Magnetic heads for perpendicular recording and magnetic recording disk apparatus using the same

[0001] 1. Field of the Invention

[0002] The present invention relates to the structure of a main pole of a magnetic head for perpendicular recording, a process of manufacturing the same and a magnetic recording disk apparatus using the same.

[0003] 2. Description of Related Art

[0004] One possible approach to increasing the areal recording density of a magnetic disk is to use a perpendicular recording method instead of the conventional in-plane magnetic recording method. In magnetic perpendicular recording, the recorded magnetization formed in a recording medium is perpendicular to the film face. This recording method offers an advantage that microscopic recorded magnetization is thermally stable. A magnetic head for perpendicular recording may be a write/read dual element head which should use a magnetoresistive effect type head as a read head and a single-pole type head consisting of a main pole and an auxiliary pole, as a write head. In the single-pole type head, a magnetic field necessary for recording is generated from the main pole which is tailored to the recording track width. For this reason, the shape of the main pole on the head surface facing the recording medium largely affects the distribution of recorded magnetization. It can be demonstrated, for example, by comparison between the case of FIG. 1A and the case of FIG. 1B. In the case of FIG. 1A where a main pole 12 is a rectangle which is determined by the track width and pole thickness, and the angle formed by the direction perpendicular to a recording track 11 and the main pole's cross-track direction, namely what is called a yaw angle, is 0 degree, writing (recording) is made depending on the width of the downstream edge of the main pole in a medium moving direction 15 and thus no side writing occurs. On the other hand, in the case of FIG. 1B where there is a yaw angle, a considerable amount of side writing 13 will occur depending on the main pole edge in the direction of thickness. As an attempt to prevent such side writing, a trapezoidal main pole 12 has been used as illustrated in FIG. 1C and FIG. 1D. In other words, the main pole s downstream edge in the medium moving direction 15 and its neighboring side edge crossing it form an acute angle. Reference to this type of main pole has been made, for example, in JP-B No.286842/2000 and Digests of PMRC 2000 (2000) pp.131-132.

[0005] The above prior art, which is intended to decrease the amount of side writing in a situation that there is a yaw angle, has the following problem: since the pole thickness is smaller at the track edge, the head's recording performance is lower in an area nearer to the track edge and thus the effective track width decreases. This is a barrier to improvement in track density.

[0006] One object of the present invention is to increase the recording performance at the track edge while suppressing the amount of side writing, thereby preventing the effective track width from decreasing. Another object of the present invention is to provide a magnetic recording disk apparatus with increased track density which uses the above-mentioned magnetic head.

[0007] In order to solve the above problem, the main pole according to the present invention has the following profile on the air bearing surface: it is composed of a first portion and a second portion where the length of the first portion in the cross-track direction continuously increases in the direction from the upstream side in the medium moving direction (namely the leading edge) to the downstream side in the medium moving direction (namely the trailing edge); the second portion 42 is located on the side of the trailing edge of the first portion; and the length in the cross-track direction at the point of contact between the first and second portions is equal to or shorter than the second portion's length in the cross-track direction at the trailing edge.

[0008] The use of a magnetic head having a main pole with the above-mentioned profile increases the recording performance at the track edge while suppressing the amount of side writing, thereby preventing the effective track width from decreasing. Furthermore, it is possible to prove a magnetic recording disk apparatus which uses a magnetic head with a main pole according to the present invention and thus improves the track density.

[0009] FIG. 1A is a schematic diagram showing a rectangular main pole and a recording track in the prior art; FIG. 1B is a schematic diagram showing a main pole with a yaw angle and a recording track in the prior art; FIG. 1C is a schematic diagram showing a trapezoidal main pole and a recording track in the prior art; and FIG. 1D is a schematic diagram showing a trapezoidal main pole with a yaw angle and a recording track in the prior art;

[0010] FIG. 2A shows a magnetic recording disk apparatus according to an embodiment of the present invention where the yaw angle is 0 degree and FIG. 2B shows a magnetic recording disk apparatus according to an embodiment of the present invention where the yaw angle is not 0 degree;

[0011] FIG. 3 is a schematic diagram showing the flow of a magnetic flux in the process of recording with a magnetic disk for perpendicular recording;

[0012] FIG. 4A is a schematic diagram showing a main pole and a recording track according to an embodiment of the present invention; and FIG. 4B is a schematic diagram showing a main pole with a yaw angle and a recording track according to an embodiment of the present invention;

