PROCESS CONDITIONS AND PRECURSORS FOR ATOMIC LAYER DEPOSITION (ALD) OF AL2O3

[0001] 1. Field of the Invention

[0002] This invention relates to semiconductor processing. More particularly, this invention relates to a method of sequential deposition of high-K Al₂O₃ films on a substrate.

[0003] 2. Description of the Related Art

[0004] The semiconductor industry continues to strive for larger production yields while increasing the uniformity of layers deposited on substrates having increasingly larger surface areas. These same factors in combination with new materials also provide higher integration of circuits per unit area of the substrate. High-K dielectrics are an example of new materials currently investigated. These materials are being investigated as a potential replacement for SiO₂ as both gate and DRAM dielectrics. The present and future requirements for SiO₂ in MOS structures relate to thicknesses <5 nm. The equivalent thicknesses may be achieved with higher K materials physically thicker than the SiO₂ layers. The choice of suitable high-K dielectrics is typically directed to materials with relatively large band gaps and high dielectric constants. The band gap of Al₂O₃ is 9 eV, which is considerably larger than that of most high-K materials and comparable to that of SiO₂. Also, the dielectric constant of Al₂O₃ is 9, which is more than two times greater than that of SiO₂. Therefore, Al₂O₃ is a suitable high-K replacement for SiO₂.

[0005] As circuit integration increases, the need for greater uniformity and process control regarding layer thickness rises. As a result, various technologies have been developed to deposit layers on substrates in a cost-effective manner, while maintaining control over the characteristics of the layer. Chemical Vapor Deposition (CVD) is a common deposition process employed for depositing layers on a substrate. CVD is a flux-dependent deposition technique that requires precise control of the substrate temperature and precursors introduced into the processing chamber in order to produce a desired layer of uniform thickness. These requirements become more critical as substrate size increases, creating a need for more complexity in chamber design and fluid flow technique to maintain adequate uniformity.

[0006] Another deposition process that demonstrates superior step coverage is a sequential deposition technique known as Atomic Layer Deposition (ALD). ALD has steps of chemisorption that deposit monolayers of reactive precursor molecules on a substrate surface. A drawback with ALD of Al₂O₃ films is that the deposition rate is much lower than conventional CVD methodologies, in part, because many of the precursors employed are highly viscous or solid. This increases the time required to introduce the precursors into a processing chamber and, thus, processing time.

[0007] Thus, a need exists, to provide an improved technique to form Al₂O₃ films employing sequential deposition techniques, such as Atomic Layer Deposition.

[0008] Disclosed is a method and apparatus for depositing high-K Al₂O₃ films on a substrate disposed in a processing chamber employing liquid precursors having low viscosity. In this manner, the time required to form an Al₂O₃ film using ALD techniques is reduced. The method features sequential flow of aluminum and oxygen precursors into the processing chamber. To that end, the aluminum precursor is chemisorbed onto the wafer surface when it flows into the processing chamber. The non-chemisorbed aluminum precursor is then purged from the processing chamber, followed by introduction of the oxygen precursor. The oxygen precursor reacts with the chemisorbed layer, creating a monolayer of Al₂O₃. Finally, excess oxygen precursor and by-products of the reaction are purged from the processing chamber completing an ALD cycle. To obtain the desired film thickness, multiple ALD cycles are repeated. The apparatus includes features that carryout the steps of the method.

[0009] FIG. 1 is a perspective view of a semiconductor processing system in accordance with the present invention;

[0010] FIG. 2 is a detailed view of processing chambers shown above in FIG. 1;

[0011] FIG. 3 is a detailed cross-sectional view of a memory cell formed on a substrate shown in FIG. 2;

[0012] FIG. 4 is a detailed cross-sectional view of the substrate shown in FIG. 3 during formation of a dielectric layer that will eventually become a gate dielectric layer for transistors associated with the memory cell shown in FIG. 3;

[0013] FIG. 5 is a schematic view showing deposition of a first molecule onto a substrate using sequential deposition techniques in accordance with one embodiment of the present invention;

[0014] FIG. 6 is a schematic view showing formation of an Al₂O₃ layer during deposition of second molecule onto a substrate in accordance with one embodiment of the present invention;

[0015] FIG. 7 is a graphical representation showing the concentration of gases introduced into the processing chamber shown in FIG. 2, and the time in which the gases are present in the processing chamber to deposit the Al₂O₃ layer shown above in FIG. 4, in accordance with one embodiment of the present invention;

[0016] FIG. 8 is a detailed cross-sectional view of an alternate embodiment of a storage capacitor shown in FIG. 3;

[0017] FIG. 9 is a schematic view showing deposition of a first molecule onto a substrate during sequential deposition techniques in accordance with one embodiment of the present invention; and

[0018] FIG. 10 is a schematic view showing formation of an Al₂O₃ layer during deposition of second molecule onto a substrate in accordance with one embodiment of the present invention.

