ORGANIC FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME

[0001] This application claims priority to and the benefit of Korean Patent Application No. 10-2010-0103678, filed on Oct. 22, 2010, in the Korean Intellectual Property Office, the entire disclosure of which is incorporated herein by reference.

[0002] 1. Field

[0003] Aspects of embodiments according to the present invention relate to an organic film deposition apparatus and a method of manufacturing an organic light-emitting display device by using the same.

[0004] 2. Description of Related Art

[0005] Organic light-emitting display devices have a larger viewing angle, better contrast characteristics, and faster response speeds than other display devices, and thus have drawn attention as next-generation display devices.

[0006] Organic light-emitting display devices generally have a stacked structure including an anode, a cathode, and an emission layer interposed between the anode and the cathode. The devices display images in color when holes and electrons, injected respectively from the anode and the cathode, recombine in the emission layer such that light is emitted. However, it is difficult to achieve a high light-emission efficiency with such a structure, and thus one or more intermediate layers, such as an electron injection layer, an electron transport layer, a hole transport layer, a hole injection layer, and the like may be additionally interposed between the emission layer and one or both of the electrodes.

[0007] However, it is very difficult in practice to form fine patterns with organic thin films, such as the emission layer and intermediate layers, and red, green and blue light-emission efficiencies vary according to characteristics of the organic thin films. For these reasons, conventional organic film deposition apparatuses may not be suitable for patterning on large substrates. Thus, it is difficult to manufacture large organic light-emitting display devices having satisfactory driving voltages, current densities, brightnesses, color purities, light emission efficiencies, and life span characteristics, and there are still demands for improvements in this regard.

[0008] Exemplary embodiments according to the present invention provide an organic film deposition apparatus that may be easily manufactured, that may be applied to the manufacture of large-size display devices on a mass scale in a simple fashion, and that may improve manufacturing yield and deposition efficiency, and a method of manufacturing an organic light-emitting display device by using the organic film deposition apparatus.

[0009] According to an embodiment of the present invention, there is provided an organic film deposition apparatus for forming an organic film on a substrate, the apparatus including: a deposition source configured to discharge a deposition material; a deposition source nozzle unit located at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet located opposite to and spaced apart from the deposition source nozzle unit and having a plurality of patterning slits arranged in a second direction perpendicular to the first direction; a first blocking member located between the substrate and the deposition source and movable together with the substrate to be positioned to screen at least a part of the substrate; and a second blocking member located between the first blocking member and the substrate and held in a fixed position relative to the deposition source, wherein the substrate is spaced apart from the organic film deposition apparatus and at least one of the substrate or the organic film deposition apparatus is configured to move relative to the other.

[0010] The first blocking member may be positioned to screen a non-deposition region of the substrate.

[0011] The first blocking member may be positioned to screen either a first non-deposition region at an end region of the substrate or a second non-deposition region at an opposite end region of the substrate.

[0012] The first blocking member may be configured to start moving together with the substrate after the substrate is moved until the first or second non-deposition region of the substrate is directly above the first blocking member.

[0013] The first blocking member may have a planar shape.

[0014] The second blocking member may have an open mask shape.

[0015] The first blocking member may be moved in a direction parallel to the substrate at the same speed as the substrate.

[0016] While the first blocking member is moved together with the substrate, a relative position of the first blocking member with respect to the substrate may be constantly maintained.

[0017] The patterning slit sheet may be smaller than the substrate.

[0018] According to another embodiment of the present invention, there is provided an organic film deposition apparatus for forming an organic film on a substrate, the apparatus including: a deposition source configured to discharge a deposition material; a deposition source nozzle unit located at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet located opposite to the deposition source nozzle unit and having a plurality of patterning slits arranged in the first direction; a barrier plate assembly including a plurality of barrier plates that are arranged in the first direction and located between the deposition source nozzle unit and the patterning slit sheet, the barrier plates partitioning a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces; a first blocking member located between the substrate and the deposition source and movable together with the substrate to be positioned to screen at least a part of the substrate; and a second blocking member located between the first blocking member and the substrate and held in a fixed position relative to the deposition source, wherein the substrate is spaced apart from the organic film deposition apparatus and at least one of the substrate or the organic film deposition apparatus is configured to move relative to the other.

[0019] The first blocking member may be positioned to screen a non-deposition region of the substrate.

[0020] The first blocking member may be positioned to screen either a first non-deposition region at an end region of the substrate or a second non-deposition region at an opposite end region of the substrate.

