US 4,620,934 AGrant
Soluble Fluorinated Cycloalkane Sulfonate Surfactant Additives for NH.sub.4
Issue Date:1986-11-04
•10 Claims
Abstract
Silicon dioxide etching solutions with soluble surfactant additives are provided. The improved silicon dioxide etchants are produced by adding soluble fluorinated surfactant additives to standard oxide etchants in the manufacture of integrated circuits. The surfactants found effective in accordance with the invention are referred to as fluorinated cycloalkane sulfonates and fluorinated cycloalkene sulfonates and have the general formula ##STR1## where X is F, H, Cl, OH, SO.sub.3 A or R and Y is F, H, OH, R or be omitted and thereby impart a double bond; wherein R is a 1 to 4 fluoroalkyl group; and wherein n has a value of up to 6. A represents as the cation group may be NH.sub.4.sup.+, H.sup.+, Na.sup.+, K.sup.+, Li.sup.+, R.sup.+ or organic amine cations.
Metadata
Assignee
- Allied Corporation
Inventors
- Ronald J. Hopkins
- Evan G. Thomas
- Harold J. Kieta
Application Information
Application Number:US 7335687
Filing Date:1985-05-13
Priority Date:1984-04-26
Art Unit:133
Classifications
IPC:
C09K 1306B44C 122C03C 1500C03C 2506
Field of Search:
25215613479.3;79.4;142653;657;659.1;6622;3
Patent Drawings
This patent does not have any drawings.
Description
Examples 1-6
To a solution 27 percent by weight of ammonium fluoride, 6 percent by weight of hydrofluoric acid and the remainder being water, was added 250 ppm surfactant. An analysis of the surfactant was preformed using F.sup.19 -NMR and mass spectrometry. Surface tensions were measured using a Du Nouy Ring tensiometer at 25.degree. C. The solutions (as identified in Table I) were filtered through an 0.2 .mu.m TEFLON.RTM. fluorocarbon polymer filter and were remeasured for surface tension using the same method.
The results in Table I show that the potassium salts of perfluorocyclohexyl sulfonic acid and its perfluoroethyl derivative, and of the branched perfluorooctyl sulfonic acid were not significantly removed by 0.2 .mu.m filtration as indicated by surface tension measurements. However, the surface tension results show that the potassium salts of linear perfluorooctyl sulfonic acid was essentially removed from solution upon filtration.
As seen, the linear fluorinated sulfonates having a chain length of C.sub.8 are removed, whereas the fluorinated cycloalkyl sulfonates and branched perfluoroalkylsulfonates of similar mass remain in solution.
It will be understood that various modifications may be made in the compositions described without departing from the scope of the invention and the several details disclosed as illustrative are not to be construed as placing limitations on the invention except as may be recited in the appended claims.
Claims
What is claimed:
1. An etching solution containing a surfactant, which is stable against the precipitation of the surfactant, comprising an aqueous mixture of ammonium fluoride and surfactant that contains between 13.5 and 45 weight percent ammonium fluoride (NH.sub.4 F) and between 25 and 2000 ppm of a fluorinated sulfonate selected from the group consisting of cycloalkane sulfonate, fluorinated cycloalkene sulfonate of the formula: ##STR6## wherein n has a value of up to 6, X may be F, Cl, H, OH, SO.sub.3 A or R and Y may be F, Cl, H, OH, R' or be a double bond and A may be H, NH.sup.+, Na.sup.+, K.sup.+, Li.sup.+, R".sup.+ or NR".sub.4.sup.+ wherein R" is a 1 to 4 carbon atom alkyl and/or fluoroalkyl group and mixtures thereof and the remainder being water.
2. An etching solution according to claim 1 containing up to 11 weight percent hydrogen fluoride.
3. The etching solution of claim 1 wherein "n" in the fluorinated cyclic surfactant has a value of 2 to 4.
4. The etching solution of claim 1 wherein the fluorinated cyclic surfactant is the ammonium salt having a low metal ion content.
5. The etching solution of claim 1 wherein the fluorinated cycloalkane or cycloalkene sulfonate is fluorinated cycloalkane or cycloalkene sulfonic acid.
6. An etching solution of claim 1 wherein the fluorinated cyclo surfactant is present in smounts of 200 to 5000 ppm and is added to the etchant solution as a dry solid or as a solution in an aqueous polar solvent mixture.
7. An etching solution according to claim 1 containing up to 11 weight percent hydrogen fluoride, between 200 and 1000 ppm fluorinated cyclic surfactant diluent to lessen corrosion.
8. The etching solution of claim 2 containing up to 50 weight percent as a corrosion depressing diluent selected from the group consisting of acetic acid, ethylene glycol, and a 1 to 3 carbon atom alcohol.
9. A process for producing an etching solution which comprises blending 49% by weight aqueous hydrogen fluoride and a 15% to 40% by weight aqueous solution of ammonium fluoride, with 200 to 5000 ppm active fluorinated cyclic surfactant.
10. The process according to claim 9 wherein the aqueous ammonium fluoride contains about 30% NH.sub.4 F by weight.