[0019] Referring to FIG. 1, an exemplary wafer processing system includes one or more process systems 12 and 14 disposed in a common work area 16 surrounded by a wall 18. Process systems 12 and 14 are in data communication with a controller 22 that is connected to one or more monitors, shown as 24 and 26. Monitors 24 and 26 typically display common information concerning the process associated with the process systems 12 and 14. Monitor 26 is mounted to the wall 18, with monitor 24 being disposed in the work area 16. Operational control of process systems 12 and 14 may be achieved with use of a light pen, associated with one of monitors 24 and 26, to communicate with controller 22. For example, a light pen 28a is associated with monitor 24 and facilitates communication with the controller 22 through monitor 24. A light pen 28b facilitates communication with controller 22 through monitor 26.

[0020] Referring to both FIGS. 1 and 2, each of process systems 12 and 14 includes a housing 30 having a base wall 32, a cover 34, disposed opposite to the base wall 32, and a sidewall 35, extending therebetween. Housing 30 defines a chamber 36. A pedestal 37 is disposed within processing chamber 36 to support a substrate 42. Pedestal 37 may be mounted to move between the cover 34 and base wall 32, using a displacement mechanism (not shown), but is typically fixed proximate to bottom wall 32. Supplies of processing fluids 38a, 38b, 38c, 39 and 40 are in fluid communication with the processing chamber 36 via a manifold 34a. Process fluid supply 39 consists of a liquid injection assembly having an ampoule 39a in fluid communication with a vaporizer 39b. Ampoule 39a includes a supply of a liquid precursor 39c and is in fluid communication with supply 38c, which contains a carrier gas. Ampoule 39a is in fluid communication with vaporizer 39b via precursor channel 39d to deliver, to processing chamber 36, precursor 39c, with the aid of carrier gas in supply 38c. Ampoule 39a, liquid 39c and channel 39d may be heated by conventional heating methods, e.g., heating tape (not shown). Process fluid supply 40 is an ozonator that produces ozone, which is introduced into processing chamber 36 over ozone channel 40a and is regulated by valve 40b. Regulation of the flow of gases from supplies 38a, 38b, 38c and 39 is effectuated via flow valves 41.

[0021] Depending on the specific process, substrate 42 may be heated to a desired temperature prior to layer deposition via a heater embedded within pedestal 37. For example, pedestal 37 may be resistively heated by applying an electric current from an AC power supply 43 to a heater element 44. Substrate 42 is, in turn, heated by pedestal 37, and can be maintained within a desired process temperature range. The actual temperature, however, is dependent upon the gases employed and the topography of the surface upon which deposition is to occur. A temperature sensor 46, such as a thermocouple, is also embedded in wafer support pedestal 37 to monitor the temperature of pedestal 37 in a conventional manner. For example, the measured temperature may be used in a feedback loop to control the electrical current applied to heater element 44 by the power supply 43, such that the wafer temperature can be maintained or controlled at a desired temperature that is suitable for the particular process application. Pedestal 37 is optionally heated using radiant heat (not shown). A vacuum pump 48 is used to evacuate processing chamber 36 and to help maintain the proper gas flows and pressure inside processing chamber 36.

[0022] Referring to both FIGS. 1 and 2, for processes requiring a plasma, one or more of process systems 12 and 14 include a remote plasma source 49. Although virtually any remote plasma source may be included, an exemplary remote plasma source 49 includes a microwave source 49a, such as a magnetron, coupled via an antenna 49b to a waveguide system 49c, and a plasma applicator 49d. Defining a volume therein, plasma applicator 49d includes a gas inlet 49e and an outlet 49f. Gas inlet 49e may be coupled to a gas source, such as source 49g via a supply line 49h having a valve 49i to control the rate of gas input to gas inlet 49e from gas source 49g.