[0013] FIG. 5 shows the structure of a main pole according to an embodiment of the present invention;

[0014] FIG. 6 is a graph showing the magnetic field distribution according to an embodiment of the present invention;

[0015] FIG. 7 is a graph showing the magnetic field distribution according to an embodiment of the present invention;

[0016] FIG. 8 is a schematic diagram showing the structure of a main pole according to an embodiment of the present invention;

[0017] FIG. 9 is a graph showing the magnetic field distribution according to an embodiment of the present invention;

[0018] FIG. 10 is a graph showing magnetic field gradient variation with respect to the magnetic field according to an embodiment of the present invention;

[0019] FIG. 11 is a graph showing the magnetic field distribution according to an embodiment of the present invention;

[0020] FIG. 12 is a graph showing dependency of the magnetic field on the film thickness according to an embodiment of the present invention;

[0021] FIG. 13 is a graph showing dependency of side writing on the film thickness according to an embodiment of the present invention;

[0022] FIG. 14 is a schematic diagram showing the structure of a main pole according to an embodiment of the present invention;

[0023] FIG. 15A shows an inorganic insulation film in the main pole manufacturing process according to the present invention; FIG. 15B shows a resist pattern formed on the inorganic film in the main pole manufacturing process; FIG. 15C shows anisotropic etching done on the inorganic insulation film in the main pole manufacturing process; FIG. 15D shows taper etching in the main pole manufacturing process; FIG. 15E shows removal of the resist in the main pole manufacturing process; FIG. 15F shows formation of a magnetic film in the main pole manufacturing process; and FIG. 15G shows a main pole formed on a planarized magnetic film in the main pole manufacturing process;

[0024] FIG. 16A shows an inorganic insulation film in the main pole manufacturing process according to the present invention; FIG. 16B shows a resist pattern formed on the inorganic film in the main pole manufacturing process; FIG. 16C shows anisotropic etching done on the inorganic insulation film in the main pole manufacturing process; FIG. 16D shows taper etching in the main pole manufacturing process; FIG. 16E shows removal of the resist in the main pole manufacturing process; FIG. 16F shows formation of a magnetic film in the main pole manufacturing process; FIG. 16G shows dishing of the magnetic film in the main pole manufacturing process; FIG. 16H shows formation of a magnetic film in the main pole manufacturing process; and FIG. 16I shows planarization of the magnetic film to obtain a main pole in the main pole manufacturing process;

[0025] FIG. 17A shows an inorganic insulation film in the main pole manufacturing process according to the present invention; FIG. 17B shows a resist pattern formed on the inorganic film in the main pole manufacturing process; FIG. 17C shows anisotropic etching done on the inorganic insulation film in the main pole manufacturing process; FIG. 17D shows taper etching in the main pole manufacturing process; FIG. 17E shows removal of the resist in the main pole manufacturing process; FIG. 17F shows formation of a magnetic film in the main pole manufacturing process; FIG. 17G shows dishing of the magnetic film in the main pole manufacturing process; FIG. 17H shows formation of a magnetic film in the main pole manufacturing process; and FIG. 17I shows planarization of the top face of the magnetic film to obtain a main pole in the main pole manufacturing process;

[0026] FIG. 18 shows a magnetic recording disk apparatus according to an embodiment of the present invention; and

[0027] FIG. 19 shows a magnetic head slider according to an embodiment of the present invention.

[0028] (Embodiment 1)

[0029] FIG. 18 is a schematic view showing a magnetic recording disk apparatus as an embodiment of the present invention. A slider 183 is fixed at the tip of a suspension arm 182 supported by a rotary actuator 181. There is a supporting member called gimbals (not shown) at the tip of the suspension arm 182. The slider is fixed through the gimbals to the suspension arm. Data is written to or read from a medium for perpendicular recording 186 which rotates in an indicated rotational direction 185 through a magnetic head element 184 provided at the tip of the slider. The recording head element 184 uses a single-pole type head for writing and a magnetoresistive effect head for reading. As the rotary actuator 181 rotates, the head element 184 is moved to a position with a different radius on the disk. In this process, a concentric recording track 187 is formed on the medium. The radius difference between a recording track and one adjacent to it is track pitch T. As illustrated in FIG. 2A and FIG. 2B, the angle formed by the head and a recording track, namely a yaw angle 28, varies depending on the radius (track position). The maximum yaw angle is determined by the distance between the rotary actuator's rotational axis center and the magnetic head, the distance between the rotary actuator's rotational axis center and the magnetic disk medium's rotational center, and the radius of a magnetic disk medium recording area. FIG. 2A shows a case that the yaw angle is 0 degree and FIG. 2B shows a case that the yaw angle is not 0 degree.

