Nanogranular magnetic film and electronic component

[0001] The present invention relates to a nanogranular magnetic film and an electronic component.

[0002] Recent mobile devices, such as smartphones and smartwatches, have been required to have a larger display, a larger battery capacity, a smaller size, and less weight at the same time. The requirements of having a larger display and a larger battery capacity are inconsistent with the requirements of having a smaller size and less weight. To achieve these inconsistent requirements, circuit boards have been required to have a smaller size. In particular, power supply circuits, which occupy large areas in the circuit boards, have been required to have a smaller size. Accordingly, inductors included in the power supply circuits are required to have a smaller size.

[0003] One way to reduce the size of the inductors is to enable the power supply circuits to be used at higher frequencies. To enable the power supply circuits to be used at higher frequencies, switching elements included in the power supply circuits are required to be operable at high frequencies.

[0004] In recent years, semiconductors such as GaN and SiC described in Patent Document 1 have been practically used as semiconductors included in the switching elements. For example, as described in Patent Document 2, semiconductors other than silicon have been included in the switching elements.

[0005] Including the semiconductors (e.g., GaN) having excellent high-frequency properties in the switching elements enables the switching elements to operate at high frequencies. As the switching elements have become operable at high frequencies, it has become possible to increase the operating frequency of the power supply circuits, meaning that the power supply circuits have become usable at higher frequencies.

[0006] As the power supply circuits have become usable at higher frequencies, small inductors that can operate at high frequencies and reduce the size of the power supply circuits have been in demand.

[0007] To achieve such a small inductor operable at high frequencies, use of a thin film inductor as the small inductor is effective. The thin film inductor is manufactured by laminating a coil, a terminal, a magnetic film, and an insulating layer or the like on a substrate through semiconductor manufacturing processes. In the thin film inductor, the magnetic film is the magnetic core of the thin film inductor. Thus, it is essential that the magnetic film of the thin film inductor have the requisite properties to enable the thin film inductor to have these properties.

[0008] Patent Document 3 discloses a nanogranular magnetic film having a structure including nano-sized crystals dispersed in an insulating matrix. The nano-sized crystals include mainly a metal simple substance, an alloy, or a compound. Examples of the metal simple substance include a simple substance of Fe, a simple substance of Co, and a simple substance of Ni. Examples of the alloy include an alloy containing at least one selected from the group consisting of Fe, Co, and Ni. Examples of the compound include a compound containing at least one selected from the group consisting of Fe, Co, and Ni.

[0009] Nanogranular magnetic films have a higher saturation magnetic flux density (Bs) than ferrite materials. The nanogranular magnetic films further have a higher specific resistance (ρ) than normal metal materials. For having a high saturation magnetic flux density (Bs) and a high specific resistance (ρ), the nanogranular magnetic films have a high permeability even at high frequencies. Because the nanogranular magnetic films have a high permeability, application of the nanogranular magnetic films to high-frequency thin film components (e.g., thin film inductors) has been under consideration.

[0010] Unfortunately, the thin film inductors with the nanogranular magnetic films are now required to have less losses when operating at high frequencies. The larger the coercivity (Hc) of the nanogranular magnetic films, the larger the hysteresis loss. The smaller the specific resistance (ρ) of the nanogranular magnetic films, the larger the eddy current loss. Thus, nanogranular magnetic films with a good coercivity (Hc) and a further improved specific resistance (ρ) are in demand.

• [0011] Patent Document 1: JP Patent Application Laid Open No. S60-152651
• [0012] Patent Document 2: JP Patent Application Laid Open No. 2020-065160
• [0013] Patent Document 3: JP Patent No. 3956061

[0014] It is an object of the present invention to provide a nanogranular magnetic film having a good coercivity (Hc) and a high specific resistance (ρ).

[0015] To achieve the above object, a nanogranular magnetic film according to the present invention comprises a structure including first phases comprised of nano-domains dispersed in a second phase, wherein

• • [0016] the first phases include at least one selected from the group consisting of Fe, Co, and Ni;
  • [0017] the second phase includes at least one selected from the group consisting of O, N, and F;
  • [0018] a ratio of a volume of the first phases to a total volume of the first phases and the second phase is 65% or less; and
  • [0019] the nanogranular magnetic film has a porosity of 0.17 or more and 0.30 or less.

[0020] In the nanogranular magnetic film according to the present invention, the first phases comprised of the nano-domains may have an average size of 30 nm or less.

[0021] In the nanogranular magnetic film according to the present invention, a total of Fe, Co, and Ni may occupy 75 at % or more in the first phases.

[0022] An electronic component according to the present invention includes the above-mentioned nanogranular magnetic film.

[0025] Hereinafter, an embodiment of the present invention will be explained with reference to the drawings.