[0023] Referring to FIGS. 1 and 3, one of process systems 12 and 14, discussed above may operate to form, on substrate 42, a layer of Al₂O₃ in accordance with the present invention. For exemplary purposes, the present invention is discussed with respect use of Al₂O₃ as a dielectric layers during the fabrication of memory devices.

[0024] An exemplary memory device includes a DRAM memory cell 50 shown as being defined between two spaced apart field oxide regions, FOX, that may be formed on the substrate employing any known technique, such as a LOCOS technique. Formed into substrate 42 between field oxide regions FOX are a plurality of spaced-apart diffusion regions 52a, 52b and 52c. Gate structures 53 and 54 are disposed between adjacent diffusion regions 52a, 52b and 52c and include a gate electrode 53a and 54a with gate dielectric 53b and 54b being disposed between gate electrode 53a and 54a and substrate 42. Disposed adjacent to each gate electrode 53a and 54a is an insulating layer 53c and 54c that may be formed from silicon nitride. An insulating layer 55 is also dispersed adjacent to field oxide regions FOX. A pair of storage capacitors 56 and 57 are included, each of which is in electrical communication with one of the diffusion regions 52a and 52c, respectively. To that end, a polysilicon plug 58 and 59 extends from one of these diffusion regions and connects to storage capacitors 56 and 57, respectively. A conductive layer extends from diffusion region 52b toward storage capacitors 56 and 57, forming a bit line electrode 60. A layer 62 of silicon oxide is disposed between storage capacitors 56 and 57 and silicon nitride layers 53c, 54c and 55 and bit line electrode 60.

[0025] As shown, each storage capacitor 56 and 57 is formed from a pair of spaced-apart polysilicon silicon spacers 56a and 57a that are formed with hemispherical grain polysilicon. This increases the surface area of capacitor 56 and 57 due to the rough and bumped surface that results from this layer, effectively increasing the capacitance of the same. Blanketing spacers 56a and 57a is a dielectric layer 56b and 57b. A conductive layer 64 is disposed adjacent to dielectric layers 56b and 57b to complete formation of storage cell capacitors 56 and 57. Conductive layer 64 may be formed from virtually any conductive material, such as tungsten titanium-nitride of doped polysilicon.

[0026] Referring to both FIGS. 3 and 4, with respect to formation of gate dielectric 53b and 54b, substrate 42 typically includes a wafer 42a that may be formed from any material suitable for semiconductor processing, such as silicon. One or more layers, shown as layer 42b, may be deposited on wafer 42a. Layer 42b is formed from p-epitaxial silicon that includes doped regions 42c, separated by shallow trench isolation regions 42d made employing standard processing techniques. Doped regions 42c may be either n-type or p-type, depending upon the desired application.

[0027] Formed adjacent to layer 42b is dielectric layer 42e. In the present example, layer 42e is formed from, Al₂O₃, by sequentially exposing substrate 42 to processing gases to chemisorb monolayers of differing compounds onto substrate 42, discussed more fully below.

[0028] Referring to FIGS. 2 and 5-7, in the present example layer 42e is formed on substrate 42 employing sequential deposition techniques and using an aluminum-containing precursor consisting of AlR_m, where R is a ligand and m is an integer, and an oxygen-containing precursor B. Specifically, the initial surface of substrate 42 presents an active ligand to precursor AlR_m.

[0029] Once the processing pressure and deposition temperature have been established, a carrier gas is introduced into processing chamber 36 during time t₁ before the AlR_m is flowed into processing chamber 36. Specifically, an inert carrier gas is flowed into process chamber 36 during time t₁, for approximately 5 to 8 seconds. The carrier gas is selected from a set of inert gases including Ar, He₂ and N₂. During time t₂, AlR_m precursor is introduced into processing chamber 36 to produce a monolayer AlR_m on substrate 42 via chemisorption reaction. Typically, AlR_m precursor is introduced into processing chamber 36 along with the carrier gas for approximately 0.8 to 1.5 seconds during time t₂. After t₂ has lapsed, the flow of AlR_m process gas terminates, and the flow of the carrier gas continues during time t₃, purging processing chamber 36 of AlR_m precursor and byproducts of the chemisorption reaction. This lasts for approximately 5 to 8 seconds.