[0030] FIG. 3 is a schematic diagram showing the flow of a magnetic flux between the head and medium in the perpendicular recording process. A recording (writing) head which is composed of a main pole 31, an auxiliary pole 32 and a coil 33 is facing a perpendicular recording medium having a recording layer 34 and a soft magnetic under layer 35. As a current is applied to excite the coil 33, a magnetic field is perpendicularly generated between the tip of the main pole and the soft magnetic under layer 35 so that recording is made in the recording layer 34 of the perpendicular recording medium. The magnetic flux which has reached the soft magnetic under layer 35 goes back to the auxiliary pole 32, making up a magnetic circuit. Here, the recording magnetic field distribution depends on the shape of the main pole. It can be understood from the figure that writing is made through the main pole's end which is on the downstream side in the medium moving direction 36. On the other hand, reading is made through a magnetoresistive effect element 38 located between the auxiliary pole 32 and a bottom shield 37.

[0031] FIGS. 4A and 4B schematically show the shape of the magnetic head main pole's surface facing the medium and a recording track according to this embodiment. FIG. 4A shows a case that the yaw angle is 0 degree and FIG. 4B is a case that the yaw angle is not 0 degree.

[0032] As illustrated in the figures, the main pole according to the present invention has the following profile on the air bearing surface: it is composed of a first portion 41 and a second portion 42 where the length of the first portion 41 in the cross-track direction continuously increases from the leading edge to the trailing edge, the second portion 42 is located on the side of the trailing edge of the first portion, and the length in the cross-track direction at the point of contact between the first and second portions, w, is equal to or shorter than the second portion's length in the cross-track direction at the trailing edge. The rate of change in the second portion's length in the cross-track direction, from the leading edge to the trailing edge, is different from the rate of change in the first portion's length in the cross-track direction, from the leading edge to the trailing edge.

[0033] It is desirable that the relation of xs be satisfied where x denotes the angle formed by the normal to the second portion's trailing edge and the first portion's side edge on the track edge side and s denotes the maximum angle (what is called a yaw angle) formed by the second portion's trailing edge and the direction perpendicular to the medium moving direction. Regarding the thickness t of the second portion, preferably the relation of t0.25T/(sin(s)) should be satisfied where T denotes a track pitch, or the distance between the center of the recording track and the center of a track adjacent to that track.

[0034] In this embodiment, the main pole is composed of two portions: the first portion 41, which is on the upstream side in the medium moving direction 44, has a width which continuously increases from the leading edge to the trailing edge and the first portion's thickness is 350 nm and its trailing side width w is 250 nm. The second portion 42, which is on the downstream side in the medium moving direction 44, has the same width w as the trailing side width of the first portion 41 and thus its width is constant from the leading edge to the trailing edge. In other words, the second portion's length in the cross-track direction is constant from the leading edge to the trailing edge and therefore the main pole's length in the cross-track direction discontinuously changes from the first portion's leading edge to the (main pole) trailing edge. More specifically, as shown in FIGS. 4A and 4B, because the first portion's length in the cross-track direction continuously increases from its leading edge to its trailing edge, its rate of change in the length in the cross-track direction is not zero but a fixed value. On the other hand, the second portion's length in the cross-track direction is constant and its rate of change in the length in the cross-track direction is zero. The angle x formed by the normal to the second portion's trailing edge and the first portion's side edge on the track edge side is 10 degrees. The maximum yaw angle in the magnetic recording disk apparatus used in this embodiment is 10 degrees. It is equal to the above-said angle x. In this embodiment, the second portion's thickness t is 100 nm so that the relation of t0.25T/(sin(s)) is satisfied when the maximum yaw angle s is 10 degrees, and track pitch T is 300 nm.