[0021] The first blocking member may be configured to start moving together with the substrate after the substrate is moved until the first or second non-deposition region of the substrate is directly above the first blocking member.

[0022] The first blocking member may have a planar shape.

[0023] The second blocking member may have an open mask shape.

[0024] The first blocking member may be moved in a direction parallel to the substrate at the same speed as the substrate.

[0025] While the first blocking member is moved together with the substrate, a relative position of the first blocking member to the substrate may be constantly maintained.

[0026] The patterning slit sheet may be smaller than the substrate.

[0027] The plurality of barrier plates may extend in a second direction substantially perpendicular to the first direction.

[0028] According to an embodiment of the present invention, there is provided a method of manufacturing an organic light-emitting display device by using an organic film deposition apparatus for forming an organic film on a substrate, the method including: arranging the substrate to be spaced apart from the organic film deposition apparatus; and depositing a deposition material discharged from the organic film deposition apparatus on the substrate while moving the substrate relative to the organic film deposition apparatus, wherein the depositing of the deposition material on the substrate further includes: placing a second blocking member in a fixed position; moving a first blocking member together with a first non-deposition region of the substrate while the deposition material is deposited on the substrate; moving the first blocking member back to an original position; and moving the first blocking member together with a second non-deposition region of the substrate while the deposition material is deposited on the substrate.

[0029] In the moving of the first blocking member together with the first non-deposition region of the substrate while the deposition material is deposited on the substrate, the first blocking member may be moved while being overlapped with the first non-deposition region of the substrate. In the moving of the first blocking member together with the second non-deposition region of the substrate while the deposition material is deposited on the substrate, the first blocking member may be moved while being overlapped with the second non-deposition region of the substrate.

[0030] In the moving of the first blocking member together with the first non-deposition region of the substrate or together with the second non-deposition region of the substrate, the first blocking member may be moved in a direction parallel to the substrate at the same speed as the substrate while the deposition material is deposited on the substrate.

[0031] In the moving of the first blocking member together with the first non-deposition region of the substrate or together with the second non-deposition region of the substrate, a relative position of the first blocking member to the substrate may remain the same while the first blocking member is moved together with the substrate.

[0032] In the moving of the first blocking member back to the original position, the first blocking member may be moved at a higher speed than the substrate.

[0033] In the moving of the first blocking member together with the first non-deposition region of the substrate while the deposition material is deposited on the substrate, the first blocking member may start to be moved together with the substrate when the first non-deposition region of the moving substrate is above the first blocking member in a position overlapping with a first region of the second blocking member.

[0034] The method may further include, between the moving of the first blocking member together with the first non-deposition region of the substrate and the moving the first blocking member back to the original position, holding the first blocking member in a position overlapping with a second region of the second blocking member.

[0041] Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the present invention to those of ordinary skill in the art.

[0042] FIG. 1 is a schematic perspective view of an organic film deposition apparatus 100 according to an embodiment of the present invention, FIG. 2 is a schematic cross-sectional side view of the organic film deposition apparatus 100 of FIG. 1, and FIG. 3 is a schematic cross-sectional plan view of the organic film deposition apparatus 100 of FIG. 1.

[0043] Referring to FIGS. 1 to 3, the organic film deposition apparatus 100 according to one embodiment of the present invention includes a deposition source 110, a deposition source nozzle unit 120, a barrier plate assembly 130, a patterning slit sheet 150, and first and second blocking members 160 and 170.

[0044] Although a chamber is not illustrated in FIGS. 1 through 3 for the convenience of explanation, all the components of the organic film deposition apparatus 100 may be located within a chamber that is maintained at an appropriate degree of vacuum. The chamber is maintained at an appropriate vacuum in order to allow a deposition material to move substantially in a straight line in the organic film deposition apparatus 100.

[0045] In such a chamber, a substrate 400, which is a deposition target on which a deposition material 115 is to be deposited, may be transferred by an electrostatic chuck (not shown). The substrate 400 may be a substrate for flat panel displays. A large substrate, such as a mother glass, for manufacturing a plurality of flat panel displays, may be used as the substrate 400. Other substrates may also be employed.

[0046] In an embodiment, the substrate 400 and/or the organic film deposition apparatus 100 may be moved relative to the other. For example, as illustrated in FIG. 1, the substrate 400 may be moved in a direction of an arrow A, relative to the organic film deposition apparatus 100.

