Method of manufacturing semiconductor devices with titanium aluminum nitride work function

[0002] A method of manufacturing semiconductor devices, and more particularly to, a method of semiconductor devices is disclosed wherein the devices are capable of reducing the threshold voltage (V_th), by which a metal gate electrode having a dual work-function having a low work-function in a nMOS region and a high work-function in a pMOS region is formed when a surface channel CMOSFET is formed during the process of manufacturing a metal gate, thus implementing a surface channel CMOS device both in the nMOS region and the pMOS region.

[0003] Generally, a silicon oxide film (SiO₂film) is used as a gate dielectric film of a DRAM device and a logic device in mass-produced, semiconductor devices. As the design rule is scaled down, there is a trend that the thickness of the SiO₂is reduced to below the range of 25˜30 Å which limits tunneling. It is expected that the thickness of a DRAM gate dielectric film of a sub-0.10 μm technology is in the range of about 30˜35 Å and the thickness of a logic device gate dielectric film is in the range of 13˜15 Å. If a currently polysilicon gate electrode is continuously employed, however, the components in the thickness of the gate dielectric film, that is electrically increased by the gate poly depletion falls within the range of 3˜8 Å, which thus significantly reducing the thickness of an effective gate oxide film (T_eff) to the approximate range of 15˜30 Å.

[0004] Therefore, in order to overcome this problem, there has been recent efforts to adopt a high-k dielectric material as the gate dielectric film. Meanwhile, there has been efforts to minimize a poly gate depletion phenomenon by using a metal gate instead of a currently developed polysilicon gate. Also, in case of P⁺ poly gate, a lot of research has recently been made since using the metal gate can prevent problems such as boron penetration. In case of the metal gate electrode, a lot of research has been conducted relating to the use of TiN or WN. The work function value is formed toward the valence band in a mid-gap work function since it has a work function in the range of 4.75˜4.85 eV.

[0005] In case of the surface channel pMOSFET, it could be said that the work function is appropriate. However, in case of nMOSFET, it means that the threshold voltage (V_th) is almost in the range of 0.8˜1.2 V when the channel doping is about 2˜5×10¹⁷/cm³. In other words, in this case, a target threshold voltage of 0.3˜0.6 V could not be achieved which is required in a high performance device having low-voltage or low-power characteristics. Therefore, in order to obtain a low threshold voltage of about 0.3˜0.6 V both in nMOS and pMOS simultaneously, it is preferred that a dual metal electrode is used having the work function value of about 4.2 eV in case of nMOS and having the work function value of about 4.8 eV in case of pMOS.

[0006] A method of manufacturing semiconductor devices which reduces the threshold voltage (V_th), in a way that a surface channel CMOS device is implemented both in nMOS and pMOS by forming a metal gate electrode having a dual work-function having a low work-function in a nMOS region and a high work-function in a pMOS region, when a surface channel CMOSFET is formed in a meta gate manufacture process.

[0007] The disclosed method of semiconductor devices comprises the steps of forming a P-well and a N-well in a semiconductor substrate to define an nMOS region and a pMOS, respectively; forming a first gate insulating film in the nMOS region and a second gate insulating film in, the pMOS region, respectively; forming a first (Ti_xAl_y)_1-zN_zfilm on the first gate insulating film and a second (Ti_xAl_y)_1-zN_zfilm on the second gate insulating film, respectively; forming a first metal gate electrodes on the first (Ti_xAl_y)_1-zN_zfilm and a second metal gate electrodes on the second (Ti_xAl_y)_1-zN_zfilm, respectively; and forming a N-type source/drain junction at the semiconductor substrate in the nMOS region and a P-type source/drain junction at the semiconductor substrate in the pMOS region, respectively.

[0008] In the above, the first (Ti_xAl_y)_1-zN_zfilm has a work function value ranging from about 4.2 to about 4.3 eV, wherein z ranges from about 0.0 to about 0.2. The second (Ti_xAl_y)_1-zN_zfilm has the work function value ranging from about 4.8 to about 5.0 eV, wherein z ranges from about 0.3 to about 0.6. Each of the first and second (Ti_xAl_y)_1-zN_zfilms is formed with a thickness ranging from about 100 to about 500 Å.

[0009] Various aspects and other features of the disclosed methods will be explained in the following description, taken in conjunction with the accompanying drawings, wherein:

[0010] FIG. 1 is a cross-sectional view of a device for explaining a method of manufacturing semiconductor devices according to one embodiment of the disclosure;

[0011] FIG. 2 illustrates, graphically, capacitance and voltage depending on the thickness of a gate oxide film in a Ti₃Al film; and

[0012] FIG. 3 illustrates, graphically, a flat band voltage depending on the thickness of the gate oxide film in a Ti₃Al film and a (Ti₃Al)_0.5N_0.3film.

