US 4,906,898 AGrant
Surface Wave Launchers to Produce Plasma Columns and Means for Producing Plasma of Different Shapes
Issue Date:1990-03-06
•15 Claims
•5 Drawing Sheets
Abstract
The present invention relates to a device for generating plasma (ionizing gas) by a propagating surface wave. The device comprises a wave launching structure mounted on a plasma vessel and connected to an impedance matching network. The latter comprises a coupler and a tuner which is either formed by a section of a transmission line or is of the lumped circuitry type. The launching structure may either generate an azimuthally symmetric or a non symmetric propagating wave. This invention also relates to a method and a device for shaping plasma which comprises a plasma vessel receiving a surface wave generator and having a serviceable portion of a size and/or shape substantially different from the shape and/or size of the portion of the plasma vessel receiving the wave generator.
Metadata
Assignee
- Universite de Montreal
Inventor
- Michel Moisan
Application Information
Application Number:US 2295016
Filing Date:1988-08-08
Priority Date:1985-07-05
Art Unit:262
Classifications
IPC:
H01J 1104
Field of Search:
31531339;111.21;248;267231.31;634
Patent Drawings (5 sheets)
Description
A detailed description of several embodiments of the present invention will now be given with reference to the annexed drawings in which:
FIG. 1 is a sectional view of an embodiment of a surface wave launching structure according to this invention;
FIG. 2 is a side view, partly sectionnal, of a plasma generator whose launching structure is illustrated in FIG. 1;
FIG. 3 is a perspective view, partly sectional of another embodiment of a plasma generator according to this invention;
FIG. 4 is a variant of the device illustrated in FIG. 3;
FIGS. 5 and 6 are schematic diagrams of impedance matching networks according to this invention;
FIG. 7 is a plan view of an azimuthally non symmetric surface wave plasma generator;
FIGS. 8 to 14 illustrate various embodiments of plasma shaping devices according to this invention.
FIG. 14a is a graph showing the relation between the electron density and the distance from the lauching region in the device of FIG. 14;
FIGS. 15 to 19 illustrate further embodiments of plasma shaping devices according to this invention; and
FIG. 20 illustrates a tapered plasma vessel and a graph showing the relationship between the normalized electron density and the normalized axial distance of the vessel.
With reference to FIGS. 1 and 2, a surface wave plasma generator 30 comprises a wave launching structure 32 to which is mounted an impedance matching network constituted by a coupler 48 and a tuner 55. Launcher 32 is coaxially mounted on a plasma vessel 12, made of dielectric material and containing a gas to be energized. Launcher 32 comprises metallic sleeve or member 34 defining an opening 36 through which tube 12 is to be inserted and also comprises an outer metallic member or tube 38 coaxial to member 34 and being attached thereto by an insulating ring 40 made, for example, of Teflon (Trademark) material. Members 34 and 38 are slightly spaced apart from each other and member 38 comprises a radially inwardly projecting wall 39 extending toward member 34 and defining therewith a wave launching gap 42 for obtaining the desired field distribution of the surface wave to be excited. For reducing as much as possible spurious field components in the launching gap vicinity, a flange 44 is formed at one end of member 34. A small spacing 46 is left between flange 44 and outer member 38.
Coupler 48 comprises a plate 50 and is connected to the inner conductor of a semi-rigid coaxial cable (not shown) connected in turn to a suitable power generator (not shown). The shield of the coaxial cable is connected to member 38.
Plate 50 extends in the vicinity at gap 42 and defines with member 34 a capacitance through spacing 52, through which the power from the generator is coupled to the launcher 32. The coupler 48 is radially moveable with respect to the axis of the plasma vessel 12 by any suitable means (not shown) for adjusting the capacitive spacing 52 for tuning purposes.
On the outer member 38 is mounted the male part 53 of a two terminals connector 54 having an outer metallic threaded surface 56 and a central conductor or terminal 58 connected to member 34.
The threaded surface 56 constitutes the other terminal of connector 54 and is electrically connected to member 38.
