not greater than about 500° C., more preferably not greater than about 400° C., even more preferably not greater than about 300° C. The preferred processing times are not greater than about 5 minutes, more preferably not greater than about one minute. The substrate can be transparent or reflective.
[0247] The resistor precursor compositions can also combine conductive nanoparticles with glass precursors. The resistor composition can also combine ruthenate precursor and/or particles with a sol-gel precursor to a silica, or multi-component glass phase. The resistor precursor composition can also include precursors that are compatible with organic solvents, such as metal ethylhexanoate type precursors. The resistor precursor compositions can be a combination of powder and precursor in aqueous or organic carriers.
[0248] The resistor precursor composition can include a metal or metal alloy which exhibits good TCR characteristics with or without some insulating or semiconductive phase such as SiO2, ZrO2, Al2O3, TiO2, ZnO or SnO2 that limits the connectivity and current carrying area of the resistor. For example, Ag/Pd alloys can be produced having a temperature coefficient of resistance (TCR) of not greater than 100 ppm/° C. It is also possible to produce alloys such as Ni/Cr and other common resistor alloys under the correct processing conditions, such as by using a forming gas.
[0249] The present invention includes resistor precursor compositions that are a combination of precursor and particles with a carrier. The precursor composition can include one or more precursors and vehicle. The precursor composition can include precursor, vehicle, and particles. The precursor composition can include precursor, vehicle, and polymer precursor. The precursor composition can include polymer, precursor, and vehicle. The precursor composition can include glass and metal oxide particles. The precursor composition can include glass and metal oxide particles, and a precursor. The precursor composition can include glass and metal particles. The precursor composition can include glass and metal oxide particles and a precursor. The glass particles can be a conductive glass, for example a AgI doped AgPO3 glass. The precursor composition may use a precursor as a carrier material for particles to increase ceramic yield.
[0250] The present invention also provides combinations of conductive metal and metal oxide particles in a matrix derived from a low melting glass. The present invention also provides combinations of insulating particles in a matrix of conductive metal derived from particles and precursor. The present invention also provides combinations of composite particles, or composite and single phase particles, or composite particles and precursor, or composite particles and single-phase particles and precursor in a matrix derived from a polymeric precursor or resin.
[0251] Preferred conductor particles or phases include conductive metals, metal oxides, or conductive low melting point glasses such as AgI doped silver phosphate glass. Preferred insulator glass compositions include lead borosilicate and bismuth borosilicate. Preferred insulator particles include many metal oxides with insulative properties. The precursor composition can include precursor to conductor and insulator. The precursor composition can include a precursor to conductor with insulating particles, or precursor to insulator with conductive particles, or a combination of several precursors and particles. The precursor composition can include small additions of TCR modifiers.
[0252] Preferred average particle sizes for the low melting glass particles are not greater than 1 μm, such as not greater than 0.5 μm. A bimodal particle size distribution can advantageously be used to increase the packing density of the particles and increase the final density and uniformity of the structure. The preferred morphology for all particles is spherical in order to improve rheology and optimize particle loading in the precursor composition and the density of the processed resistor.
[0253] The precursor compositions of the present invention can include a variety of material combinations. The resistor composition can be a composite. The composite can be metal-metal, metal-metal oxide, metal-polymer, metal oxide-polymer, metal-glass and other combinations. By way of example, a silver precursor can be combined with a palladium precursor to form a silver-palladium alloy. These precursor compositions have applications in the fabrication of surge resistors. The metal-oxide composition can include ruthenium-based mixed metal oxides and various glasses. The metal-polymer resistors can include metal derived from powder and/or precursors, and polymer. The metal can include silver, nickel, copper, and other metals.
[0254] The metal-glass compositions can include metals and various glasses. The metals can include silver, copper, nickel, and others. The glasses can include lead-based glasses.
[0255] The resistor precursor compositions according to the present invention can also utilize particles that result in an advantageous microstructure and promote uniformity of the structure with minimal processing time and temperature. Conductor particles for mid- to high-ohm resistors are traditionally sub-micron in size with a fairly high surface area. Insulative matrix particles have traditionally been larger than the conductive phase, with a mean particle size from about 1 μm to 4 μm. This forms a microstructure where ruthenate particles are segregated at interfaces of glass particles and tend to form conductive chains of conductor particles separated by glass, which has flowed and wetted to the conductor particles. Sub-micron particles may help dispersion of the conductive phase and lower processing temperature and time. The present invention includes the use of sub-micron particles for glass and ruthenate to improve the overall uniformity of a precursor composition. Morphology of particles also plays an important role in the processing characteristics of the precursor. Spherical glass matrix particles with fairly low surface areas and mean particle size of about 1 μm allow higher loading and better rheological characteristics. In one embodiment of the present invention, glass particles of sub-micron size are used, resulting in better uniformity in the precursor. Spherical glass particles with a bimodal size distribution are more desirable than a unimodal size distribution in terms of packing efficiency. It is important that the matrix particles have a low melting temperature, wet the conductor particles, have good TCR characteristics and good stability. An optimal resistor particle can include a composite particle having a microstructure that is already evolved after powder processing.
[0256] In one embodiment of the present invention, a precursor composition includes a lead borosilicate glass or other low melting glass, or a higher melting temperature glass in a composite particle with a segregated ruthenate phase, for example a particle incorporating separate phases of ruthenate and matrix glass. This composition allows tailoring of bulk properties (i.e., p, TCR, tolerance, etc.) into a single powder component. Such composite particles will give properties that are less dependent on processing temperature parameters. Composite particles will have an intrinsic microstructure similar to that of the developed microstructure of a thick film resistor, with phase-separated ruthenate regions in a dielectric matrix of glass with ruthenium and other ions diffused into dielectric regions. This could be accomplished by firing the resistor material in bulk and fritting the resultant material into a “resistor” powder. This would allow resistivities indicative of volume loading of resistor and higher processing temperatures.
[0257] In another embodiment precursors are combined in a spray pyrolysis process to produce a powder. In this embodiment of the present invention, the composite resistor particles are substantially spherical. This allows a precursor composition consisting entirely of spherical particles. Ruthenate resistors can also be made with higher conductor loading but without the resultant roughness and porosity usually associated with use of non-spherical particles.
[0258] Another advantage of using composite particles is that these particles have qualities more representative of the bulk properties. Processing will typically require less time at a lower temperature to realize the (diffusion induced) necessary properties while retaining a very robust, high performance resistor. Such a composition can be designed to be fired at 500° C. or less. In addition, a much more rapid thermal process could be employed such as an IR furnace or a laser.
[0259] In yet another embodiment of the present invention, composite particles are mixed with another resistor powder or with another glass powder to give desired properties at lower temperatures. In the case of using a higher temperature glass composition, a low melting glass or dopant material (PbO, BiO) can be used to bond the “resistor” particles at lower temperatures. Because the resistor particles should exhibit bulk properties by themselves, it is not necessary to achieve a totally dense structure to achieve certain resistance values. Therefore, resistor particles could be partially necked and infiltrated with a low melting glass, polymeric material, or a silanating agent to keep water and other environmental factors from changing the resistor. It is also possible to achieve improved characteristics with a high loading of composite resistor particles in a polymer matrix.
[0260] The resistor precursor compositions according to the present invention typically include particulates in the form of micron-size particles and/or nanoparticles, unless a precursor is dissolved in a high-viscosity vehicle.
[0261] In low ohm resistor compositions, preferred particle compositions include silver, palladium, copper, gold, platinum, nickel, alloys thereof, composites thereof (2 or more separate phases), core-shell structures thereof (coated particles). For low cost resistor solutions, particle compositions can be selected from the group of copper aluminum, tungsten, molybdenum, zinc, nickel, iron, tin, solder, and lead. Transparent conductive particles can also be used, for example particulates of ZnO, TiO2, In2O3, indium-tin oxide (ITO), antimony-tin oxide (ATO). Other conductive particles such as titanium nitride, various forms of carbon such as graphite and amorphous carbon, and intrinsically conductive polymer particles can also be used.
[0262] Other particles that can be used in the present invention belong to the group of glass particles, preferably low melting point glass particles, and even more preferably conductive low melting point glass particles such as silver doped phosphate glasses.
[0263] A mixture of a high melting point metal powder such as Cu and a low-melting point metal powder can be formulated into a precursor so that the low melting point powder melts and fills up the voids between the high melting point metal particles.
[0264] Finally, particulates can also be in the form of solid precursors to a conductive phase, such as Ag2O nanoparticles. An extensive list of precursors is disclosed below.
[0265] A preferred resistor precursor composition of precursor and powder includes a precursor to a metal ruthenate with a low melting glass powder in an organic carrier. Low melting glass powder is preferably spherical and is preferably bimodal in particle size distribution with a mean size of about 1 μm. Another preferred resistor precursor composition includes a precursor to a ruthenate phase and a precursor to an insulative phase or TCR modifier with glass matrix particles. Low melting glass powder is preferably spherical and bimodal in particle size distribution with a mean size of 1 μm.
[0266] Another preferred resistor precursor precursor/powder composition includes metal or metal alloy particles representative of a resistor alloy (AgPd, NiCr, others) with a precursor or precursors to the metal or alloy in an aqueous or organic vehicle. There could also be an insulating powder component consisting of an insulating metal oxide (SiO2, Al2O3, TiO2, low temperature glass) to limit the conductive area or modify the mechanical characteristics of the resistor.
[0267] Resistor precursor compositions can also be produced by combining RuO2 nanoparticles with a low-melting lead sealing glass along with an organic carrier of terpineol and fish oil dispersant. In one embodiment, compositions can be produced ranging from 10 to 30 vol. % RuO2 powder, which can be processed at 500° C. for 30 minutes. Resistivity values up to 100 ohm-cm can be produced and TCR values of not greater than 300 ppm/° C. have been measured for this type of material system. Other systems for powder/powder include a variety of metal oxides with lead borosilicate powders (SrRuO3/glass, Pb2Ru2O6.5/glass etc.) A preferred resistor precursor composition includes ruthenate nanoparticles with a low temperature glass of spherical morphology with a bimodal size distribution and mean particle size of 1 μm in an aqueous or organic vehicle.
[0268] Another preferred resistor precursor composition includes ruthenate nanoparticles with a low temperature glass of spherical morphology and a bimodal size distribution and mean particle size of not greater than 1 μm in an aqueous or organic vehicle.
[0269] A preferred resistor precursor composition includes a powder with a composite structure representative of a bulk resistor in an organic or aqueous vehicle.
[0270] Another preferred resistor precursor composition includes a powder with a composite structure representative of a bulk resistor without lead or bismuth in an organic or aqueous vehicle.
[0271] Another preferred composition includes a powder with composite structure representative of a bulk resistor with a low melting glass powder in an organic or aqueous vehicle.
[0272] Another preferred register precursor composition includes a powder with a composite structure representative of a bulk resistor, including a dopant to aid necking of the particles in an organic or aqueous vehicle.
[0273] Another preferred resistor precursor composition includes a powder with a composite structure representative of a bulk resistor with a precursor to a low melting glass or dopant to aid necking of the particles in an organic or aqueous vehicle.
[0274] Another preferred resistor precursor composition includes a powder with a composite structure representative of a bulk resistor in a vehicle containing a precursor to a polymer matrix, such as polyimide or another resin.
[0275] In a preferred embodiment, the resistor precursor composition includes a conversion reaction inducing agent, which can be either or both of a powder or molecular precursor or another inorganic or organic agent. In another embodiment, the combination of molecular precursor and solvent is chosen to provide a high solubility of the precursor in the solvent. The resistor precursor compositions of the present invention typically combine a precursor formulation and particles together with other additives. In one embodiment, the precursor includes metal particles, a molecular precursor and a vehicle. The molecular precursor is preferably a metal organic compound.
[0276] In another embodiment, the resistor precursor composition includes insulative low-melting-point micron-size particles, conductive nanoparticles and a vehicle.
[0277] In another embodiment, the resistor precursor composition includes insulative low-melting-point micron-size particles, nanoparticles and a vehicle. The nanoparticles can be an inorganic precursor to a conductive phase such as Ag2O nanoparticles.
[0278] In another embodiment, the resistor precursor composition includes micron-size particles, a molecular precursor, nanoparticles and a vehicle. The precursor is preferably a metal organic compound.
[0279] In another embodiment, the resistor precursor composition includes micron-size particles, a molecular precursor, nanoparticles and a vehicle. The precursor is preferably a metal organic compound. The nanoparticles are an inorganic precursor to a conductive phase such as Ag2O nanoparticles. The precursor can also include precursor, vehicle, and nanoparticles. The nanoparticles can be selected from silver, copper and other metals, or can be non-conductive nanoparticles such as silica, copper oxide and aluminum oxide.
[0280] The resistor precursor composition can also include a precursor, a vehicle, and a polymer or polymer precursor, such as in cases where adhesion to a polymeric substrate is desired. The precursor to a polymer can be poly (amic) acid. The polymer can be an epoxy, polyimide, phenolic resin, thermo set polyester, polyacrylate and the like. The precursor compositions can include a low curing polymer, such as one that cures at not greater than 200° C., more preferably not greater than 150° C.
[0281] The resistor precursor compositions can also include carbon, a molecular precursor and a vehicle. The compositions can include particulate carbon, such as conductive graphitic carbon. One preferred combination is conductive carbon with molecular precursors to silver metal.
[0282] The resistor precursor compositions can also include a conductive polymer, molecular precursor and a vehicle. The polymer can be conductive for both electrons and protons. Electrically conductive polymers can be selected from polyacetylene, polyaniline, polyphenylene, polypyrrole, polythiophene, polyethylenedioxythiophene and poly(paraphenylene vinylene). Protonic conductive polymers include those with sulfonates or phosphates, for example sulfonated polyaniline
[0283] The resistor precursor composition can also include conductive nanoparticles and vehicle. The flowable composition can include conductive nanoparticles, a vehicle and polymer precursor.
[0284] Most of the foregoing description relating to-optimum packing of particles in dielectric precursor compositions applies directly to resistor precursor compositions as well. The traditional route to high performance resistors is dominated by sintering of ceramic/glass composites at high temperatures, which eliminates porosity and allows for high degrees of crystallization, which yield high performance. When processing at low temperatures sintering will not occur and other methods must be employed to achieve the best performance. The resistivity of a composite also follows a logarithmic mixing rule where the log of the resistivity of the composite is a sum of the resistivities of the phases (ri) multiplied by their volume fractions (Vi). Thus, air gaps or voids will dramatically reduce the conductivity of the composite. In addition, stress and moisture associated with these voids will reduce stability and reproducibility. This leads to two pursuable routes to obtain reproducible resistor values. One is to maximize the volume fraction of the resistive and insulative phases, and the other is to control the resistivity of the two phases and their morphology after firing. Both are determined by the material properties, the particle size distribution of the two phases, and the firing profile.
[0285] The resistor precursor compositions of the present invention enable the efficient packing of particles at low firing temperatures, as is discussed above for dielectric precursor compositions.
[0286] In resistor precursor compositions that include a molecular precursor and powders (nanoparticles and/or micron-size particles), the ratio of precursors to powders is ideally close to that corresponding to the amount needed to fill the spaces between particulates with material derived from the precursors. However, a significant improvement in tolerance can also be obtained for lower levels of molecular precursor. It is preferred that at least about 5 vol. %, more preferably at least about 10 vol. % and even more preferably at least about 15 vol. % of the final resistor is derived from the precursor.
[0287] Other resistor precursor compositions according to the present invention are preferred for different applications. Typically, the precursor composition will take into account the deposition mechanism, the desired performance of the features and the relative cost of the features. For example, simple circuitry on a polymer or other organic substrate designed for a disposable, high-volume application will require a low cost precursor composition but will not require electronic features having superior properties. On the other hand, higher end applications will require electronic features having very good electrical properties and relative cost of the precursor composition will typically not be a significant factor.
[0288] A precursor composition will typically include a solid phase made up of particulates, including particulates that are a precursor to a conductive phase such as silver oxide, silver nitrate particles, Ag trifluoroacetate crystallites, conductive micron-size particles and nanoparticles of the conductive phase, and a liquid phase made up of a vehicle and a molecular precursor
[0289] In one embodiment, the resistor precursor composition includes up to about 40 volume percent carbon and from about 5 to about 15 weight percent of a molecular precursor, with the balance being vehicle and other additives. In another embodiment, the precursor composition includes up to about 30 volume percent carbon and up to about 10 volume percent metal nanoparticles, with the balance being vehicle and other additives.
[0290] According to another embodiment, the resistor precursor composition includes up to about 40 volume percent metal nanoparticles and from about 5 to about 15 weight percent of a molecular precursor, wherein the balance is vehicle and other additives.
[0291] According to another embodiment, the precursor composition includes up to about 50 volume percent micron-size metal particles and from about 5 to about 15 weight percent of a molecular precursor with the balance being vehicle and other additives.
[0292] In addition to the foregoing, the resistor precursor compositions according to the present invention can also include carbon particles, such as graphitic particles. Depending upon the other components in the precursor composition, carbon particle loading up to about 50 volume percent can be obtained in the compositions. The average particle size of the carbon particles is preferably not greater than about 1 μm and the carbon particles can advantageously have a bimodal or trimodal particle size distribution. Graphitic carbon has a bulk resistivity of about 1375 μΩ-cm and is particularly useful in resistor precursor compositions that require a relatively low cost.
[0293] One embodiment of the present invention is directed to a low cost resistor precursor including between 20 and 50 vol % micron-size particles selected from the group of amorphous carbon, carbon graphite, iron, nickel, tungsten, molybdenum, and between 0 and 15 vol. % nanoparticles selected from the group of Ag, carbon, intrinsically conductive polymer, Fe, Cu, Mo, W, and between 0 and 20 wt. % precursor to an metal such as Ag, with the balance being solvents, vehicle and other additives.