[0013] The disclosed methods will be described in detail by way of a preferred embodiment with reference to accompanying drawings.

[0014] Referring now to FIG. 1, there is shown a cross-sectional view of a device for explaining a method of manufacturing semiconductor devices according to one embodiment of the disclosure.

[0015] A device isolation film (not shown) is formed in a semiconductor substrate 11 to define an active region and a field region. A P-well 11aand a N-well 11bare respectively formed in selected portions of the semiconductor substrate 11 through a well formation process to define an nMOS region and a pMOS region. A first gate insulating film 12ais formed in the nMOS region and a second gate insulating film 12bis formed in the pMOS region. A first (Ti_xAl_y)_1-zN_zfilm 13ais formed in the first gate insulating film 12aand a second (Ti_xAl_y)_1-zN_zfilm 13bis formed in the second gate insulating film 12b.Also, a first metal gate electrodes 14ais formed in the first (Ti_xAl_y)_1-zN_zfilm 13aand a second metal gate electrodes 14bis formed in the second (Ti_xAl_y)_1-zN_zfilm 13b.A low-concentration impurity ion implantation process is formed with respect to the nMOS region and the pMOS region, respectively, to form first and second insulating film spacers 15aand 15bat the side walls of the first and second metal gate electrodes 14aand 14b.A high-concentration impurity ion implantation process is formed to form a N-type source/drain junction 16aof a LDD structure in the nMOS region and a P-type source/drain junction 16bof a LDD structure in the pMOS region, respectively.

[0016] In the above, the first (Ti_xAl_y)_1-zN_zfilm 13ain the nMOS region has the work function value ranging from about 4.2 to about 4.3 eV, where z ranges from about 0.0 to about 0.2. The second (Ti_xAl_y)_1-zN_zfilm 13bin the pMOS region has the work function value ranging from about 4.8 to about 5.0 eV, where z ranges from about 0.3 to about 0.6. Each of the first (Ti_xAl_y)_1-zN_zfilm 13aand the second (Ti_xAl_y)_1-zN_zfilm 13bis formed in thickness ranging from about 100 to about 500 Å, respectively. The first and second metal gate electrodes 14aand 14bare formed with tungsten (W).

[0017] Generally, in order to find the work function value of the gate electrode, as shown in FIG. 2, a capacitance-voltage (C-V) curve for the thickness of several gate oxide film is obtained and a flat-band voltages (V_FB) is then obtained with respect to each of the thickness in the C-V curve.

[0018] Referring now to FIG. 2, there is shown a C-V curve of the Ti₃Al film. It should be understood that Ti₃Al film means the case of x=3, y=1 and z=0 in the (Ti_xAl_y)_1-zN_zfilm. Thereafter, as shown in FIG. 3, the flat-band voltage curve depending on the effective gate oxide film thickness (T_eff) in the (Ti_xAl_y)_1-zN_zfilm is linearly fitted to obtain a single straight line. An intercept value where the straight line and a Y-axis meet corresponds to (ø_ms/q). At this time, ø_msindicates the difference in the work function value (ø_m) of metal and the work function value (ø_s) of silicon semiconductors.

[0019] In case that the work function value (Ti_xAl_y)_1-zN_zfilm depending on the composition of nitrogen (N) is obtained by the above method, if the composition z of nitrogen (N) in the (Ti₃Al)_1-zN_zfilm ranges from about 0.0 to about 0.2, the work function value (ø_m) ranges from about 4.2 to about 4.3 eV. Also, if the composition z of nitrogen (N) in the (Ti₃Al)_1-zN_zfilm ranges from about 0.3 to about 0.6, the work function value (ø_m) ranges from about 4.8 to about 5.0 eV. In other words, if the nitrogen (N) content is below 20%, the work function ranging from about 4.2 to about 4.3 eV could be obtained and if the composition of nitrogen (N) is more than 30%, the work function ranging from about 4.8 to about 5.0 eV could be obtained. This means that a CMOS metal gate electrode having a dual work function can be implemented by controlling the amount of nitrogen (N) in the (Ti_xAl_y)_1-zN_zfilm. Therefore, in the present invention, the (Ti_xAl_y)_1-zN_zfilm containing a small amount of nitrogen (N) below 20% is used in the nMOS and the (Ti_xAl_y)_1-zN_zfilm containing a large amount of nitrogen (N) ranging from about 30 to about 60% is used in the pMOS, in using the (Ti_xAl_y)_1-zN_zfilm as a gate.