[0035] The cross sectional area of the main pole is constant from the surface facing the medium to the point of distance Ly along the normal to this surface in the direction towards the pole inside; when the distance from the surface exceeds Ly, the cross sectional area increases. The relation of Ly1Ly2 should be satisfied where Ly1 represents Ly for a film constituting the first portion and Ly2 represents Ly for a film constituting the second portion. In order to obtain a larger magnetic field, the saturation magnetic flux density of the film constituting the first portion, Bs1, should be larger than that of the film constituting the second portion, Bs2. In order to obtain a larger magnetic field gradient, Bs2 for the film constituting the second portion should be larger than Bs1 for the film constituting the first portion.

[0036] Referring to FIG. 5, in this embodiment, the width w of the main pole is constant from the surface facing the medium to the point of distance Ly along the normal to this surface in the direction towards the pole inside; when the distance from the surface exceeds Ly, the width increases. Here, the first portion and the second portion have the same distance Ly, in this case, 500 nm. The first portion and the second portion have the same saturation magnetic flux density Bs, in this case, 1.6T. FIG. 6 shows a magnetic field strength distribution on a line along the track center at a distance of 30 nm from the head surface, as a result of estimation by computer simulation. For comparison, a similar calculation was made on a magnetic head which has the same structure as the head in this embodiment except the profile of the main pole on the air bearing surface in which it is composed of a single portion with a width continuously increasing from the leading edge to the trailing edge and the thickness of the main pole is 450 nm and the trailing edge width is 250 nm. Also in this case, the angle x formed by the normal to the trailing edge and the side edge crossing the trailing edge is 10 degrees. It has been found that the magnetic field of the head in this embodiment is approx. 5% stronger than that of the head for comparison. This is attributable to the difference in the pole cross sectional area.

[0037] FIG. 7 shows a magnetic field strength distribution on a line at a distance of 120 nm from the track center, namely at the track edge. The graph indicates that the magnetic field of the head in this embodiment is 18% stronger than that of the head for comparison. The magnetic field at the track edge for the head in this embodiment is stronger than that for the head for comparison, so the recording performance at the track edge is higher and thus the effective track width is larger. As a result of calculation, it has been demonstrated that the effective track width for the head in this embodiment is 243 nm and that for the head for comparison is 225 nm. The head in this embodiment provides an increased track width and thus improves the S/N ratio, thereby ensuring that the magnetic recording disk apparatus in this embodiment operates with a prescribed track density.

[0038] (Embodiment 2)

[0039] A second embodiment concerns a magnetic recording disk apparatus which is similar to the one according to the first embodiment though it has a track pitch T of 230 nm and a maximum yaw angle s of 13 degrees. FIG. 8 schematically shows the profile of the main pole of the single-pole head used in the second embodiment on the air bearing surface. In this embodiment, the trailing edge width of a first portion 81, which continuously increases from the leading edge to the trailing edge, is 190 nm. The thickness of the first portion is 350 nm. In its second portion, which is on the side of the trailing edge of the first portion, there is a slight width increase from the leading edge to the trailing edge. Concretely, the width of the leading edge of the second portion is 190 nm and that of its trailing edge is 200 nm. Also in this case, the change in the second portion's length in the cross-track direction from the leading edge to the trailing edge is discontinuous with the change in the first portion's length in the cross-track direction from the leading edge to the trailing edge. The thickness t of the second portion 82 is 50 nm. The angle x formed by the normal to the second portion's trailing edge and the first portion's side edge on the track edge side is 15 degrees. In this embodiment, the first portion 81 is nearly triangular. Regarding length Ly along which the pole width w is constant, Ly1 for the first portion is 220 nm and Ly2 for the second portion is 500 nm. In this embodiment, the saturation magnetic flux density Bs1 for the film as the first portion is 1.6T and the saturation magnetic flux density Bs2 for the film as the second portion is 2.0T. For comparison, a similar calculation was made on a magnetic head in which Bs for the first portion and the second portion is 1.6T. FIG. 9 shows a magnetic field strength distribution on a line along the track center at a distance of 30 nm from the head surface, as a result of estimation by computer simulation. It is obvious from the graph that the magnetic field strength for both the heads is almost equal.

[0040] FIG. 10 shows a magnetic field distribution on the downstream side in the medium moving direction where the horizontal axis represents the magnetic field and the vertical axis represents the magnetic field gradient. The graph indicates that the absolute value of the magnetic field gradient for the head with 2.0T as Bs2 for the second portion film is larger than the other head. This means that a larger magnetic field gradient leads to a better S/N ratio in writing/reading. In comparison of S/N ratio in writing between the two heads, the head with 2.0T as Bs2 for the second portion film is 1.3 dB better in S/N ratio than the head with 1.6T as Bs2 for the second portion film.