[0030] After t₃ has lapsed, the flow of the carrier gas terminates, and the flow of the oxygen containing precursor B is introduced into processing chamber 36 during time t₄ to chemisorb oxygen into the AlR_m layer. Specifically, the R ligand present on layer AlR_m reacts with precursor B so that oxygen is chemisorbed into layers AlR_m . To that end, the oxygen-containing precursor is introduced into processing chamber 36 for approximately 1 to 3 seconds, during time t₄. This releases ligands, R, as well as by-products, z, which move away from substrate 42, thereby concluding one cycle of the sequential deposition technique in accordance with the present invention. In this manner layer 42e consists of a mono-molecular layer of Al₂O₃.

[0031] The flow of precursor B into processing chamber 36 is subsequently terminated. After the flow of precursor B terminates, a flow of the carrier gas may be repeated as discussed with respect to t₁ which purges processing chamber 36 of precursor B, ligands, R, and byproducts of the chemisorption of oxygen reaction. The aforementioned cycles t₂, t₃ and t₄ may be repeated multiple times until Al₂O₃ layer 42e reaches a desired thickness. After Al₂O₃ layer 42e reaches a desired thickness, subsequent processing may occur to form, for example, gate dielectric layers 53b and 54b of gate structures 53 and 54 using standard deposition techniques. The advantage of employing sequential deposition techniques to form gate dielectric layers 53b and 54b is that precise control of the gate dielectric thickness and width may be achieved.

[0032] Formation of an Al₂O₃ layer in this manner is particularly advantageous when creating dielectric layers 56b and 57b for storage capacitor 56 and 57, respectively. As shown, spaced-apart spacers 56a and 57a are covered with hemispherical grain polysilicon, which has a rough, or bumped, surface. Such a surface is very difficult to blanket with a conformal dielectric layer. Depositing a conformal layer is further exacerbated by the aspect ratio of the void defined by either spacers 56a or 57a and a nadir 56c and 57c, respectively. The void defined by these features may provide an aspect ratio of as great as 30:1. However, formation of layers 56b and 57b by sequential deposition of an Al₂O₃ results in the formation of a highly conformal dielectric layer over spacers 56a and 57a.

[0033] An alternate embodiment of the storage capacitors 56 and 57 that may be fabricated in accordance with the present invention is shown in FIG. 8 as crown storage cell capacitor 156. Crown capacitor 156 includes a plurality of spaced-apart polysilicon spacers 156a. A serpentine dielectric layer 156b disposed adjacent to spacers 156a, with a conductive layer 164 disposed to blanket dielectric layer 156b. This configuration increases the surface area of storage capacitor 156, effectively increasing the capacitance per unit volume of the memory cell. Forming dielectric layer 156b from Al₂O₃ with the present invention is advantageous, because of the conformableness of the same. As a result dielectric layer 156b may be disposed adjacent to spacers 156a having aspect ratios as high as 30:1, while still providing adequate step coverage.

[0034] Referring to FIGS. 2, 4 and 7, one example of precursor AlR_m is formed by sublimation of a fluid aluminum-containing compound, Triisopropoxyaluminum, and the oxygen-containing precursor B is selected from a set consisting of ozone and oxygen radicals. To that end, precursor AlR_m is prepared in ampoule 39a by dissolving Triisopropoxyaluminum a Hexane solution to produce a weight ratio of Triisopropoxyaluminum to Hexane that is between 10:90 to 60:40. The use of Triisopropoxyaluminum is beneficial, because it is a nonpyrophoric, resulting in a relative safe compound. However, Triisopropoxyaluminum is a solid making the same difficult to deliver into processing chamber 36 in an efficient manner. The use of hexane is advantageous, because it reduces Triisopropoxyaluminum to provide precursor AlR_m with a viscosity that is less than water, i.e., the precursor is a low viscosity fluid. For purposes of the present invention, low viscosity is defined as a viscosity lower than water. By providing precursor AlR_m with low viscosity, injection system 39 may more rapidly inject precursor AlR_m into processing chamber 36, thereby reducing the time required to form layer 42e.