[0294] In another embodiment of a low cost resistor precursor, the precursor includes between 20 and 50 vol. % micron-size particles selected from the group of amorphous carbon, graphite, iron, nickel, tungsten, molybdenum, and between 20 and 50 wt. % precursor to an intrinsically conductive polymer, with the balance being solvents, vehicle and other additives.
[0295] It will be appreciated that the foregoing resistor precursor compositions can include the additional components, such as solvents, vehicles and other additives, as is described above.
Substrates
[0296] The precursor compositions according to the present invention can be deposited and converted to the electronic feature at low temperatures, thereby enabling the use of a variety of substrates having a relatively low melting or decomposition temperature. During conversion of low viscosity precursor compositions to the electronic feature, the substrate surface that the composition is printed onto significantly influences how the overall conversion to a final structure occurs.
[0297] The types of substrates that are particularly useful according to the present invention include polyfluorinated compounds, polyimides, epoxies (including glass-filled epoxy), polycarbonates and many other polymers. Particularly useful substrates include cellulose-based materials such as wood or paper, acetate, polyester, polyethylene, polypropylene, polyvinyl chloride, acrylonitrile, butadiene (ABS), flexible fiber board, non-woven polymeric fabric, cloth, metallic foil and thin glass. The substrate can be coated, for example a dielectric on a metallic foil. Although the present invention can be used for such low-temperature substrates, it will be appreciated that traditional substrates such as ceramic substrates can also be used in accordance with the present invention.
[0298] According to a particularly preferred embodiment of the present invention, the substrate onto which the precursor composition is deposited and converted to a conductive feature has a softening point of not greater than about 200° C., more preferably not greater than 250° C., more preferably not greater than about 185° C. and even more preferably not greater than about 150° C.
Deposition of Features
[0299] One difficulty in printing and processing low viscosity precursor compositions is that the composition can wet the surface and rapidly spread to increase the width of the deposit, thereby negating the advantages of fine line printing. This is particularly true when ink-jet printing is employed to deposit fine features such as interconnects, because ink-jet technology puts strict upper boundaries on the viscosity of the composition that can be employed. Nonetheless, ink-jet printing is a preferred low-cost, large-area deposition technology that can be used to deposit the precursor compositions of the present invention.
[0300] According to a preferred embodiment of the present invention, the low viscosity precursor compositions can be confined on the substrate, thereby enabling the formation of features having a small minimum feature size. The minimum feature size is the smallest dimension of the feature in the x-y axis. The precursor composition can be confined to regions having a width of not greater than 100 μm, preferably not greater than 75 μm, more preferably not greater than 50 μm, even more preferably not greater than 25,um, and even more preferably not greater than 10 μm, such as not greater than about 5 μm.
[0301] The present invention provides compositions and methods of processing that advantageously reduce the spreading of the low viscosity composition. For example, small amounts of rheology modifiers such as styrene allyl alcohol (SAA) and other polymers can be added to the precursor composition to reduce spreading. The spreading can also be controlled through combinations of nanoparticles and precursors. Spreading can also be controlled by rapidly drying the compositions during printing by irradiating the composition during deposition.
[0302] Spreading can also be controlled by the addition of a low decomposition temperature polymer in monomer form. The monomer can be cured during deposition by thermal or ultraviolet means, providing a network structure to maintain line shape. The polymer can then be either retained or removed during subsequent processing of the conductor.
[0303] A preferred method is to pattern an otherwise non-wetting substrate with wetting enhancement agents that control the spreading and also yield increased adhesion. For example, this can be achieved by functionalizing the substrate surface with hydroxide or carboxylate groups.
[0304] Fabrication of conductor features with feature widths of not greater than 100 μm or features with minimum feature size of not greater than 100 μm from a low viscosity composition requires the confinement of the low viscosity precursor compositions so that the composition does not spread over certain defined boundaries. Various methods can be used to confine the composition on a surface, including surface energy patterning by increasing or decreasing the hydrophobicity (surface energy) of the surface in selected regions corresponding to where it is desired to confine the precursor or eliminate the precursor. These can be classified as physical barriers, electrostatic and magnetic barriers, surface energy differences, and process related methods such as increasing the precursor viscosity to reduce spreading, for example by freezing or drying the composition very rapidly once it strikes the surface.
[0305] In physical barrier approaches, a confining structure is formed that keeps the precursor composition from spreading. These confining structures may be trenches and cavities of various shapes and depths below a flat or curved surface which confine the flow of the precursor composition. Such trenches can be formed by chemical etching or by photochemical means. The physical structure confining the precursor can also be formed by mechanical means including embossing a pattern into a softened surface or means of mechanical milling, grinding or scratching features. Trenches can also be formed thermally, for example by locally melting a low melting point coating such as a wax coating. Alternatively, retaining barriers and patches can be deposited to confine the flow of composition within a certain region. For example, a photoresist layer can be spin coated on a polymer substrate. Photolithography can be used to form trenches and other patterns in this photoresist layer. These patterns can be used to retain precursor that is deposited onto these preformed patterns. After drying, the photolithographic mask may or may not be removed with the appropriate solvents without removing the deposited metal. Retaining barriers can also be deposited with direct write deposition approaches such as ink-jet printing or any other direct writing approach, as disclosed herein.
[0306] For example, a polymer trench can be ink-jet printed onto a flat substrate by depositing two parallel lines with narrow parallel spacing. A precursor composition can be printed between the two polymer lines to confine the composition. Another group of physical barriers include printed lines or features with a certain level of porosity that can retain a low viscosity composition by capillary forces. The confinement layer may comprise particles applied by any of the techniques disclosed herein. The particles confine the precursor composition that is deposited onto the particles to the spaces between the particles because of wetting of the particles by the precursor composition. In one embodiment, the particles are surface modified to make them hydrophilic and the composition is hydrophilic with the substrate being hydrophobic.
[0307] In one particular example, carbon particles are deposited onto a substrate with a 75 μm resolution using electrostatic laser printing. A silver precursor composition can be subsequently applied to this printed pattern and the resolution is retained while the printed line has a bulk conductivity of 10 milli-ohm-cm after heating at 200° C.
[0308] Surface energy patterning can be classified by how the patterning is formed, namely by mechanical, thermal, chemical or photochemical means. In mechanical methods, the physical structure confining the precursor composition is formed by mechanical means including embossing a pattern into a softened surface, milling features, or building up features to confine the composition. In thermal methods, heating of the substrate is used to change the surface energy of the surface, either across the entire surface or in selected locations, such as by using a laser or thermal print head. In chemical methods, the entire surface or portions of the surface are chemically modified by reaction with some other species. In one embodiment, the chemical reaction is driven by local laser heating with either a continuous wave or pulsed laser. In photochemical methods, light from either a conventional source or from a laser is used to drive photochemical reactions that result in changes in surface energy.
[0309] The methods of confining precursor compositions disclosed herein can involve two steps in series—first the formation of a confining pattern, that may be a physical or chemical confinement method, and second, the application of a precursor composition to the desired confinement areas.
[0310] Electrostatic printing can be used to print high resolution patterns that correspond to at least two levels of surface energies. In one embodiment, the electrostatic printing is carried out on a hydrophobic surface and a hydrophilic material is printed. The regions where no printing occurs correspond to hydrophobic material. A hydrophobic precursor composition can then be printed onto the hydrophobic regions thereby confining the composition. Alternatively, a hydrophilic composition can be printed onto the hydrophilic electrostatically printed regions. The width of the hydrophobic and hydrophilic regions can be not greater than 100 μm, more preferably are not greater than 75 μm, more preferably not greater than 50 μm and even more preferably not greater than 25 μm.
[0311] The precursor composition confinement may be accomplished by applying a photoresist and then laser patterning the photoresist and removing portions of the photoresist. The confinement may be accomplished by a polymeric resist that has been applied by another jetting technique or by any other technique resulting in a patterned polymer. In one embodiment, the polymeric resist is hydrophobic and the substrate surface is hydrophilic. In that case, the precursor composition utilized is hydrophilic resulting in confinement of the composition in the portions of the substrate not covered by the polymeric resist.
[0312] A laser can be used in various ways to modify the surface energy of a substrate in a patterned manner. The laser can be used to remove hydroxyl groups through local heating. These regions are converted to more hydrophobic regions that can be used to confine a hydrophobic or hydrophilic precursor composition. The laser can be used to remove selectively a previously applied surface layer formed by chemical reaction of the surface with a silanating agent.
[0313] In one embodiment, a surface is laser processed to increase the hydrophilicity in regions where the laser strikes the surface. A polyimide substrate coated with a thin layer of hydrophobic material, such as a fluorinated polymer. A laser, such as a pulsed YAG, excimer or other UV or shorter wavelength pulsed laser, can be used to remove the hydrophobic surface layer exposing the hydrophilic layer underneath. Translating (e.g., on an x-y axis) the laser allows patterns of hydrophilic material to be formed. Subsequent application of a hydrophilic precursor composition to the hydrophilic regions allows confinement of the composition. Alternatively, a hydrophobic precursor composition can be used and applied to the hydrophobic regions resulting in composition confinement.
[0314] In another embodiment of the present invention, a surface is laser processed to increase the hydrophobicity in regions where the laser strikes the surface. A hydrophobic substrate such as a fluorinated polymer can be chemically modified to form a hydrophilic layer on its surface. Suitable modifying chemicals include solutions of sodium naphthalenide. Suitable substrates include polytetrafluoroethylene and other fluorinated polymers. The dark hydrophilic material formed by exposing the polymer to the solution can be removed in selected regions by using a laser. Continuous wave and pulsed lasers can be used. Hydrophilic precursor compositions, for example aqueous based compositions, can be applied to the remaining dark material. Alternatively, hydrophobic precursor compositions, such as those based on solutions in non-polar solvents, can be applied to the regions where the dark material was removed leaving the hydrophobic material underneath. Ceramic surfaces can be hydroxylated by heating in moist air or otherwise exposing the surface to moisture. The hydroxylated surfaces can be silanated to create a monolayer of hydrophobic molecules. The laser can be used to selectively remove the hydrophobic surface layer exposing the hydrophilic material underneath. A hydrophobic patterned layer can be formed directly by micro-contact printing using a stamp to apply a material that reacts with the surface to leave exposed a hydrophobic material such as alkyl chain. The precursor composition can be applied directly to the hydrophilic regions or hydrophobic regions using a hydrophilic or hydrophobic precursor composition, respectively.
[0315] A surface with patterned regions of hydrophobic and hydrophilic regions can be formed by micro-contact printing. In this approach, a stamp is used to apply a reagent to selected regions of a surface. This reagent can form a self-assembled monolayer that provides a hydrophobic surface. The regions between the hydrophobic surface regions can be used to confine a hydrophilic precursor composition.
[0316] Precursor composition modification can also be employed to confine the composition on the substrate. Such methods restrict spreading of the compositions by methods other than substrate modification. A precursor composition including a binder can be used for surface confinement. The binder can be chosen such that it is a solid at room temperature, but is a liquid suitable for ink-jet deposition at higher temperatures. These compositions are suitable for deposition through, for example, a heated, ink-jet head. The precursor composition can also include metal particles. The precursor composition that is frozen on the surface can provide linear features having widths of not greater than 100 μm, more preferably not greater than 75 μm and more preferably not greater than 50 μm. The precursor composition can also include a molecular precursor that is capable of forming a metal when heated or irradiated by light. The precursor composition can combine conductive particles and a molecular precursor.
[0317] Binders can also be used in the precursor compositions of the present invention to provide mechanical cohesion and limit spreading of the composition after deposition. In one preferred embodiment, the binder is a solid at room temperature. During ink-jet printing, the binder is heated and becomes flowable. The binder can be a polymer or in some cases can be a precursor. In one embodiment, the binder is a solid at room temperature, when heated to greater than 50° C. the binder melts and flows allowing for ease of transfer and good wetting of the substrate, then upon cooling to room temperature the binder becomes solid again maintaining the shape of the deposited pattern. The binder can also react in some instances. Preferred binders include waxes, styrene allyl alcohols, poly alkylene carbonates, polyvinyl acetals, cellulose based materials, tetradecanol, trimethylolpropane and tetramethylbenzene. The preferred binders have good solubility in the solvent used in the precursor composition and should be processable in the melt form. For example, styrene allyl alcohol is soluble in dimethylacetimide, solid at room temperature and becomes fluid-like upon heating to 80° C.
[0318] The binder in many cases should depart out of the ink-jet printed feature or decompose cleanly during thermal processing, leaving little or no residuals after processing the precursor composition. The departure or decomposition can include vaporization, sublimation, unzipping, partial polymer chain breaking, combustion, or other chemical reactions induced by a reactant present on the substrate material, or deposited on top of the material.
[0319] An example of a precursor as a binder is the use of Ag-trifluoroacetate with DMAc. The DMAc will form adducts with the Ag-trifluoroacetate which then acts as a binder as well as the silver precursor.
[0320] Other methods for controlling the spreading during printing of a low viscosity precursor composition according to the present invention include the steps of depositing a composition onto a cooled substrate, freezing the composition as the droplets contact the substrate, removing at least the solvent without melting the composition, and converting the remaining components of the composition to an electronic material. The melting point of the composition is preferably less than 25° C. Preferred solvents include higher molecular weight alcohols. It is preferred to cool the substrate to less than 10° C.
[0321] The surface of a substrate can be pretreated with a reactant, in one embodiment a reactant that does not contain a metal. This reactant can be a reducing agent for a metal-containing precursor. The surface can be completely coated or regions can be coated with any approach including screen printing, ink-jet printing, spin coating, dip coating, spraying, or any other approach. In a second step, a metal containing reactant is ink-jet printed onto the surface. The metal containing precursor reacts with the co-reactant on the surface to form metal. The reaction is rapid enough to confine the spreading of the metal on the surface. In one embodiment, the metal containing precursor comprise silver or copper. The co-reactant on the surface can comprise a reducing agent for the metal. Alternatively, a reducing agent or reaction inducing agent can be printed locally prior to or following the deposition of the metal precursor composition. By performing both printing steps within a short time frame and by ensuring that the co-reactant triggered decomposition reaction occurs fast enough to avoid spreading of the precursor composition, fine features can be deposited. All the metal-containing compounds and reducing agents discussed herein can be used in this approach.
[0322] Yet another method for controlling the spreading of a low viscosity precursor composition during printing is provided. The method comprises depositing a precursor composition onto a substrate, simultaneously irradiating the deposited composition with light to limit the spreading of the composition on the surface and converting the composition to a conductive feature. UV light can be used to photochemically decompose a metal precursor to a metal before spreading of the precursor composition occurs.
[0323] Yet another method for controlling the spreading during printing according to the present invention comprises the steps of depositing a precursor composition onto a porous substrate, thereby limiting the spreading of the composition, and converting the composition to a conductive feature. In one embodiment, the porosity in the substrate is created by laser patterning. The porosity can be limited to the very surface of the substrate.
[0324] Yet another method for controlling the spreading of a low viscosity precursor composition according to the present invention includes the steps of patterning the substrate to form regions with two distinct levels of porosity where the porous regions form the pattern of a desired feature. The precursor composition can then be deposited, such as by ink-jet printing, onto the regions defining the pattern thereby confining the precursor composition to these regions, and converting the deposited precursor composition to a conductive feature. Preferred substrates are polyimide, and epoxy laminates. In one embodiment the patterning is carried out with a laser. In another embodiment the patterning is carried out using photolithography. In another embodiment, capillary forces pull at least some portion of the composition into the porous substrate.
[0325] Spreading of the precursor composition is influenced by a number of factors. A drop of liquid placed onto a surface will either spread or not depending on the surface tensions of the liquid, the surface tension of the solid and the interfacial tension between the solid and the liquid. If the contact angle is greater than 90 degrees, the liquid is considered non-wetting and the liquid tends to bead or shrink away from the surface. For contact angles less than 90 degrees, the liquid can spread on the surface. For the liquid to completely wet, the contact angle must be zero. For spreading to occur, the surface tension of the liquid must be lower than the surface tension of the solid on which it resides.
[0326] In one embodiment, a precursor composition is applied, as by ink-jet deposition, to an unpatterned substrate. Unpatterned refers to the fact that the surface energy (tension) of the substrate has not been intentionally patterned for the sole purpose of confining the composition. It is to be understood that variations in surface energy (used synonymously herein with surface tension) of the substrate associated with devices, interconnects, vias, resists and any other functional features may already be present. For substrates with surface tensions of less than 30, a hydrophilic precursor composition can be based on water, glycerol, glycol, and other solvents or liquids having surface tensions of greater than 30 dynes/cm, more preferably greater than 40 dynes/cm and preferably greater than 50 dynes/cm and even greater than 60 dynes/cm. For substrates with surface tensions of less than 40, the solvents should have surface tensions of greater than 40 dynes/cm, preferably greater than 50 dynes/cm and even more preferably greater than 60 dynes/cm. For substrates with surface tensions less than 50, the surface tension of the precursor composition should be greater than 50 dynes/cm, preferably greater than 60 dynes/cm. Alternatively, the surface tension of the composition can be chosen to be 5, 10, 15, 20, or 25 dynes/cm greater than that of the substrate. Continuous ink jet heads often require surface tensions of 40 to 50 dynes/cm. Bubble-jet ink jet heads often require surface tensions of 35 to 45 dynes/cm. The previously described methods are particularly preferred for these types of deposition approaches.
[0327] In another embodiment, a precursor composition is applied, as by ink-jet deposition, to an unpatterned low surface energy (hydrophobic) surface that has been surface modified to provide a high surface energy (hydrophilic). The surface energy can be increased by hydroxylating the surface by various means known to those skilled in the art including exposing to oxidizing agents and water, heating in moist air and the like. The surface tension of the precursor composition can then be chosen to be 5, 10, 15, 20, or 25 dynes/cm less than that of the substrate. Piezo-jet ink jet heads operating with hot wax often require surface tensions of 25 to 30 dynes/cm. Piezo-jet ink jet heads operating with UV curable inks often require surface tensions of 25 to 30 dynes/cm. Bubble-jet ink jet heads operating with UV curable inks often require surface tensions of 20 to 30 dynes/cm. Surface tensions of roughly 20 to 30 dynes/cm are required for piezo-based ink jet heads using solvents. The previously described methods are particularly preferred for these types of applications.