[0041] (Embodiment 3)

[0042] An experiment was conducted on a magnetic head which is the same as that in the first embodiment except that Bs1 for the first portion film is 2.0T and Bs2 for the second portion film is 1.6T. FIG. 11 shows a magnetic field strength distribution on a line along the track center at a distance of 30 nm from the head surface, as a result of estimation by computer simulation. For comparison, a similar calculation was made on a magnetic head in which Bs for the first portion and the second portion is 1.6T. It is obvious from the graph that the magnetic field for the head with 2.0T as Bs for the first portion film is approx. 15% stronger than the other head. This means that it is possible to write data even on a recording medium with a large coercive force adequately. It has been demonstrated that when overwriting at a recording density of 700 kFCI is done on a record made on a medium with a coercive force of 4.7 kOe at a recording density of 88 kFCI using the head according to this embodiment, an overwrite of 32 dB is achieved.

[0043] (Embodiment 4)

[0044] In heads which are similar to the head according to the first embodiment, the second portion thicknesses t are 100 nm, 200 nm and 300 nm. In this fourth embodiment, the maximum yaw angle s is 15 degrees. The angle x formed by the normal to the second portion's trailing edge and the first portion's side edge on the track edge side is 17 degrees. When track pitch T is 300 nm, the relation of t0.25T/(sin(s)) is satisfied provided that t is 100 nm or 200 nm. FIG. 12 shows estimation of maximum magnetic field strength on a line along the track center at a distance of 30 nm from the head surface. The graph indicates that the thicker the second portion is, the stronger the magnetic field is. FIG. 13 shows estimation of side writing with these heads. Assuming that the maximum allowable amount of side writing for the apparatus is 25% of the track pitch, the maximum allowable side writing for track pitch T of 300 nm is 75 nm. Therefore, when the maximum yaw angle s is 15 degrees, the second portion's maximum allowable thickness is 290 nm (0.25T/(sin(s)). In the case of the head with thickness t of 300 nm, the amount of side writing is large and off-track margin is insufficient, so it is impossible to attain track pitch T of 300 nm. This means that the present invention is effective when the relation of t0.25T/(sin(s)) is satisfied.

[0045] (Embodiment 5)

[0046] FIG. 14 shows the shape of the magnetic head main pole's surface facing the medium according to this fifth embodiment. The main pole is composed of three portions. In a first portion 141, which is on the side of the leading edge of the pole, the width increases from the leading edge to the trailing edge continuously. The thickness of the first portion is 350 nm. The trailing edge width of the first portion is 190 nm.

[0047] The leading edge width of a second portion 142 which is on the trailing side of the first portion 141 is the same as the trailing edge width of the first portion and there is a slight increase in the width from the leading edge to the trailing edge. The thickness t2 of the second portion is 50 nm. Further, a third portion 143 which is on the trailing side of the second portion has the same width as the trailing edge width of the second portion 142 and the width is constant (200 nm) from the leading edge to the trailing edge. The thickness t3 of the third portion is 50 nm. In this case, the rate of change in the length in the cross-track direction from the leading edge to the trailing edge is discontinuous (changes) at the point of contact between the first and second portions and the point of contact between the second and third portions. The angle x formed by the normal to the third portion's trailing edge and the first portion's side edge on the track edge side is 15 degrees. When the maximum yaw angle s is 13 degrees, the third portion's track width w is 200 nm, and track pitch T is 230 nm, the relation of t0.25T/(sin(s)) is satisfied where t represents the sum of the thicknesses of the second and third portions.

[0048] Where Ly1, Ly2, and Ly3 represent Ly for the first portion, the second portion, and the third portion respectively, Ly1, Ly2, and Ly3 are all 500 nm in this embodiment. The first portion film and the second portion film have the same saturation magnetic flux density Bs, in this case 1.8T and Bs for the third portion film is 2.0T. The amount of side writing with this head is as small as approx. 18 nm and the S/N ratio is improved by 0.7 dB as compared to the head according to the second embodiment.