[0026] As shown in FIG. 1, a nanogranular magnetic film 1 according to the present embodiment has a nanogranular structure. In the nanogranular structure, first phases 11 (nano-domains) are dispersed in a second phase 12. By observing a cross section of the nanogranular magnetic film 1 using a TEM, a TEM image like the one shown in FIG. 2 can be acquired. The TEM image shown in FIG. 2 is a TEM image (magnification: 2,500,000×) of Example 5 described later.

[0027] The first phases 11 (nano-domains) have a nanoscale average size, namely an average size of 50 nm or less. The average size of the first phases 11 (nano-domains) may be 30 nm or less. The size of the respective first phases 11 (nano-domains) may be measured by any method. For example, the equivalent circular diameter of each first phase 11 (nano-domain) in a cross section of the nanogranular magnetic film 1 may be regarded as the size of the first phase 11 (nano-domain).

[0028] Note that the equivalent circular diameter of the first phase 11 (nano-domain) in the cross section of the nanogranular magnetic film 1 means the diameter of a circle having the same area as the area of the first phase 11 (nano-domain) in the cross section of the nanogranular magnetic film 1.

[0029] The first phases 11 may be composed of a pure substance or may be composed of a mixture.

[0030] The first phases 11 are phases including a metal element. Specifically, the first phases 11 include at least one selected from the group consisting of Fe, Co, and Ni. The at least one element selected from the group consisting of Fe, Co, and Ni may be included in the first phases 11 in any way. For example, the at least one element selected from the group consisting of Fe, Co, and Ni may be included in the first phases 11 as a simple substance, as an alloy of the at least one element and another metal element, or as a compound of the at least one element and another element. The compound in the first phases 11 may be an oxide magnetic material, such as a ferrite.

[0031] The total amount of Fe, Co, and/or Ni in the first phases 11 is not limited to particular values. The ratio of the total amount of Fe, Co, and Ni in the first phases 11 to the total amount of Fe, Co, Ni, X1, and X2 in the first phases 11 may be 75 at % or more and may be 80 at % or more.

• • [0032] X1 is a metalloid element. For example, X1 may be at least one metalloid element selected from the group consisting of B, Si, P, C, and Ge.
  • [0033] X2 is a metal element other than Fe, Co, and Ni. For example, X2 may be at least one metal element selected from the group consisting of Cr, Ti, Zr, Hf, V, Nb, Ta, Mo, W, Mn, Cu, Ag, Zn, Al, Sn, Bi, Y, La, and Mg, or at least one metal element selected from the group consisting of Cr, V, Mo, Zr, Nb, Ti, Mn, Zn, Al, Cu, and Y.

[0034] The first phases 11 may include elements other than Fe, Co, Ni, X1, and X2. The ratio of the total amount of the elements other than Fe, Co, Ni, X1, and X2 in the first phases 11 to the total amount of Fe, Co, Ni, X1, and X2 in the first phases 11 may be 5 at % or less.

[0035] The second phase 12 may be composed of a pure substance or may be composed of a mixture.

[0036] The second phase 12 is a phase including a non-metal element. Specifically, the second phase 12 includes at least one selected from the group consisting of O, N, and F. The at least one element selected from the group consisting of O, N, and F may be included in the second phase 12 in any way. For example, the at least one element selected from the group consisting of O, N, and F may be included in the second phase 12 as a compound of the at least one element and another element.

[0037] The compound in the second phase 12 may be any compound. For example, the compound may be SiO₂, Al₂O₃, AlN, ZnO, MgF₂, SnO₂, GaO₂, GeO₂, Si₃N₄·Al₂O₃, and BN. The compound may be at least one selected from SiO₂, Al₂O₃, AlN, ZnO, MgF₂, SnO₂, GaO₂, GeO₂, and Si₃N₄·Al₂O₃.

[0038] The ratio of the volume of the first phases 11 to the total volume of the first phases 11 and the second phase 12 is 65% or less. In other words, provided that V₁ denotes the proportion of the volume of the first phases 11 and V₂ denotes the proportion of the volume of the second phase 12, V₁/(V₁+V₂) has a value of 0.65 or less. The value of V₁/(V₁+V₂) may be 0.60 or less. An excessively large ratio of the volume of the first phases 11 to the total volume of the first phases 11 and the second phase 12 reduces the specific resistance (ρ) of the nanogranular magnetic film, because the first phases 11 are more conductive than the second phase 12.

[0039] There is no lower limit of the ratio of the volume of the first phases 11 to the total volume of the first phases 11 and the second phase 12. The lower limit may be 30% or more. In other words, the value of V₁/(V₁+V₂) may be 0.30 or more. The value of V₁/(V₁+V₂) may be 0.40 or more. The smaller the ratio of the volume of the first phases 11 to the total volume of the first phases 11 and the second phase 12, the higher the specific resistance (ρ), and unfortunately the lower the saturation magnetic flux density.