[0328] Most electronic substrates with practical applications have low values of surface tension, in the range of 18 (polytetrafluroethylene) to 45, often between 20 and 40 dynes/cm. In one approach to confining a precursor composition to a narrow line or other shape, a hydrophilic pattern corresponding to the pattern of the desired conductor feature is formed on the surface of a substrate through the methods discussed herein. A particularly preferred method uses a laser. For example, a laser can be used to remove a hydrophobic surface layer exposing a hydrophilic layer underneath. In one embodiment, the hydrophilic material pattern on the surface has a surface energy that is 5, 10, 15, 20, 25 or 30 dynes/cm greater than the surrounding substrate. In one embodiment, the surface tension of the composition is chosen to be less than the surface tension of the hydrophilic region but greater than the surface tension of the hydrophobic region. The surface tension of the composition can be chosen to be 5, 10, 15, 20 or 25 dynes/cm less than that of the hydrophilic regions. The surface tension of the composition can be chosen to be 5, 10, 15, 20 or 25 dynes/cm greater than that of the hydrophobic regions. In another approach, the surface energy of the composition is higher than the surface energy of both the hydrophobic and hydrophilic regions. The surface tension of the composition can be chosen to be 5, 10, 15, 20 or 25 dynes/cm greater than that of the hydrophilic regions. The surface tension of the ink is chosen to be 5, 10, 15, 20 or 25 dynes/cm less than that of the hydrophilic regions. This approach is preferred for aqueous-based precursor compositions and compositions with high surface tensions in general. Continuous ink jet heads often require surface tensions of 40 to 50 dynes/cm. Bubble-jet ink jet heads often require surface tensions of 35 to 45 dynes/cm. The previously described methods are particularly preferred for these types of applications that can handle compositions with high surface tensions.
[0329] In one embodiment of this latter approach, a hydrophilic composition is applied, as by ink-jet deposition, to the hydrophilic regions. For substrates with unpatterned hydrophobic regions with surface tensions of less than 30, the hydrophilic composition can be based on water, glycerol, glycol, and other solvents or liquids to provide compositions having surface tensions of greater than 30 dynes/cm, more preferably greater than 40, greater than 45, greater than 50, and even greater than 60 dynes/cm. For substrates with surface tensions of less than 40 in the hydrophobic regions, the compositions should have surface tensions of greater than 40, greater than 45, greater than 50 and greater than 60 dynes/cm. For substrates with surface tensions less than 50, the surface tension of the composition should be greater than 50 greater than 55, or greater than 60 dynes/cm. For hydrophilic regions with surface tensions of less than 30, the hydrophilic precursor compositions can be based on water, glycerol, glycol, and other solvents or liquids having surface tensions of greater than 30 dynes/cm, greater than 35 dynes/cm, greater than 40 and greater than 50, and even greater than 60 dynes/cm. For hydrophilic regions with surface tensions of less than 40, the compositions should have surface tensions of greater than 40, greater than 50 and greater than 60 dynes/cm. For hydrophilic regions with surface tensions less than 50, the surface tension of the composition should be greater than 50 or greater than 60 dynes/cm. For continuous ink-jet heads that require surface tensions of 40 to 50 dynes/cm. For bubble-jet ink-jet heads that require surface tensions of 35 to 45 dynes/cm. The previously described methods are particularly preferred for these types of applications.
[0330] In another approach to confining a composition to a narrow feature, a hydrophilic surface, or a hydrophobic surface that is rendered hydrophilic by surface modification, is patterned with a hydrophobic pattern. In one embodiment, the hydrophobic pattern has a surface energy that is 5, 10, 15, 20, 25 or 30 dynes/cm less than the surrounding substrate. This can be done by removing a hydrophilic surface layer using a laser to expose a hydrophobic region underneath. A hydrophobic precursor composition is applied to the hydrophobic surface regions to confine the composition. In one embodiment, the hydrophobic composition has a surface energy that is 5, 10, 15, 20, 25 or 30 dynes/cm less than the surrounding substrate. In one embodiment, the hydrophobic composition has a surface energy that is 5, 10, 15, 20, 25 or 30 dynes/cm greater than the surrounding substrate. In one embodiment, the hydrophobic precursor composition has a surface energy that is 5, 10, 15, 20, 25 or 30 dynes/cm less than the hydrophobic surface pattern. In one embodiment, the hydrophobic ink has a surface energy that is 5, 10, 15, 20, 25 or 30 dynes/cm greater than the hydrophobic surface pattern. In another embodiment, the surface tension of the composition is less than the hydrophilic regions and greater than the hydrophobic regions. The hydrophilic surface can have a surface tension of greater than 40, greater than 50 or greater than 60 dynes/cm. When the hydrophobic surface has a surface energy of greater than 40 dynes/cm, it is preferred to use an ink with surface tension of less than 40, even less than 30 dynes/cm, and less than 25 dynes/cm. When the hydrophobic surface has a surface energy of greater than 50 dynes/cm, it is preferred to use a composition with a surface tension of less than 50, preferably less than 40, even less than 30 dynes/cm, and more preferably less than 25 dynes/cm. When the hydrophobic surface has a surface tension of greater than 40 dynes/cm, it is preferred to use a precursor composition with a surface tension of less than 40, less than 35, less than 30 and even less than 25 dynes/cm.
[0331] Piezo-jet ink jet heads operating with hot wax often require surface tensions of 25 to 30 dynes/cm. Piezo-jet ink jet heads operating with UV curable inks often require surface tensions of 25 to 30 dynes/cm. Bubble-jet ink jet heads operating with UV curable inks often require surface tensions of 20-30 dynes/cm. Surface tensions of roughly 20 to 30 dynes/cm are required for piezo-based ink jet heads using solvents. The previously described methods are particularly preferred for these types of applications.
[0332] For ink-jet heads and other deposition techniques that require surface tensions greater than 30 dynes/cm, a particularly preferred method for confining a precursor composition to a surface involves increasing the hydrophilicity of the surface to provide a surface tension greater than 40, greater than 45 or greater than 50 dynes/cm and then providing a hydrophobic surface pattern with surface tension lower than the surrounding surface. The surface tension of the pattern can be 5, 10, 15, 20 or 25 dynes/cm greater than the surface tension of the surrounding substrate.
[0333] Surfactants, molecules with hydrophobic tails corresponding to lower surface tension and hydrophilic ends corresponding to higher surface tension can be use to modify the compositions and substrates to achieve the values of surface tensions and interfacial energies required.
[0334] For the purposes of this application, hydrophobic means a material that has the opposite response to interaction with water. Hydrophobic materials have low surface tensions. They also do not have functional groups for making hydrogen bonds with water.
[0335] Hydrophilic means a material that has an affinity for water. Hydrophilic surfaces are wetted by water. Hydrophilic materials also have high values of surface tension. They can also form hydrogen bonds with water. The surface tensions for different liquids are listed in Table 6 and the surface energies for different solids are listed in Table 7.
[0336]
| TABLE 6 | |||
|---|---|---|---|
| Surface Tensions of Various Liquids | |||
| Surface | |||
| Temp | Tension | ||
| Liquid | (° C.) | (dynes/cm) | |
| Water | 20 | 72.75 | |
| Acetamide | 85C | 39.3 | |
| Acetone | 20C | 23.7 | |
| Acetonitrile | 20 | 29.3 | |
| n-butyl | 20C | 24.6 | |
| alcohol | |||
| ethyl | 20 | 24 | |
| alcohol | |||
| Hexane | 20 | 18.4 | |
| Isopropyl | 20 | 22 | |
| alcohol | |||
| Glycerol | 20 | 63.4 | |
| Glycol | 20 | 47.7 | |
| Tolulene | 20 | 29 | |
[0337]
| TABLE 7 | ||
|---|---|---|
| Surface Energies of Various Solids | ||
| Surface | ||
| Energy | ||
| Material | (dynes/cm) | |
| Glass | 30 | |
| PTFE | 18 | |
| Polyethylene | 31 | |
| Polyvinychlorides | 41 | |
| Polyvinylidene | 25 | |
| fluoride | ||
| Polypropylene | 29 | |
| Polystyrene | 33 | |
| Polyvinylchloride | 39 | |
| Polysulfone | 41 | |
| Polycarbonate | 42 | |
| Polyethylene | 43 | |
| terephthalate | ||
| Polyacryonitrile | 44 | |
| Cellulose | 44 | |
[0338] Another difficulty during printing and processing is that during drying, precursors in the composition can crystallize and form discontinuous lines that provide poor conductivity upon conversion to the conductor. This can be substantially prevented by adding small amounts of a crystallization inhibitor, as is discussed above. The present invention also provides compositions and methods to increase adhesion of the conductive feature, referred to herein as adhesion promoters. Various substrates have different surface characteristics that result in varying degrees of adhesion. According to the present invention, the surface can be modified by hydroxylating or otherwise functionalizing the surface to provide reaction sites from the precursor compositions. In one embodiment, the surface of a polyfluorinated material is modified by a sodium naphthalenide solution that provides reactive sites for bonding during reaction with the precursor. In another embodiment, a thin layer of metal is sputtered onto the surface to provide for better adhesion of precursor composition or conductive feature to the substrate. In another embodiment, polyamic acid or similar materials are added to the composition that then bond with both the conductor and surface to provide adhesion. Preferred amounts of polyamic acid and related compounds are from about 5 to 10 weight percent of the low viscosity precursor composition.
[0339] The substrate can also be treated to create a seed layer. A seed layer is an initial layer that facilitates the adhesion of a subsequent conductive feature to the substrate. The seed layer should be smooth, highly crystalline and deposited in the correct crystal orientation to facilitate formation of the conductive feature on the substrate. After deposition of the seed layer, the foregoing steps may be performed again to deposit the final conductor layer. Alternatively, the conductor layer may be deposited by other conventional methods, such as CVD, PVD, electroplating, and electroless plating. The seed layer may be of a different metal or alloy as the final conductor feature, or be of a polymer or ceramic material.
[0340] In another embodiment, the low viscosity precursor composition includes additives to reduce spreading of the composition by controlling the wetting angle of the composition on the surface. In another embodiment, the combination of molecular precursor and solvent is chosen to provide a high solubility of the precursor in the solvent.
[0341] In another embodiment, the precursor composition includes hollow or porous micron-size particles, a molecular precursor and a vehicle. The molecular precursor is preferably a metal organic compound. In another embodiment, the precursor composition includes hollow or porous micron-size particles, nanoparticles and a vehicle. In another embodiment, the precursor composition includes hollow or porous micron-size particles, a molecular precursor, nanoparticles and a vehicle. The precursor is preferably a metal organic compound.
[0342] The precursor composition can also include a molecular precursor, a vehicle and nanoparticles. The nanoparticles can be selected from silver, copper and other metals, or can be non-conductive nanoparticles such as silica, copper oxide and aluminum oxide.
[0343] The precursor compositions can also include a molecular precursor, a vehicle, and a polymer or polymer precursor, such as in cases where adhesion to a polymeric substrate is desired. The precursor to a polymer can be poly (amic) acid. The polymer can be an epoxy, polyimide, phenolic resin, thermo set polyester, polyacrylate and the like. The low viscosity precursor compositions can include a low curing polymer, such as one that cures at not greater than 200° C., more preferably not greater than 150° C.
[0344] The precursor compositions can also include carbon, a molecular precursor and a vehicle. The compositions can include particulate carbon, such as conductive carbon, e.g., graphitic carbon. One preferred combination is conductive carbon with a molecular precursor to silver metal.
[0345] The precursor compositions can also include conductive transparent particles (e.g., ITO particles), a molecular precursor and a vehicle. The molecular precursors can include ITO precursors and metal precursors such as silver precursors.
[0346] The precursors compositions can also include a conductive polymer, molecular precursor and a vehicle. The polymer can be conductive for both electrons and protons. Electrically conductive polymers can be selected from polyacetylene, polyaniline, polyphenylene, polypyrrole, polythiophene, polyethylenedioxythiophene and poly(paraphenylene vinylene). Protonic conductive polymers include those with sulfonates or phosphates, for example sulfonated polyaniline.
[0347] The precursor compositions can also include glass or metal oxide nanoparticles, micron-size particles and a molecular precursor. The compositions can include nanoparticles of metal oxides such as silica, copper oxide, and aluminum oxide. Preferred molecular precursors according to this embodiment are metal organics.
[0348] The precursor compositions can also include conductive nanoparticles and vehicle. The flowable composition can further include a polymer precursor. The low viscosity precursor compositions can also include an electrocatalyst or catalyst and a precursor. The precursor can be converted to a catalytically active material or can serve to fuse the layer together.
Deposition of the Precursor Compounds
[0349] The low viscosity precursor compositions of the present invention can be deposited onto surfaces using a variety of tools.
[0350] As used herein, a low viscosity deposition tool is a device that deposits a liquid or liquid suspension onto a surface by ejecting the composition through an orifice toward the surface without the tool being in direct contact with the surface. The low viscosity deposition tool is preferably controllable over an x-y grid, referred to herein as a direct-write deposition tool. A preferred direct-write deposition tool according to the present invention is an ink-jet device. Other examples of direct-write deposition tools include aerosol jets and automated syringes, such as the MICROPEN tool, available from Ohmcraft, Inc., of Honeoye Falls, N.Y.
[0351] For use in an ink-jet, the viscosity of the precursor composition is preferably not greater than 50 centipoise, such as in the range of from about 10 to about 40 centipoise. For use in an aerosol jet atomization, the viscosity is preferably not greater than about 20 centipoise. Automated syringes can use compositions having a higher viscosity, such as up to about 5000 centipoise.
[0352] A preferred direct-write deposition tool according to the present invention is an ink-jet device. Ink-jet devices operate by generating droplets of the composition and directing the droplets toward a surface. The position of the ink-jet head is carefully controlled and can be highly automated so that discrete patterns of the composition can be applied to the surface. Ink-jet printers are capable of printing at a rate of 1000 drops per second per jet or higher and can print linear features with good resolution at a rate of 10 cm/sec or more, up to about 1000 cm/sec. Each drop generated by the ink-jet head includes approximately 25 to 100 picoliters of the composition, which is delivered to the surface. For these and other reasons, ink-jet devices are a highly desirable means for depositing materials onto a surface.
[0353] Typically, an ink-jet device includes an ink-jet head with one or more orifices having a diameter of less than about 100 μm, such as from about 50 μm to 75 μm. Droplets are generated and are directed through the orifice toward the surface being printed. Ink-jet printers typically utilize a piezoelectric driven system to generate the droplets, although other variations are also used. Ink-jet devices are described in more detail in, for example, U.S. Pat. No. 4,627,875 by Kobayashi et al. and U.S. Pat. No. 5,329,293 by Liker, each of which is incorporated herein by reference in their entirety. However, such devices have primarily been used to deposit inks of soluble dyes.
[0354] It is also important to simultaneously control the surface tension and the viscosity of the precursor composition to enable the use of industrial ink-jet devices. Preferably the surface tension is from about 10 to 50 dynes/cm, such as from about 20 to 40 dynes/cm, while the viscosity is maintained at not greater than about 50 centipoise.
[0355] According to one embodiment, the solids loading of particles in the low viscosity precursor composition is preferably as high as possible without adversely affecting the viscosity or other necessary properties of the composition. For example, the low viscosity precursor composition can have a particle loading of up to about 75 weight percent, and in one embodiment the particle loading is from about 5 to about 50 weight percent.
[0356] The precursor compositions for use in an ink-jet device can also include water and an alcohol. Surfactants can also be used to maintain the particles in suspension. Co-solvents, also known as humectants, can be used to prevent the precursor composition from crusting and clogging the orifice of the ink-jet head. Biocides can also be added to prevent bacterial growth over time. Examples of such ink-jet liquid vehicle compositions are disclosed in U.S. Pat. No. 5,853,470 by Martin et al.; U.S. Pat. No. 5,679,724 by Sacripante et al.; U.S. Pat. No. 5,725,647 by Carlson et al.; U.S. Pat. No. 4,877,451 by Winnik et al.; U.S. Pat. No. 5,837,045 by Johnson et al.; and U.S. Pat. No. 5,837,041 by Bean et al. Each of the foregoing U.S. patents is incorporated by reference herein in their entirety. The selection of such additives is based upon the desired properties of the composition, as is known to those skilled in the art. Particles can be mixed with the liquid vehicle using a mill or, for example, an ultrasonic processor.
[0357] The low viscosity precursor compositions according to the present invention can also be deposited by aerosol jet deposition. Aerosol jet deposition can enable the formation of conductive features having a feature width of not greater than about 200 μm, such as not greater than 100 μm, not greater than 75 μm and even not greater than 50 μm. In aerosol jet deposition, the precursor composition is aerosolized into droplets and the droplets are transported to the substrate in a flow gas through a flow channel. Typically, the flow channel is straight and relatively short.
[0358] The aerosol can be created using a number of atomization techniques. Examples include ultrasonic atomization, two-fluid spray head, pressure atomizing nozzles and the like. Ultrasonic atomization is preferred for compositions with low viscosities and low surface tension. Two-fluid and pressure atomizers are preferred for higher viscosity fluids. Solvent or other precursor components can be added to the precursor composition during atomization, if necessary, to keep the concentration of precursor components substantially constant during atomization.
[0359] The size of the aerosol droplets can vary depending on the atomization technique. In one embodiment, the average droplet size is not greater than about 10 μm and more preferably is not greater than about 5 μm. Large droplets can be optionally removed from the aerosol, such as by the use of an impactor.
