Background of the Invention
The present invention relates to improvements in combined turbo-molecular pumps.
As a prior art type of a turbo-molecular pump, there is described in Japanese patent publication No. 47-33446, a turbo-molecular pump whose outlet port is coaxially disposed with a thread-type pump.
The turbo-molecular pump of this type has the advantages that relatively low of the pumping speed, which is a drawback of the thread-type pump, is improved and its processing is simplified by utilizing the higher pumping speed that is a characteristic of the turbo-molecular pump and by providing fully compressed gas which is supplied from the inlet port to the thread-type pump.
However, this type of turbo-molecular pump can be operated at a high compression ratio and at a throughput which corresponds to the throughput of the thread-type pump when the turbo-molecular pump is operated in a high vacuum range, but in the range of 10.sup.-2 to 1 Torr, the efficiency of the turbo-molecular pump is normally extremely reduced so that the compression ratio thereof can not be improved. Thus, as shown in FIG. 1, the diminished throughput, which is a disadvantage of the thread-type pump, becomes apparent when operating in the range 10.sup.-2 to 1 Torr so that the pumping speed is rapidly reduced. Moreover, in this vacuum range, the efficiency of the rotary type pump is also at a low level. In another prior art type of turbo-molecular pump as described in Japanese patent publication No. 47-33447, alternately arranged rotary circular plates and stationary circular plates having an upper and a lower reverse spiral thereon are employed in place of the thread-type pump. But, even in this pump, as in the thread-type pump, the gas flow passage extends from the inlet side toward the outlet side along the winding direction of the spiral so that as in the thread-type pump, the pumping speed is extremely reduced in the range in which the compression ratio of the turbo-molecular pump is reduced.
Summary of the Invention
An object of the present invention is to improve the pumping speed in the range of 10.sup.-2 to 1 Torr. That is, the range of 10.sup.-2 to 1 Torr is a vacuum range which is suitable for fabricating semiconductors by flowing low-pressurized gas of plasma CVD and reactive ion-etching material and so on. This invention provides a combined turbo-molecular pump which is suitable for use in this vacuum range.
To accomplish the foregoing objects, the combined turbo-molecular pump according to the present invention includes rotary circular plates at the inlet port of a rotatable rotor and stationary circular plates being alternatively arranged in layers at the circumference thereof, and a helical or thread groove is disposed either on the rotor or the cylindrical part which surrounds the rotor in the vicinity of the circumference of the outlet side of the rotor. On both surfaces of either the rotary circular plates or the stationary circular plates, there is provided respectively a spiral groove having the same winding direction, and the circumference of each stationary circular plate communicates with the inlet port and the rotary circular plates communicate with the helical or thread groove.
Brief Description of the Drawings
FIG. 1 is a graph of the pumping speed-inlet pressure characteristic of a conventional combined turbo-molecular pump.
FIG. 2 is a longitudinal cross-sectional view of a turbo-molecular pump according to the present invention.
FIG. 3 is a perspective view of a portion of the pump of FIG. 2 in a disassembled state. FIG. 4 is a graph of the pumping speed-inlet pressure characteristic turbo-molecular pump according to the present invention.
Description of the Invention
FIG. 2 is a whole view of a combined turbo-molecular pump according to the invention and FIG. 3 is an exploded view of a part thereof. The pump is composed of a cylindrical housing 1, a base 2 which is airtightly secured to the bottom portion of the housing 1 and a cover 3 which covers the under opening of the base 2.
The upper portion of the housing 1 is opened and on the peripheral portion thereof, a flange portion 1a is embodied and during use, the flange portion 1a is connected to the outlet hole of vacuum chamber and the like (not shown). On a part of the base 2, a connector 4 is arranged and on an opposite part thereof, an outlet pipe 2a is secured. The outlet pipe 2a is connected to a rotary pump or a mechanical booster. Moreover, a rotor case 5 is arranged within the base 2 and to a rotor shaft 5a, which is extruded on upper portion thereof, a rotor 6 is fixed by thread.
In the rotor case 5 are housed a driving motor to be connected to a connector 4 and a control device. At the inner periphery of the housing 1 is provided a cylinder 7 having a helical or thread groove 7a formed in the inner periphery thereof in the region spaced from the lower exterior periphery of the rotor 6. On the upper portion of the rotor 6, are fixed rotary circular plates 8 arranged in three axially spaced steps, and three stationary circular plates 10, 11, 11 are secured via spacer rings 9 on the interior periphery of the housing 1 so as to face the rotary circular plates 8.
Of the stationary circular plates, the lowermost plate 10 is provided with a spiral groove 10a only on the upper surface thereof, and the upper stationary circular plates 11 are provided with a spiral groove 11a on both the upper and lower surfaces thereof. The winding direction of each spiral groove 10a, 11a is the same in both the upper and lower surfaces. Further, on the circumference of each stationary circular plate, a plurality of openings or notch grooves 11b are provided and on the interior periphery of the spacer ring 9, openings or notch grooves 9a are also provided. The grooves 11b and 9a are axially aligned to form a plurality of axial flow passages for flowing the gas downwardly and into the spiral grooves 10a, 11a so that the upper opening of the housing 1 can communicate with the exterior periphery of the rotor 6. In turn, on the external surface of the rotor 6, a plurality of knurled axial passage grooves 6a are provided. Each passage groove 6a is closed by the uppermost rotary circular plate 8 and at the lower portion thereof communicates with the helical or thread groove 7a. By such a construction, when the rotor 6 of the turbo-molecular pump is rotated, gas supplied from the inlet port is supplied through the passage grooves 9a, 11b and in accordance with rotation of the rotary plates 8, the gas flows along the spiral grooves 10a, 11a so as to undergo compression and is supplied to the helical or thread groove 7a of the cylinder 7 through the axial passage grooves 6a which are provided along the circumference of the rotor 6. In accordance with the rotation of the rotor 6, the gas is further compressed along the helical or thread groove 7a and is exhausted from the outlet pipe 2a to the open air.
The gas which is compressed through each spiral groove 11a and 10a on the upper portion of the rotor 6 is supplied within the helical or thread groove 7a so that the pumping speed can be increased even if the throughput from the thread groove 7a is less. FIG. 4 illustrates an observed value of the pumping speed in reference to the inlet port pressure of a turbo-molecular pump which is constituted as above-mentioned. This figure shows that in a range of 10.sup.-2 to 1 Torr, the pumping speed is not at all changed and a stable pumping speed can be maintained in this range in comparison with a conventional combined type of turbo-molecular pump and a thread-groove pump or a spiral pump.
Moreover, in the afore-described embodiment, the spiral grooves are provided on the stationary circular plates, but if it is desired, the spiral grooves can be provided on the rotary circular plates and, the effect can be obtained. Further, it is also possible to form the helical or thread groove in the rotor instead of the cylinder.
As shown in FIG. 4, according to the present invention, in a range in which the prior art turbo-molecular pump efficiency is lowered and a rotary pump can not be effectively driven, a stable driving can be executed.
Therefore, a combined turbo-molecular pump according to this invention is suitable for a semiconductor fabricating device to execute fabricating steps, such as flowing a gas current of plasma CVD, reactive ion-etching material and so on.