[0047] In a conventional deposition method using a fine metal mask (FMM), the size of the FMM is typically greater than or equal to the size of a substrate. Thus, the size of the FMM has to be increased when performing deposition on a larger substrate. However, it is difficult to manufacture a large FMM and to extend an FMM to be accurately aligned with a pattern.

[0048] In order to overcome this problem, in the organic film deposition apparatus 100 according to one embodiment of the present invention, deposition may be performed while the organic film deposition apparatus 100 or the substrate 400 is moved relative to the other. That is, deposition may be continuously performed while the substrate 400, which is disposed so as to face the organic film deposition apparatus 100, is moved in a Y-axis direction. In other words, deposition is performed in a scanning manner while the substrate 400 is moved in a direction of arrow A in FIG. 1. Although the substrate 400 is illustrated as being moved in the Y-axis direction in FIG. 1 while deposition is performed, aspects of the present invention are not limited thereto. For example, deposition may be performed while the organic film deposition apparatus 100 is moved in the Y-axis direction, while the substrate 400 is held in a fixed position. In other embodiments, both the substrate 400 and the organic film deposition apparatus 100 may be moved in opposite directions with respect to each other along the Y-Axis.

[0049] Thus, in the organic film deposition apparatus 100 according to one embodiment of the present invention, the patterning slit sheet 150 may be significantly smaller than an FMM used in a conventional deposition method. In other words, in the organic film deposition apparatus 100, deposition is continuously performed, e.g., in a scanning manner, while the substrate 400 is moved in the Y-axis direction. Thus, a length of the patterning slit sheet 150 in the Y-axis direction may be significantly less than a length of the substrate 400 while a width of the patterning slit sheet 150 in the X-axis direction and a width of the substrate 400 in the X-axis direction are substantially equal to each other. However, even when the width of the patterning slit sheet 150 in the X-axis direction is less than the width of the substrate 400 in the X-axis direction, deposition may be performed on the entire substrate 400 in a scanning manner while the substrate 400 or the organic film deposition apparatus 100 is moved relative to the other.

[0050] As described above, since the patterning slit sheet 150 may be formed to be significantly smaller than an FMM used in a conventional deposition method, it is relatively easy to manufacture the patterning slit sheet 150 used in embodiments of the present invention. Further, using the patterning slit sheet 150, which is smaller than an FMM used in a conventional deposition method, is more convenient in all processes, including etching and other subsequent processes, such as precise extension, welding, moving, and cleaning processes, compared to the conventional deposition method using a larger FMM. This is more advantageous for manufacturing a relatively large display device.

[0051] In order to perform deposition while the organic film deposition apparatus 100 and/or the substrate 400 is moved relative to the other as described above, the organic film deposition apparatus 100 and the substrate 400 may be separated from each other (e.g., by a predetermined distance), as will be described later in detail.

[0052] The deposition source 110 that contains and heats the deposition material 115 is located at an opposite side of the chamber to a side at which the substrate 400 is located.

[0053] The deposition source 110 includes a crucible 112 that is filled with the deposition material 115, and a cooling block 111 surrounding the crucible 112. The cooling block 111 prevents radiation of heat from the crucible 112 outside, i.e., into the chamber. The cooling block 111 may include a heater (not shown) that heats the crucible 112.

[0054] The deposition source nozzle unit 120 is located at a side of the deposition source 110, and in particular, at the side of the deposition source 110 facing the substrate 400. The deposition source nozzle unit 120 includes a plurality of deposition source nozzles 121 (or deposition source nozzle slits) arranged at equal intervals (e.g., regular intervals) in the X-axis direction. The deposition material 115 that is vaporized in the deposition source 110 passes through the deposition source nozzles 121 of the deposition source nozzle unit 120 towards the substrate 400, which is a deposition target on which the deposition material 115 is to be deposited.

[0055] The barrier plate assembly 130 is located at a side of the deposition source nozzle unit 120. The barrier plate assembly 130 includes a plurality of barrier plates 131, and a barrier plate frame 132 that covers sides of the barrier plates 131. The plurality of barrier plates 131 may be arranged parallel to each other at equal intervals (e.g., regular intervals) in the X-axis direction. In addition, each of the barrier plates 131 may be arranged parallel to an YZ plane in FIG. 1, and may have a rectangular shape. The plurality of barrier plates 131 arranged as described above partitions the space between the deposition source nozzle unit 120 and the patterning slit sheet 150 into a plurality of sub-deposition spaces S (see FIG. 3). In the organic film deposition apparatus 100 according to one embodiment of the present invention, as illustrated in FIG. 3, the deposition space is divided by the barrier plates 131 into the sub-deposition spaces S that respectively correspond to the deposition source nozzles 121 through which the deposition material 115 is discharged.