[0360] Low aerosol concentrations require large volumes of flow gas and can be detrimental to the deposition of fine features. The concentration of the aerosol can optionally be increased, such as by using a virtual impactor. The concentration of the aerosol can be greater than about 106 droplets/cm3 and more preferably is greater than 107 droplets/cm3. The concentration of the aerosol can be monitored and the information can be used to maintain the mist concentration within, for example, 10% of the desired mist concentration over a period of time.
[0361] The droplets are deposited onto the surface of the substrate by inertial impaction of larger droplets, electrostatic deposition of charged droplets, diffusional deposition of sub-micron droplets, interception onto non-planar surfaces and settling of droplets, such as those having a size in excess of about 10 μm.
[0362] Examples of tools and methods for the deposition of fluids using aerosol jet deposition include U.S. Pat. No. 6,251,488 by Miller et al., U.S. Pat. No. 5,725,672 by Schmitt et al. and U.S. Pat. No. 4,019,188 by Hochberg et al. Each of these U.S. patents is incorporated herein by reference in their entirety.
[0363] The precursor compositions of the present invention can also be deposited by a variety of other techniques including intaglio, roll printer, spraying, dip coating, spin coating, and other techniques that direct discrete units of fluid or continuous jets, or continuous sheets of fluid to a surface. Other printing methods include lithographic and gravure printing.
[0364] For example, gravure printing can be used with precursor compositions having a viscosity of up to about 5000 centipoise. The gravure method can deposit features having an average thickness of from about 1 μm to about 25 μm micrometers and can deposit such features at a high rate of speed, such as up to about 700 meters per minute. The gravure process also enables the direct formation of patterns onto the surface.
[0365] Lithographic printing methods can also be utilized. In the lithographic process, the inked printing plate contacts and transfers a pattern to a rubber blanket and the rubber blanket contacts and transfers the pattern to the surface being printed. A plate cylinder first comes into contact with dampening rollers that transfer an aqueous solution to the hydrophilic non-image areas of the plate. A dampened plate then contacts an inking roller and accepts the ink only in the oleophillic image areas.
[0366] Using one or more of the foregoing deposition techniques, it is possible to deposit the precursor composition on one side or both sides of a substrate. Further, the processes can be repeated to deposit multiple layers of the same or different precursor compositions on a substrate.
[0367] An optional first step, prior to deposition of the precursor composition, is surface modification of the substrate, as is discussed above. The surface modification can be applied to the entire substrate or can be applied in the form of a pattern, such as by using photolithography. The surface modification can include increasing or decreasing the hydrophilicity of the substrate surface by chemical treatment. For example, a silanating agent can be used on the surface of a glass substrate to increase the adhesion and/or to control spreading of the precursor composition through modification of the surface tension and/or wetting angle. The surface modification can also include the use of a laser to clean the substrate. The surface can also be subjected to mechanical modification by contacting with another type of surface. The substrate can also be modified by corona treatment.
[0368] For the deposition of organic-based precursor compositions, the activation energy of the substrate surface can be modified. For example, a line of polyimide can be printed on the substrate prior to deposition of a precursor composition to prevent infiltration of the precursor composition into a porous substrate, such as paper. In another example, a primer material may be printed onto a substrate to locally etch or chemically modify the substrate, thereby inhibiting the spreading of the precursor being deposited in the following deposition step.
[0369] The next step is the deposition of the precursor composition. As is discussed above, the deposition can be carried out by a variety of methods, including the use of a direct-write tool. In one embodiment, a first deposition step provides the precursor composition including a molecular precursor while a second deposition step provides a reducing agent or other co-reactant that converts the precursor. Another method for depositing the precursor is using multi-pass deposition to build the thickness of the deposit.
[0370] A third optional step is the modification of the properties of the deposited precursor. This can include freezing, melting and otherwise modifying the precursor properties such as viscosity, with or without chemical reactions or removal of material from the precursor. For example, a precursor composition including a thermoset polymer can be deposited and immediately exposed to a light source such as an ultraviolet lamp to polymerize and thicken the precursor and reduce spreading of the precursor. Depending on the nature of the thermoset polymer, other modification means can be used such as heat lamps or lasers.
[0371] A fourth optional step is drying or subliming of the precursor composition by heating or irradiating. In this step, material is removed from the precursor or chemical reactions occur in the precursor. An example of a method for processing the deposited precursor is using a UV, IR, laser or a conventional light source. In one embodiment, the deposited precursor is dried before processing in the subsequent step. In another embodiment, a precursor is contacted with a conversion reaction inducing agent before the precursor is dried. In another embodiment, the precursor is contacted with a gaseous reducing agent such as hydrogen.
[0372] A fifth step is increasing the temperature of the deposited precursor composition. An example of one method is to process the deposited precursor with specific temperature/time profiles. Heating rates can preferably be greater than about 10° C./min, more preferably greater than 100° C./min and even more preferably greater than 1000° C./min. The temperature of the deposited precursor can be raised using hot gas or by contact with a heated substrate. This temperature increase may result in further evaporation of solvents and other species. A laser, such as an IR laser, can also be used for heating. IR lamps or a belt furnace can also be utilized. It may also be desirable to control the cooling rate of the deposited feature. The heating step can also coincide with the activation of a reducing agent present in the precursor. The action of such reducing agent could include removal of a surface oxide from particles such as copper particles or nickel particles.
[0373] A sixth step is reacting the molecular precursors, if such precursors are present in the precursor composition. In one embodiment, the precursors are reacted using various gases to assist in the chemical conversion of the precursor to the targeted electronic material or feature. For example, hydrogen, nitrogen, and reducing gases can be used to assist the reaction. Copper, nickel, and other metals that oxidize when exposed to oxygen may require the presence of reducing atmospheres. It has been found that the precursor compositions of the present invention can advantageously provide very short reaction times when processed with light (e.g., a laser) that heats the materials. This is a result of the high chemical reaction rates when sufficiently high temperatures are provided for a specific precursor and the ability of light to rapidly heat the materials over time scales of milliseconds or even less. In the case of precursor compositions including particles, phases having a low melting or softening point allow short processing times.
[0374] The precursor compositions of the present invention including only particles, particles and molecular precursors and precursors without particles can all be processed for very short times and still provide useful materials. Short heating times can advantageously prevent damage to the underlying substrate. Preferred thermal processing times for deposits having a thickness on the order of about 10 μm are not greater than about 100 milliseconds, more preferably not greater than about 10 milliseconds, and even more preferably not greater than about 1 millisecond. The short heating times can be provided using laser (pulsed or continuous wave), lamps, or other radiation. Particularly preferred are scanning lasers with controlled dwell times. When processing with belt and box furnaces or lamps, the hold time is preferably not greater than 60 seconds, more preferably not greater than 30 seconds, and even more preferably not greater than 10 seconds. The heating time can even be not greater than 1 second when processed with these heat sources, and even not greater than 0.1 second, while providing electronic materials that are useful in a variety of applications. It will be appreciated that short heating times may not be beneficial if the solvent or other constituents boil rapidly and form porosity or other defects in the feature.
[0375] According to one embodiment, the deposited precursor compositions can be substantially fully converted at temperatures of not greater than 400° C., more preferably not greater than 300° C., more preferably not greater than 250° C., and even more preferably not greater than 200° C.
[0376] An optional seventh step is sintering of the particles or the material derived from the precursor. The sintering can be carried out using furnaces, light sources such as heat lamps and/or lasers. In one embodiment, the use of a laser advantageously provides very short sintering times and in one embodiment the sintering time is not greater than 1 second, more preferably not greater than 0.1 seconds and even more preferably not greater than 0.01 seconds. Laser types include pulsed and continuous wave. In one embodiment, the laser pulse length is tailored to provide a depth of heating that is equal to the thickness of the material to be sintered. The components in the precursor can be fully or partially reacted before contact with laser light. The components can be reacted by exposure to the laser light and then sintered. In addition, other components in the precursor composition (e.g., glasses) can melt and flow under these conditions.
[0377] Selective laser sintering can also be used to selectively melt a low melting phase in the precursor composition. Selective laser sintering was developed as a method for solid freeform fabrication of three-dimensional parts. One process involves spreading a layer of powder evenly over an area. A laser is then used to selectively melt the powder in a pattern that is representative of one layer of the desired part. The melted region becomes a solid layer while the untreated powder provides support for subsequent layers. A second layer of powder is then spread over the entire area and the laser used to melt the second layer. The process continues, building the part layer by layer until the final shape is complete. While the process really involves selective laser melting, it has been dubbed selective laser sintering as ceramic parts can be built by this method. Although the selective laser sintering process is traditionally used with only one material, the various combinations of ceramic powder and a low melting glass as described in the present invention allow for new applications for laser melting. Once a direct-write tool has deposited a mixture of ceramic oxide powder and glass, a laser may be employed to densify the structure by melting the glass phase. The proper balance of oxide powder to glass must be achieved along with the proper size distribution of both particulate phases. For high k dielectric applications the glass content would ideally be minimized so that the high k performance of the dielectric powder is maximized. For high-ohm resistors the glass phase may be the majority of the composition so that the conduction between the conductive oxide particles is limited by the insulating glass phase. As the glass phase is melted it wets the oxide powder and assists in densification. The laser energy can be coupled into the glass directly and other times it is desired to couple the laser energy with the oxide powder and achieve melting of the glass indirectly.
[0378] In an optional eighth step, the feature can be post-treated. For example, the crystallinity of the material phases can be increased by laser processing. The post-treatment can also include cleaning and/or encapsulation of the electronic features, or other modification such as silanation of a dielectric material.
[0379] Surface modification can also be performed to remove hydroxyl groups. Surface modification of the porosity in dielectric layers can lead to dramatically reduced dielectric loss and decreased sensitivity to humidify. In one embodiment, a porous dielectric layer is formed according to the previous steps 1 through 8. The dielectric is then exposed to a liquid surface modification agent such as a silanating agent. The silanating agent can include hexamethyldisilazane. For example, a surface modifying agent can be poured onto the fired dielectric layer and allowed to sit for about 15 minutes. The dielectric layer is then dried in an oven at 120° C. for 10 minutes, completing the surface modification.
[0380] The exposure time for the surface modifying agent is preferably not greater than 20 minutes, more preferably not greater than 10 minutes, with the temperature preferably about room temperature. The drying profile to remove excess surface modifying agent is preferably about 120° C. for 15 minutes.
[0381] Useful organosilanes include: RnSiX(4-n) where X is a hydrolysable leaving group, such as X=amine (e.g., hexamethyldisilazane), halide (e.g., dichlorodimethylsilane), alkoxide (e.g., trimethoxysilane, Methacryloxypropyltrimethoxysilane, N-methyl-3-aminopropyltrimethoxysilane), and acyloxy (e.g., acryloxytrimethylsilane).
[0382] Hydrolysis and condensation occur between organosilane and surface hydroxy groups on the dielectric layer surface. Hydrolysis occurs first with the formation of the corresponding silanol followed by condensation with hydroxo groups on the metal oxide surface. As an example:
R—(CH2)3Si(OMe)3+H2O→R—(CH2)3Si(OH)2(OMe)2+2MeOH
R—(CH2)3Si(OH)2(OMe)2+(LayersurfSi)OH→(LayersurfSi)—O—Si(OH)2(CH2)3—R+H2O,
where R=CH2CCH3COO—
R—(CH2)3Si(OMe)3+H2O→R—(CH2)3Si(OH)2(OMe)2+2MeOH
R—(CH2)3Si(OH)2(OMe)2+(LayersurfSi)OH→(LayersurfSi)—O—Si(OH)2(CH2)3—R+H2O,
where R=CH2CCH3COO—
[0383] It will be appreciated from the foregoing discussion that two or more of the latter process steps (e.g., drying, heating, reacting and sintering) can be combined into a single process step.
[0384] The compositions and methods of the present invention produce features that have good adhesion to the substrates on which they are formed. For example, the conductive features will adhere to the substrate with a peel strength of at least 10 newtons/cm. Adhesion can be measured using the scotch-tape test, wherein scotch-tape is applied to the feature and is pulled perpendicular to the plane of the trace and the substrate. This applies a force of about 10 N/cm. A passing measure is when little or no residue from the feature remains on the tape.
Dielectric Features
[0385] The dielectric precursor compositions of the present invention can provide dielectric features having novel combinations of high performance in terms of dielectric constant, while being formed at a low processing temperature.
[0386] In one embodiment for a high k dielectric, a dielectric constant of 700 and a loss of 6% is achieved for a material processed at 600° C. for 12 minutes. In another embodiment for a high k dielectric, a dielectric constant of 200 and a loss of 2% is achieved for a material processed at 550° C. for 15 minutes. In another embodiment for a high k dielectric, a dielectric constant of 100 and a loss of 12% is achieved for a material processed at 350° C. for 30 minutes.
[0387] In one embodiment for a low loss dielectric, a dielectric constant of 300 is achieved with a low loss of 0.9% for a material processed at 400° C. for 30 minutes.
[0388] In another embodiment illustrating the importance of surface modification to reduce loss, a dielectric constant of 17 is obtained with a loss of 0.2% for a material processed at 450° C. for 30 minutes. In another embodiment illustrating the importance of surface modification to reduce loss, a dielectric constant of 13 is obtained with a loss of 0.7% for a material processed at 350° C. for 30 minutes. Both of these examples were treated after firing with a surface modification.
[0389] By way of example, a porous layer of dielectric composite consisting of BaTiO3 particles and a ZST matrix has a loss of 5%. The layer was exposed to a silanating agent for 15 minutes, then oven dried at 120° C. for 15 minutes. The measured loss was reduced to 0.7%.
[0390] In accordance with the foregoing direct-write processes, the present invention enables the formation of features for devices and components having a small minimum feature size (the smallest feature dimension in the x-y plane). For example, the method of the present invention can be used to fabricate features having an average width of not greater than about 100 μm, more preferably not greater than about 75 μm, even more preferably not greater than 50 μm and even more preferably not greater than 25 μm, such as not greater than about 10 μm and even not greater than about 5 μm. The precursor compositions according to the present invention also enable the deposition of thinner layers than what is state of the art for thick film pastes. Dielectric layers with thickness of not greater than 20 μm can be readily deposited, more preferably not greater than 15 μm, or even more preferably not greater than 10 μm, while maintaining resistance to dielectric breakdown in the range of several kV/cm. In general terms, the capacitance of a capacitor embedded in a multilayer package is related to the dielectric constant of a dielectric material and the thickness of the dielectric layer according to the following equation:
C=(eNAk)/t
C=(eNAk)/t
[0391] where C is the capacitance of the multilayer capacitor; e is a constant; N is the number of active layers in the case of multilayered ceramic package; k is the dielectric constant of the dielectric material obtained after deposition and processing of the dielectric precursor. A is the area of the electrodes which is often small to save “real estate cost”, and t is the thickness or distance between the capacitor plates.
[0392] This equation illustrates that if the value of A is constant, the capacitance can be improved by increasing either the number of active layers N or the ratio of K/t. Hence, the importance of using high-k compositions, and applying this dielectric precursor in very thin layers, as enabled by the present invention.
[0393] The present invention is particularly useful for fabrication of capacitors or dielectric layers that can be fired below 500° C., more preferably below 400° C., more preferably below 350° C., and even more preferably below 250° C. The present invention enables the production of highly pure dielectric features with low porosity, or fully dense composite layers with a dielectric constant of up to 500, more preferably up to 750, even more preferably up to 1000. The present invention further enables the deposition of very thin dielectric layers, such as not greater than 20 μm, more preferably thinner than 15 μm, and even more preferably thinner than 10 μm while having a typical surface roughness not greater than 10% of the full layer thickness and a typical breakdown voltage of at least 500 kV/cm for a 5 mm2 device.
[0394] The present invention also enables the production of highly pure dielectric features with low porosity, or fully dense composite layers with a dielectric loss of not greater than 1%, more preferably not greater than 0.1%, even more preferably not greater than 0.05%. The dielectric constants are up to 700 at 1 MHz when processed at 600° C. The porosity is not greater than 20% when processed at 600° C. The surface roughness is not greater than 5% of the thickness of the layer.
[0395] The layer thickness is not greater than 1 μm for dielectrics made from pure precursors. Screen printed dielectric layers are typically about 12 μm thick.
[0396] The loss can be as low as 0.2% for dielectrics processed at 450° C. and surface modified.
[0397] The layers of the present invention can combine the attributes of being flexible, being compatible with a wide variety of electrode materials, including polymer thick film materials.
[0398] The dielectric layer can be a composite layer. The composite can include metal oxide/glass, metal oxide/polymer, and metal oxide 1/metal oxide 2. For example, the low temperature processing allows the formulation of composite dielectric layer including Al2O3 and TiO2 particles. This composition can be tailored to have a very low TCC value combined with very low loss for low fire microwave applications. In a preferred embodiment, the dielectric metal oxide is PMN and the preferred glass is a lead based borosilicate glass. In another preferred embodiment, the dielectric derived from particles is doped BaTiO3, and the dielectric derived from precursors is ZST.
[0399] The glass-metal oxide compositions can include powders of each material or various combinations of powders and precursors. For example, the dielectric composite could be a combination of dielectric particles, dielectric precursor, and a low melting temperature glass.
[0400] The compositions and methods of the present invention provide final microstructures including phases of dielectric and glass that are not interdiffused. They also provide compositions where the two dielectric phases are not interdiffused. For example, the composite could include BaTiO3 particles that are connected through a network of TiO2 derived from precursor. This structure would be impossible to achieve through traditional sintering routes where the phases would interdiffuse.
[0401] The porosity of the composite dielectric structures derived from the compositions and methods of the present invention is preferably not greater than 25%, more preferably not greater than 10%, even more preferably not greater than 5%, and most preferably not greater than 2%.
[0402] The low temperature processing further allows the combination of dielectric and magnetic materials into one composite phase. For example, a mixed phase including Ni—Zn ferrite and BaTiO3 can be prepared by using particles of both phases and a low melting point glass and firing at 600° C. This low firing temperature avoids the problems that are typically associated with sintering, such as thermal mismatch during cooling, and solid-state diffusion, which causes interdiffusion of the two very different functional phases. The composite materials can have tailored dielectric and magnetic properties and be deposited on low temperature substrates including semiconductor chip components, microwave components, organic substrates, polymer substrates and glass substrates.