With reference to FIG. 2, the male part 53 threadedly receives the female part 51 of connector 54 to which is connected a tuner 55 constituted by a length of coaxial transmission line 56 short-circuited at one end 57 and extending transversely relatively to the axis of the plasma vessel 12. Such coaxial line introduces an imaginary impedance where it is connected. The value of this impedance is derived in practice either by using a standard coaxial tuning stub with a sliding short (57) or by connecting alternatively different length of standard short-circuited coaxial lines of various lengths at the male part 53. The required length of the tuning stub is generally about .lambda./8 (where .lambda. is the free-space wave length of the EM field).
The wave launcher 32 provides an unsymmetrical plasma column with respect to the launching gap 42, since the surface wave emitted therethrough, toward flange 44, is more rapidly damped that the wave emitted in the other direction. Therefore, the plasma extending towards flange 44 will be shorter than the plasma extending in the other direction. By varying the length of members 34 and 38, the dampening effect may be adjusted.
Launching structure 32 is mainly capable of exciting an azimuthally symetric surface wave.
FIG. 3 illustrates a surface wave plasma generator 60 designed to produce an axial symmetrical plasma with respect to the launching gap region. The generator 60 is designed to be fed with a symmetric line and comprises a wave launching structure 62 to which is connected an impedance matching network 64 comprising a coupler 66 and a tuner 68 of a balanced line type.
The launching structure 62 comprises two symmetrical metallic members or sleeves, 70 and 72 coaxially mounted on the plasma vessel 12. Members 70 and 72 are slightly spaced apart from each other for defining a launching gap region 74. Members 70 and 72 are retained to a casing 76 by a ring 73 of insulating material. Casing 76 projects laterally relatively to vessel 12 and defines a sleeve 78 containing the impedance matching network 64 comprising the coupler 66 and the tuner 68.
Tuner 68 is constituted by two parallel metallic conductors 80 and 82 connected to members 70 and 72 and being short-circuited by a slidingly movable plate 84. The tuner 68 introduces an imaginary impedance between members 70 and 72, which may be adjusted by moving the sliding plate 84. The latter is in electrical contact with casing 78 and it is guided by the latter.
The outer conductor of a coaxial cable 86 from a power generator (not shown) is connected to the casing 78. The central conductor 90 of cable 86 passes through conductor 80 and forms a section of a coaxial line. Conductor 90 is connected to coupler 66 defining a capacitance with conductor 82 and with member 72 since the two are connected together. Coupler 66 is retained to casing 78 by a dielectric screw 92 threadedly engaged therein. By rotating screw 92 this capacitance may be adjusted by varying the distance between coupler 66 and conductor 82.
It should be noted that the impedance matching network 64 not only ensures the possibility of impedance matching but also performs the functions of a balun transformer from a coaxial feeder to a symmetrical line.
FIG. 4 illustrates a variant of plasma generator 60. In this case, coupler 66 is mounted adjacent to sleeve 72 and establishes directly a capacitive coupling therewith instead through the intermediary of conductor 82. The position of coupler 66 is also adjustable by rotating the dielectric screw 92 engaged in casing 76 or 78, as explained earlier.
Plasma generators 30 and 60 operate well in a frequency range between 10 MHz and 1 GHz. However this frequency range maybe extended.
FIG. 5 is a diagram of an impedance matching network 93 which operates well in a frequency range between 500 KHz and 150 MHz. This frequency range can be further extended. The impedance 93 matching network may advantageously be used with the wave launching structures 32 or 62, already described. Impedance matching network 93 is a lumped element two port circuit which is adapted to be inserted between the launcher and the coaxial feeding line from the power generator. The circuit is attached to the launcher with a coaxial link and comprises a variable coil 94 and a variable capacitance 96. For utilizing network 93 with the launching structure 32 illustrated in FIG. 2, the output port 95 may be connected to structure 32 through the coaxial connector 54. In that case, the coupler 48 is to be completely removed from launcher 32.