[0056] The barrier plates 131 may be respectively located between adjacent deposition source nozzles 121. In other words, each of the deposition source nozzles 121 may be located between two adjacent barrier plates 131. The deposition source nozzles 121 may be respectively located at the midpoint between two adjacent barrier plates 131. However, the present invention is not limited to this structure. For example, two or more of the plurality of deposition source nozzles 121 may be located between two adjacent barrier plates 131. In this case, the two or more deposition source nozzles 121 between two adjacent barrier plates 131 may be also respectively located at the midpoint between the two adjacent barrier plates 131.

[0057] As described above, since the barrier plates 131 partition the space between the deposition source nozzle unit 120 and the patterning slit sheet 150 into the plurality of sub-deposition spaces S, the deposition material 115 discharged through each of the deposition source nozzles 121 is not mixed with the deposition material 115 discharged through the other deposition source nozzles 121, and passes through the patterning slits 151 so as to be deposited on the substrate 400. In other words, the barrier plates 131 guide the deposition material 115, which is discharged through the deposition source nozzles 121, to move straight in the Z-axis direction, and not to flow in the X-axis direction.

[0058] As described above, the deposition material 115 is forced to move straight by the presence of the barrier plates 131, so that a smaller shadow zone may be formed on the substrate 400, compared to a case where no barrier plates are installed. Thus, the organic film deposition apparatus 100 and the substrate 400 can be separated from each other (e.g., by a predetermined distance), as will be described later in detail.

[0059] The patterning slit sheet 150 and a frame 155, which surrounds and binds the patterning slit sheet 150, are located between the deposition source 110 and the substrate 400. The frame 155 may be formed in a lattice shape, similar to a window frame. The patterning slit sheet 150 includes a plurality of patterning slits 151 arranged in (e.g., located at equal or regular intervals along) the X-axis direction. Each of the patterning slits 151 extends in the Y-axis direction. The deposition material 115 that has been vaporized in the deposition source 110 and passed through the deposition source nozzle 121 passes through the patterning slits 151 towards the substrate 400.

[0060] The patterning slit sheet 150 may be formed of a metal thin film. The patterning slit sheet 150 is fixed to the frame 155 such that a tensile force is exerted thereon. For example, the patterning slit sheet 150 may be tightly stretched or pulled toward the frame 155 by exerting force in opposite directions along the X-axis and/or Y-axis directions. The patterning slits 151 may be formed by etching the patterning slit sheet 150 to have a stripe pattern. The number of patterning slits 151 may be equal to the number of deposition patterns to be formed on the substrate 400.

[0061] In addition, the barrier plate assembly 130 and the patterning slit sheet 150 may be located to be separated (e.g., spaced) from each other (e.g., by a predetermined distance). Alternatively, the barrier plate assembly 130 and the patterning slit sheet 150 may be coupled (e.g., connected) to each other by a connection member 135.

[0062] The first and second blocking members 160 and 170 are located between the barrier plate assembly 130 and the patterning slit sheet 150. In the organic film deposition apparatus 100 according to one embodiment of the present invention, the first blocking member 160 is movable together with the substrate 400 and is disposed (or arranged) to screen a first non-deposition region 401 and/or a second non-deposition region 402 of the substrate 400. The second blocking member 170 having an open mask structure (e.g., frame shaped) is held in a fixed position. The first and second blocking members 160 and 170 prevent the deposition material 115 from being deposited on first and second non-deposition regions 401 and 402 of the substrate 400. This will be described later in detail with reference to FIG. 4.

[0063] As described above, the organic film deposition apparatus 100 according to one embodiment of the present invention performs deposition while being moved relative to the substrate 400. In order for the organic film deposition apparatus 100 to be movable relative to the substrate 400, the patterning slit sheet 150 may be spaced apart from the substrate 400 (e.g., by a predetermined distance). In addition, in order to prevent the formation of a relatively large shadow zone on the substrate 400 when the patterning slit sheet 150 and the substrate 400 are spaced apart from each other, the barrier plates 131 are arranged between the deposition source nozzle unit 120 and the patterning slit sheet 150 to force the deposition material 115 to move in a straight direction. Thus, the size of the shadow zone that may be formed on the substrate 400 may be reduced (e.g., sharply reduced).