[0040] The ratio of the volume of the first phases 11 to the total volume of the first phases 11 and the second phase 12 may be measured by any method. For example, the ratio can be calculated from the results of measurement of the nanogranular magnetic film 1 using XRF. The ratio may also be calculated from the ratio of the area of the first phases 11 to the total area of the first phases 11 and the second phase 12 through observation of a cross section of the nanogranular magnetic film 1 using a TEM. In this case, the ratio in terms of area is converted to the ratio in terms of volume.

[0041] The nanogranular magnetic film 1 may include only the first phases 11 and the second phase 12. The nanogranular magnetic film 1 may further include different phases other than the first phases 11 and the second phase 12. The different phases may occupy any proportion. The different phases may partly or entirely be a void.

[0042] The nanogranular magnetic film 1 according to the present embodiment has a porosity of 0.17 or more and 0.30 or less. Including voids within this range, especially at a porosity of 0.17 or more, enables the nanogranular magnetic film 1 to have a particularly increased specific resistance (ρ) without its composition being substantially changed. Note that the coercivity (Hc) becomes too high at a porosity of over 0.30.

[0043] A method of calculating the porosity will be explained below.

[0044] First, the percentages of all substances included in the nanogranular magnetic film 1 are measured in terms of weight. The percentages may be measured by any method. For example, the percentages may be measured using XRF.

[0045] Next, the percentage of each substance is divided by the density of the substance to convert the percentage in terms of weight to the percentage in terms of volume. Then, the total of the percentages of all substances in terms of volume is calculated.

[0046] Next, the total of the percentages of all substances in terms of weight is divided by the total of the percentages of all substances in terms of volume to calculate the theoretical density of the nanogranular magnetic film 1.

[0047] Next, a converted thickness of the nanogranular magnetic film 1 is calculated using the deposited amount (weight per unit area) and the theoretical density of the nanogranular magnetic film 1.

[0048] Next, the actual thickness of the nanogranular magnetic film 1 is measured. The actual thickness of the nanogranular magnetic film 1 may be measured by any method. For example, the actual thickness can be measured with a TEM, a SEM, or a surface profiler. Also, the reliability of measurement results may be checked by correlating multiple measurement apparatuses with each other in advance.

[0049] The value of (1−(converted thickness/actual thickness)) is the porosity. Hereinafter, the simple “thickness” of the film refers to the actual thickness of the film.

[0050] The nanogranular magnetic film 1 may have any thickness. For example, the thickness may be 0.05 μm or more and 200 μm or less. A suitable thickness may be appropriately determined based on usage.

[0051] Hereinafter, a method of manufacturing the nanogranular magnetic film 1 (soft magnetic thin film) according to the present embodiment will be explained.

[0052] The soft magnetic thin film according to the present embodiment may be manufactured by any method, such as sputtering.

[0053] First, a substrate on which to form the nanogranular magnetic film is prepared. The substrate may be any substrate. For example, the substrate may be a silicon substrate, a silicon substrate having a thermal oxide film, a ferrite substrate, a non-magnetic ferrite substrate, a sapphire substrate, a glass substrate, a glass epoxy substrate, or the like. However, the substrate is not limited to these substrates. Any of various ceramic substrates or semiconductor substrates can be used. When it is difficult to check various properties using only the thin film to be formed on the substrate (sample substrate), a dummy substrate may also be used as necessary. The thin film may be formed on the sample substrate and the dummy substrate simultaneously, and the properties of the thin film on the dummy substrate may be regarded as the properties of the thin film on the sample substrate.

[0054] Next, a sputtering apparatus is prepared. The sputtering apparatus is capable of multi-target simultaneous sputtering. The sputtering apparatus is further capable of changing the distance between sputtering targets and the substrate per sputtering target.

[0055] Next, a metal sputtering target and a ceramic sputtering target are prepared as the sputtering targets. The metal sputtering target is a sputtering target mainly including Fe, Co, and/or Ni. The ceramic sputtering target is a sputtering target mainly including the compound in the second phase 12. The composition of the metal sputtering target and the composition of the ceramic sputtering target are appropriately adjusted so that the nanogranular magnetic film has a desired compositional ratio.

[0056] Next, the metal sputtering target and the ceramic sputtering target are attached to a sputter gun for metal and a sputter gun for ceramics of the sputtering apparatus respectively. Then, the nanogranular magnetic film is formed on the substrate by multi-target simultaneous sputtering.

[0057] Controlling the voltage applied to each sputtering target can control the film deposition speed and the ratio of the volume of the first phases to the total volume of the first phases and the second phase. The film deposition speed can be, for example, 1 Å/s or more and 100 Å/s or less.

[0058] Controlling the film deposition speed and the film deposition time can control the thickness of the nanogranular magnetic film.