[0403] The present invention also provides high performance dielectric layers containing no polymer that are in contact with either a polymeric substrate, or a thin metal layer that is directly in contact with a polymeric substrate. This is a result of the low processing temperatures coupled with the high performance.
[0404] The following is a non-limiting description of the types) of devices and components to which the methods and compositions of the present invention are applicable.
[0405] The compositions and methods of the present invention advantageously allow the fabrication of a variety of dielectric structures. The dielectric can form a portion of a loaded antenna. The dielectric can be placed under the conductor in an antenna. The dielectric can be used in a capacitor or sensor. The dielectric layer can also be used in organic and inorganic EL displays.
[0406] The present invention provides a method for creating unique microstructures of dielectric materials.
[0407] The compositions and methods of the present invention can be used to fabricate dielectric and capacitive layers for RF tags and smart cards. The compositions and methods provide the ability to print disposable electronics such games in magazines.
[0408] The precursor compositions and processes of the present invention can be used to fabricate microelectronic components such as decoupling capacitors deposited directly onto the semiconductor chip.
[0409] Another technology where the direct-write deposition of electronic powders according to the present invention provides significant advantages is for flat panel displays, such as plasma display panels. High resolution dispensing of low fire dielectric layers is a particularly useful method for forming the capacitive layers for a plasma display panel. Typically, a dielectric precursor is printed onto a glass substrate and is fired in air at from about 450° C. to 600° C. The present invention offers much lower firing temperatures.
[0410] Direct-write deposition offers many advantages over the precursor techniques including faster production time and the flexibility to produce prototypes and low-volume production applications. The deposited features will have high resolution and dimensional stability, and will have a high density.
[0411] The present invention is also applicable to inductor-based devices including transformers, power converters and phase shifters. Examples of such devices are illustrated in: U.S. Pat. Nos. 5,312,674 by Haertling et al.; U.S. Pat. No. 5,604,673 by Washburn et al.; and U.S. Pat. No. 5,828,271 by Stitzer. Each of the foregoing U.S. patents is incorporated herein by reference in their entirety.
[0412] Further, the use of hollow particles leads to layers with lower dielectric constants. A particularly useful material for this application is alumina, where the hollowness reduces the dielectric constant and increases the buoyancy thereby reducing stratification, and has low loss due to the intrinsic characteristics of alumina at high frequencies. Further, very high thermal conductivity is not required and therefore silica is often used in this application.
[0413] The present invention can be used in circuitry for a disposable calculator, sensors including conductor features of pure metal on an organic, semiconductor, or glass substrates for solar cell technology, disposable cell phone, game in a magazine, electronic paper, where the paper is in a magazine
[0414] The present invention can also be used to print dielectric materials onto substrates that are not flat. For example, these can include helmets, windshields, electronic components, electronic packaging, visors, etc.
[0415] The present invention allows printing of electronic materials on substrates that have multiple material surfaces exposed. These exposed materials can include Si, SiO2, silicon nitride, polymers, polyimides, epoxies, etc.
[0416] According to another embodiment of the present invention, the circuit can contain various combinations of circuit elements, some or all of which can be formed by direct writing. The circuit can include only a conductor. The circuit can include conductor and resistor elements as in resistor networks. The circuit can include conductor, resistor and dielectric elements.
[0417] According to another embodiment of the present invention, the circuit can be printed on a substrate that is transparent or reflective.
[0418] The present invention can be used to direct write the dielectric substrate for directly written antennae. The antenna can be a fractal antenna. The antenna can be a loaded antenna comprising resistive, inductive, or capacitive elements.
[0419] 3-D deposition techniques such as syringe dispensing described herein allow direct deposition of a wide variety of materials. The composition of the particle/precursor can be continuously modified during deposition, and micrometer-scale composition and positioning accuracy can be achieved. The complete synthesis process can be performed below 500° C. and local laser heating can be employed for in-situ material processing. These deposition capabilities can be fully utilized to deposit radially graded structures.
[0420] In addition to circulators in microwave devices, the composite and functionally graded composites that are described herein have numerous other applications in the area of miniaturization of hybrid microwave circuits. For example, graded dielectric constants in the plane can be used for impedance transformers by relying on the graded dielectric constant rather than tapered geometry to change intrinsic impedance along the length of the line. This will reduce size and has the potential to reduce losses associated with the geometrical aspects and related resonance effects.
[0421] In another embodiment of the present invention, conducting or ceramic structures of one composition in a medium of a different composition can be provided. By building some type of resonance into the structure, novel properties can be obtained.
[0422] In one particular implementation of these resonant structures, miniature microwave filters with very specific performance can be constructed by imbedding a conductive resonant structure into a high-k medium. For example, imbedding a conductive resonator structure into a dielectric with a relative dielectric constant of 10,000 will enable a size reduction by a factor of 100.
[0423] This technique will enable the fabrication of devices with highly customized filter characteristics, while the reduction in device footprint, especially in the 1 GHz range where current component sizes are of the order of several centimeters, will allow for direct integration versatility onto monolithic microwave integrated chips.
[0424] The present invention, when combined with high resolution 3-D deposition techniques such as syringe dispensing described herein allow direct deposition of multiple types of materials in a multilayer fashion with micron-scale spatial resolution within the layers. One implementation of this capability results in a photonic bandgap material consisting of stacked layers of dielectric rods. Each layer in the stack is rotated 90 degrees relative to adjacent layers, forming what is commonly known as a Lincoln log structure. While such structures can be obtained using photolithographic techniques, the present invention allows the structures to be made from new materials, with fewer steps, and at significantly lower costs
Resistor Features
[0425] In one embodiment of the present invention for low ohm resistors, the feature includes silver derived from a precursor and an insulating phase. The insulating phase is preferably a glass or metal oxide. Preferred glasses are aluminum borosilicates, lead borosilicates and the like. Preferred metal oxides are silica, titania, alumina, and other simple and complex metal oxides. In one embodiment the insulating phase is derived from particles. In another embodiment, it is derived from precursors. In yet another embodiment, the insulative phase is derived from nanoparticles.
[0426] In one embodiment, the substrate is not planar and a non-contact printing approach is used. The non-contact printing approach can be syringe-dispense providing deposition of discrete units of precursor onto the surface. Examples of surfaces that are non-planar include windshields, electronic components, electronic packaging and visors.
[0427] The precursor compositions and methods provide the ability to print disposable electronics such as for games included in magazines. The precursor compositions can advantageously be deposited and reacted on cellulose-based materials such as paper or cardboard. The cellulose-based material can be coated if necessary to prevent bleeding of the precursor composition into the substrate. For example, the cellulose-based material can be coated with a UV curable polymer.
[0428] The low-ohm resistors formed in accordance with the present invention have combinations of various features that have not been attained using other high viscosity precursor compositions. After firing, precursor compositions of the present invention will yield solids that may or may not be porous with specific bulk resistivity values. As a background, bulk resisitivity values of a number of fully dense solids are provided in Table 8 below.
[0429]
| TABLE 6 | |
|---|---|
| Bulk Resistivity of Various Materials | |
| Bulk Resistivity | |
| Material | (micro-Ωcm) |
| silver (Ag-thick film material fired at 850° C.) | 1.59 |
| copper (Cu) | 1.68 |
| gold (Au) | 2.24 |
| aluminum (Al) | 2.65 |
| Ferro CN33-246 (Ag + low melting glass, fired at | 2.7-3.2 |
| 450° C.) | |
| SMP Ag flake + precursor formulation, 250° C. | 4.5 |
| molybdenum (Mo) | 5.2 |
| Tungsten (W) | 5.65 |
| zinc (Zn) | 5.92 |
| nickel (Ni) | 6.84 |
| iron (Fe) | 9.71 |
| Palladim (Pd) | 10.54 |
| Platinum (Pt) | 10.6 |
| tin (Sn) | 11 |
| solder (Pb-Sn; 50:50) | 15 |
| Lead | 20.64 |
| Titanium nitrate (TiN transparent conductor) | 20 |
| polymer thick film (state of the art Ag filled | 18-50 |
| polymer, 150° C.) | |
| Polymer thick film (Cu filled polymer) | 75-300 |
| ITO indium tin oxide (IN2O3) | 100 |
| zinc oxide (ZnO) doped-undoped) | 120-450 |
| carbon (C-graphite) | 1375 |
| doped silver phosphate glass, 330° C. | 3000 |
| ruthenium oxide (RuO2) type conductive oxides) | 5000-10,000 |
| intrinsically conductive polymer | 1,000,000 |
[0430] A low cost resistor precursor including between 20 and 40 vol. % micron-size particles selected from the group of amorphous carbon, carbon graphite, iron, nickel, tungsten, molybdenum, and between 0 and 15 vol. % nanoparticles selected from the group of Ag, carbon, intrinsically conductive polymer, Fe, Cu, Mo, W, and between 0 and 15 wt. % precursor to a metal such as Ag, with the balance being solvents, vehicle and other additives, will, after firing at between 250° C. and 400° C., yield a bulk conductivity in the range from 50 to 4000 micro-ohm-centimeter.
[0431] A low cost resistor precursor including between 20 and 40 vol. % micron-size particles selected from the group of amorphous carbon, graphite, iron, nickel, tungsten, molybdenum, and between 10 wt. % and 30 wt. % precursor to a intrinsically conductive polymer, with the balance being solvents, vehicle and other additives, will, after firing at between 100° C. and 200° C., yield a bulk conductivity is in the range from 1,000 to 10,000 micro-ohm-centimeter.
[0432] The compositions and methods of the present invention can also produce conductive patterns that can be used in flat panel displays. The conductive materials used for electrodes in display devices have traditionally been manufactured by commercial deposition processes such as etching, evaporation, and sputtering onto a substrate. In electronic displays it is often necessary to utilize a transparent electrode to ensure that the display images can be viewed. Indium tin oxide (ITO), deposited by means of vacuum-deposition or a sputtering process, has found widespread acceptance for this application. U.S. Pat. No. 5,421,926 by Yukinobu et al. discloses a process for printing ITO inks. For rear electrodes (i.e., the electrodes other than those through which the display is viewed) it is often not necessary to utilize transparent conductors. Rear electrodes can therefore be formed from conventional materials and by conventional processes. Again, the rear electrodes have traditionally been formed using costly sputtering or vacuum deposition methods. The compositions according to the present invention allow the direct deposition of metal electrodes onto low temperature substrates such as plastics. For example, a silver precursor composition can be ink-jet printed and heated at 150° C. to form 150 μm by 150 μm square electrodes with excellent adhesion and sheet resistivity values of less than 1 ohms per square.
[0433] In one embodiment, the precursor compositions are used to interconnect electrical elements on a substrate, such as non-linear elements. Non-linear elements are defined herein as electronic devices that exhibit nonlinear responses in relationship to a stimulus. For example a diode is known to exhibit a nonlinear output-current/input-voltage response. An electroluminescent pixel is known to exhibit a non-linear light-output/applied-voltage response. Nonlinear devices also include but are not limited to transistors such as TFTs and OFETs, emissive pixels such as electroluminescent pixels, plasma display pixels, field emission display (FED) pixels and organic light emitting device (OLED) pixels, non emissive pixels such as reflective pixels including electrochromic material, rotatable microencapsulated microspheres, liquid crystals, photovoltaic elements, and a wide range of sensors such as humidity sensors.
[0434] Nonlinear elements, which facilitate matrix addressing, are an essential part of many display systems. For a display of M×N pixels, it is desirable to use a multiplexed addressing scheme whereby M column electrodes and N row electrodes are patterned orthogonally with respect to each other. Such a scheme requires only M+N address lines (as opposed to M×N lines for a direct-address system requiring a separate address line for each pixel). The use of matrix addressing results in significant savings in terms of power consumption and cost of manufacture. As a practical matter, the feasibility of using matrix addressing usually hinges upon the presence of a nonlinearity in an associated device. The nonlinearity eliminates crosstalk between electrodes and provides a thresholding function. A traditional way of introducing nonlinearity into displays has been to use a backplane having devices that exhibit a nonlinear current/voltage relationship. Examples of such devices include thin-film transistors (TFT) and metal-insulator-metal (MIM) diodes. While these devices achieve the desired result, they involve thin-film processes, which suffer from high production costs as well as relatively poor manufacturing yields.
[0435] The present invention allows the direct printing of the conductive components of nonlinear devices including the source the drain and the gate. These nonlinear devices may include directly printed organic materials such as organic field effect transistors (OFET) or organic thin film transistors (OTFT), directly printed inorganic materials and hybrid organic/inorganic devices such as a polymer based field effect transistor with an inorganic gate dielectric. Direct printing of these conductive materials will enable low cost manufacturing of large area flat displays.
[0436] The compositions and methods of the present invention produce conductive patterns that can be used in flat panel displays to form the address lines or data lines. The lines may be made from transparent conducting polymers, transparent conductors such as ITO, metals or other suitable conductors. The present invention provides ways to form address and data lines using deposition tools such as an ink-jet device. The precursor compositions of the present invention allow printing on large area flexible substrates such as plastic substrates and paper substrates, which are particularly useful for large area flexible displays. Address lines may additionally be insulated with an appropriate insulator such as a non-conducting polymer or other suitable insulator. Alternatively, an appropriate insulator may be formed so that there is electrical isolation between row conducting lines, between row and column address lines, between column address lines or for other purposes. These lines can be printed with a thickness of about one μm and a line width of 100 μm by ink-jet printing the precursor composition. These data lines can be printed continuously on large substrates with an uninterrupted length of several meters. Surface modification can be employed, as is discussed above, to confine the composition and to enable printing of lines as narrow as 10 μm. The deposited lines can be heated to 200° C. to form metal lines with a bulk conductivity that is not less than 10 percent of the conductivity of the equivalent pure metal.
[0437] Flat panel displays may incorporate emissive or reflective pixels. Some examples of emissive pixels include electroluminescent pixels, photoluminescent pixels such as plasma display pixels, field emission display (FED) pixels and organic light emitting device (OLED) pixels. Reflective pixels include contrast media that can be altered using an electric field. Contrast media may be electrochromic material, rotatable microencapsulated microspheres, polymer dispersed liquid crystals (PDLCs), polymer stabilized liquid crystals, surface stabilized liquid crystals, smectic liquid crystals, ferroelectric material, or other contrast media well known in art. Many of these contrast media utilize particle-based non-emissive systems. Examples of particle-based non-emissive systems include encapsulated electrophoretic displays (in which particles migrate within a dielectric fluid under the influence of an electric field); electrically or magnetically driven rotating-ball displays as disclosed in U.S. Pat. Nos. 5,604,027 and 4,419,383, which are incorporated herein by reference in their entirety; and encapsulated displays based on micromagnetic or electrostatic particles as disclosed in U.S. Pat. Nos. 4,211,668, 5,057,363 and 3,683,382, which are incorporated herein by reference in their entirety. A preferred particle non-emissive system is based on discrete, microencapsulated electrophoretic elements, examples of which are disclosed in U.S. Pat. No. 5,930,026 by Jacobson et al. which is incorporated herein by reference in its entirety.
[0438] In one embodiment, the present invention relates to directly printing conductive features, such as electrical interconnects and electrodes for addressable, reusable, paper-like visual displays. Examples of paper-like visual displays include “gyricon” (or twisting particle) displays and forms of electronic paper such as particulate electrophoretic displays (available from E-ink Corporation, Cambridge, Mass.). A gyricon display is an addressable display made up of optically anisotropic particles, with each particle being selectively rotatable to present a desired face to an observer. For example, a gyricon display can incorporate “balls” where each ball has two distinct hemispheres, one black and the other white. Each hemisphere has a distinct electrical characteristic (e.g., zeta potential with respect to a dielectric fluid) so that the ball is electrically as well as optically anisotropic. The balls are electrically dipolar in the presence of a dielectric fluid and are subject to rotation. A ball can be selectively rotated within its respective fluid-filled cavity by application of an electric field, so as to present either its black or white hemisphere to an observer viewing the surface of the sheet.
[0439] In another embodiment, the present invention relates to electrical interconnects and electrodes for organic light emitting displays (OLEDs). Organic light emitting displays are emissive displays consisting of a transparent substrate coated with a transparent conducting material (e.g., ITO), one or more organic layers and a cathode made by evaporating or sputtering a metal of low work function characteristics (e.g., calcium or magnesium). The organic layer materials are chosen so as to provide charge injection and transport from both electrodes into the electroluminescent organic layer (EL), where the charges recombine to emit light. There may be one or more organic hole transport layers (HTL) between the transparent conducting material and the EL, as well as one or more electron injection and transporting layers between the cathode and the EL. The precursor compositions according to the present invention allow the direct deposition of metal electrodes onto low temperature substrates such as flexible large area plastic substrates that are particularly preferred for OLEDs. For example, a metal precursor composition can be ink-jet printed and heated at 150° C. to form a 150 μm by 150 μm square electrode with excellent adhesion and a sheet resistivity value of less than 1 ohm per square. The compositions and printing methods of the present invention also enable printing of row and column address lines for OLEDs. These lines can be printed with a thickness of about one μm and a line width of 100 μm using ink-jet printing. These data lines can be printed continuously on large substrates with an uninterrupted length of several meters. Surface modification can be employed, as is discussed above, to confine the precursor composition and to enable printing of such lines as narrow as 10 μm. The printed ink lines can be heated to 150° C. and form metal lines with a bulk conductivity that is no less than 5 percent of the conductivity of the equivalent pure metal.
[0440] In one embodiment, the present invention relates to electrical interconnects and electrodes for liquid crystal displays (LCDs), including passive-matrix and active-matrix. Particular examples of LCDs include twisted nematic (TN), supertwisted nematic (STN), double supertwisted nematic (DSTN), retardation film supertwisted nematic (RFSTN), ferroelectric (FLCD), guest-host (GHLCD), polymer-dispersed (PD), polymer network (PN).