The diagram in FIG. 6 is a lumped elements impedance matching network 97, operating well in a frequency range between 500 KHz and 150 MHz and which may be further extended if desired. Network 97 establishes a connection with a launching structure through a symmetric line and comprises a variable capacitor 98 connected in parallel to the primary winding of a variable transformer 100. The output terminals of the secondary winding 101, of transformer 100 are connected to the launching structure, which may advantageously be the launcher 62, shown in FIGS. 3 and 4. The middle point 102 of secondary winding 101 is to be connected to the shielding box of the matching network and to the casing 76.
If the launching structure 62 is to be utilized with network 97, conductors 80, 82 and coupler 66 are to be removed. Subsequently, the output terminals of secondary winding 101 are connected to respectively members 70 and 72.
The launching structures which have been described earlier generate only azimuthally symmetric waves. In the case where an azimuthally non symmetric wave excitation is required, for example, the plasma generator 103 illustrated in FIG. 7 may be used. The launcher 103 excites waves of dipolar symmetry. The launching structure 104 comprises two substantially semi-circular members 106 and 108 facing each other and being mounted on either side of a plasma vessel 12. To the launching structure 104 is connected an impedance matching network 110 of the lumped elements type, for example, and which is fed by a power generator 112.
In order to achieve a proper operation of the plasma generator 103, an impedance matching network of symmetric output has to be employed, such as that shown in FIG. 6.
The operation of the launching structures 32 and 62 is as follows.
Initially, when no plasma is present in the dielectric tube or vessel 12, and the power generator is activated, an electric field is established between coupler 48 or 66 and one of the metallic members forming the wave launching structure. The electric field has a direction generally normal to the coupler plate, and in the launching gap region, is oriented mainly, along the axis of tube 12. If the electric field is of a sufficient amplitude, it will ionize the gas contained in the vessel, producing the plasma. Subsequently, a surface wave will begin to propagate between the walls of tube 12 and the plasma, the power from the frequency generator being coupled to the launching structure through the capacitive spacing defined between the coupler and the adjacent metallic member.
The plasma generator 103, for launching azimuthally nonsymmetric surface waves, operates as follows.
When the power generator is activated, an electric field with a direction transverse to the axis of tube 12 will be established between members 106 and 108. The gas in vessel 12 will be ionized and plasma will be produced. Subsequently, surface waves of a dipolar symmetry will begin to propagate along the interface between the plasma and the walls of the dielectric tube 12, for sustaining the plasma and extending the length thereof.
Since the launching region of launcher 104 does not completely encircle tube 12, the propagating wave will have an amplitude which is not constant when measured along the circumference of tube 12. In other words, the wave will be azimuthally non symmetric. The amplitude of the propagating wave will be maximum in the region designated "MAX" in FIG. 7, whereas the minimum "MIN" will be situated in a position generally transverse to the maximum amplitude position.
The property of the propagating surface wave which resides in that it is always concentrated in the vicinity of the plasma-dielectric interface can be advantageously used to extend the variety of dimensions and shapes of the plasma beyond the limits imposed by a straight cylindrical constant diameter plasma tube. The propagating surface wave plasma generators which may be used for this purpose are not limited to those described earlier.
FIGS. 8 to 11 illustrate plasma vessels 119 comprising each a serviceable portion 120 whose shape and/or size differ substantially from the shape and/or size of the portions of vessels 119 on which are mounted the surface wave launchers 117. The diameter of the plasma tube 119 can be increased (FIGS. 8 and 9) or reduced (FIGS. 10 and 11) along the wave path.
Efficient surface wave generators cannot have aperture diameters larger or close to .lambda./4 otherwise a lesser amount of the EM energy emitted by the generator is converted into surface wave energy, since the available EM energy has the tendency to be transformed into space waves. For this reason it seems more efficient to use tube diameters that are smaller than .lambda./4, or still better, less than .lambda./8. Practically, this corresponds to a 45 mm diameter plasma at 915 MHz and to about a 15 mm one at 2.45 GHZ. These diameter values can be too small for some application. Decreasing the wave frequency would allow to produce a larger diameter plasma but this usually considerably reduces the electron density (except at high gas pressures). One way of increasing the plasma diameter and keeping a relatively high value of electron density, is to use the plasma vessels of FIGS. 8 and 9.