[0059] The present inventors have found that controlling the gas pressure during sputtering and/or the distance between the sputtering targets and the sample substrate can control the porosity of the nanogranular magnetic film. Note that the gas is not limited to particular gases. Examples of the gas include noble gases, particularly Ar.

[0060] Specifically, increasing the gas pressure during sputtering can increase the porosity of the nanogranular magnetic film. Also, increasing the distance between the sputtering targets and the sample substrate can increase the porosity of the nanogranular magnetic film.

[0061] Now, a mechanism by which the porosity of the nanogranular magnetic film changes will be explained. Note that the gas used in the following explanation is a noble gas.

[0062] In sputtering, the sputtering targets have negative charge. The noble gas atoms between the sputtering targets and the substrate are ionized to produce noble gas positive ions and electrons. The noble gas positive ions undergo elastic collision with the sputtering targets having negative charge. At this time, the noble gas positive ions receive electrons from the sputtering targets to become noble gas atoms. In response to the kinetic energy of the noble gas positive ions at the time of elastic collision with the sputtering targets, sputtering particles are sputtered out of the sputtering targets. These sputtering particles are deposited on the substrate to form a sputtering film.

[0063] The sputtering particles sputtered out of the sputtering targets may undergo elastic collision with the noble gas atoms in the film formation chamber while moving from the surfaces of the sputtering targets to the substrate. The sputtering particles lose their kinetic energy as they undergo elastic collision with the noble gas atoms. The higher the energy, particularly the kinetic energy, of the sputtering particles at the time of reaching the substrate, the denser the sputtering film. Conversely, the lower the energy, particularly the kinetic energy, of the sputtering particles at the time of reaching the substrate, the less dense the sputtering film.

[0064] Also, the shorter the distance between the sputtering targets and the substrate, the higher the kinetic energy of the sputtering particles when they reach the substrate. Consequently, the shorter the distance between the sputtering targets and the substrate, the lower the porosity of the nanogranular magnetic film.

[0065] Also, especially when the distance between the ceramic sputtering target and the substrate is long, the porosity of the nanogranular magnetic film is likely to be high. In contrast, changing the distance between the metal sputtering target and the substrate is not likely to change the porosity. Consequently, bringing only the ceramic sputtering target farther from the substrate can increase the porosity of the nanogranular magnetic film to control the porosity at 0.17 or more and 0.30 or less.

[0066] The distance between the ceramic sputtering target and the substrate may be changed by any method. The distance is changed by a method appropriate for the sputtering apparatus. Typically, the sputter gun for ceramics is moved to change the distance between the ceramic sputtering target and the substrate.

[0067] When only moving the sputter gun for ceramics cannot increase the distance between the ceramic sputtering target and the substrate to an intended distance, for example, the loading position of the substrate may be moved farther from the sputter gun for ceramics than a specified value. In this case, the sputter gun for metal is moved as necessary to change the distance between the sputter gun for metal and the substrate as well.

[0068] Conversely, when only moving the sputter gun for ceramics cannot reduce the distance between the ceramic sputtering target and the substrate to an intended distance, for example, the substrate holder where the substrate is attached may be moved closer to the sputter gun for ceramics than a specified value. Also, a jig or a shutter around the substrate may be detached. Further, a spacer may be attached between a transport tray and the substrate, or an aluminum plate may be attached between the substrate and the substrate holder. In this case, the sputter gun for metal is moved as necessary to change the distance between the sputter gun for metal and the substrate as well.

[0069] The specific resistance (ρ) of the nanogranular magnetic film may be measured by any method. For example, a resistivity meter can be used for measurement. The magnetic properties of the nanogranular magnetic film may be measured by any method. For example, a vibrating sample magnetometer (VSM) can be used for measurement.

[0070] Hereinabove, one embodiment of the present invention has been explained, but the present invention is not to be limited to the embodiment.

[0071] The nanogranular magnetic film according to the present embodiment may be used for any purpose. A magnetic material including the nanogranular magnetic film is suitable for electronic components that are particularly used at a high frequency and are required to have a high specific resistance (ρ). Examples of the electronic components include a perpendicular recording medium, a TMR head for a magnetoresistive random access memory (MRAM), a magneto-optical element, a thin film inductor, a noise filter, and a high-frequency capacitor.

[0072] The magnetic material including the nanogranular magnetic film in the above-mentioned electronic components may have a single-layer structure including only the nanogranular magnetic film, or may have a multilayer structure including the nanogranular magnetic film and other films (e.g., SiO₂ films) containing other materials. The number of layers is not limited to particular numbers.

[0073] Hereinafter, the present invention will be specifically explained with examples.