[0064] In a conventional deposition method using an FMM, deposition is performed with the FMM in close contact with a substrate in order to prevent formation of a shadow zone on the substrate. However, when the FMM is used in close contact with the substrate, the contact may cause defects, such as scratches on patterns formed on the substrate. In addition, in the conventional deposition method, the size of the mask has to be the same as the size of the substrate since the mask cannot be moved relative to the substrate. Thus, the size of the mask has to be increased as display devices become larger. However, it is not easy to manufacture such a large mask.

[0065] In order to overcome this and/or other problems, in the organic film deposition apparatus 100 according to one embodiment of the present invention, the patterning slit sheet 150 is located to be spaced apart from the substrate 400 (e.g., by a predetermined distance), which may be facilitated by installing the barrier plates 131 to reduce the size of the shadow zone formed on the substrate 400. Shadow zones on the substrate 400 may be reduced or minimized by installing the barrier plates 131.

[0066] Hereinafter, embodiments of a method of depositing an organic film by using the organic film deposition apparatus 100, including the first and second blocking members 160 and 170, according to embodiments of the present invention will be described in detail.

[0067] FIGS. 4 through 11 are cross-sectional views for illustrating a method of manufacturing an organic light emitting display device by using the organic film deposition apparatus 100 described above, according to an embodiment of the present invention.

[0068] Referring to FIGS. 4 to 11, the first and second blocking members 160 and 170 of the organic film deposition apparatus 100 are disposed (or arranged) to screen the first and second non-deposition regions 401 and 402 of the substrate 400 and prevent the deposition material 115 from being deposited on the first and second non-deposition regions 401 and 402, wherein the first blocking member 160 is movable along with the substrate 400, and the second blocking member 170 having an open mask structure is held in a fixed position.

[0069] For example, an anode pattern or a cathode pattern is formed at edge regions of the substrate 400, and may be used as a terminal for product testing or manufacturing. However, if an organic film is deposited on the edge regions (e.g., the first and second non-deposition regions 401 and 402) of the substrate 400, the anode or cathode may not function properly. Thus, it is desirable to avoid deposition of organic material on the first and second non-deposition regions 401 and 402 of the substrate 400. As described above, however, since deposition is performed in a scanning manner while the substrate 400 is moved relative to the organic film deposition apparatus 100, it is not easy to prevent the organic material from being deposited on the first and second non-deposition regions 401 and 402 of the substrate 400.

[0070] As such, in order to prevent or reduce deposition of the organic material on the first and second non-deposition regions 401 and 402 of the substrate 400, the organic film deposition apparatus 100 includes the first and second blocking members 160 and 170 disposed (or arranged) to screen the edge regions of the substrate 400.

[0071] Referring to FIG. 4, the first blocking member 160 is located to be spaced apart from the substrate 400, for example, spaced apart from a surface of the substrate 400 facing the deposition source 110. The second blocking member 170, which has an open mask shape, is located between the first blocking member 160 and the substrate 400, and is held in a fixed position relative to the moving substrate 400. The first blocking member 160 may have a flat planar shape, and the second blocking member 170 may have an open mask shape, like a window frame, for example.

[0072] As described above, deposition may be continuously performed while the substrate 400, which is located so as to face the organic film deposition apparatus 100, is moved in a Y-axis direction. In other words, deposition is performed in a scanning manner while the substrate 400 is moved in a direction of arrow A in FIG. 4. The first blocking member 160 is held in a fixed position overlapping with a first region 171 of the second blocking member 170 until the first non-deposition region 401 of the substrate 400 is moved over the first blocking member 160.

[0073] The first blocking member 160 starts moving along with the substrate 400 from a moment when the first non-deposition region 401 of the substrate 400 has reached and overlapped with the first blocking member 160, as illustrated in FIGS. 5 and 6.

[0074] The first blocking member 160 may be moved in a direction of arrow B (see FIG. 6) at the same speed as that of the substrate 400. Thus, the relative position of the first blocking member 160 with respect to the substrate 400 may remain the same or substantially the same. That is, the first blocking member 160 may remain in a blocking position relative to the first non-deposition region 401 of the substrate 400.