[0020] More particularly, in order to form a (Ti_xAl_y)_1-zN_zfilm having a low work function value (where, z ranges from about 0.0 to about 0.2) in the metal gate electrode of the nMOS, nitrogen reactive sputtering using a Ti_xAl_ytarget is performed, where a ratio, x/y of the composition x of titanium (Ti) to the composition y of aluminum (Al) ranges from about 0.5 to about 20. At this time, the flow rate of nitrogen (N) ranges from about 0 to about 20 sccm, the flow rate of argon (Ar) ranges from about 5 to about 30 sccm and a RF power ranges from about 0.25 to about 15 kW. Also, in order to form the (Ti_xAl_y)_1-zN_zfilm having a high work function (where, z ranges from about 0.3 to about 0.6) in the metal gate electrodes of the pMOS, nitrogen reactive sputtering using a Ti_xAl_ytarget is performed, where a ratio, x/y of the composition x of titanium (Ti) to the composition y of aluminum (Al) ranges from about 0.5 to about 20. At this time, the flow rate of nitrogen (N) ranges from about 30 to about 100 sccm, the flow rate of argon (Ar) ranges from about 5 to about 30 sccm and a RF power ranges from about 0.25 to about 15 kW.

[0021] Meanwhile, the disclosed method may implement chemical vapor deposition (CVD) method or advanced CVD using as a precursor to change the composition of the (Ti_xAl_y)_1-zN_zfilm so that the work function value can be adjusted. At this time, the precursor of titanium (Ti) may include one of TiCl₄, TDEAT(tetrakis diethylaminotitanium) and TDMAT(tetrakis dimethylaminotitanium), the precursor of aluminum (Al) may include one of Cl₃and TMA[Al(CH₃)₃], and a source of nitrogen (N) may use one of NH₃, N₂and ND₃.

[0022] Further, the disclosed method may implement atomic layer deposition (ALD) to change the composition of the (Ti_xAl_y)_1-zN_zfilm so that the work function value can be controlled. At this time, the precursor of titanium (Ti) may include one of TiCl₄, TDEAT (tetrakis diethylaminotitanium) and TDMAT(tetrakis dimethylaminotitanium), and the precursor of aluminum (Al) may include one of AlCl₃and TMA[Al(CH₃)₃]. During the time between cycles when the (Ti_xAl_y)_1-zN_zfilm is deposited using the precursor, one of NH₃, N₂and ND₃for purging materials may be used in order to adjust the nitrogen (N) content. The precursor can be deposited at the temperature ranging from about 50 to about 650° C. and at the pressure ranging from about 0.05 to about 3 Torr. At this time, the composition of nitrogen (N) is controlled by the number of each of the cycles.

[0023] As another method, remote plasma CVD (RPCVD) method may be employed. At this time, if ECR (electron cyclotron resonance) is used as a plasma source for remote plasma, the frequency ranges from about 2.0 to about 9 GHz may be used and one of helium(He), argon(Ar), krypton(Kr) and xenon (Xe) may be also used when a plasma is excited. Also, the flow rate of a used gas is controlled to control the relative amount of Ti/Al/N. At this time, when the precursor is deposited by means of remote plasma CVD method, a metal source such as titanium (Ti), aluminum (Al), and the like is injected into the chamber. However, the precursor is sprayed around the wafer and a nitrogen (N) source is introduced around the wafer by exciting the precursor around the plasma.

[0024] In addition to the above embodiments, the disclosed methods may employ a process of forming a (Ti_xAl_y)_1-zN_zfilm having different compositions of nitrogen at the nMOS region and the pMOS transistor in a damascene gate, etc., to control the work function value.

[0025] As can be understood from the above description, the disclosed methods can implement a surface channel CMOS device both in a nMOS region and a pMOS region by controlling the nMOS region to have the work function value ranging from about 4.2 to about 4.3 eV and the pMOS region to have the work function value ranging from about 4.8 to about 5.0 eV, using a (Ti_xAl_y)_1-zN_zfilm, when a gate of a semiconductor device is formed. Therefore, the disclosed methods can reduce the threshold voltage.

[0026] The disclosed methods have been described with reference to a particular embodiment in connection with a particular application. Those having ordinary skill in the art and access to the teachings of the present invention will recognize additional modifications and applications within the scope thereof.

[0027] It is therefore intended by the appended claims to cover any and all such applications, modifications, and embodiments within the scope of the present invention.