[0074] Two silicon substrates (6×6×0.6 mmt) each having a thermal oxide film were prepared as sample substrates for measurement with a VSM. One silicon substrate (6×6×0.6 mmt) having a thermal oxide film with a resist (length: 6 mm, width: 0.5 to 1 mm) thereon was prepared as a dummy substrate for film thickness measurement. One sapphire substrate (φ2 inches, 0.4 mmt) was prepared as a dummy substrate for composition check and sheet resistance measurement. On each of these substrates, a nanogranular magnetic film was formed simultaneously. A multi-target simultaneous sputtering apparatus (ES340 manufactured by EIKO Corporation) was used for film formation. Further details will be explained below.

[0075] In Experiment 1, a metal sputtering target made of an alloy having an atomic ratio of Fe₆₀Co₄₀ and a ceramic sputtering target made of SiO₂ were prepared as sputtering targets. Next, the sputtering targets were attached to different sputter guns.

[0076] In Experiment 1, the gas pressure of Ar during sputtering was fixed to 0.4 Pa. The distance (TS distance) between the ceramic sputtering target and the sample substrates was set to a value shown in Table 1 to control the porosity of the nanogranular magnetic film. The distance between the metal sputtering target and the sample substrates was 90 mm.

[0077] Sputtering was performed with controlled power input to each sputtering target so that the ratio of the volume of first phases to the total volume of the first phases and a second phase was about 55% and the film deposition speed was 1.0 Å/s, to form the nanogranular magnetic film. The nanogranular magnetic film had a thickness of 300 nm.

[0078] The nanogranular magnetic film formed on the sapphire substrate was measured with an XRF spectrometer (Primus IV manufactured by Rigaku Corporation) to calculate the ratio of the volume of the first phases to the total volume of the first phases and the second phase. Table 1 shows the results.

[0079] Using a TEM (JEM-2100F manufactured by JEOL Ltd.), it was confirmed that the nanogranular magnetic film formed on one silicon substrate having the thermal oxide film of each sample had a structure including the first phases 11 (nano-domains) dispersed in the second phase 12. Using the TEM, it was further confirmed that the first phases (nano-domains) had an average size of 30 nm or less. Using TEM-EDS, it was also confirmed that the ratio of the total amount of Fe, Co, and Ni in the first phases to the total amount of Fe, Co, Ni, X1, and X2 in the first phases was 75 at % or more.

[0080] The porosity of the nanogranular magnetic film of each sample was measured by the above-mentioned method. XRF was used to measure the percentages of all substances in the nanogranular magnetic film, which were necessary for calculating the converted thickness. The percentages measured using the thin film formed on the sapphire substrate were regarded as the percentages of the nanogranular magnetic film of each sample. Primus IV manufactured by Rigaku Corporation was used as an XRF spectrometer. In XRF, a thin film FP method was used with a measurement diameter of φ30 mm.

[0081] The actual thickness of the nanogranular magnetic film was measured with a surface profiler (KLA-Tencor P-16+), which had been correlated with the TEM in advance. Specifically, the actual thickness of the thin film formed on the dummy substrate for film thickness measurement was measured with the surface profiler. The measured film thickness was regarded as the actual film thickness of each sample. Table 1 shows the results.

[0082] The coercivity (Hc) of the nanogranular magnetic film formed on the other silicon substrate having the thermal oxide film of each sample was measured with a VSM. The magnetic properties were measured with the VSM (TM-VSM331483-HGC) manufactured by TAMAKAWA CO., LTD. at a magnetic field of −10,000 Oe to +10,000 Oe. Table 1 shows the results. The coercivity (Hc) was regarded as good at 4.00 Oe or less and better at 3.00 Oe or less.

[0083] To calculate the specific resistance (ρ) of each sample, the sheet resistance was measured with a resistivity meter (Loresta-EP MCP-T360 manufactured by Mitsubishi Chemical Corporation). The sheet resistance of the thin film formed on the sapphire substrate for composition check and sheet resistance measurement was measured. The measured sheet resistance was regarded as the sheet resistance of the thin film in each experiment. Using the actual thickness of the thin film formed on the dummy substrate for film thickness measurement, the specific resistance (ρ) of each sample was calculated.

[0084] The specific resistance (ρ) was regarded as good when the ratio (may be referred to as “ρ ratio”) of a ρ value to the ρ value of a sample having a TS distance of 90 mm was 1.20 or more. Table 1 shows the results.

[0085]

TABLE 1
		TS
	V1/	distance		ρ		Hc
	(V1 + V2)	(mm)	Porosity	(Ω · cm)	ρ ratio	(Oe)
Comparative	0.55	55	0.07	0.060	0.90	1.97
Example 1
Comparative	0.55	75	0.11	0.063	0.94	1.88
Example 2
Comparative	0.55	90	0.15	0.067	1.00	1.84
Example 3
Comparative	0.55	95	0.15	0.070	1.04	1.85
Example 4
Example 1	0.55	105	0.17	0.087	1.30	1.90
Example 2	0.55	140	0.19	0.110	1.64	1.96
Example 3	0.55	200	0.23	0.304	4.53	2.60

[0086] According to Table 1, it was confirmed that, the longer the TS distance, namely the longer the distance between the ceramic sputtering target and the sample substrates, the larger the porosity. It was also confirmed that Examples 1 to 3 with a porosity of 0.17 or more and 0.30 or less had higher p values than the Comparative Examples under substantially the same conditions except for the porosity.