[0441] Thin film transistors (TFTs) are well known in the art, and are of considerable commercial importance. Amorphous silicon-based thin film transistors are used in active matrix liquid crystal displays. One advantage of thin film transistors is that they are inexpensive to make, both in terms of the materials and the techniques used to make them. In addition to making the individual TFTs as inexpensively as possible, it is also desirable to inexpensively make the integrated circuit devices that utilize TFTs. Accordingly, inexpensive methods for fabricating integrated circuits with TFTs, such as those of the present invention, are an enabling technology for printed logic.
[0442] For many applications, inorganic interconnects are not adequately conductive to achieve the desired switching speeds of an integrated circuit due to high RC time constants. Printed pure metals, as enabled by the precursor compositions of the present invention, achieve the required performance. A metal interconnect printed by using a silver precursor composition as disclosed in the present invention will result in a reduction of the resistance (R) and an associated reduction in the time constant (RC) by a factor of 100,000, more preferably by 1,000,000, as compared to current conductive polymer interconnect material used to connect polymer transistors.
[0443] Field-effect transistors (FETs), with organic semiconductors as active materials, are the key switching components in contemplated organic control, memory, or logic circuits, also referred to as plastic-based circuits. An expected advantage of such plastic electronics is the ability to fabricate them more easily than traditional silicon-based devices. Plastic electronics thus provide a cost advantage in cases where it is not necessary to attain the performance level and device density provided by silicon-based devices. For example, organic semiconductors are expected to be much more readily printable than vapor-deposited inorganics, and are also expected to be less sensitive to air than recently proposed solution-deposited inorganic semiconductor materials. For these reasons, there have been significant efforts expended in the area of organic semiconductor materials and devices.
[0444] Organic thin film transistors (TFTs) are expected to become key components in the plastic circuitry used in display drivers of portable computers and pagers, and memory elements of transaction cards and identification tags. A typical organic TFT circuit contains a source electrode, a drain electrode, a gate electrode, a gate dielectric, an interlayer dielectric, electrical interconnects, a substrate, and semiconductor material. The precursor compositions of the present invention can be used to deposit all the components of this circuit, with the exception of the semiconductor material.
[0445] One of the most significant factors in bringing organic TFT circuits into commercial use is the ability to deposit all the components on a substrate quickly, easily and inexpensively as compared with silicon technology (i.e., by reel-to-reel printing). The precursor compositions of the present invention enable the use of low cost deposition techniques, such as ink-jet printing, for depositing these components.
[0446] The precursor compositions of the present invention are particularly useful for the direct printing of electrical connectors as well as antennae of smart tags, smart labels, and a wide range of identification devices such as radio frequency identification (RFID) tags. In a broad sense, the conductive precursor compositions can be utilized for electrical connection of semiconductor radio frequency transceiver devices to antenna structures and particularly to radio frequency identification device assemblies. A radio frequency identification device (“RFID”) by definition is an automatic identification and data capture system comprising readers and tags. Data is transferred using electric fields or modulated inductive or radiating electromagnetic carriers. RFID devices are becoming more prevalent in such configurations as, for example, smart cards, smart labels, security badges, and livestock tags.
[0447] The precursor compositions of the present invention also enable the low cost, high volume, highly customizable production of electronic labels. Such labels can be formed in various sizes and shapes for collecting, processing, displaying and/or transmitting information related to an item in human or machine readable form. The precursor compositions of the present invention can be used to print the conductive features required to form the logic circuits, electronic interconnections, antennae, and display features in electronic labels. The electronic labels can be an integral part of a larger printed item such as a lottery ticket structure with circuit elements disclosed in a pattern as disclosed in U.S. Pat. No. 5,599,046.
[0448] In another embodiment of the present invention, the conductive patterns made in accordance with the present invention can be used as electronic circuits for making photovoltaic panels. Currently, conventional screen-printing is used in mass scale production of solar cells. Typically, the top contact pattern of a solar cell consists of a set of parallel narrow finger lines and wide collector lines deposited essentially at a right angle to the finger lines on a semiconductor substrate or wafer. Such front contact formation of crystalline solar cells is performed with standard screen-printing techniques. Direct printing of these contacts with the precursor compositions of the present invention provides the advantages of production simplicity, automation, and low production cost.
[0449] Low series resistance and low metal coverage (low front surface shadowing) are basic requirements for the front surface metallization in solar cells. Minimum metallization widths of 100 to 150 μm are obtained using conventional screen-printing. This causes a relatively high shading of the front solar cell surface. In order to decrease the shading, a large distance between the contact lines, i.e., 2 to 3 mm is required. On the other hand, this implies the use of a highly doped, conductive emitter layer. However, the heavy emitter doping induces a poor response to short wavelength light. Narrower conductive lines can be printed using the precursor composition and printing methods of the present invention. The conductive precursor compositions of the present invention enable direct printing of finer features down to 20 μm. The precursor compositions of the present invention further enable the printing of pure metals with resistivity values of the printed features as low as 2 times bulk resistivity after processing at temperatures as low as 200° C.
[0450] The low processing and direct-write deposition capabilities according to the present invention are particularly enabling for large area solar cell manufacturing on organic and flexible substrates. This is particularly useful in manufacturing novel solar cell technologies based on organic photovoltaic materials such as organic semiconductors and dye sensitized solar cell technology as disclosed in U.S. Pat. No. 5,463,057 by Graetzel et al. The precursor compositions according to the present invention can be directly printed and heated to yield a bulk conductivity that is no less than 10 percent of the conductivity of the equivalent pure metal, and achieved by heating the printed features at temperatures below 200° C. on polymer substrates such as plexiglass (PMMA).
[0451] Another embodiment of the present invention enables the production of an electronic circuit for making printed wiring board (PWBs) and printed circuit boards (PCBs). In conventional subtractive processes used to make printed-wiring boards, wiring patterns are formed by preparing pattern films. The pattern films are prepared by means of a laser plotter in accordance with wiring pattern data outputted from a CAD (computer-aided design system), and are etched on copper foil by using a resist ink or a dry film resist.
[0452] In such conventional processes, it is necessary to first form a pattern film, and to prepare a printing plate in the case when a photo-resist ink is used, or to take the steps of lamination, exposure and development in the case when a dry film resist is used.
[0453] Such methods can be said to be methods in which the digitized wiring data are returned to an analog image-forming step. Screen-printing has a limited work size because of the printing precision of the printing plate. The dry film process is a photographic process and, although it provides high precision, it requires many steps, resulting in a high cost especially for the manufacture of small lots.
[0454] The precursor composition and printing methods of the present invention offer solutions to overcome the limitations of the current PWB formation process. For example, they do not generate any waste. The printing methods of the present invention are a single step direct printing process and are compatible with small-batch and rapid turn around production runs. For example, a copper precursor composition can be directly printed onto FR4 (a polymer impregnated fiberglass) to form interconnection circuitry. These features are formed by heating the printed copper precursor in an N2 ambient at 150° C. to form copper lines with a line width of not greater than 100 μm, a line thickness of not greater than 5 μm, and a bulk conductivity that is not less than 10 percent of the conductivity of the pure copper metal.
[0455] Patterned electrodes obtained by one embodiment of the present invention can also be used for screening electromagnetic radiation or earthing electric charges, in making touch screens, radio frequency identification tags, electrochromic windows and in imaging systems, e.g., silver halide photography or electrophotography. A device such as the electronic book described in U.S. Pat. No. 6,124,851 can be formed using the compositions of the present invention.
EXAMPLES
Example 1
Lead Zirconate Titanate (PZT)
[0456] The following precursors are mixed in the following ratios in toluene to form a solution: 23.8 wt. % Ti dimethoxy dineodecanoate; 21.4 wt. % Zr butoxide; and 54.8 wt. % Pb ethylhexanoate. The PZT precursor mixture decomposes at 450° C. as evidenced by TGA. Formation of crystalline PZT does not occur until processing at 500° C. for at least 30 minutes and preferably 90 minutes or more.
Example 2
Zirconium Tin Titanate (ZST)
[0457] Precursors are mixed in the following ratios: 49.8 wt. % Ti isopropoxide triethylamine; 18.2 wt. % Zr ethylhexanoate; 5.9 wt. % Zr propoxide; and 26.1 wt. % Sn ethylhexanoate. The mixture was heated and found to decompose by 550° C. as evidenced by TGA. The crystallinity of the ZST is improved by post processing at greater than 500° C. for 60 minutes.
Example 3a
Zirconium Tin Titanate (ZST)
[0458] Precursors are mixed in the following ratios: 50.9 wt. % Ti dimethoxy dineodecanoate; 19.3 wt. % Zr propoxide; 27.2 wt. % Sn ethylhexanoate; and 2.6 wt. % Zr ethylhexanoate. The composition was found to decompose by 550° C. as evidenced by TGA. The crystallinity of the ZST is improved by post processing at greater than 500° C. for 60 minutes.
Example 3b
Pb2Ta2O7
[0459] Precursors are mixed in the following ratios: 45.1 wt. % Ta ethoxide; 54.9 wt. % Pb ethylhexanoate; and dodecane as needed for solubility. The lead tantalate precursor decomposes by 450° C. as evidenced by TGA. Formation of crystalline Pb2Ta2O7 occurs by processing at 550° C. for one hour.
Example 4
Composite Layer of Barium Titanate and Zirconium Tin Titanate
[0460] A barium titanate powder is dispersed in hexane with Menhaden fish oil as a dispersant. To this is added a ZST precursor and the hexane is volatalized. The precursor is then doctor bladed onto a silver coated alumina substrate and fired at 300° C. for 30 minutes. The resulting 34 μm film has a dielectric constant of 35 and a loss of 4% when electroded and measured at 1 MHz. This is equivalent to a capacitance of 970 pF/cm2.
Example 5
Lead Magnesuim Niobate/Glass Composite
[0461] A lead magnesium niobate powder (PMN) is dispersed in hexane with Menhaden fish oil as a dispersant. The solvent is then removed leaving a coated PMN powder. This powder is then mixed with a lead-based glass powder, which can optionally be coated with a dispersant. The powder mixture is combined with terpineol as a solvent and ethyl cellulose as a binder and milled into a precursor. The precursor is then screen printed onto a gold-electroded alumina substrate and fired at 600° C. for 12 minutes. The resulting 13 μm film has a dielectric constant of 700 with a loss of 6% when electroded and measured at 1 kHz. This is equivalent to a capacitance of 48 nF/cm2.
Example 6
[0462] A resistor precursor composition including aqueous precursors to Pb2Ru2O6.5 and lead borosilicate glass along with lead borosilicate glass particles was formulated. The components were 25.7 wt. % lead glass precursor (contains water and butyl carbitol), 6.4 wt. % Ru precursor (aqueous) and 67.9 wt. % of a lead glass. This composition showed upwards of 50 ohm-cm resistivity.
Example 7
[0463] A resistor precursor including 34.8 wt. % of composite Ag-10% RuO2 particles, 47.7 wt. % lead borosilicate glass particles and 17.4 wt. % alpha-terpineol was formulated. This represented about 30% conductor by volume. The resistor was processed at 500° C. for 30 minutes.
Example 8
[0464] A resistor precursor composition was prepared including 50.3 wt. % of composite Ag-10% RuO2 particles, 19.7 wt. % calcium aluminum borosilicate glass, 14.3 wt. % tetraethoxysilane, 14.3 wt. % terpineol carrier, 0.5 wt. % ethyl cellulose and 1.4 wt. % fumed silica. The composition was processed at 300° C. and had a sheet resistance of 9.9 kΩ/square.
Example 9
[0465] A resistor precursor composition was prepared including 34.9 wt. % SrRuO3, 25.7 wt. % calcium aluminum borosilicate glass, 18.8 wt. % tetraethoxysilane, 1.9 wt. % fumed silica, 18.0 wt. % terpineol and 0.7 wt. % ethyl cellulose. The composition was processed at 300° C. and had a sheet resistance of 22.4 kΩ/square.
Example 10
[0466] A very low-ohm resistor composition was prepared consisting of 70 vol. % spherical silver powder produced by spray pyrolysis with 30 vol. % conductive low melting silver glass. The composition was processed at 450° C. for 20 minutes and yielded a resistivity of 5.5× bulk silver.
Example 11
[0467] A resistor composition was prepared consisting of RuO2 particles dispersed with lead borosilicate glass with 15 vol. % conductor. The composition shows resistivity values of 300 kΩ/square with a TCR on the order of 200 ppm/° C. The composition is processable by a laser.
Example 12
[0468] Ag—RuO2 particles were produced and combined in a glass matrix to make a resistor. The line was shown to be conductive with a 30 volume percent loading of conductor material when processed at 550° C. for 15 minutes.
Example 13
[0469] Ag—RuO2 particles were combined with a precursor to a silica matrix and processed at low temperatures (300° C.), and showed conductivity. In contrast, identical compositions containing pure silver particles showed no conductivity. This is believed to be due to RuO2 phase on the surface of the particles, which allows either more intimate contact of particles or some tunneling, or both.
[0470] The following examples illustrate the many advantages of the conductor precursor compositions according to the present invention. For reference purposes, pure Ag-trifluoroacetate has a normal decomposition temperature of about 325° C. as indicated by thermogravimetric analysis. Pure Ag-acetate decomposes at about 255° C. As used in these examples, thermogravimetric analysis consisted of heating samples (typically 50 milligrams) in air at a heating rate of 10° C./minute and observing the weight loss of the sample.
Example 14
Comparative Example
[0471] A silver metal precursor composition containing 50 parts by weight (pbw) Ag-trifluoroacetate and 50 pbw H2O was formulated. The calculated silver content of the precursor composition was 24.4 wt. % and thermogravimetric analysis showed the mass loss reached 78 wt. % at 340° C. This data corresponds to the above-described decomposition temperature for pure Ag-trifluoroacetate, within a reasonable margin for error.
Example 15
Preferred Additive
[0472] A silver precursor composition was formulated containing 44 pbw Ag-trifluoroacetate, 22 pbw H2O, 33 pbw DEGBE and 1 part by weight lactic acid. The calculated silver content was 21.5 wt. % and thermogravimetric analysis showed the mass loss reached 79 wt. % at 215° C. The addition of DEGBE as a conversion reaction inducing agent advantageously reduced the conversion temperature by 125° C. compared to the formulation described in Example 14, a decrease of about 34 percent compared to pure Ag-trifluoracetate. The lactic acid functions as a crystallization inhibitor.
Example 16
Comparative Example
[0473] A silver precursor composition was formulated containing 58 pbw Ag-trifluoroacetate and 42 pbw dimethylformamide. The calculated silver content was 21.5 wt. % and thermogravimetric analysis showed a mass loss of 78.5 wt. % at 335° C., a conversion temperature similar to the formulation in Example 14. This example illustrates that a common solvent (dimethylformamide) had no affect on the conversion temperature of the composition.
Example 17
Preferred Solvent
[0474] A silver precursor composition was formulated containing 40 pbw Ag-trifluoroacetate, 21 pbw DMAc and 0.7 pbw of a styrene allyl alcohol (SAA) copolymer binder. Thermogravimetric analysis showed that precursor conversion to silver was complete at 275° C. The use of DMAc reduced the conversion temperature by about 65° C. as compared to Example 14.
Example 18
[0475] A silver precursor composition was formulated containing 51 pbw Ag-trifluoroacetate, 16 pbw DMAc and 32 pbw alpha-terpineol. The calculated silver content was 25 wt. %. Thermogravimetric analysis showed a mass loss of 77 wt. % at 205° C. Compared to the composition described in Example 17, which does not employ alpha-terpineol as an additive, the conversion temperature was further reduced by 70° C.
Example 19
[0476] A silver precursor composition was formulated containing 33.5 pbw Ag-trifluoroacetate, 11 pbw DMAc, 2 pbw lactic acid and 53.5 pbw DEGBE. The calculated silver content was 16.3 wt. %. Thermogravimetric analysis showed a mass loss of 83 wt. % at 205° C. to 215° C. The decomposition temperature is 60° C. to 70° C. lower as compared to the composition described in Example 17, which does not employ DEGBE as an additive in addition to DMAc.
Example 20
[0477] A silver precursor composition was formulated containing 49 pbw Ag-trifluoroacetate, 16 pbw DMAc, 32 pbw alpha-terpineol and 1.2 pbw Pd-acetate. Thermogravimetric analysis indicated complete conversion of the metal organic precursors at 170° C. This conversion temperature is 35° C. lower as compared to the composition described in Example 18, which does not employ Pd-acetate as a further additive.
Example 21
[0478] A silver precursor composition was formulated containing 46 pbw Ag-trifluoroacetate, 49 pbw DMAc and 2.3 pbw Pd-acetate. Thermogravimetric analysis indicated complete conversion of the metal organic precursors at 195° C. This conversion temperature is 80° C. lower compared to the composition described in Example 17, which does not employ Pd-acetate as a further additive.
Example 22
[0479] A silver precursor composition was formulated containing 4 pbw Ag-acetate and 50 pbw ethanolamine. Thermogravimetric analysis showed that precursor conversion to silver was complete at 190° C. This conversion temperature is 65° C. lower than the conversion temperature of pure Ag-acetate.
Example 23
[0480] A silver/palladium precursor composition was formulated containing 3.8 pbw Ag-trifluoroacetate, 8.6 pbw Pd-trifluoroacetate, 32.3 parts DMAc and 1.3 parts lactic acid. The targeted ratio of Ag/Pd was 40/60 by mass. The calculated Ag/Pd content of the precursor composition was 10 wt. %. Thermogravimetric analysis showed a mass loss of 87 wt. % at 190° C. The presence of Pd-trifluoroacetate reduced the conversion temperature by 80° C. compared to the composition described in Example 17.