[0075] When the substrate 400 has moved in the direction of arrow A and the first non-deposition region 401 of the substrate 400 has been positioned to face the deposition source 110, the first blocking member 160 is located between the barrier plate assembly 130 and the patterning slit sheet 150, blocking the deposition material 115 that is vaporized from the deposition source 110 from being deposited on the first non-deposition region 401 of the substrate 400.

[0076] Then, as illustrated in FIG. 7, when the first non-deposition region 401 of the substrate 400 and the first blocking member 160 have passed a deposition zone where deposition takes place and reached a position overlapping with a second region 172 of the second blocking member 170, the first blocking member 160 stops moving and stays in that position, while the substrate 400 continues moving in the direction of arrow A at the same speed.

[0077] Then, as illustrated in FIG. 8, the first blocking member 160 is moved in a direction of arrow C back to the initial position to block the deposition material 115 from being deposited on the second non-deposition region 402 of the substrate 400. At this stage the first blocking member 160 is moved at a higher speed than the substrate 400 to be able to timely reach the first region 171 of the second blocking member 170.

[0078] If the second blocking member 170 is not present, a thickness of an organic film deposited on the substrate 400 while the first blocking member 160 is positioned as illustrated in FIG. 7 may differ from a thickness of an organic film deposited on the substrate 400 while the first blocking member 160 is moved in the direction of arrow C as illustrated in FIG. 8. This may reduce thickness uniformity of the organic film deposited on the substrate 400.

[0079] For example, while being in the position illustrated in FIG. 7, the first blocking member 160 may effectively block the deposition material 115 vaporized from the deposition source 110 so as not to be deposited on a region of the substrate 400 that has passed the deposition zone where the deposition source 110 is placed. On the other hand, while the first blocking member 160 is being moved in the direction of arrow C as illustrated in FIG. 8, the deposition material 115 vaporized from the deposition source 110 may still be deposited on the region of the substrate 400 that has passed the deposition zone where the deposition source 110 is placed, unnecessarily increasing the thickness of the organic film deposited on that region of the substrate 400. That is, the thickness of the organic film deposited on the substrate 400 may vary according to positions of the first blocking member 160.

[0080] To address this drawback, the organic film deposition apparatus 100 according to an aspect of the present invention further includes the second blocking member 170 having an open mask shape, which is held in a fixed position, in addition to the first blocking member 160 that is movable along with the substrate 400. The second blocking member 170 ensures the organic film deposited on the substrate 400 to have a constant thickness (or a substantially constant thickness) irrespective of the position of the first blocking member 160. The second blocking member 170 effectively blocks the deposition material 115 vaporized from the deposition source 110 from being deposited on the region of the substrate 400 that has passed through the deposition zone where the deposition source 110 is placed, irrespective of the position of the first blocking member 160.

[0081] The second blocking member 170 may include at least one material selected from the group consisting of carbon (C), iron (Fe), chrome (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), stainless steel (SUS), an Invar alloy, an Inconel alloy, a Kovar alloy, and combinations thereof. However, any suitable material may be used for the second blocking material 170. In some embodiments, the second blocking member 170 may include an Invar alloy, which undergoes less thermal expansion and is less crushed than stainless steel (SUS). Invar alloys may almost constantly maintain tension even at high temperatures, and are unlikely to interfere with the first blocking member 160.

[0082] As described above, according to aspects of one embodiment of the present invention, the organic film deposited on the substrate 400 may have a more uniform thickness.

[0083] Next, as illustrated in FIGS. 9 and 10, while the first blocking member 160 is in the position overlapping with the first region 171 of the second blocking member 170, once the substrate 400 has moved for the second non-deposition region 402 of the substrate 400 to reach above and overlap with the first blocking member 160, the first blocking member 160 starts moving along with the substrate 400.

[0084] The first blocking member 160 may be moved in a direction of arrow D (e.g., see FIG. 10) at the same speed as that of the substrate 400. Thus, the relative position of the first blocking member 160 with respect to the substrate 400 may remain the same or substantially the same. That is, the first blocking member 160 may remain in a blocking position relative to the second non-deposition region 402 of the substrate 400.

[0085] When the substrate 400 has moved in the direction of arrow A and the second non-deposition region 402 of the substrate 400 has been positioned to face the deposition source 110, the first blocking member 160 is located between the barrier plate assembly 130 and the patterning slit sheet 150, blocking the deposition material 115 vaporizing from the deposition source 110 from being deposited on the second non-deposition region 402 of the substrate 400.