[0087] Experiment 2 was carried out as in Experiment 1, except that the ratio of the volume of the first phases to the total volume of the first phases and the second phase was about 47%. Table 2 shows the results. For the Example and the Comparative Example having a TS distance of 240 mm or more, the loading positions of the substrates were changed, and the distance between the metal sputtering target and the sample substrates was accordingly adjusted to 90 mm.

[0088]

TABLE 2
		TS
	V1/	distance		ρ		Hc
	(V1 + V2)	(mm)	Porosity	(Ω · cm)	ρ ratio	(Oe)
Comparative	0.47	55	0.07	1.03	0.94	0.25
Example 5
Comparative	0.47	75	0.09	1.05	0.95	0.22
Example 6
Comparative	0.47	90	0.15	1.10	1.00	0.21
Example 7
Example 4	0.47	105	0.18	1.41	1.28	0.20
Example 5	0.47	140	0.20	1.88	1.71	0.22
Example 6	0.47	150	0.21	2.46	2.24	0.27
Example 7	0.47	200	0.24	3.66	3.33	0.42
Example 8	0.47	240	0.30	8.10	7.36	0.99
Comparative	0.47	270	0.37	25.5	23.18	4.12
Example 8

[0089] According to Table 2, it was confirmed that, the longer the TS distance, namely the longer the distance between the ceramic sputtering target and the sample substrates, the larger the porosity. It was also confirmed that Examples 4 to 8 with a porosity of 0.17 or more and 0.30 or less had higher p values than the Comparative Examples under substantially the same conditions except that the porosity was too low. It was further confirmed that Examples 4 to 8 with a porosity of 0.17 or more and 0.30 or less had lower Hc values than the Comparative Example under substantially the same conditions except that the porosity was too high.

[0090] Experiment 3 was carried out as in Experiment 1, except that the composition of the metal sputtering target was changed to change the composition of the first phases as shown in Tables 3A and 3B. Tables 3A and 3B show the results. Note that, in Experiments 3, 5, and 6, the Hc values of all Examples were 3.00 Oe or less. Note that, when Si was intentionally not included in the metal sputtering target, it may be that the first phases included a small amount of Si attributable to the ceramic sputtering target. However, such a small amount of Si was not taken into account in Tables 3A and 3B.

[0091]

TABLE 3A
	First phase composition (at %)
				X1	X1	X2	V1/	TS distance		ρ
	Fe	Co	Ni	Element	Percentage	Element	Percentage	Element	Percentage	(V1 + V2)	(mm)	Porosity	(Ω · cm)	ρ ratio
Comparative	60	40	—	—	—	—	—	—	—	0.55	90	0.15	0.067	1.00
Example 3
Example 2	60	40	—	—	—	—	—	—	—	0.55	140	0.19	0.110	1.64
Comparative	20	80	—	—	—	—	—	—	—	0.55	90	0.15	0.072	1.00
Example 9
Example 9	20	80	—	—	—	—	—	—	—	0.55	140	0.20	0.127	1.76
Comparative	80	20	—	—	—	—	—	—	—	0.55	90	0.16	0.060	1.00
Example 10
Example 10	80	20	—	—	—	—	—	—	—	0.55	140	0.20	0.103	1.72
Comparative	100	—	—	—	—	—	—	—	—	0.55	90	0.16	0.056	1.00
Example 11
Example 11	100	—	—	—	—	—	—	—	—	0.55	140	0.19	0.097	1.73
Comparative	—	100	—	—	—	—	—	—	—	0.55	90	0.14	0.062	1.00
Example 12
Example 12	—	100	—	—	—	—	—	—	—	0.55	140	0.18	0.106	1.71
Comparative	55	—	45	—	—	—	—	—	—	0.55	90	0.13	0.077	1.00
Example 13
Example 13	55	—	45	—	—	—	—	—	—	0.55	140	0.18	0.128	1.66
Comparative	75	—	—	B	25	—	—	—	—	0.55	90	0.14	0.088	1.00
Example 14
Example 14	75	—	—	B	25	—	—	—	—	0.55	140	0.19	0.153	1.74
Comparative	85	—	—	P	15	—	—	—	—	0.55	90	0.14	0.080	1.00
Example 15
Example 15	85	—	—	P	15	—	—	—	—	0.55	140	0.18	0.137	1.71
Comparative	85	—	—	C	15	—	—	—	—	0.55	90	0.15	0.076	1.00
Example 16
Example 16	85	—	—	C	15	—	—	—	—	0.55	140	0.19	0.133	1.75
Comparative	80	—	—	B	10	Si	10	—	—	0.55	90	0.14	0.097	1.00
Example 17
Example 17	80	—	—	B	10	Si	10	—	—	0.55	140	0.19	0.162	1.67
Comparative	98	—	—	—	—	Ge	2	—	—	0.55	90	0.16	0.057	1.00
Example 18
Example 18	98	—	—	—	—	Ge	2	—	—	0.55	140	0.18	0.098	1.72