Example 24
[0481] A silver/palladium precursor composition was formulated containing 2.4 pbw Ag-trifluoroacetate, 10.8 pbw Pd-trifluoroacetate, 31.3 pbw DMAc and 1.6 pbw lactic acid. The targeted ratio of Ag/Pd was 25/75 by mass and the calculated Ag/Pd content was 10 wt. %. Thermogravimetric analysis showed a mass loss of 88 wt. % at 190° C. The presence of Pd-trifluoroacetate reduced the conversion temperature by 80° C. compared to the composition described in Example 17.
Example 25
[0482] Silver precursor compositions containing various amounts and ratios of Ag-neodecanoate, solvents and additives were formulated. Specific examples are outlined in Table 9. In general, the differences in decomposition temperature are not as pronounced as in formulations containing Ag-trifluoroacetate. Typically, compositions containing Ag-neodecanoate in either DMAc or NMP, together with DEGBE or ethyleneglycolbutylether and/or alpha-terpineol as additives resulted in decomposition temperatures that are between 40° C. and 55° C. lower than pure Ag-neodecanoate. Xylene had no affect on the decomposition temperature of the Ag-neodecanoate.
[0483]
| TABLE 9 | ||||
|---|---|---|---|---|
| Examples Utilizing Ag-Neodecanoate | ||||
| DECOMPOSITION | ||||
| TEMPERATURE | ||||
| RUN | SOLVENT | ADDITIVE 1 | ADDITIVE 2 | (° C.) |
| Ag | 265 | |||
| neodecanoate | ||||
| Ag | Xylene | 265 | ||
| neodecanoate | ||||
| Ag | DMAc | Methoxyethanol | 250 | |
| neodecanoate | 7.9 × 10−2 mole | 1.45 × 10−2 mole | ||
| 7.6 × 10−2 mole | ||||
| Ag | Xylene | 1-Butanol | 250 | |
| neodecanoate | 3.58 × 10−2 mole | 2.67 × 10−2 mole | ||
| 1.52 × 10−2 mole | ||||
| Ag | DMAc | DEGBE | 220-230 | |
| neodecanoate | 6.43 × 10−2 mole | 1.48 × 10−2 mole | ||
| 7.6 × 10−2 mole | ||||
| Ag | DMAc | DEGBE | Alpha-Terpineol | 210-230 |
| neodecanoate2 | 6.43 × 10−2 mole | 2.95 × 10−2 mole | 5.19 × 10−2 mole | |
| .66 × 10−2 mole | ||||
| Ag | DMAc | DEGBE | EGBE | 225 |
| neodecanoate | 2.64 × 10−2 mole | 3.1 × 10−2 mole | 1.69 × 10−2 mole | |
| 1.14 × 10−2 mole | ||||
| Ag | DMAc | EGBE | 240 | |
| neodecanoate | 5.05 × 10−2 mole | 2.2 × 10−2 mole | ||
| 1.14 × 10−2 mole | ||||
| Ag | THF | EGBE | 240 | |
| neodecanoate | 6.1 × 10−2 mole | 2.2 × 10−2 mole | ||
| 1.14 × 10−2 mole | ||||
| Ag | Xylene | DEGBE | 230 | |
| neodecanoate | 2.92 × 10−2 mole | 1.79 × 10−2 mole | ||
| 1.55 × 10−5 mole | ||||
| Ag | NMP | Ethanolamine | 220 | |
| neodecanoate | 6.45 × 10−2 mole | 1.8 × 10−2 mole | ||
| 9.5 × 10−2 mole | ||||
| Ag | THF | Methoxyethanol | 250 | |
| neodecanoate | 5.27 × 10−2 mole | 2.89 × 10−2 mole | ||
| 1.5× 10−2 mole | ||||
Example 26
[0484] A gold containing precursor composition was prepared containing 5 pbw hydrated gold hydroxide, 15 ml acetic acid and 3 ml trifluoroacetic acid. The mixture was heated to 53° C. for 24 hours until all gold hydroxide had dissolved. The solution was filtered through a microfilter and a clear golden solution of the gold precursor was obtained. Thermogravimetric analysis showed that precursor conversion to gold was complete at 125° C.
Example 27
[0485] A gold containing precursor composition was prepared containing 5 pbw hydrated gold hydroxide and 18 ml trifluoroacetic acid. The mixture was heated to 53° C. for 3 hours and subsequently stirred at room temperature for 21 hours until all gold hydroxide has dissolved. The solution was filtered through a microfilter and a clear purple solution of the gold precursor was obtained. Thermogravimetric analysis showed that precursor conversion to gold started at room temperature and was complete at a conversion temperature of 90° C.
Example 28
[0486] A silver precursor composition was formulated containing 2.5 pbw Ag-trifluoroacetate, 2.5 pbw DMAc and 0.2 pbw DEGBE. The precursor composition was deposited on a glass substrate and fired on a hotplate at 200° C. The resulting film showed large crystal growth and was not conductive. This was believed to be due to crystallization of the Ag-trifluoracetate.
Example 29
[0487] A silver precursor composition was formulated containing 2.5 pbw Ag-trifluoroacetate, 2.5 pbw DMAc and 0.2 pbw lactic acid as a crystallization inhibitor. The composition was deposited on a glass substrate and fired on a hotplate at 200° C. The resulting film showed reduced crystal growth, demonstrating the effectiveness of lactic acid as a crystallization inhibitor.
Example 30
[0488] A silver precursor composition was formulated containing 33.5 pbw Ag-trifluoroacetate, 11.2 pbw DMAc, 53.6 pbw DEGBE and 1.8 pbw lactic acid. The composition was deposited on a polyimide substrate (KAPTON HN, E.I. duPont deNemours, Wilmington, Del.) using an ink-jet device. The resulting film showed severe spreading and formed areas that no longer resembled the original pattern. This example illustrates that additional additives may be necessary to control spreading of the precursor composition.
Example 31
[0489] A silver precursor composition was formulated containing 41.2 pbw Ag-trifluoroacetate, 29.7 pbw DMAc, 1.0 pbw lactic acid, 38.4 pbw DEGBE and 1.0 pbw SAA to control spreading. The composition was deposited on a polyimide substrate (KAPTON HN) using an ink-jet device. No spreading was observed. After heating in an oven at 250° C. the resulting film showed some shrinkage and had a bulk resistivity of 5.2 times the resistivity of bulk silver.
Example 32
[0490] A silver precursor composition was formulated including 7.7 weight percent Ag-trifluoroacetate, 12.5 weight percent silver nanoparticles, 7.7 weight percent ethylene glycol and 7.7 weight percent water. All weight percentages are relative to the weight of the final composition. The composition was deposited using an inkjet device and the deposited precursor was heated at 220° C. for 10 minutes to form a conductive trace.
Example 33
[0491] A silver precursor composition was formulated including 33.6 pbw Ag-trifluoroacetate, 21.6 pbw silver nanoparticles, 11.5 pbw DMAc, 53.6 pbw DEGBE and 1.8 pbw lactic acid. The composition was deposited using an ink-jet device and the deposited precursor was heated to 220° C. for 10 minutes to form a conductive trace having a resistivity of not more than about 10 times the resistivity of pure bulk silver.
Example 34
[0492] A copper precursor composition was formulated containing equal parts Cu-formate.H2O, 3-amino-1-propanol and water. The composition was deposited on a glass substrate and rapidly heated to 350° C. The temperature was held at 350° C. for less than 5 seconds, and then rapidly cooled to room temperature. A Scanning Electron Microscope (SEM) photomicrograph showed the film to be dense and x-ray diffraction (XRD) showed that the film contained copper with small amounts of copper oxide. The film had a resistivity of 40 times the bulk resistivity of pure copper metal.
Example 35
[0493] The same precursor composition as in Example 22 was processed at 300° C. with rapid heating and cooling. The conductivity of the resulting film was measured at approximately 3×108 times the bulk copper resistivity while XRD results were identical to Example 34.
Example 36
[0494] A precursor composition including 13 wt. % Cu-formate; 16 wt. % 3-amino-1-propanol; 58 wt. % deionized water; and 20 wt. % ethanol (95%) was deposited on ink jet paper using an ink jet printer. The ink was rapidly heated and cooled and resulted in conductive traces.
Example 37
[0495] A precursor composition including 30 weight percent Cu-formate.H2O, 40 weight percent 3-amino-1-propanol and 30 weight percent water was deposited and processed on glass, FR-4, and KAPTON at 200° C. under a nitrogen atmosphere. The resulting films when scraped with a razor blade rolled up, behaving much like a foil. The films were dense and had an average resistivity of 10 times the resistivity of bulk copper. This example demonstrates that conductive copper features can be formed by processing the precursor compositions under an inert gas, such as nitrogen.
Example 38
[0496] The composition of Example 25 was deposited on glass, FR-4, and Kapton and processed at 180° C. and at 150° C. The resulting films averaged 47 times the bulk copper resistivity and 390 times the bulk copper resistivity, respectively.
Example 39
[0497] A composition with equal parts Cu-formate.H2O, 3-amino-1-propanol and water was deposited on glass and processed at 180° C. in a nitrogen atmosphere. The resulting copper films were dense and averaged 10 times the bulk copper resistivity.
Example 40
[0498] Different precursor compositions were made by mixing Cu-formate, water and different complexing/reducing gents at a molar ratio of 2 moles of reducing agent to 1 mole of Cu. The compositions produced films of descending quality relative to the complexing agent used: 3-amino-1-propanol, 2-amino-1-butanol, 2-(isopropylamino)ethanol, triethanolamine, ethylene diamene. The composition containing 3-amino-1-propanol produced the most continuous and most conductive deposit when processed at 160° C. under a reducing environment (nitrogen gas). Triethanolamine and ethylene diamene produced deposits that looked like copper metal, but were very disconnected.
Example 41
[0499] A 50:50 Cu:Ni precursor composition was prepared using Cu-formate.xH2O (x˜2) and Ni-formate.2H2O complexed with 3-amino-1-propanol. The precursor composition was decomposed under nitrogen cover/flow gas at 350° C. to produce a metallic looking and conductive deposit. The deposit had a nickel colored sheen and was very porous.
Precursor Solubility
[0500] Solubility of precursor material in a variety of different solvents was tested. Test solutions were prepared by dissolving the precursor in the respective solvent. Small amounts of solid precursor were added incrementally and the solution shaken for 10 to 30 minutes. When the solubility limit was reached by this method the solution was shaken for 12 hours and re-evaluated. This procedure was repeated until additional precursor did not dissolve or precipitation occurred. Solvents tested included water, toluene, xylene, N-methylpyrrolidinone (NMP), alpha-terpineol, N,N-dimethylacetamide (DMAc), N-methylacetamide, nitromethane, diethyleneglycolbutylether (DEGBE), triethyleneglycoldiethylether, methylalcohol, ethyl alcohol, isopropyl alcohol, 1-butyl alcohol, methyl ethyl ketone, acetone, diethylether, tetrahydrofurane, ethanolamine, 3-amino-1-propanol, pyridine, diethylentriamine, tetraethylenediamine, 2-amino-butanol, isopropylaminoethanol.
[0501] In general, high solubilities were observed in particular for fluorinated metal carboxylates, mixed carboxylates as well as long chain carboxylates. Preferred solvents for these compounds with regard to solubility are toluene, xylene, N-Methyl pyrrolidinone, tetrahydrofurane and DMAc. Also, some precursors can be successfully dissolved in high amounts in water. A particularly preferred combination consists of silver trifluoroacetate in DMAc where solutions with up to 78 wt. % precursor loading can be achieved.
Example 42
Ratio of Precursor to Reducing Agent
[0502] DMAc based silver precursor compositions were formulated containing different ratios of Ag-trifluoroacetate and DEGBE. As illustrated in Table 10 thermogravimetric analysis showed that the higher the ratio of DEGBE to Ag-trifluoroacetate, the lower the conversion temperature to silver. A molar ratio of 1.2—slightly above the stoichiometric ratio of DEGBE to Ag precursor—produces a conversion temperature to silver of 210° C. The use of DEGBE reduced the decomposition temperature by about 65° C. as compared to Example 17, whose data are incorporated in Table 10 for reference, where no DEGBE was used. Smaller ratios of DEGBE to Ag-trifluoroacetate had a decreased effect on lowering the conversion temperature.
[0503]
| TABLE 10 | ||
|---|---|---|
| Effect of Ratio of DEGBE to Ag-trifluoroacetate | ||
| DEGBE | Ag-trifluoroacetate | Conversion temperature |
| (pbw) | (pbw) | (° C.) |
| 0 | 40 | 275 |
| 30 | 100 | 285 |
| 38 | 59 | 270 |
| 26.5 | 50 | 245 |
| 38 | 41 | 250 |
| 45 | 46 | 240 |
| 53.5 | 33.5 | 205-215 |
Example 43
Conductivity as Function of Time and Temperature
[0504] A precursor composition was formulated containing 41.2 pbw Ag-trifluoroacetate, 38.4 pbw DEGBE, 29.7 pbw DMAc, 1 pbw SAA copolymer and 1 pbw lactic acid and the composition was applied to glass slides to form thin films. These slides were then placed into a preheated oven and heated for controlled lengths of time varying from 1 minute to 60 minutes. The oven was heated to temperatures ranging from 130° C. to 250° C. As is illustrated in Table 9, the precursor composition formed conductive features at 200° C. after 10 minutes in a convection oven. The numbers listed in Table 11 are the resistivity values expressed as a multiple of bulk silver (“no” indicates a complete lack of conductivity). The most conductive features were formed and the most complete conversion occurred at 250° C.
[0505]
| TABLE 11 | |||||||
|---|---|---|---|---|---|---|---|
| Resistivity as a Function of Time and Temperature | |||||||
| Tem- | |||||||
| pera- | Time | ||||||
| ture | (mins) | ||||||
| (° C.) | 1 | 2 | 5 | 7 | 10 | 30 | 60 |
| 130 | no | no | no | no | no | no | no |
| 150 | no | no | no | no | no | no | no |
| 175 | no | no | no | no | no | no | no |
| 200 | no | no | no | no | yes | yes | yes |
| 220 | no | no | np | no | no | yes/no | yes |
| 250 | no | no | 850.5 | 161.8 | 119.3 | 5.2 | 5.8 |
[0506] The precursor composition does not form highly conductive features unless exposed to temperatures above 200° C. for a period of time. The highest conductivities are achieved when the composition is exposed to 250° C. for 10 minutes or greater. Thermogravimetric analysis shows that the composition shows complete conversion at about 220° C. Samples that are fired below 200° C. tended to form crystalline deposits caused by evaporation of the solvent before the desired reactions occurred. The formation of crystals is more of a problem in convection ovens due to the mass transfer from the films to the air. This transfer does not occur in a box furnace. The samples heated in the box furnace tend to stay moist longer and not form crystals. The solutions formed elemental silver as shown by x-ray diffraction (XRD) analysis.
[0507] The above indicates that one can achieve similar conductivities through heating in an oven, or by any other conventional method by varying either the time or the temperature. If one wishes to achieve a given conductivity all one has to do is fire for a short time at an elevated temperature. If it is desired to fire at lower temperatures one can fire at extended periods of time at a lower temperature. The resulting materials should not differ substantially.
Example 44
[0508] A TEFLON coated KAPTON substrate was selectively coated with a removable protective coating exposing a 100 μm wide trench of the underlying TEFLON coating. This substrate was dipped into an etchant (TETRA-ETCH, available from W.L. Gore and Associates) that forms a hydrophilic surface, followed by a rinse in water and removal of the adhesive protective coating. This resulted in a hydrophobic surface (natural surface of TEFLON) with a 100 μm wide hydrophilic strip from the etchant. The substrate was subsequently drop coated with a silver precursor composition containing 33 grams Ag-trifluoroacetate, 33 grams H2O, 33 grams DEGBE and 1 gram lactic acid. The composition was observed to be confined to the hydrophilic surface strip. After heating of the confined composition to 200° C. for 5 minutes, a 100 μm wide silver line was obtained with a bulk resistivity of about 3 times the bulk resistivity of pure solid silver.
[0509] This example demonstrates the ability to confine a low viscosity precursor composition through surface modification of the substrate.
[0510] While various embodiments of the present invention have been described in detail, it is apparent that modifications and adaptations of those embodiments will occur to those skilled in the art. However, it is to be expressly understood that such modifications and adaptations are within the spirit and scope of the present invention.
Claims
What is claimed is:
1. A method for the fabrication of an inorganic resistor on a substrate, comprising the steps of:
(a) providing a substrate;
(b) depositing a resistor precursor composition onto said substrate using a direct-write tool, said resistor precursor composition having a viscosity of not greater than about 100 centipoise and comprising:
i) at least a first molecular precursor compound; and
ii) at least first particles selected from the group consisting of metal particles, metal oxide particles and carbon and carbon particles;
(c) heating said resistor precursor composition to a temperature of not greater than about 350° C. to convert said resistor precursor composition to an inorganic resistor.
2. A method as recited in claim 1, wherein said substrate is an organic substrate.
3. A method as recited in claim 1, wherein said substrate comprises polyimide.
4. A method as recited in claim 1, wherein said resistor precursor composition comprises a molecular precursor compound to a metal.
5. A method as recited in claim 1, wherein said resistor precursor composition comprises a molecular precursor compound to a transition metal.
6. A method as recited in claim 1, wherein said resistor precursor composition comprises a molecular precursor compound to silver.
7. A method as recited in claim 1, wherein said resistor precursor composition comprises a molecular precursor compound to a metal oxide.
8. A method as recited in claim 1, wherein said first particles comprise metal particles.
9. A method as recited in claim 1, wherein said depositing step comprises depositing said precursor composition using an ink-jet device.
10. A method as recited in claim 1, wherein said depositing step comprises depositing said precursor composition using an aerosol jet.
11. A method as recited in claim 1, wherein said heating step comprises heating to a temperature of not greater than about 250° C.