[0049] (Embodiment 6)

[0050] The process of manufacturing the above-mentioned main poles according to the first to fifth embodiments is composed of the following steps: forming a resist pattern on an inorganic insulation film; making a groove with side walls perpendicular to the film plane by anisotropic etching of the inorganic insulation film using the resist pattern as a mask; taper-etching to taper the side walls of the groove; removing the resist pattern; making a magnetic film on the inorganic insulation film including this groove; and planarizing (flattening) the magnetic film by chemical mechanical polishing (CMP) or etching. These steps are taken sequentially.

[0051] The planarizing step may include a step of removing most of the magnetic film so as to make it form a recess in the inorganic insulation film and then making another magnetic film over it and a step of planarizing the magnetic film top face. Alternatively, the process may consist of the following steps: making, on a first inorganic insulation film, a second inorganic insulation film of another material; forming a resist pattern on the second inorganic insulation film; making a groove with side walls perpendicular to the film plane by anisotropic etching of the second inorganic insulation film using the resist pattern as a mask; taper-etching the first inorganic insulation film to taper the side walls of the groove; removing the resist pattern; making a magnetic film over the inorganic insulation film including this groove; removing most of the magnetic film so as to make it form a recess in the inorganic insulation film by chemical mechanical polishing (CMP) or etching; making another magnetic film over it; and planarizing the magnetic film top face. These steps are taken sequentially.

[0052] FIGS. 15A to 15G outline the process of manufacturing a main pole in a magnetic head according to the present invention (it should be noted that the magnification ratios for the figures are different). The process for a reading head is omitted here. FIG. 5B shows a resist pattern 152 formed on an inorganic insulation film 151 (FIG. 15A) . The inorganic insulation film is made of commonly used material Al₂O₃ but it may be made of SiC, AlN, Ta₂O₅, TiC, TiO₂, SiO₂ or the like. A resist pattern is formed by exposure using a KrF excimer laser stepper. In the experiment, we used posi-resist TDUR-P201 available from Tokyo Ohka Kogyo Co., Ltd. When a resist film thickness of 0.7 m was used, a resolution of 0.2 m was attained. FIG. 15C shows that anisotropic etching is done on the inorganic insulation film using the resist pattern as a mask.

[0053] When Al₂O₃ is used, BCl₃ or a mixture of BCl₃ and Cl₂ or a mixture of BCl₃ and Ar may be used as an etching gas. When AlN is used, chlorine gases as mentioned above may be used. When easy-to-etch Ta₂O₅, TiC, TiO₂, SiO₂, SiC or the like is used, fluorine gases such as CHF₃, CF₄, SF₆, and C₄F₈ may be used. The etching depth is 0.2 m. Next, the step of taper etching is taken under different etching conditions (FIG. 15D). When etching Al₂O₃, for example, BCl₃ mixed with CHF₃ may be used. FIG. 15E shows that the resist is removed after etching. FIG. 15F shows that a magnetic film 153 is made over it. When using a plating technique, a plating base film is first made and then electroplating is done. Magnetic materials such as CoNiFe, FeNi, CoFeCu, and FeCo may be used. After making the plating base film, if CMP is to be used for planarizing it, a stopper film for CMP may be made, or if etching is to be done, an etching stopper film may be made, though not shown here. If the film thickness can be controlled adequately during planarizing work, the step of making a stopper film may be omitted.

[0054] For a stopper film for CMP, a single layer film made of C, Ta, Mo, Nb, W, or Cr or an alloy lamination film may be used. In the experiment, we used a stopper film made by sputtering C. C is chemically stable and cannot be chemically polished; if it is mechanically polished, the polishing waste fluid is black, which makes it easy to detect the completion of polishing, thereby improving the controllability of the main pole film thickness.

[0055] For an etching stopper film, precious metals may be used because they cannot undergo reactive ion etching; a single-layer film of Au, Pt, Pd, Ru, Rh, Cu, Ag, Tc, Re, Os or Ir or a lamination film or an alloy film may be used. In addition, Cr, Ni and the like may be used because they cannot undergo reactive ion etching. These types of stopper film may be all produced using a sputtering technique. Next, the step of making a magnetic film is shown in FIG. 15F. The magnetic film can be made using a plating technique or a sputtering technique. When using an electroplating technique, a plating base film must be made before starting electroplating work. When using a sputtering technique, care must be taken not to generate voids in the magnetic film using a sputtering technique with high directivity such as a long throw sputter technique or a collimation sputter technique because the aspect ratio of the groove made through the steps shown in FIGS. 15C, 15D and 15E is large. When using an electroplating technique, Fe₅₅Ni₄₅ with a saturation magnetic flux density of 1.6T or CoNiFe with a saturation magnetic flux density of 2.2T may be used. For the plating base film, a magnetic film whose composition is the same as a plated film or a nonmagnetic film may be used.