[0092]

TABLE 3B
	First phase composition (at %)
				X1	X1	X2	V1/	TS distance		ρ
	Fe	Co	Ni	Element	Percentage	Element	Percentage	Element	Percentage	(V1 + V2)	(mm)	Porosity	(Ω · cm)	ρ ratio
Comparative	98	—	—	—	—	—	—	Cr	2	0.55	90	0.16	0.062	1.00
Example 19
Example 19	98	—	—	—	—	—	—	Cr	2	0.55	140	0.19	0.100	1.61
Comparative	98	—	—	—	—	—	—	V	2	0.55	90	0.15	0.058	1.00
Example 20
Example 20	98	—	—	—	—	—	—	V	2	0.55	140	0.19	0.097	1.67
Comparative	98	—	—	—	—	—	—	Mo	2	0.55	90	0.16	0.059	1.00
Example 21
Example 21	98	—	—	—	—	—	—	Mo	2	0.55	140	0.19	0.099	1.68
Comparative	98	—	—	—	—	—	—	Zr	2	0.55	90	0.16	0.060	1.00
Example 22
Example 22	98	—	—	—	—	—	—	Zr	2	0.55	140	0.19	0.100	1.67
Comparative	98	—	—	—	—	—	—	Nb	2	0.55	90	0.15	0.059	1.00
Example 23
Example 23	98	—	—	—	—	—	—	Nb	2	0.55	140	0.18	0.098	1.66
Comparative	98	—	—	—	—	—	—	Ti	2	0.55	90	0.16	0.058	1.00
Example 24
Example 24	98	—	—	—	—	—	—	Ti	2	0.55	140	0.19	0.097	1.67
Comparative	98	—	—	—	—	—	—	Mn	2	0.55	90	0.15	0.056	1.00
Example 25
Example 25	98	—	—	—	—	—	—	Mn	2	0.55	140	0.19	0.096	1.71
Comparative	98	—	—	—	—	—	—	Zn	2	0.55	90	0.16	0.055	1.00
Example 26
Example 26	98	—	—	—	—	—	—	Zn	2	0.55	140	0.19	0.093	1.69
Comparative	98	—	—	—	—	—	—	Al	2	0.55	90	0.15	0.054	1.00
Example 27
Example 27	98	—	—	—	—	—	—	Al	2	0.55	140	0.19	0.091	1.69
Comparative	98	—	—	—	—	—	—	Cu	2	0.55	90	0.16	0.052	1.00
Example 28
Example 28	98	—	—	—	—	—	—	Cu	2	0.55	140	0.18	0.088	1.69
Comparative	98	—	—	—	—	—	—	Y	2	0.55	90	0.16	0.059	1.00
Example 29
Example 29	98	—	—	—	—	—	—	Y	2	0.55	140	0.18	0.099	1.68

[0093] According to Tables 3A and 3B, it was confirmed that, even when the composition of the metal sputtering target was changed, Examples 2 and 9 to 29 with a porosity of 0.17 or more and 0.30 or less had higher ρ values than the Comparative Examples under substantially the same conditions except for the porosity.

[0094] Experiment 4 was carried out as in Example 2 and Comparative Example 3 of Experiment 1, except that the ratio of the volume of the first phases to the total volume of the first phases and the second phase was changed. Table 4 shows the results.

[0095]

TABLE 4
	V1/	TS distance		ρ		Hc
	(V1 + V2)	(mm)	Porosity	(Ω · cm)	ρ ratio	(Oe)
Comparative Example 30	0.34	90	0.16	30.8	1.00	0.14
Example 30	0.34	140	0.21	62.2	2.02	0.12
Comparative Example 31	0.38	90	0.16	10.4	1.00	0.18
Example 31	0.38	140	0.20	19.5	1.88	0.14
Comparative Example 7	0.47	90	0.15	1.10	1.00	0.21
Example 5	0.47	140	0.20	1.88	1.71	0.22
Comparative Example 3	0.55	90	0.15	0.067	1.00	1.84
Example 2	0.55	140	0.19	0.110	1.64	1.96
Comparative Example 32	0.65	90	0.14	0.0071	1.00	2.77
Example 32	0.65	140	0.19	0.0090	1.27	2.95
Comparative Example 33	0.75	90	0.14	0.000094	1.00	19.52
Comparative Example 34	0.75	140	0.18	0.000099	1.05	22.09

[0096] According to Table 4, when the ratio of the volume of the first phases to the total volume of the first phases and the second phase was 65% or less, the porosity was 0.17 or more and 0.30 or less, and the ρ value was higher than the Comparative Examples under substantially the same conditions except for the porosity.