[0086] Then, as illustrated in FIG. 11, when the second non-deposition region 402 of the substrate 400 and the first blocking member 160 have passed the deposition zone where deposition takes place and reached a position overlapping with the second region 172 of the second blocking member 170, the first blocking member 160 stops moving and stays in that position, while the substrate 400 continues moving in the direction of arrow A at the same speed.

[0087] As described above, according to aspects of one embodiment of the present invention, the organic film deposited on the substrate 400 may have a more uniform thickness.

[0088] FIG. 12 is a schematic perspective view of an organic film deposition apparatus 900 according to another embodiment of the present invention.

[0089] Referring to FIG. 12, an organic film deposition apparatus 900 according to one embodiment includes a deposition source 910, a deposition source nozzle unit 920, a patterning slit sheet 950, a first blocking member 960, and a second blocking member 970.

[0090] For example, the deposition source 910 includes a crucible 912 that is filled with a deposition material 915, and a heater 911 that heats the crucible 912 to vaporize the deposition material 915, which is contained in the crucible 912, so as to move the vaporized deposition material 915 toward the deposition source nozzle unit 920. The deposition source nozzle unit 920, which has a planar shape, is located at a side of the deposition source 910. The deposition source nozzle unit 920 includes a plurality of deposition source nozzles 921 arranged in the Y-axis direction (e.g., located at equal or regular intervals along the Y-axis direction). The patterning slit sheet 950 and a frame 955 are further located between the deposition source 910 and the substrate 400. The patterning slit sheet 950 includes a plurality of patterning slits 951 arranged in the X-axis direction (e.g., located at equal or regular intervals along the X-axis direction) that is perpendicular to the Y-axis direction. In addition, the deposition source 910 and the deposition source nozzle unit 920 may be coupled or connected to the patterning slit sheet 950 by a connection member 935.

[0091] The organic film deposition apparatus 900 illustrated in FIG. 12 differs from the organic film deposition apparatus 100 illustrated in FIG. 1 in terms of the arrangement of the plurality of deposition source nozzles in the deposition source nozzle unit 920, which will now be described in detail.

[0092] The deposition source nozzle unit 920 is located at a side of the deposition source 910, and in particular, at the side of the deposition source 910 facing the substrate 400. The deposition source nozzle unit 920 includes a plurality of deposition source nozzles 921 arranged at equal intervals (e.g., regular intervals) in the Y-axis direction, i.e., a scanning direction of the substrate 400. The deposition material 915 that is vaporized in the deposition source 910, passes through the deposition source nozzle unit 920 towards the substrate 400. As described above, when the deposition source nozzle unit 920 includes the plurality of deposition source nozzles 921 arranged in the Y-axis direction, that is, in the scanning direction of the substrate 400, the size of a pattern formed of the deposition material discharged through the patterning slits 951 of the patterning slit sheet 950 depends on the size of one of the deposition source nozzles 921 (since there is only one line of deposition nozzles in the X-axis direction), and thus no shadow zone may be formed on the substrate 500. In addition, since the plurality of deposition source nozzles 921 are arranged in the scanning direction of the substrate 400, even when there is a difference in flux between the deposition source nozzles 921, the difference may be compensated for and deposition uniformity may be maintained constantly or substantially constantly.

[0093] In the organic film deposition apparatus 900 according to one embodiment of the present invention, the first blocking member 960 is movable along with the substrate 400 and is disposed (or arranged) to screen either the first non-deposition region 401 and/or the second non-deposition region 402 of the substrate 400. The second blocking member 970 having an open mask structure is held in a fixed position. The first and second blocking members 960 and 970 prevent the deposition material 915 from being deposited on first and second non-deposition regions 401 and 402 of the substrate 400, and at the same time, improve thickness uniformity of an organic film deposited on the substrate 400. This structure is described in the embodiment with reference to FIG. 4, and thus a detailed description thereof will not be repeated here.

[0094] As described above, with a thin film deposition apparatus according to embodiments of the present invention and a method of manufacturing an organic light-emitting display device according to embodiments of the present invention by using the thin film deposition apparatus, large-sized display devices may be manufactured on a mass scale in a simple fashion. In addition, the thin film deposition apparatus and the organic-light-emitting display device may be easily manufactured, may improve manufacturing yield and deposition efficiency, and may allow deposition materials to be reused.

[0095] While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims and their equivalents.