Laser Marking Enhancement System Using Reflection From the Mask

This invention relates to the use of lasers for marking information on articles.

In a well-known technique commonly in use, a pulsed laser beam is passed through a mask and imaged onto an article by a lens. Provided the laser pulse is intense enough and provided the article surface is absorptive at the laser wavelength, the effect of the laser beam is to vaporise, or otherwise chemically change, the surface of the article to be marked. For a given material, the area bounded by the mark produced is proportional to the energy density on the material.

However, since the mask is in the form of a stencil containing the information to be marked, only that part of the laser beam which passes through the open parts of the stencil is actually imaged onto the article to form the mark, while that part of the beam which is obstructed by closed parts of the stencil is normally reflected from the stencil and lost. A typical mask arrangement will transmit 25% of the incident energy, and reflect 75%. Thus, this marking technique is wasteful and inefficient in terms of its use of the output energy of the laser.

Since the area which can be marked on an article is characterised by the energy density incident on the article, it will be appreciated that if more energy could be transmitted through a given mask, the area covered by the mark on the article would be increased.

It is an object of the present invention to provide a laser marking technique which enables a greater proportion of the laser energy to be transmitted by a given mask to an object to be marked.

In accordance with the present invention, at least part of the energy which is reflected from the mask is collected and redirected to the mask, particularly the open areas of mask, thus increasing the overall transmission and hence the efficiency of the process. The invention takes advantage of the polarization properties of radiation, particularly inasmuch as these properties can be used with a polarization sensitive beamsplitter to discriminate between different parts of a radiation field. By using a pulsed, linearly polarized laser beam and by detecting the radiation which is reflected from the mask, and separating this from the incident radiation, it is possible to reflect this radiation back on to the mask so that a further percentage of the total radiation field is transmitted by the mask.

The invention is described further hereinafter, by way of example only, with reference to the accompanying drawings, in which:

FIG. 1 diagrammatically illustrates a known technique for laser marking;

FIG. 2 diagrammatically illustrates a first embodiment of a laser marking apparatus in accordance with the present invention;

FIG. 3 diagrammatically illustrates a second embodiment of a laser marking apparatus in accordance with the present invention; and

FIGS. 4, 5 and 6 illustrate three further embodiments in accordance with the invention.

In the known technique illustrated in FIG. 1, a pulsed laser beam is passed through a mask or stencil 1 and imaged by a lens 2 onto an article 3 which is to be marked. In this arrangement, that part of the laser beam which is obstructed by the closed parts of the stencil 1 is largely reflected by the stencil 1 and lost.

In the description of the embodiments in accordance with the present invention which follow, parts which correspond to those already described are given the same reference numerals.

The laser beam, which is arranged to be linearly polarized in the plane of the drawing, is incident from the left, and first passes through a polarization sensitive beamsplitter 5. This may be, for example, an uncoated optical flat which is set at Brewster's angle, or else, preferably, an optical flat which is set at Brewster's angle or some other angle, and with a suitable coating deposited on one surface, the other surface being anti-reflection coated. As is well known to those skilled in the art, a beamsplitter set in the manner shown and described will efficiently transmit radiation polarized as described (this direction of polarization is commonly referred to as p-plane with respect to the beamsplitter, whereas the orthogonal plane of polarization, i.e. in a direction into the plane of the drawing, is commonly known as S-plane).

After being transmitted through the beamsplitter 5, the laser beam passes through a quarter waveplate 4. A quarter waveplate 4, as is well known in the art, will convert a linearly polarized beam to a circularly polarized beam. The resulting circularly polarized beam is then incident on the mask 1, where parts are either transmitted or reflected, depending upon whether they encounter open or closed parts of the mask. That fraction of the beam which is reflected from the mask again passes through the quarter waveplate 4, and that part of the reflected beam which is not depolarized by the reflection (such depolarisation typically being a small percentage of the total) is converted to a beam which is now linearly polarized in a direction othogonal to the original plane of polarization, i.e. the S plane with respect to the beamsplitter 5. Thus it is reflected from the beamsplitter 5 to a mirror 6, from where it is returned via the beamsplitter 5 and quarter waveplate 4 to the mask 1. It will be appreciated that by suitably adjusting the mirror 6, that part of the laser beam which was reflected from the mask can be redirected so that more of the beam is transmitted through the mask. That part of the beam which is reflected from the mask during the second transit is transmitted back through the beamsplitter 5, from where a percentage may be reflected back into the system described by the laser optics. Thus the net effect is to increase the total percentage of the laser beam which is transmitted by the mask.

In a further embodiment of the present invention illustrated in FIG. 6, an optical component 8 can be inserted between the beamsplitter 5 and the mirror 6 so as to "scramble" the reflected beam, so that, instead of a beam which is non-uniform (this resulting from the non-uniform first reflection from the mask) a much more homogeneous beam is reflected back into the system. It is important however, that such "scrambling" of the beam should substantially retain the polarization properties of the beam, or else the concept of selection by polarization does not work. As indicated diagrammatically in FIG. 6, the optical component 8 as here described can take the form, for example, of a multi-faceted lens or some other compound lens system. To the same end, the planar mirror 6 can be replaced by a multi-faceted mirror 6a as in the embodiment illustrated diagrammatically in FIG. 5.

Another embodiment of the present invention illustrated diagrammatically in FIG. 4 combines the quarter waveplate and the mask, whereby, instead of having a discrete quarter waveplate and a metallic stencil type mask, the mask 1 is actually evaporated, or otherwise deposited, on the second surface of the waveplate 4. In this case the mask can be a metallic or a dielectric coating, the main requirement being that the coating is highly reflective where the "solid" parts of the mask would be.

This latter embodiment has several advantages, viz

1. No "Landings" are necessary to hold the solid parts together, as in a conventional stencil.

2. The "empty" parts of the mask need not necessarily be 100% transmissive, but, by suitably depositing coatings, may provide any percentage reflection required. This may be useful, for example, in some "scrambling" schemes.

3. The composite piece is much less likely to become misaligned when the mask is disturbed for whatever reason.

Yet another embodiment employs the arrangement shown in FIG. 3. In this case, the quarter waveplate is replaced by a suitably constructed mirror 7, which has the same properties as a quarter waveplate, except that it works by reflection and not by transmission. One advantage of this embodiment is that the mirror 6, beamsplitter 5, polarizing mirror 7, and mask holder, can be assembled as a single unit, offering substantial improvements in manufacturing cost, and system alignment.