[0035] The chamber pressure is established to be in a range of 0.1 to 6 Torr, inclusive. The substrate temperature is in the range of 150 C. to 500 C., inclusive. Once the processing pressure and deposition temperature have been reached, the carrier gas is introduced during time t₁. The Triisopropoxyaluminum:Hexane solution is introduced into the processing chamber 36, flowing at a flow rate between 1 to 200 mg/min during time t₂. In this manner, layer AlR_m, is deposited as a mono-molecular layer of Triisopropoxyaluminum:Hexane by a chemisorption reaction. Thereafter, a carrier gas consisting of Argon, Helium or Nitrogen enters processing chamber 36 during time t₃ to purge the non-deposited Triisopropoxyaluminum:Hexane solution that remains therein, as well as the by-products of the chemisorption reaction.

[0036] During time t₄, either oxygen radicals or ozone is flowed into processing chamber as precursor B. The choice of which oxygen-containing precursor to employ is dependent upon many factors, including the topology of the underlying layer. For example, oxygen radicals are chemically more reactive than ozone, resulting in a given volume of oxygen radicals reacting more quickly with the aluminum-containing precursor in layer AlR_m than the same volume of ozone. However, the relative reactive lifetime of oxygen radicals is short, compared to ozone, after which time the radicals combine with an adjacent radical forming a less active oxygen molecule. As a result, ozone may be preferred for applications requiring formation of an Al₂O₃ layer on features, such as the roughened topology of spacers 56a and 57a having an aspect ratios as great as 30:1, shown in FIG. 3. Often, the oxygen radicals recombine before reaching nadir 56c and 57c. This has a tendency to create voids and result in other defects in resulting layer 56b and 57b. A similar situation is present should the oxygen radicals be required to travel long distances over substrate 42 before reacting with the aluminum-containing layer, e.g. 300 mm or larger area glass substrates such as those used for flat-panel displays. One manner in which to reduce recombination of oxygen radicals is to position remote plasma source 49 on cover 34 so as to shorten the distance between remote plasma source 49 and substrate 42. However, it should be understood that remote plasma source 49 may be mounted anywhere desired.

[0037] Referring to both FIGS. 3 and 4, ozone overcomes many of the drawbacks of oxygen radical and affords high conformableness with low defects for features having aspect ratios as high as 30:1. This results from the relatively long reactivity life of ozone, compared to that of oxygen radicals. In addition, ozone is quite useful when having to travel long distances over substrate 42 before reacting with layer AlR_{m .}

[0038] Referring to FIGS. 2, 4 and 7 were oxygen radicals employed as the oxygen-containing precursor, it may be activated by remote plasma source 49. To that end, oxygen gas from supply 49g would be flowed into applicator 49d. Microwave source 49a would generate microwave energy at power levels between 100W and 3000W. The microwave energy would propagate through waveguide 49c and into applicator 49d, dissociating oxygen molecules into a plurality of reactive radicals. The reactive radicals would flow through outlet 49f and into processing chamber 36. In this manner, the oxygen radicals or ions react with the Triisopropoxyaluminum:Hexane monolayer 42e to form a monolayer of Al₂O₃. At this point, an ALD cycle is complete and a surface comprising a monolayer of Al₂O₃ remains upon substrate 42. Were ozone employed as the oxygen-containing precursor, ozone would be introduced into processing chamber 36 at a rate of 300-3000 sccm.

[0039] An alternate precursor chemistry for sequential deposition of Al₂O₃ films in accordance with the present invention includes a liquid aluminum-containing precursor consisting of a Triisopropoxyaluminum and Tetrahydrofuran solution prepared in ampoule 39a at a weight ratio of Triisopropoxyaluminum to Tetrahydrofuran that is between 10:90 to 60:40 to form a low viscosity aluminum-containing precursor. As before, the oxygen-containing precursor is selected from a set consisting of ozone and oxygen radicals, the choice of which is based upon, inter alia, the topology of substrate 42. The use of Tetrahydrofuran is advantageous, because it reduces Triisopropoxyaluminum to a fluid to provide precursor AlR_m with a viscosity that is less than water. As discussed above, this reduces the time required to deposit an aluminum-containing layer.

