Wide Angle Lens With Improved Flat Field Characteristics

This invention relates to optical lens design. In particular, it pertains to a wide angle lens having very flat field characteristics suitable for use in "step and repeat" microlithography.

Lenses usable in step and repeat microlithography must have high numerical apertures and must have fields as flat as possible in order to reproduce the reticle pattern accurately onto the surface of a wafer.

In conventional optical designs for such applications, the third order Petzval curvature is left partly under-corrected. That is, it is curved inward toward the lens so that at some point in the field the third order Petzval just balances the fifth order Petzval. The fifth order Petzval is usually positive, or over corrected, and curves away from the lens. Thus, at the point where the third and fifth order Petzval just balance, the curvature of field is zero and the position of best focus corresponds to the paraxial focus. By choosing a different focus on axis than the best focus, a better balance can be achieved so that, at two points in the field, the position of best focus corresponds to the image plane.

The position of best focus includes factors other than Petzval curvature. However, Petzval curvature has a strong influence and results in a field which, at low values of image height curves inward but, at large values of image height, curves outward from the lens. It has been discovered that a single strong field lens may be used to correct the third order Petzval curvature. However, it has also been determined that no amount of bending of the strong field lens will correct the fifth order Petzval and, in fact, only adds additional over correction. An example of a field flattener employed to correct third order field curvature is disclosed in U.S. Pat. No. 2,846,923 of A. W. Tronnier. In the system disclosed in this patent, third and fifth order distortion remained when such a field flattener was employed.

In accordance with the present invention, the single element field flattener is replaced by two elements--one negative and the other positive. By suitably bending these elements, it is possible to correct both third and fifth order Petzval curvature as well as third and fifth order distortion.

FIG. 1 is a lens diagram of a singlet having a field flattener in accordance with the invention;

FIG. 2 is an optical diagram of a multi-element lens having the field flattener of the invention;

FIG. 3 is a plot of best focus versus height of image for the lens of FIG. 2;

FIG. 4 is a diagram of a modified version of the lens of FIG. 2;

FIG. 5 is a graph of best focus versus height of image for the lens of FIG. 4;

FIG. 6 is a diagram of a color corrected version of the lens of this invention;

FIG. 7 is a graph of the best focus versus height of image for the lens of FIG. 6; and

FIG. 8 is a graph of the monochromatic and weighted polychromatic performance of the lens of FIG. 6.

The invention will first be described in connection with its use with a singlet. With particular reference to FIG. 1, there is illustrated a singlet 10 and a compound field flattener L.sub.F comprising negative element 12 and positive element 14. The prescription of the lens assembly of FIG. 1 is given in Table I (dimensions in mm).

The following table gives the power of each surface of the singlet 10 and the compound field flattener L.sub.F.

The second and third surfaces are the positive singlet and each surface has a power +0.005 for a total power of +0.010. The compound field flattener L.sub.F is made up of surfaces 4, 5, 6, and 7 which have a total power of -0.010 which just balances the power of the singlet and results in a fully corrected third order Petzval curvature. Negative element surfaces 4 and 5 over correct the third order Petzval curvature by only 17.5% in that its power is -0.01175 rather than -0.0100. Thus, the negative element 12 of the field flattener L.sub.F over corrects the curvature of field by only a slight amount. The positive element 14 adds back the 17.5% over correction.

The following table gives the third order surface by surface contributions of the FIG. 1 lens assembly.

Examination of the table above indicates that surface 4, the first surface of the field flattener L.sub.F provides most of the third order field flattening.

Table IV gives the fifth order surface by surface contribution of the lens assembly of FIG. 1.

Inspection of Table IV will indicate that the correction of the fifth order Petzval curvature is provided by the meniscus positive element 14 of the field flattener L.sub.F.

The third and fifth order aberrations of the lens of FIG. 1 is given in the following table.

The field flattener of this invention may also be employed with a more complex lens assembly such as illustrated in FIG. 2. This is a refractive design with a magnification of -0.2X, NA=0.35, with a track length of 1,000 mm, and corrected at a wavelength of .lambda.=0.4047 .mu.m. The prescription is given in Table VI.

Table VII gives the third and fifth order aberrations when traced from the object to the image.

It will be noted that the fifth order Petzval curvature has been completely corrected and the third order Petzval is substantially reduced. FIG. 3 is the plot of best focus versus image height of the lens of FIG. 2. It will be noted that, with the fifth order Petzval curvature corrected, the seventh order Petzval, which is negative, becomes dominant at the edge of the field. As a result, the best focus curves back in towards the lens, resulting in a third cross-over point. Accordingly, there is achieved a much flatter field and a wider field of good correction than has heretofore been achievable.

It is often better to control the fifth order Petzval rather than to completely correct it. This allows the focus and the 3rd, 5th, and 7th order Petzval to be balanced for best overall field characteristics. A lens assembly of such a design is illustrated in FIG. 4 and its prescription given in Table VIII below.

The foregoing refractive design also has the same magnification, NA, track length, and corrected wavelength as the design shown in FIG. 2. The third and fifth order aberrations, with the fifth order Petzval limited but not zero, are given in Table IX.

The resulting curve of best focus versus height of image is given in FIG. 5. It will be noted that the third cross-over is retained but that the inward curve at the edge of the field is reduced.

By further refinement of this design a final color corrected version was obtained. The color correction is for the mercury h line with a bandwidth of .lambda.=0.4015 .mu.M, to .lambda.=0.4095 .mu.M. This design is illustrated in FIG. 6 and its prescription is given in Table X.

The third and fifth order aberrations are given in Table XI and its surface of best focus is given in FIG. 7. The monochromatic performance as well as the weighted polychromatic performance is given in FIG. 8.

It is believed that the many advantages of this invention will now be apparent to those skilled in the art. It will also be apparent that a number of variations and modifications may be made therein without departing from its spirit and scope. Accordingly, the foregoing description is to be construed as illustrative only, rather than limiting. This invention is limited only by the scope of the following claims.