For tube diameters that are smaller than the aperture of the launcher available, the plasma column may be excited by disposing directly part of this smaller tubes into the launcher. However, this method is not efficient in term of the EM energy converted into surface waves. The largest launcher efficiency for surface wave is achieved when the plasma diameter is very close, or equal, to the launcher aperture. This means that the wave excitation in a plasma generator as shown in FIG. 10 still remains an efficient one even if the serviceable portion diameter is much smaller than the launcher aperture.
Regarding the tapered plasma vessels shown in FIGS. 8 to 11, the transition portions between the serviceable portion of the plasma vessel and the portion thereof receiving the plasma generator, over which the plasma type progressively changes to the required shape and size should be long enough and smooth. If this is not the case, an important part of the surface wave energy will be reflected back toward the launcher and, also, part of the surface wave energy will be converted, at the transition point, into a radiation wave or space wave (a space wave is a wave that propagates in all direction and, thus, is not attached to the plasma-tube interface). In that respect, experiences show that a transition over half a free space wavelength seems to be a good compromise.
It has been shown experimentally and theoretically that the electron density decreases (about linearly) in the direction of propagation, which implies that the plasma column produced, is actually inhomogeneous. This phenomena may be a disadvantage in certain application. For correcting this inhomogeneity the plasma tube diameter may be decreased in a smooth and generally constant manner, in the direction of propagation, as illustrated in FIG. 11. The required tapering of the tube can be determined experimentally or calculated. Another way of reducing the axial inhomogeneity of the plasma is to use a T-shaped tube described hereinafter.
FIG. 14 shows such an arrangement. The wave emerges from the launcher at the base 121 of the T-shaped plasma vessel 122, where it is divided into two waves of the same power flow, propagating in opposite directions in the two arms 124 and 126, respectively of vessel 122. For a given plasma length along the arms 124 and 126, the plasma is more homogeneous axially than if one launcher was used at one end of a straight tube having the same lenght. This may be visualized on the graph of FIG. 14a showing the electron density (N) with respect to the distance (Z) along the arms or conduits 124 and 126.
FIG. 15 is a variant where T-tubes 130, 132 and 134 have been stacked to have a longer plasma column with an axial density variation as small as possible. Note that in this case, the various launchers should not be supplied from the same power generator, i.e., the surface waves excited by various launchers should not be coherent one with the others, otherwise they will interfere and a standing wave pattern will appear along the plasma column.
FIGS. 16, 17 and 18 illustrate plasma vessels having closed serviceable portions or bulbs.
FIGS. 16 and 17 show how to obtain a spherical plasma. The device in FIG. 17 could be used, for example, to produce a high density plasma for a spectral lamp that can be considered optically as a point source.
FIG. 19 is a cross sectional view, transverse to the axis of the plasma vessel and showing that an annular plasma can be produced, using two concentric tubes 150 and 156 the ionized gas being located in-between these two tubes. Also, as illustrated in FIG. 13, an annular plasma having a rectangular cross-section can be obtained.
Also, flat or rectangular plasmas may be obtained by utilizing the devices shown in FIGS. 12 and 12a, being respectively cross-sectional views of a flat and rectangular serviceable portions of plasma vessels.
The shapes given above are only examples and are not limitative of the shapes and dimensions of plasmas that can be obtained with the surface wave technique.
An example of a fluorescent lamp 138 that can be realized with elements from the present invention is illustrated in FIG. 18. In this example, the plasma generator 140 is provided with a lumped circuitry matching network, the generator 140 acting also as a base holder for the lamp 138. The tube 142 illuminates as a result of the surface wave emitted by the launcher that propagates along the tube envelope (the surface wave plasma generators and the light tube could be arranged in a large variety of ways depending on the application it is intended for). Tube 142 contains mercury vapor generating ultra violet light converted into visible light by using some appropriate coating (e.g. phospor) on the tube inner wall.
The insert in FIG. 20 shows a cross-sectional view of a tapered plasma vessel 200 on which is mounted a surface wave generator 210 of a suitable type. On the same figure is also shown the graph giving the relation of the normalized electron density n(z)/n(z.sub.1) of the plasma in vessel 200 with reference to the normalized axial distance z/z.sub.1 of the plasma vessel. The value z.sub.1 corresponds to the position of the launching plane along which the surface wave generator extends.