[0040] The chamber pressure is established to be in a range of 0.1 to 6 Torr, inclusive. The substrate temperature is in the range of 150 C. to 300 C., inclusive. Once the processing pressure and deposition temperature have been reached, the carrier gas is introduced during time t₁. The Triisopropoxyaluminum:Tetrahydrofuran solution is introduced into the processing chamber 36, flowing at a flow rate between 1 to 200 mg/min during time t₂. In this manner, a monolayer of Triisopropoxyaluminum:Tetrahydrofuran is deposited on substrate 42 by a chemisorption reaction. Thereafter, a carrier gas consisting of Argon, Helium or Nitrogen enters processing chamber 36 during time t₃ to purge the non-deposited Triisopropoxyaluminum:Tetrahydrofuran solution that remains therein, as well as the by-products of the chemisorption reaction. This is followed by termination of the flow of the carrier gas and introduction of an oxygen-containing precursor during time t₄. Were ozone employed as the oxygen-containing precursor, ozone would be introduced into processing chamber 36 at a rate of 300-3000 sccm.

[0041] Were oxygen radicals employed as the oxygen-containing precursor, then oxygen gas would be flowed into applicator 49d of remote plasma source 49. Microwave source 49a would generate microwave energy at power levels between 100W and 3000W. The microwave energy would propagate through waveguide 49c and into applicator 49c, dissociating oxygen molecules into a plurality of reactive radicals. The reactive radicals would flow through outlet 49f and into processing chamber 36. In this manner, the oxygen radicals or ions react with the Triisopropoxyaluminum:Tetrahydrofuran monolayer present on substrate 42 to chemisorb oxygen into the monolayer. At this point, an ALD cycle is complete and a surface comprising a monolayer of Al₂O₃ remains upon substrate 42.

[0042] Additional alternate precursor chemistries for sequential deposition of Al₂O₃ films in accordance with the present invention include a liquid aluminum-containing precursor consisting of a solution of Dimethylaluminumhydride and dimethylethylamine, or a solution of Ethylpiperidine and Dimethylaluminumhydride. Unlike Triisopropoxyaluminum, Dimethylaluminumhydride is pyrophoric, but was found to be easily converted to a nonpyrophoric low viscosity fluid by mixing with either Dimethylethylamine or Ethylpiperidine. To that end, Dimethylaluminumhydride is mixed in ampoule 39a at a weight ratio between 10:90 to 60:40 of Dimethylaluminumhydride to either Dimethylethylamine or Ethylpiperidine. The oxygen-containing precursor is selected from a set consisting of ozone and oxygen radicals, the choice being dependent upon, inter alia, substrate 42 topology, as discussed above.

[0043] The chamber pressure is established to be in a range of 0.1 to 4 Torr, inclusive. The substrate temperature is in the range of 100 C. to 300 C., inclusive. Once the processing pressure and deposition temperature have been reached, the carrier gas is introduced during time t₁. The Dimethylaluminumhydride:dimethylethylamine or Ethylpiperidine:Dimethylaluminumhydride solution is introduced into the processing chamber 36, flowing at a flow rate between 1 to 200 mg/min during time t₂. In this manner, a monolayer of either Dimethylaluminumhydride:Dimethylethylamine or Ethylpiperidine:Dimethylaluminumhydride is deposited on substrate 42 by a chemisorption reaction. Thereafter, a carrier gas consisting of Argon, Helium or Nitrogen enters processing chamber 36 during time t₃ to purge the non-deposited Dimethylaluminumhydride:Dimethylethylamine or Ethylpiperidine:Dimethylaluminumhydride solution that remains therein, as well as the by-products of the chemisorption reaction. This is followed by termination of the flow of the inert gas and introduction of an oxygen-containing precursor during time t₄. Were ozone employed as the oxygen-containing precursor, ozone would be introduced into processing chamber 36 at a rate of 300-3000 sccm.

[0044] Were oxygen radicals employed as the oxygen-containing precursor, then oxygen gas would be flowed into applicator 49d of remote plasma source 49. Microwave source 49a would generate microwave energy at power levels between 100W and 3000W. The microwave energy would propagate through waveguide 49c and into applicator 49c, dissociating oxygen molecules into a plurality of reactive radicals. The reactive radicals would flow through outlet 49f and into processing chamber 36. In this manner, the oxygen in the oxygen-precursor reacts with the monolayer present of substrate 42 to chemisorb oxygen therein. At this point, an ALD cycle is complete and a surface comprising a monolayer of Al₂O₃ remains upon substrate 42.

[0045] In yet another embodiment of the present invention, an inexpensive oxygen-containing precursor, Bb_y, is substituted for precursor B, discussed above with respect to FIGS. 5, 6 and 7. The oxygen precursor Bb_y consists of H₂O, shown more clearly in FIG. 8.