[0097] When the ratio of the volume of the first phases to the total volume of the first phases and the second phase was 75%, the ρ value was significantly lower and the Hc value was significantly higher than when the ratio was 65% or less. Even at a porosity of 0.17 or more, the ρ value was not sufficiently higher than that of the Comparative Example under substantially the same conditions except for the porosity.

[0098] Experiment 5 was carried out as in Example 2 and Comparative Example 3 of Experiment 1, except that the compound included in the second phase was changed. To change the compound included in the second phase, the ceramic sputtering target was changed. Table 5 shows the results.

[0099]

TABLE 5
	Ceramic sputtering	V1/	TS distance		ρ
	target	(V1 + V2)	(mm)	Porosity	(Ω · cm)	ρ ratio
Comparative Example 35	Al2O3	0.56	90	0.14	0.072	1.00
Example 33	Al2O3	0.56	140	0.19	0.131	1.82
Comparative Example 36	AlN	0.53	90	0.15	0.065	1.00
Example 34	AlN	0.53	140	0.20	0.102	1.57
Comparative Example 3	SiO2	0.55	90	0.15	0.067	1.00
Example 2	SiO2	0.55	140	0.19	0.110	1.64
Comparative Example 37	ZnO	0.55	90	0.16	0.058	1.00
Example 35	ZnO	0.55	140	0.20	0.094	1.62
Comparative Example 38	MgF2	0.54	90	0.16	0.034	1.00
Example 36	MgF2	0.54	140	0.19	0.049	1.44
Comparative Example 39	SnO2	0.55	90	0.15	0.077	1.00
Example 37	SnO2	0.55	140	0.19	0.124	1.61
Comparative Example 40	GaO2	0.56	90	0.14	0.061	1.00
Example 38	GaO2	0.56	140	0.18	0.097	1.59
Comparative Example 41	GeO2	0.55	90	0.15	0.064	1.00
Example 39	GeO2	0.55	140	0.19	0.101	1.58
Comparative Example 42	Si3N4•Al2O3	0.55	90	0.15	0.064	1.00
Example 40	Si3N4•Al2O3	0.55	140	0.19	0.101	1.58

[0100] According to Table 5, it was confirmed that, even when the compound included in the second phase was changed, provided that the porosity was 0.17 or more and 0.30 or less, the ρ value was higher than that of the Comparative Examples under substantially the same conditions except for the porosity.

[0101] Experiment 6 was carried out as in Comparative Example 3 of Experiment 1, except that the distance (“TS2 distance”) between the metal sputtering target and the sample substrates was changed. Table 6 shows the results. Note that the ρ ratio denoted the ratio of a ρ value to the ρ value of Comparative Example 3.

[0102]

TABLE 6
	V1/	TS distance	TS2 distance		ρ
	(V1 + V2)	(mm)	(mm)	Porosity	(Ω · cm)	ρ ratio
Comparative Example 3	0.55	90	90	0.15	0.067	1.00
Example 41	0.55	140	55	0.18	0.102	1.52
Example 2	0.55	140	90	0.19	0.110	1.64
Example 42	0.55	140	140	0.21	0.109	1.63

[0103] According to Table 6, it was confirmed that changing the TS2 distance did not significantly change the porosity or the ρ value.

[0104] The substrate temperature during sputtering was increased to change the average particle size of the first phases 11 of the nanogranular magnetic film, namely the average size of the first phases (nano-domains). Samples were manufactured as in Example 2 except that the substrate temperature was different, and were compared. Table 7 shows the results.

[0105]

TABLE 7
			Substrate
	V1/	TS distance	temperature	Average size		ρ	Hc
	(V1 + V2)	(mm)	(° C.)	(nm)	Porosity	(Ω · cm)	(Oe)
Example 2	0.55	140	R.T.	4	0.19	0.110	1.89
Example 43	0.55	140	200	12	0.18	0.106	2.08
Example 44	0.55	140	300	30	0.18	0.101	2.55
Example 45	0.55	140	350	50	0.17	0.079	3.87
R.T. = Room Temperature (25° C.)

[0106] According to Table 7, as the average particle size of the first phases 11 increased, namely as the average size of the first phases (nano-domains) increased, the porosity gradually decreased. Along with the decrease of porosity, the coercivity increased. In Example 45 with an average particle size, namely an average size of the first phases (nano-domains) of over 30 nm, the porosity decreased to 0.17 and the coercivity (Hc) increased to a value rather higher than that of other Examples.

• • [0107] 1 . . . nanogranular magnetic film
  • [0108] 11 . . . first phase
  • [0109] 12 . . . second phase