More specifically, vessel 200 has a conical shape and comprises ends 212 and 214, closed or connected to other parts of the apparatus. The cone angle of vessel 200 is designated by .phi..
It has been observed that the axial density of the plasma in vessel 200 depends upon the shape and the size of the latter and may be varied, as will be shown hereinafter.
With reference to FIG. 20, the surface waves are excited in the z.sub.1 plane and travel in both directions along the z axis. The waves travelling in the z and -z directions are designated "upward" and "downward" wave, respectively.
The electron density in a column sustained by the downward wave decreases, increases or remains constant with an increasing distance from the wave launching plane, depending upon the value of 2.alpha..sub.1 z.sub.1, (.alpha..sub.1, being the wave attenuation coefficient at z=z.sub.1. Thus, conditions (.phi., gas pressure, electron density) may be sought, for which the density is axially uniform. This feature can be of interest for some applications.
The specific description of several embodiments of the present invention should not be interpreted in any limiting manner since it is given only for illustrative purposes. The scope of this invention is defined in the following claims.
Claims
The embodiments of the invention in which an exclusive property or privilege is claimed are defined as follows:
1. A device for producing plasma of given shape and size, comprising: a surface wave launcher that can be energized, formed with an opening; a vessel having an inner surface, completely made of dielectric material and containing a gas that can be ionized, said vessel including: (a) a surface wave launcher receiving portion inserted in said opening and conforming thereto, said opening comprising means for transferring energy from said surface wave launcher to said gas in the receiving portion to ionize the latter gas; (b) a usable portion having a shape and size corresponding to the shape and size of the plasma to be produced, said receiving and usable portions of the vessel being substantially different from each other in cross-sectional shape or size; and (c) a smooth, tapered transition portion for interconnecting the said receiving and usable portions; whereby, in operation, ionization of the gas in the receiving portion produces plasma and a surface wave propagating on the inner surface of the vessel from the said receiving portion to said usable portion through the said transition portion to thereby create in the said usable portion the plasma having the shape and size of the usable portion.
2. A device as defined in claim 1, in which said smooth, tapered transition portion comprises means for propagation said surface wave without reflection and without conversion of the surface wave into space wave propagating in all directions.
3. A device as defined in claim 1, wherein said receiving portion of the vessel has a circular cross-section.
4. A device as defined in claim 2, wherein said receiving portion of the vessel tapers toward said usable portion.
5. A device as defined in claim 2, wherein said usable portion has a longitudinal axis and is of a generally constant circular cross-section along its longitudinal axis.
6. A device as defined in claim 5, wherein the said receiving portion has a cross-sectional area smaller than the cross-sectional area of said usable portion.
7. A device as defined in claim 5, wherein said receiving portion of the vessel has a cross-section area larger than the cross-section area of said usable portion.
8. A device as defined in claim 1, wherein said vessel is constituted by a header comprising a main conduit to which are connected in fluid communication therewith a plurality of tubes, on each tube being mounted a surface wave launcher for emitting a surface wave in the associated tube, each surface wave launcher being supplied with energy from a separate electric power supply to prevent a definite phase relationship between the surface waves emitted by the different launchers.
9. A device as defined in claim 1, wherein said usable portion has a generally rectangular cross-section.
10. A device as defined in claim 1, wherein said usable portion is substantially flat.
11. A device as defined in claim 1, wherein said usable portion has an annular shaped cross-section.
12. A device as defined in claim 1, wherein said usable portion is a spherical bulb.
13. A device as defined in claim 1, wherein said usable portion is a pear-shaped bulb.
14. A device as defined in claim 1, wherein said usable portion comprises a discharge opening, said usable portion tapering down toward said discharge opening for achieving a substantially constant electron density of the plasma in said usable portion.
15. A device as defined in claim 1, wherein said vessel is T-shaped and comprises a central tube in fluid communication with two oppositely extending conduits, the surface wave launcher being mounted on said central tube.