[0046] Referring to FIGS. 2 and 7-9, aluminum-containing precursor AlR_m consists of solid AlCl₃ that is contained in ampoule 39a. The chamber pressure is established to be in a range of 0.1 to 500 Torr, inclusive. The substrate temperature is in the range of 100 C. to 300 C., inclusive. Taking advantage of the low sublimation temperature of AlCl₃, the ampoule 39a is heated to approximately 190 C., vaporizing the AlCl₃ to form a low viscosity fluid. Once the processing pressure and deposition temperature have been reached, the carrier gas is introduced during time t₁. The AlCl₃ precursor is introduced into processing chamber 36, flowing at a flow rate between 20-1000 sccm during time t₂.

[0047] As discussed above, the initial surface of substrate 42 presents an active ligand to the AlCl₃ precursor, resulting in layer AlR_m consisting of ACl₃, with the Cl₃ exposed to the processing chamber 36. Thereafter, a carrier gas consisting of Argon, Helium or Nitrogen enters processing chamber 36 during time t₃ to purge the non-deposited AlCl₃ precursor that remains therein and by-products of the chemisorption reaction. This is followed by termination of the flow of the carrier gas and introduction of the oxygen-containing precursor at time t₄. During time t₄, vaporized H₂O is introduced into processing chamber 36 at a rate of 300-3000 sccm. The vaporized H₂O may be introduced as steam through a steam line (not shown). The AlCl₃ reacts with the H₂O, releasing HCL and Cl₂ molecules that move away from substrate 42 and are subsequently pumped from processing chamber 36, leaving a monolayer of Al₂O₃. Specifically, oxygen contained in the water vapor reacts with the AlCl₃ monolayer, disposed on substrate 42, to chemisorb oxygen therein. At this point, a sequential deposition cycle is complete and a surface comprising monolayer 42e of Al₂O₃ remains upon substrate 42. The process proceeds cycle after cycle, until the desired thickness is achieved.

[0048] Water is also employed as the oxygen containing precursor Bb_y in conjunction with either of the solutions of Dimethylaluminumhydride and Dimethylethylamine, or of Ethylpiperidine and Dimethylaluminumhydride, which are prepared as discussed above. To that end, the process conditions mentioned above are employed, with water vapor being flowed into processing chamber 36, in place of either oxygen radicals or ozone and at a rate of 2000 sccm.

[0049] Referring to FIGS. 2 and 4, the aforedescribed processes for depositing the Al₂O₃ layer 42e may be controlled using a computer program product that is executed by the controller 22. To that end, the controller 22 includes a central processing unit (CPU) 70, a volatile memory, such as a random access memory (RAM) 72 and permanent storage media, such as a floppy disk drive for use with a floppy diskette, or hard disk drive 74. The computer program code can be written in any conventional computer readable programming language; for example, 68000 assembly language, C, C, Pascal, Fortran, and the like. Suitable program code is entered into a single file, or multiple files, using a conventional text editor and stored or embodied in a computer-readable medium, such as the hard disk drive 74. If the entered code text is in a high level language, the code is compiled and the resultant compiler code is then linked with an object code of precompiled Windows library routines. To execute the linked and compiled object code the system user invokes the object code, causing the CPU 70 to load the code in RAM 72. The CPU 70 then reads and executes the code to perform the tasks identified in the program.

[0050] Although the invention has been described in terms of specific embodiments, one skilled in the art will recognize that various changes to the reaction conditions, i.e., temperature, pressure, film thickness and the like can be substituted and are meant to be included herein and sequence of gases being deposited. For example, sequential deposition process may have a different initial sequence. The initial sequence may include exposing the substrate the oxygen-containing precursor before the aluminum-containing precursor is introduced into the processing chamber. Additionally, removal of precursors and by-products from the processing chamber may occur by concurrently pumping the processing chamber and flowing a carrier gas therein. In this manner, temperature and pressure fluctuations may be minimized. Further, the oxygen precursor has been discussed with respect to the oxygen radical-ozone molecule dichotomy. It is feasible, however, to employ either molecular oxygen or ozone radicals, as well. Therefore, the scope of the invention should not be based upon the foregoing description. Rather, the scope of the invention should be determined based upon the claims recited herein, including the full scope of equivalents thereof.