[0056] FIG. 15G shows that a main pole 154 is formed on a planarized magnetic film top face. It has been found that when CMP or a similar polishing technique is used and a stopper film is made to stop polishing, it is possible to control the film thickness and completely planarize the top face with an accuracy of not more than 1 nm throughout the groove which corresponds to a track width. In the experiment, a track width of 0.2 m was obtained as in the step of forming a resist pattern as shown in FIG. 15B and the taper angle on the main pole lower side remained 10 degrees as was at the step of FIG. 15D. When using etching for this planarizing step, the following procedure may be used: resist is once coated and etching is done for planarization using a chlorine gas such as BCl₃ or a mixture of BCl₃ and Cl₂ (etch-back) . If that is the case, a stopper film made of any of the above-mentioned precious metals or Ni, Cr or the like may be useful. According to the main pole manufacturing process as defined by this embodiment, there will be little track width fluctuation in the manufacture of many elements, namely a higher track width accuracy in the manufacture will be achieved.

[0057] As discussed above, the main pole manufacturing process according to the present invention reduces the track width fluctuation in the manufacture of many elements resulting in a smaller track width tolerance.

[0058] (Embodiment 7)

[0059] The main pole manufacturing process according to a seventh embodiment uses the same steps (FIGS. 16A to 16F) as the steps of FIGS. 15A to 15F according to the sixth embodiment. However, it also includes additional steps. At the step of FIG. 16G, for example, the acidity of CMP slurry is increased and the magnetic film is dished or recessed from the inorganic insulation film surface. At the step of FIG. 16H, a magnetic film 164 is made, for example, by sputtering. For this purpose, FeCo with a saturation magnetic flux density Bs of 2.4T or a similar material may be used. The use of a material with a high saturation magnetic flux density for the top face permits a steeper magnetic field gradient from the head, thereby improving the recording characteristics. At the step of FIG. 16I, a slurry which is different from the slurry used at the step of FIG. 16G is used to planarize the magnetic film and obtain a main pole 165.

[0060] (Embodiment 8)

[0061] FIGS. 17A to 17I outline the process of manufacturing a main pole in a magnetic head according to the present invention (it should be noted that the magnification ratios for the figures are different). The process for a reading head is omitted here. FIG. 17A shows that on an inorganic insulation film 171, an inorganic insulation film 176 of another material is formed. When the inorganic insulation film 171 is made of Al₂O₃, the inorganic insulation film 176 may be made of, for example, SiO₂. FIG. 17B shows a resist pattern 172 formed on it. FIG. 17C shows that the inorganic insulation film 176 is etched using the resist pattern as a mask. When the inorganic insulation film 176 is made of SiO₂, CHF₃, CF₄ or the like may be used as an etching gas to make the side face vertical. FIG. 17D shows that the inorganic insulation film 171 is etched using, for example, BCl₃ gas. At this step, the side face is tapered by etching. Since the material of the inorganic insulation film 171 is different from that of the inorganic insulation film 176, the profile can be controlled easily using different etching conditions. FIG. 17E shows that the resist pattern 172 is removed. FIG. 17F shows formation of a magnetic film 173. FIG. 17G shows that the magnetic film is dished or recessed from the inorganic insulation film 176 as in FIG. 16G. FIG. 17H shows formation of a magnetic film 174. FIG. 17I shows that the top face of the magnetic film is planarized to obtain a main pole 175.

[0062] (Embodiment 9)

[0063] A ninth embodiment of the present invention concerns a process of manufacturing a single-pole magnetic head which is characterized in that a main pole is manufactured by sequentially taking the following steps: forming a resist pattern on an inorganic insulation film; making a groove with side walls virtually perpendicular to the film plane by anisotropic etching of the inorganic insulation film using the resist pattern as a mask; taper-etching to taper the side walls of the groove; removing the resist pattern; making a magnetic film over the inorganic insulation film including this groove; and planarizing the magnetic film by chemical mechanical polishing (CMP) or etching.