12. A method as recited in claim 1, further comprising the step of modifying a first portion of said substrate, wherein said first portion is adapted to confine said deposited resistor precursor composition.
13. A method as recited in claim 1, further comprising the step of modifying a first portion of said substrate, wherein said first portion is modified to have a surface energy that is different than the surface energy on a second portion of said substrate, and wherein said first portion is adapted to confine said deposited resistor precursor composition.
14. A method as recited in claim 12, wherein said step of modifying a first portion comprises coating said first portion with a hydrophobic surface agent.
15. A method as recited in claim 12, wherein said step of modifying a first portion comprises coating said first portion with a hydrophilic surface agent.
16. A method as recited in claim 1, wherein said resistor precursor composition further comprises a reducing agent.
17. A method as recited in claim 8, wherein said metal particles comprise silver.
18. A method as recited in claim 17, wherein said metal particles further comprise platinum.
19. A method as recited in claim 17, wherein said metal particles further comprise palladium.
20. A method as recited in claim 8, wherein said metal particles comprise NiCr.
21. A method as recited in claim 8, wherein said first molecular precursor compound is a precursor to an insulative phase.
22. A method as recited in claim 21, wherein said insulative phase comprises a glass.
23. A method as recited in claim 8, wherein said resistor precursor composition further comprises second particles, wherein said second particles comprise glass particles.
24. A method as recited in claim 8, wherein said metal particles comprise nanoparticles.
25. A method as recited in claim 1, wherein said first particles comprise metal oxide particles.
26. A method as recited in claim 25, wherein said metal oxide particles comprise complex metal oxide particles.
27. A method as recited in claim 25, wherein said metal oxide particles comprise ruthenate particles.
28. A method as recited in claim 25, wherein said metal oxide particles comprise ruthenate particles selected from the group consisting of lead ruthenate and bismuth ruthenate particles.
29. A method as recited in claim 25, wherein said metal oxide particles comprise nanoparticles.
30. A method as recited in claim 1, wherein said first particles comprise glass particles.
31. A method as recited in claim 30, wherein said glass particles comprise borosilicate glass particles.
32. A method as recited in claim 1, wherein said first particles are carbon particles.
33. A method as recited in claim 32, wherein said carbon particles comprise graphitic carbon.
34. A method as recited in claim 1, wherein said resistor precursor composition comprises not greater than about 75 wt. % particles.
35. A method as recited in claim 1, wherein said resistor precursor composition comprises from about 5 wt. % to about 50 wt. % particles.
36. A method as recited in claim 1, wherein said resistor precursor composition comprises from about 5 to about 50 wt. % nanoparticles.
37. A method as recited in claim 1, wherein said resistor precursor composition comprises from about 30 wt. % to about 60 wt. % of said molecular precursor compound.
38. A method as recited in claim 1, wherein said molecular precursor compound comprises ruthenium.
Patent Citations (162)
| Patent | Date | Inventor | Cited By |
|---|---|---|---|
| US3313632(A) | 1967-04-01 | Langley et al. | Applicant |
| US3683382(A) | 1972-08-01 | Ballinger | Applicant |
| US4019188(A) | 1977-04-01 | Hochberg et al. | Applicant |
| US4105483(A) | 1978-08-01 | Lin | Applicant |
| US4122062(A) | 1978-10-01 | Monte et al. | Applicant |
| US4130671(A) | 1978-12-01 | Nagesh et al. | Applicant |
| US4186244(A) | 1980-01-01 | Deffeyes et al. | Applicant |
| US4211668(A) | 1980-07-01 | Tate | Applicant |
| US4255291(A) | 1981-03-01 | Needes et al. | Applicant |
| US4289534(A) | 1981-09-01 | Deffeyes et al. | Applicant |
| US4333966(A) | 1982-06-01 | Deffeyes et al. | Applicant |
| US4381945(A) | 1983-05-01 | Nair | Applicant |
| US4407674(A) | 1983-10-01 | Ehrreich | Applicant |
| US4416932(A) | 1983-11-01 | Nair | Applicant |
| US4418099(A) | 1983-11-01 | Cuevas et al. | Applicant |
| US4419383(A) | 1983-12-01 | Lee | Applicant |
| US4463030(A) | 1984-07-01 | Deffeyes et al. | Applicant |
| US4487811(A) | 1984-12-01 | Eichelberger et al. | Applicant |
| US4517252(A) | 1985-05-01 | Hugh | Applicant |
| US4539041(A) | 1985-09-01 | Figlarz et al. | Applicant |
| US4548879(A) | 1985-10-01 | St. John et al. | Applicant |
| US4599277(A) | 1986-07-01 | Brownlow et al. | Applicant |
| US4627875(A) | 1986-12-01 | Kobayashi et al. | Applicant |
| US4650108(A) | 1987-03-01 | Gallagher | Applicant |
| US4668533(A) | 1987-05-01 | Miller | Applicant |
| US4775439(A) | 1988-10-01 | Seeger, Jr. et al. | Applicant |
| US4808274(A) | 1989-02-01 | Nguyen | Applicant |
| US4859241(A) | 1989-08-01 | Grundy | Applicant |
| US4877451(A) | 1989-10-01 | Winnik et al. | Applicant |
| US4891242(A) | 1990-01-01 | Ito et al. | Applicant |
| US4931168(A) | 1990-06-01 | Watanabe et al. | Applicant |
| US4931323(A) | 1990-06-01 | Manitt et al. | Applicant |
| US4948623(A) | 1990-08-01 | Beach et al. | Applicant |
| US4959430(A) | 1990-09-01 | Jonas et al. | Applicant |
| US5028473(A) | 1991-07-01 | Vitriol et al. | Applicant |
| US5039552(A) | 1991-08-01 | Riemer | Applicant |
| US5045141(A) | 1991-09-01 | Salensky et al. | Applicant |
| US5049434(A) | 1991-09-01 | Wasulko | Applicant |
| US5057363(A) | 1991-10-01 | Nakanishi | Applicant |
| US5059242(A) | 1991-10-01 | Firmstone et al. | Applicant |
| US5075262(A) | 1991-12-01 | Nguyen et al. | Applicant |
| US5121127(A) | 1992-06-01 | Toriyama | Applicant |
| US5132248(A) | 1992-07-01 | Drummond et al. | Applicant |
| US5139818(A) | 1992-08-01 | Mance | Applicant |
| US5153023(A) | 1992-10-01 | Orlowski et al. | Applicant |
| US5173330(A) | 1992-12-01 | Asano et al. | Applicant |
| US5176744(A) | 1993-01-01 | Muller | Applicant |
| US5183784(A) | 1993-02-01 | Nguyen et al. | Applicant |
| US5216207(A) | 1993-06-01 | Prabhu et al. | Applicant |
| US5244538(A) | 1993-09-01 | Kumar | Applicant |
| US5250229(A) | 1993-10-01 | Hara et al. | Applicant |
| US5270368(A) | 1993-12-01 | Lent et al. | Applicant |
| US5312480(A) | 1994-05-01 | Lotze et al. | Applicant |
| US5312674(A) | 1994-05-01 | Haertling et al. | Applicant |
| US5329293(A) | 1994-07-01 | Liker | Applicant |
| US5332646(A) | 1994-07-01 | Wright et al. | Applicant |
| US5366760(A) | 1994-11-01 | Fujii et al. | Applicant |
| US5378408(A) | 1995-01-01 | Carroll et al. | Applicant |
| US5378508(A) | 1995-01-01 | Castro et al. | Applicant |
| US5395452(A) | 1995-03-01 | Kobayashi et al. | Applicant |
| US5421926(A) | 1995-06-01 | Yukinobu et al. | Applicant |
| US5433893(A) | 1995-07-01 | Jost et al. | Applicant |
| US5444453(A) | 1995-08-01 | Lalezari | Applicant |
| US5463057(A) | 1995-10-01 | Graetzel et al. | Applicant |
| US5494550(A) | 1996-02-01 | Benge | Applicant |
| US5548268(A) | 1996-08-01 | Collins | Examiner |
| US5599046(A) | 1997-02-01 | Behm et al. | Applicant |
| US5601638(A) | 1997-02-01 | Fukuda et al. | Applicant |
| US5604027(A) | 1997-02-01 | Sheridon | Applicant |
| US5604673(A) | 1997-02-01 | Washburn et al. | Applicant |
| US5645932(A) | 1997-07-01 | Uchibori | Applicant |
| US5665472(A) | 1997-09-01 | Tanaka et al. | Applicant |
| US5679724(A) | 1997-10-01 | Sacripante et al. | Applicant |
| US5712673(A) | 1998-01-01 | Hayashi et al. | Applicant |
| US5716663(A) | 1998-02-01 | Capote et al. | Applicant |
| US5725647(A) | 1998-03-01 | Carlson et al. | Applicant |
| US5725672(A) | 1998-03-01 | Schmitt et al. | Applicant |
| US5767810(A) | 1998-06-01 | Hagiwara et al. | Applicant |
| US5781158(A) | 1998-07-01 | Ko et al. | Applicant |
| US5801108(A) | 1998-09-01 | Huang et al. | Applicant |
| US5826329(A) | 1998-10-01 | Roth | Applicant |
| US5828271(A) | 1998-10-01 | Stitzer | Applicant |
| US5837041(A) | 1998-11-01 | Bean et al. | Applicant |
| US5837045(A) | 1998-11-01 | Johnson et al. | Applicant |
| US5846615(A) | 1998-12-01 | Sharma et al. | Applicant |
| US5853470(A) | 1998-12-01 | Martin et al. | Applicant |
| US5882722(A) | 1999-03-01 | Kydd | Applicant |
| US5894038(A) | 1999-04-01 | Sharma et al. | Applicant |
| US5909083(A) | 1999-06-01 | Asano et al. | Applicant |
| US5930026(A) | 1999-07-01 | Jacobson et al. | Applicant |
| US5932280(A) | 1999-08-01 | Roth | Applicant |
| US5953037(A) | 1999-09-01 | Hayashi et al. | Applicant |
| US5992320(A) | 1999-11-01 | Kosaka et al. | Applicant |
| US5997044(A) | 1999-12-01 | Behm et al. | Applicant |
| US5998085(A) | 1999-12-01 | Isberg et al. | Applicant |
| US6019926(A) | 2000-02-01 | Southward et al. | Applicant |
| US6025026(A) | 2000-02-01 | Smith et al. | Applicant |
| US6027762(A) | 2000-02-01 | Tomita et al. | Applicant |
| US6036889(A) | 2000-03-01 | Kydd | Examiner |
| US6074725(A) | 2000-06-01 | Kennedy | Applicant |
| US6080261(A) | 2000-06-01 | Popat et al. | Examiner |
| US6103393(A) | 2000-08-01 | Kodas et al. | Applicant |
| US6124851(A) | 2000-09-01 | Jacobson | Applicant |
| US6133147(A) | 2000-10-01 | Rhee et al. | Applicant |
| US6143356(A) | 2000-11-01 | Jablonski | Applicant |
| US6153348(A) | 2000-11-01 | Kydd et al. | Applicant |
| US6177151(B1) | 2001-01-01 | Chrisey et al. | Applicant |
| US6197366(B1) | 2001-03-01 | Takamatsu | Examiner |
| US6200405(B1) | 2001-03-01 | Nakazawa et al. | Applicant |
| US6207268(B1) | 2001-03-01 | Kosaka et al. | Applicant |
| US6214520(B1) | 2001-04-01 | Wolk et al. | Applicant |
| US6238734(B1) | 2001-05-01 | Senzaki et al. | Applicant |
| US6251488(B1) | 2001-06-01 | Miller et al. | Applicant |
| US6274412(B1) | 2001-08-01 | Kydd et al. | Applicant |
| US6294401(B1) | 2001-09-01 | Jacobson et al. | Applicant |
| US6317023(B1) | 2001-11-01 | Felten | Applicant |
| US6329899(B1) | 2001-12-01 | Hunt et al. | Applicant |
| US6338809(B1) | 2002-01-01 | Hampden-Smith et al. | Applicant |
| US6372158(B1) | 2002-04-01 | Hashimoto et al. | Applicant |
| US6379742(B1) | 2002-04-01 | Behm et al. | Applicant |
| US6379745(B1) | 2002-04-01 | Kydd et al. | Examiner |
| US6395053(B1) | 2002-05-01 | Fau et al. | Applicant |
| US6399230(B1) | 2002-06-01 | Tormey et al. | Applicant |
| US6402579(B1) | 2002-06-01 | Pichler et al. | Applicant |
| US6410201(B2) | 2002-06-01 | Wolk et al. | Applicant |
| US6433358(B1) | 2002-08-01 | Beierlein | Applicant |
| US6503831(B2) | 2003-01-01 | Speakman | Examiner |
| US2002/0058143(A1) | 2002-05-01 | Hunt et al. | Applicant |
| US2002/0131254(A1) | 2002-09-01 | Schaper | Examiner |
| US2002/0148640(A1) | 2002-10-01 | Holl et al. | Examiner |
| US2002/0150678(A1) | 2002-10-01 | Cramer et al. | Applicant |
| US2002/0151161(A1) | 2002-10-01 | Furusawa | Applicant |
| US2002/0176987(A1) | 2002-11-01 | Yadav et al. | Examiner |
| US2003/0020768(A1) | 2003-01-01 | Renn | Examiner |
| US2003/0070569(A1) | 2003-04-01 | Bulthaup et al. | Applicant |
| US2003/0073042(A1) | 2003-04-01 | Cernigliaro et al. | Applicant |
| US2003/0082485(A1) | 2003-05-01 | Bulthaup et al. | Applicant |
| US2003/0096056(A1) | 2003-05-01 | Kawamura et al. | Applicant |
| US2003/0108664(A1) | 2003-06-01 | Kodas et al. | Applicant |
| US2003/0124259(A1) | 2003-07-01 | Kodas et al. | Applicant |
| US2003/0148024(A1) | 2003-08-01 | Kodas et al. | Applicant |
| US2003/0161959(A1) | 2003-08-01 | Kodas et al. | Applicant |
| US2003/0180451(A1) | 2003-09-01 | Kodas et al. | Applicant |
| EP696515 | 1996-02-01 | Applicant | |
| EP696515 | 1996-02-01 | Examiner | |
| EP1323793 | 2003-07-01 | Applicant | |
| JP63278983 | 1987-05-01 | Applicant | |
| JP2000-011875 | 2000-01-01 | Applicant | |
| JP2000-182889 | 2000-06-01 | Applicant | |
| WO98/37133 | 1998-08-01 | Applicant | |
| WO99/16601 | 1999-04-01 | Applicant | |
| WO/29208 | 2000-05-01 | Applicant | |
| WO/69235 | 2000-11-01 | Applicant | |
| WO/72224 | 2000-11-01 | Applicant | |
| WO1/54203 | 2001-07-01 | Applicant | |
| WO1/56736(A2) | 2001-08-01 | Applicant | |
| WO1/82315 | 2001-11-01 | Applicant | |
| WO1/87503 | 2001-11-01 | Applicant | |
| WO2/04698 | 2002-01-01 | Applicant | |
| WO2/05294 | 2002-01-01 | Applicant | |
| WO3/018645 | 2003-03-01 | Applicant | |
| WO3/038002 | 2003-05-01 | Applicant |
Non-Patent Literature (14)
- ITT Cuts Costs of PC Board Manufacturing, Kenneth Dreyfack, Electronics, vol. 52, No. 17, (Aug. 16, 1979).Applicant
- Ink Jet Printing of Hybrid Circuits, R.W. Vest, Tweedell and B.C. Buchanan, “Hybrid Microelectronics” 6, 261,267 (1983).Applicant
- Materials, Silver Ink for Jet Printing, NASA Tech Briefs, Aug. 1989.Applicant
- Preparation of Colloidal Silver Dispersions By The Polyol Process Part 2—Mechanism Of Particle Formation, Silvert et al. (J. Mater. Chem, 1997, 7(2), pp. 293-299).Applicant
- “Advanced Materials Systems For Ultra-Low-Temperature, Digital, Direct-Write Technologies, Digital, Direct Write Technologies”, Vanheusden et al.; in Direct-Write Technologies for Rapid Prototyping Applications, pp. 123-173 (Oct. 2001).Applicant
- Liquid Ink Jet Printing With MOD Inks For Hybrid Microcircuits K.F. Teng, and Robert W. Vest, IEEE Transactions on Components, Hybrids and Manufacturing Technology, vol. CHMT-12(4), 545-549 (1987).Applicant
- “Physical Mechanisms Governing Pattern Fidelity In Microscale Offset Printing”; Darhuber et al.; Journal of Applied Physics; vol. 90, No. 7; pp. 3602-3609; Oct. 2001.Applicant
- “Late-News Paper: Inkjet-Printed Bus and Address Electrodes For Plasma Display”; Furusawa et al.; SID 02 Digest; pp. 753-755.Applicant
- “Site Selective Copper and Silver Electroless Metallization Facilitated by A Photolithographically Patterned Hydrogen Silsesquioxane Mediated Seed Layer”; Harness et al.; American Chemical Society.Applicant
- “Dispersion and Stability of Silver Inks”; Tay et al.; Journal of Materials Science 37 (2002) 4653-4661; 2002.Applicant
- “Fine-Line Conductor Manufacturing Using Drop-On-Demand PZT Printing Technology”; Szczech et al.; IEEE Transactions on Electronics Packaging Manufacturing; vol. 25, No. 1, Jan. 2002.Applicant
- “Ink-Jet Printing of Catalyst Patterns for Electroless Metal Deposition”; Shah et al.; 1999 American Chemical Society; 15; 1584-1587.Applicant
- “Ink-Jet Printed Nanoparticle Microelectromechanical Systems”; Fuller et al.; Journal of Microelectromechanical Systems; vol. 11, No. 1, Feb. 2002.Applicant
- U.S. Appl. No. 10/274,495; “Tape Compositions For The Deposition of Electronic Features”; filed Oct. 18, 2002; Kodas et al.Applicant