[0064] Alternatively it concerns a process of manufacturing a single-pole magnetic head which is characterized in that a main pole is manufactured by sequentially taking the following steps: forming a resist pattern on an inorganic insulation film; making a groove with side walls virtually perpendicular to the film plane by anisotropic etching of the inorganic insulation film using the resist pattern as a mask; taper-etching to taper the side walls of the groove; removing the resist pattern; making a first magnetic film over the inorganic insulation film including this groove; removing most of the first magnetic film by chemical mechanical polishing (CMP) or etching so as to make it form a recess in the inorganic insulation film; making a second magnetic film over the inorganic insulation film including the groove having the first magnetic film; and planarizing the second magnetic film top face.

[0065] Furthermore, alternatively it concerns a process of manufacturing a single-pole magnetic head which is characterized in that a main pole is manufactured by sequentially taking the following steps: making, on a first inorganic insulation film, a second inorganic insulation film of another material; forming a resist pattern on the second inorganic insulation film; making a groove with side walls virtually perpendicular to the film plane by anisotropic etching of the second inorganic insulation film using the resist pattern as a mask; taper-etching the first inorganic insulation film to taper the side walls of the groove; removing the resist pattern; making a first magnetic film over the inorganic insulation film including this groove; removing most of the magnetic film by chemical mechanical polishing (CMP) or etching so as to make it form a recess in the inorganic insulation film; making a second magnetic film over the inorganic insulation film including the groove having the first magnetic film; and planarizing the second magnetic film top face.

[0066] (Embodiment 10)

[0067] A tenth embodiment of the present invention concerns a magnetic head slider comprising a writing element having a main pole, a magnetic head having a reading element, and a slider having an air inlet end and an air outlet end, the main pole consisting of a first portion and a second portion provided at the air outlet end side of the first portion, where the thickness of the second portion is smaller than that of the first portion and the profile of the first portion on the magnetic head air bearing surface is such that its length in the cross-track direction continuously increases from the air inlet end to the air outlet end.

[0068] The head slider is roughly illustrated in FIG. 19. The magnetic head slider 191 has rails 196 and 197 on its air bearing surface 192 so that it can be floated or borne by an air which flows from an air inlet end 193 to an air outlet end 194 when it is placed on a rotating medium for magnetic perpendicular recording. At the air outlet end side, there are a magnetic head element 195 and electrodes 198 for data input/output with the magnetic head element 195.

[0069] (Embodiment 11)

[0070] An eleventh embodiment of the present invention concerns a head disk assembly comprising a magnetic head having a writing element having a main pole and a reading element, a slider having an air inlet end and an air outlet end, a suspension supporting the slider, a rotary actuator supporting the suspension, and a magnetic disk medium facing the magnetic head, the main pole consisting of a first portion and a second portion provided at the air outlet end side of the first portion, where the thickness of the second portion is smaller than that of the first portion and the profile of the first portion on the magnetic head air bearing surface is such that its length in the cross-track direction continuously increases from the air inlet end to the air outlet end.

[0071] Furthermore, the head disk assembly may be characterized in that the magnetic disk medium has a plurality of recording tracks and the relation of t0.25T/(sin(s)) is satisfied where t represents the thickness of the second portion of the main pole, s the maximum yaw angle and T a track pitch as the distance between the center of a recording track among the plural recording tracks and the center of a track adjacent to that track.

[0072] According to the present invention, a magnetic head for perpendicular recording uses a main pole which is composed of at least two portions where the width of the first portion continuously increases from the upstream side to the downstream side in the medium moving direction, and the width of the second portion is the same as the width of the first portion's downstream edge in the medium moving direction and is almost constant from the upstream side to the downstream side in the medium moving direction so that the amount of side writing is reduced and the recording performance at the track edge is increased, thereby preventing the effective track width from decreasing. The use of a film with a higher saturation magnetic flux density which constitutes the second portion provides a steeper recording magnetic field gradient and thus improves the S/N ratio. Also, the use of a film with a higher saturation magnetic flux density which constitutes the first portion increases the absolute value of recording magnetic field strength and assures satisfactory recording performance for a recording medium with a high coercive force.

[0073] When the main pole manufacturing process according to the present invention is followed, there will be little track width fluctuation in the manufacture of many elements and thus the track width tolerance will be decreased. The invention also provides a magnetic recording disk apparatus with improved track density which uses this type of head.